| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 03/05/2008 | CN100373540C Bottom electrode assembly for semiconductor device |
| 03/04/2008 | US7339656 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 02/27/2008 | EP1036210B1 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 02/27/2008 | CN101131917A Temperature control device of etching equipment and its method for controlling wafer temperature |
| 02/27/2008 | CN100372075C Inductive coupling plasma device |
| 02/26/2008 | US7335278 Plasma processing apparatus and plasma processing method |
| 02/20/2008 | CN101128910A Improved method and apparatus for monitoring a microstructure etching process |
| 02/20/2008 | CN101126147A Ion beam treating dielectric surface method and device for applying the same |
| 02/20/2008 | CN100370593C Electrostatic chuck for accelerating wafer etching uniformity |
| 02/20/2008 | CN100370521C Thin-film magnetic head and manufacturing method, head gimbal assembly with thin-film magnetic head, and magnetic disk apparatus |
| 02/19/2008 | US7331306 Plasma processing method and apparatus |
| 02/13/2008 | EP1319239B1 Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto |
| 02/13/2008 | CN101124663A Method for processing outer periphery of substrate and apparatus thereof |
| 02/13/2008 | CN101121108A Vacuum processing apparatus |
| 02/13/2008 | CN100369214C Grate etching method |
| 02/13/2008 | CN100369213C Plasma processing device and method thereof |
| 02/13/2008 | CN100369192C Semiconductor processing system reaction chamber |
| 02/06/2008 | EP1884505A1 Dry etching method, method for forming fine structure, mold and method for producing same |
| 02/06/2008 | CN101118854A Plasma etching system |
| 02/06/2008 | CN101117715A Polysilicon etching cavity |
| 02/06/2008 | CN100366875C Compressor wheel assembly |
| 01/30/2008 | CN101113514A Substrate processing apparatus |
| 01/23/2008 | EP1451892A4 Plasma production device and method and rf driver circuit |
| 01/23/2008 | EP1320875A4 Gas compositions for cleaning the interiors of reactors as well as for etching films of silicon-containing compounds |
| 01/23/2008 | CN101111934A Method and apparatus for controlling spatial temperature distribution |
| 01/23/2008 | CN101110346A Array type electron beam etching device and etching method |
| 01/17/2008 | US20080011718 Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface |
| 01/17/2008 | DE102006033072A1 Molten metal immersion process for tin-plating involves plasma-physical etching and immersion within vacuum chamber |
| 01/16/2008 | CN101106069A Method for extending use life of reaction cavity in plasma etching system |
| 01/16/2008 | CN100362645C Thimble device |
| 01/16/2008 | CN100362624C Device for controlling D.C. bias on wafer |
| 01/16/2008 | CN100362622C Lower-extraction type etching device |
| 01/16/2008 | CN100362621C Device and method for reducing thin-film type capacitance vacuum gauge zero-point drift |
| 01/10/2008 | US20080008890 Electronic device and method of fabrication of a same |
| 01/10/2008 | DE19503623B4 Drehratensensor Rotation rate sensor |
| 01/09/2008 | EP1742758B1 A method of and an arrangement for laser etching a structure by first radiating areas of the structure for altering the crystallinity |
| 01/09/2008 | CN101102979A Method of dry etching, method of microstructure formation, mold and process for producing the same |
| 01/03/2008 | WO2008001670A1 Monoparticulate-film etching mask and process for producing the same, process for producing fine structure with the monoparticulate-film etching mask, and fine structure obtained by the production process |
| 12/27/2007 | DE102006029039A1 Monitoring of processes for ion etching or material deposition in vacuum chamber, employs quartz resonator, excitation oscillator and sensor inside chamber |
| 12/26/2007 | CN100358080C Gas distribution apparatus for semiconductor processing |
| 12/25/2007 | US7311796 Plasma processing apparatus |
| 12/19/2007 | CN101090065A Process including silo-chloro passivation for etching tungsten silicide overlying polysilicon |
| 12/13/2007 | US20070284044 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 12/12/2007 | CN100355019C Substrate processing apparatus, pressure control method for substrate processing apparatus |
| 12/11/2007 | US7307826 Apparatus and method for removal of surface oxides via fluxless technique involving electron attachment and remote ion generation |
| 11/29/2007 | US20070274875 Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas |
| 11/28/2007 | CN200983358Y Improved structure of vacuum cavity |
| 11/28/2007 | CN100351998C Method of surface texturizing |
| 11/28/2007 | CN100351422C Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 11/27/2007 | US7301238 Structure and method of forming an enlarged head on a plug to eliminate the enclosure requirement |
| 11/22/2007 | US20070266947 Plasma generating device |
