| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
|---|
| 02/07/2007 | CN1909186A Processing chamber, flat display device production device, plasma treatment method using same |
| 02/01/2007 | US20070023392 Method for removing at least one area of a layer of a component consisting of metal or a metal compound |
| 02/01/2007 | DE19844882B4 Vorrichtung zur Plasma-Prozessierung mit In-Situ-Überwachung und In-Situ-Überwachungsverfahren für eine solche Vorrichtung An apparatus for plasma processing with in-situ monitoring and in-situ monitoring method for such a device |
| 01/31/2007 | CN1905243A Method for manufacturing a mask and an organic EL element and an organic EL printer |
| 01/31/2007 | CN1905135A Plasma etching apparatus |
| 01/30/2007 | US7168436 Gas for removing deposit and removal method using same |
| 01/24/2007 | CN1901152A Etching method and apparatus |
| 01/24/2007 | CN1296975C Processing apparatus for plasma |
| 01/23/2007 | US7166488 Metal MEMS devices and methods of making same |
| 01/23/2007 | US7166480 Particle control device and particle control method for vacuum processing apparatus |
| 01/18/2007 | US20070012401 Plasma processing apparatus |
| 01/17/2007 | EP1742758A1 A method of laser etching a structure by first radiating areas of the structure for altering the crystallinity |
| 01/17/2007 | EP1565592B1 Method for cleaning a process chamber |
| 01/17/2007 | CN1896315A Ion beam etching method and ion beam etching apparatus |
| 01/11/2007 | DE19501387B4 Verfahren zum Bilden einer im wesentlichen gleichmäßigen Anordnung scharfer Emitterspitzen A method for forming a substantially uniform array of sharp emitter tips |
| 01/11/2007 | DE102005032737A1 Dry-etching silicon-containing substrates, especially wafers for semiconductor elements, contains silicon component, e.g. silane, to form side-wall passivation layer |
| 01/11/2007 | DE102005032320A1 Decontaminating optical element surface, especially in projection illumination plant for microlithography, using cleaning device applying activated reducing gas to the surface under atmospheric pressure |
| 01/11/2007 | DE102005031602A1 Reaktor zur Durchführung eines Ätzverfahrens für einen Stapel von maskierten Wafern und Ätzverfahren Reactor for performing an etching process for a stack of wafers and etching unmasked |
| 01/10/2007 | CN1892980A Chamber isolation valve RF grounding |
| 01/10/2007 | CN1891864A Dry treatment method for superconductor cavity |
| 01/10/2007 | CN1891863A Rare earth metal member and making method |
| 01/10/2007 | CN1891861A Process kit design particle generation |
| 01/10/2007 | CN1891856A Free radical initiator in remote plasma chamber clean |
| 01/09/2007 | US7159537 Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems |
| 01/04/2007 | US20070000296 Rolled product, method and device for the production thereof, and use of the same |
| 01/04/2007 | DE202006017024U1 Vorrichtung zum Behandeln von Substraten Apparatus for processing substrates |
| 01/03/2007 | EP1737998A2 Remote chamber methods for removing surface deposits |
| 01/03/2007 | EP1079423B1 Apparatus for gas processing |
| 01/03/2007 | CN1293596C Chamber components having textured surfaces and method of manufacture |
| 12/27/2006 | CN1885491A Vacuum processing apparatus and method operation thereof |
| 12/27/2006 | CN1885488A Top electrode, plasma processing device and method |
| 12/20/2006 | EP1733072A2 Remote chamber methods for removing surface deposits |
| 12/20/2006 | EP1733071A2 Remote chamber methods for removing surface deposits |
| 12/20/2006 | CN1882217A 等离子体处理装置 Plasma processing apparatus |
| 12/20/2006 | CN1881555A Substrate-placing platform, substrate processing device and production method of substrate-placing platform |
| 12/20/2006 | CN1881537A Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method |
| 12/20/2006 | CN1881529A Substrate processing device |
| 12/20/2006 | CN1291460C Plasma processing method and apparatus |
| 12/14/2006 | US20060278611 Method and device for flattening surface of solid |
| 12/14/2006 | DE102005026334A1 Method for processing of medium- and long-wave surface shape of work piece e.g., for optical elements, involves eroding modified layers to give work piece modified surface |
| 12/13/2006 | CN1877254A Etching volume measuring device and method, etching device |
| 12/13/2006 | CN1876894A 离子源 Ion source |
| 12/13/2006 | CN1876888A Method (variant) for cleaning shade in display production and apparatus for implementing the method |
| 12/06/2006 | EP1729551A1 Plasma generating equipment |
| 12/06/2006 | CN1875129A Surface treatment method and device |
| 12/06/2006 | CN1873911A Plasma processing chamber, potential controlling apparatus, method, program and storage medium |
