| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 07/09/2008 | CN100401471C Plasma processing chamber, potential controlling apparatus, method, program and storage medium |
| 07/03/2008 | DE102006052586B4 Verfahren und Vorrichtung zur Reinigung der Abgase einer Siliziumdünnschicht-Produktionsanlage Method and apparatus for cleaning the exhaust gases of a silicon thin film production plant |
| 07/02/2008 | CN101211752A Method and device for controlling wafer DC auto-bias and compensating electrostatic gravitational force between direct current electrode and water |
| 07/02/2008 | CN101211751A Dry method etching method |
| 07/02/2008 | CN100399516C Method for etching medium material |
| 07/02/2008 | CN100399505C Air flow distribution equalized etching apparatus |
| 06/26/2008 | US20080149594 Apparatus and process for forming and handling porous materials |
| 06/25/2008 | EP1183684B1 Reactive ion beam etching method and a thin film head fabricated using the method |
| 06/25/2008 | CN101207062A Method for manufacturing substrate mounting table |
| 06/25/2008 | CN101207061A Substrate mounting table and method for manufacturing same, substrate processing apparatus, and fluid supply mechanism |
| 06/25/2008 | CN101207034A Chamber top cover and reaction chamber containing said top cover |
| 06/25/2008 | CN101207033A Method for etching polysilicon |
| 06/25/2008 | CN101207005A Method for interfering and calibrating light detection device |
| 06/25/2008 | CN101207004A Method for controlling semiconductor silicon dies etching technique |
| 06/25/2008 | CN101207003A Inner lining of wafer processing chamber and wafer processing chamber containing said inner lining |
| 06/25/2008 | CN101207001A Exhaust device and reaction chamber containing the same |
| 06/25/2008 | CN101206999A Inner lining and reaction chamber containing the same |
| 06/25/2008 | CN101206997A Method for controlling defect in non-deposition manufacture process |
| 06/25/2008 | CN100397590C Gate etching process |
| 06/25/2008 | CN100397586C Polycrystalline silicon pulse etching process for improving anisotropy |
| 06/25/2008 | CN100397570C Vacuum processing apparatus and method operation thereof |
| 06/25/2008 | CN100397569C Substrate processing apparatus, control method adopted in substrate processing apparatus |
| 06/25/2008 | CN100397567C Plasma reaction chamber |
| 06/25/2008 | CN100397038C Etching volume measuring device and method, etching device |
| 06/25/2008 | CN100396818C Dry treatment method for superconductor cavity |
| 06/18/2008 | CN101202206A Reaction chamber inner lining and reaction chamber containing the inner lining |
| 06/18/2008 | CN100395873C 等离子体蚀刻方法 The plasma etching method |
| 06/18/2008 | CN100395867C Topology simulation system, topology simulation method |
| 06/12/2008 | US20080135519 Plasma processing apparatus and control method thereof |
| 06/11/2008 | CN101197251A Etching apparatus for edges of substrate |
| 06/11/2008 | CN101197249A Reaction cavity lining and reaction cavity including the same |
| 06/11/2008 | CN101195112A Gas injection apparatus |
| 06/11/2008 | CN100394543C Gas supply member and plasma processing apparatus |
| 06/11/2008 | CN100393913C Dry cleaning process in polycrystal silicon etching |
| 06/05/2008 | DE4416525B4 Verfahren zur Herstellung einer Beschichtung erhöhter Verschleißfestigkeit auf Werkstückoberflächen, und dessen Verwendung A process for producing a coating of increased wear resistance on workpiece surfaces, and the use thereof |
| 06/04/2008 | CN101192511A Vacuum processing device |
| 06/04/2008 | CN100392824C Method and apparatus for generating gas plasma and method of manufacturing semiconductor |
| 06/04/2008 | CN100392804C Semiconductor processing equipment having tiled ceramic liner |
| 06/03/2008 | US7381292 Inductively coupled plasma generating apparatus incorporating serpentine coil antenna |
| 05/29/2008 | DE102006052586A1 Verfahren und Vorrichtung zur Reinigung der Abgase einer Siliziumdünnschicht-Produktionsanlage Method and apparatus for cleaning the exhaust gases of a silicon thin film production plant |
| 05/28/2008 | CN201066682Y Gas distribution tray of semiconductor device |
| 05/28/2008 | CN101188191A Method and structure of pattern mask for dry etching |
| 05/28/2008 | CN100390957C Substrate supporting member and substrate processing apparatus |
| 05/28/2008 | CN100390933C Gas supply unit, substrate processing apparatus, and supply gas setting method |
| 05/14/2008 | CN101179023A Gas distribution control system, polysilicon gate etching and silicon chip shallow groove isolation etching method |
| 05/14/2008 | CN101179005A Exhaust air system, semi-conductor manufacturing installation for manufacturing thin film by the same and method thereof |
| 05/14/2008 | CN100388418C Components for substrate processing apparatus and manufacturing method thereof |
| 05/13/2008 | US7371692 Method for manufacturing a semiconductor device having a W/WN/polysilicon layered film |