| 11/21/2007 | CN101075550A Corrosion resistant member |
| 11/21/2007 | CN101074473A Ceramic coating member for semiconductor processing apparatus |
| 11/21/2007 | CN100350571C Silex glass spraying component and manufacturing method thereof |
| 11/15/2007 | US20070264441 Plasma Processing Apparatus and Plasma Processing Method |
| 11/08/2007 | US20070259276 Photoresists; etching; semiconductor integrated circuit, charge-coupled device, color fiter, liquid crystal display device, magnetic head |
| 11/07/2007 | CN100348077C Plasma treatment device and substrate surface treatment device |
| 11/07/2007 | CN100347757C Method of dry etching, method of manufacturing magnetic recording medium, and magnetic recording medium |
| 11/07/2007 | CN100347343C Method for preparing thin film of transparent hydrophobic born nitride |
| 11/06/2007 | US7291506 Magnetic memory device and method of manufacturing the same |
| 10/31/2007 | DE102006019664A1 Kaltplasma-Handgerät zur Plasma-Behandlung von Oberflächen Cold plasma handset for plasma treatment of surfaces |
| 10/31/2007 | DE102006019461A1 Ätzverfahren zum Materialabtrag an Festkörpern und dessen Verwendung sowie Vorrichtung hierzu Etching process for removing material from solids and its use, and apparatus therefor |
| 10/31/2007 | CN101064238A Plasma reactor apparatus with independent capacitive and toroidal plasma sources |
| 10/30/2007 | US7289866 Plasma processing method and apparatus |
| 10/25/2007 | DE102006030323A1 Verfahren zur Oberflächenbehandlung einer metallischen Substratoberfläche A process for surface treatment of a metallic substrate surface |
| 10/24/2007 | CN101060074A Apparatus and method for radio frequency decoupling and bias voltage control in a plasma reactor |
| 10/18/2007 | WO2007116033A1 Etching process |
| 10/17/2007 | EP1152906A4 Local vectorial particle cleaning |
| 10/17/2007 | CN101054673A Light shield plasma etching method using protective cover |
| 10/17/2007 | CN100343952C Silicon chip unloading technology capable of raising production volume and reducing silicon chip surface roughness |
| 10/10/2007 | CN100342463C Method and system for patterning of magnetic thin films using gaseous transformation |
| 10/04/2007 | US20070231716 Plasma etching chamber and method for manufacturing photomask using the same |
| 10/03/2007 | CN101047127A Plasma etching method, etching device, storage medium |
| 10/03/2007 | CN101047118A Plasma processing apparatus and plasma processing method |
| 09/26/2007 | CN200953342Y Improved semiconductor machine |
| 09/26/2007 | CN101042996A Plasma treating apparatus and plasma treating method |
| 09/26/2007 | CN101042991A Plasma processing apparatus |
| 09/26/2007 | CN101042990A Plasma processing apparatus and method |
| 09/26/2007 | CN101042989A Plasma processing apparatus |
| 09/25/2007 | US7274004 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support |
| 09/19/2007 | CN101038860A Plasma processing apparatus and method |
| 09/18/2007 | US7271071 Method of forming a catalytic surface comprising at least one of Pt, Pd, Co and Au in at least one of elemental and alloy forms |
| 09/18/2007 | US7270761 Fluorine free integrated process for etching aluminum including chamber dry clean |
| 09/13/2007 | US20070210031 Features in substrates and methods of forming |
| 09/12/2007 | EP1832340A1 Process and device for partial surface treatment of a component by low pressure plasma generated in a vacuum chamber |
| 09/12/2007 | EP1831429A2 Methods and apparatus for sequentially alternating among plasma processes in order to optimize a substrate |
| 09/05/2007 | CN101030538A Plasma etching apparatus and method |
| 09/05/2007 | CN101030537A Method and apparatus for plasma etching |
| 09/05/2007 | CN101030524A Corrosion resistant multilayer member |
| 09/05/2007 | CN100336177C Method and device for cutting wire formed on semiconductor substrate |
| 09/04/2007 | US7264742 Method of planarizing a surface |
| 08/29/2007 | EP1826293A1 Formation of nanoscale surfaces for the attachment of biological materials |
| 08/29/2007 | CN101026921A Plasma generation apparatus and work processing apparatus |
| 08/29/2007 | CN101026920A Plasma generation apparatus and work processing apparatus |
| 08/23/2007 | WO2007094087A1 Method of dry etching, method of microstructure formation, mold and process for producing the same |
| 08/23/2007 | US20070193514 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 08/22/2007 | CN101021011A Dry etching method, fine structure formation method, mold and mold fabrication method |
| 08/22/2007 | CN101021010A Dry etching method, fine structure formation method, mold and mold fabrication method |
| 08/16/2007 | DE10338422B4 Selektiver Plasmaätzprozess zur Aluminiumoxid-Strukturierung und dessen Verwendung Selective plasma etching of alumina structure and its use |
| 08/15/2007 | EP1276356B1 Apparatus for plasma processing |