| 12/06/2006 | CN1288711C Diffuser and rapid cycle chamber |
| 11/30/2006 | WO2006126520A1 Dry etching method, method for forming fine structure, mold and method for producing same |
| 11/28/2006 | US7141178 Plasma etching method |
| 11/22/2006 | CN1865496A Substrate processing apparatus and substrate processing method |
| 11/21/2006 | US7138065 Method for removing at least one area of a layer of a component consisting of metal or a metal compound |
| 11/16/2006 | WO2005090638A8 Remote chamber methods for removing surface deposits |
| 11/16/2006 | US20060255447 Plasma etching method |
| 11/16/2006 | DE112005000153T5 Erweiterte Multidruck-Werkstückprozessierung Advanced multi-pressure Werkstückprozessierung |
| 11/09/2006 | US20060249254 Plasma processing apparatus and plasma processing method |
| 11/09/2006 | DE102004049825B4 Verfahren zum Entschichten von beschichteten Bauteilen A method for stripping of coated components |
| 11/08/2006 | CN1860593A Method and device for flattening surface of solid |
| 11/08/2006 | CN1284209C Plasma processing method and apparatus |
| 11/07/2006 | US7132996 Plasma production device and method and RF driver circuit |
| 11/02/2006 | WO2006115242A1 Surface-treated fine particle, surface-treating apparatus, and method for surface-treating fine particle |
| 11/01/2006 | CN1855385A Dry-etching method |
| 11/01/2006 | CN1855384A Semiconductor machinery and method for decreasing exhaust pollution |
| 10/26/2006 | DE102005019212A1 Process to descale galvanized steel tube by high-frequency electricity for application of end-cap |
| 10/25/2006 | CN1851898A Thimble device |
| 10/25/2006 | CN1851882A Grating etching technology avoiding micro-channel phenomenon |
| 10/25/2006 | CN1851881A Semiconductor etching apparatus |
| 10/25/2006 | CN1851875A Gate etching process |
| 10/25/2006 | CN1851872A Polycrystalline silicon pulse etching process for improving anisotropy |
| 10/25/2006 | CN1851864A Silicon chip unloading process |
| 10/25/2006 | CN1851860A Bottom electrode assembly for semiconductor device |
| 10/25/2006 | CN1851858A Gas injection and diffusion system |
| 10/25/2006 | CN1851857A Silicon-chip separating process |
| 10/25/2006 | CN1851856A Reaction chamber for semiconductor treatment |
| 10/25/2006 | CN1851855A Plasma etching device exhaustring |
| 10/25/2006 | CN1851854A Lower-extraction type etching device |
| 10/25/2006 | CN1851853A Device and method for reducing thin-film type capacitance vacuum gauge zero-point drift |
| 10/25/2006 | CN1851852A Plasma etching device |
| 10/25/2006 | CN1851848A Plasma reaction chamber temperature control system on-line fault detecting device and method |
| 10/25/2006 | CN1851053A Shielding plate for enhancing flow field uniformity |
| 10/25/2006 | CN1851052A Control method for removing residual gas for etching process |
| 10/25/2006 | CN1851051A Method for controlling chip temperature in reaction chamber for semiconductor etching process |
| 10/25/2006 | CN1851050A Granule control method for polycrystalline silicon etching process |
| 10/25/2006 | CN1850349A Air-intake nozzle |
| 10/25/2006 | CN1850348A Gas nozzle with function of increasing air-flow distribution evenness |
| 10/25/2006 | CN1850347A Air-intaking nozzle with adjustable air-supplying evenness |
| 10/19/2006 | DE102005017632A1 Method of controlling local etching or deposition in modification of surfaces with pulsed determination of a removal or deposition profile ion streams useful in the high accuracy forming of optical component surfaces involving |
| 10/18/2006 | CN1848389A Etching technology for reducing plasma damage |
| 10/18/2006 | CN1848388A Method for controlling key size deviation in chip etching technology |
| 10/18/2006 | CN1848386A Grate etching method |
| 10/18/2006 | CN1848385A Inductive coupling plasma device |
| 10/18/2006 | CN1848383A Method for removing residual polymer in polysilicon etching technology |
| 10/18/2006 | CN1848377A Gate valve apparatus and processing system |
| 10/18/2006 | CN1848376A Semiconductor processing system reaction chamber |
| 10/18/2006 | CN1848375A Method for releasing chip static electricity thoroughly in chip etching equipment |
| 10/18/2006 | CN1848373A Fault detection method in chip etching technology |
| 10/18/2006 | CN1848372A Plasma reaction device |
| 10/18/2006 | CN1848371A Plasma etching apparatus |
| 10/18/2006 | CN1848369A Silicon chip unloading technology capable of raising production volume and reducing silicon chip surface roughness |
| 10/18/2006 | CN1848367A Plasma reaction chamber |
| 10/18/2006 | CN1847458A Dry cleaning process in polycrystal silicon etching |