| 05/13/2008 | US7371485 Multi-step process for etching photomasks |
| 05/08/2008 | WO2008054774A2 Micromachined electrolyte sheet, fuel cell devices utilizing such, and micromachining method for making fuel cell devices |
| 05/07/2008 | EP1918971A2 Method and apparatus for photomask plasma etching |
| 05/07/2008 | EP1918776A1 Etching of nano-imprint templates using an etch reactor |
| 05/07/2008 | CN101174552A Apparatus for semiconductor process |
| 05/07/2008 | CN101174542A Gas injection apparatus |
| 05/07/2008 | CN100386467C Method for regenerating container for plasma treatement, member inside container for plasma treatment, method for preparing member inside container for plasma treatment, and apparatus for plasma proce |
| 04/30/2008 | CN101170053A Plasma processing device, plasma processing method and storage medium |
| 04/30/2008 | CN101170052A Apparatus for controlling plasma etching process |
| 04/30/2008 | CN101170050A Cleaning method for reaction cavity room, forming method of protection film, and protection wafer |
| 04/29/2008 | US7365020 Method for etching upper metal of capacitator |
| 04/23/2008 | CN101165868A Wafer processing chamber liner and wafer processing chamber comprising same |
| 04/23/2008 | CN101165855A Substrate stage and plasma processing apparatus |
| 04/23/2008 | CN101165852A Method of plasma etching with pattern mask |
| 04/16/2008 | CN101162701A Thimble for silicon chip up-down in etching equipment |
| 04/16/2008 | CN101162692A Silicon chip etching method |
| 04/16/2008 | CN101162689A Focus ring and plasma processing apparatus |
| 04/16/2008 | CN101162685A Apparatus and method to improve uniformity and reduce local effect of process chamber |
| 04/16/2008 | CN100382276C Substrate mounting table, substrate processing apparatus and substrate processing method |
| 04/16/2008 | CN100382239C Method for electrically discharging substrate, substrate processing apparatus and program |
| 04/16/2008 | CN100382238C Opening/closing mechanism for vacuum processing apparatus, and vacuum processing apparatus |
| 04/16/2008 | CN100382237C Vacuum treatment device |
| 04/16/2008 | CN100381390C Plasma resistant structural parts |
| 04/09/2008 | EP1035757B1 Substrate electrode plasma generator and substance/material processing method |
| 04/09/2008 | CN101159235A Method for dry-type clean dielectric layer opening etching reaction chamber |
| 04/09/2008 | CN101159228A Processing gas supplying mechanism, supplying method and gas processing unit |
| 04/09/2008 | CN100379897C Mask forming method, mask forming functional layer, dry etching method, and method of manufacturing an information recording medium |
| 04/08/2008 | US7354853 Selective dry etching of tantalum and tantalum nitride |
| 04/02/2008 | CN101154565A Heat-conducting gas supply mechanism, supply method and substrate processing device and method |
| 04/02/2008 | CN101154558A Method for cleaning etching equipment component |
| 04/02/2008 | CN101153396A Plasma etching method and device |
| 03/27/2008 | WO2008007134A3 Method of controlling contamination of a surface |
| 03/26/2008 | EP0938741B1 Vacuum plasma processor having coil with intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil |
| 03/26/2008 | CN101150061A A control method for semiconductor etching device |
| 03/26/2008 | CN101150040A An exception monitoring device and method for controlled components in a micro-electronic engraving system |
| 03/26/2008 | CN101150039A Gas injection device |
| 03/26/2008 | CN101148765A Silicon chip etching method |
| 03/26/2008 | CN100377314C Method for removing residual polymer in polysilicon etching technology |
| 03/26/2008 | CN100377301C Gas injection and diffusion system |
| 03/26/2008 | CN100377300C Reaction chamber for semiconductor treatment |
| 03/26/2008 | CN100376723C Shielding plate for enhancing flow field uniformity |
| 03/26/2008 | CN100376722C Control method for removing residual gas for etching process |
| 03/20/2008 | US20080070032 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film |
| 03/20/2008 | US20080069966 A protective film of oxides of aluminum and yttrium formed on an inner wall surface of the chamber and the internal exposed surfaces of the apparatus for processing semiconductor wafers; high-corrosion resistance and dielectric property; etching resistance; spraying yttrium, aluminum and amorphous garnet |
| 03/19/2008 | CN101145498A Gas injection device |
| 03/18/2008 | US7344652 Plasma etching method |
| 03/12/2008 | CN101140859A Etching apparatus and etching method using the same |
| 03/12/2008 | CN100374616C Plasma treating device with protective tube |
| 03/05/2008 | CN101137267A Plasma generation apparatus and workpiece processing apparatus using the same |
| 03/05/2008 | CN101136353A Substrate carrying mechanism and connecting method |
| 03/05/2008 | CN101135033A Conductive, plasma-resistant member |
| 03/05/2008 | CN100373542C Vacuum processing apparatus |