Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23F - Non-mechanical removal of metallic material from surfaces; Inhibiting corrosion of metallic material; Inhibiting incrustation in general; Multi-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass  or or class › C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or
Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769)
11/2008
11/26/2008CN100437969C Support ring assembly
11/26/2008CN100437931C Electric liquid chamber and method of processing substrate in the chamber
11/26/2008CN100437901C Particle sticking prevention apparatus and plasma processing apparatus
11/26/2008CN100437900C Gate valve apparatus and processing system
11/26/2008CN100437896C Plasma processing apparatus and plasma processing method
11/20/2008US20080286891 Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method
11/19/2008CN201153126Y Revolving gear of etching machine tablet bearing disk
11/19/2008CN101308779A Stepped upper electrode for plasma processing uniformity
11/19/2008CN101308773A System for manufacturing flat display
11/19/2008CN101307447A Process for cleaning reaction chamber of plasma etching equipment by dry method
11/19/2008CN101307431A Process for preparing nitrogen doped micropore titanium dioxide photocatalysis layer of visual light on base of titan and titan alloy
11/19/2008CN100435276C Vacuum processing apparatus
11/18/2008US7452476 Method for removing coating from power unit components and device for carrying out the method
11/13/2008US20080277377 Masking material for dry etching
11/13/2008DE102006033072B4 Verfahren und Vorrichtung zum Beschichten von Substraten durch Tauchen in eine Metallschmelze Method and device for coating substrates by dipping in a molten metal
11/12/2008CN101303998A Plasma processing apparatus, focus ring, and susceptor
11/12/2008CN101303997A Plasma processing apparatus, focus ring, and susceptor
11/12/2008CN101303965A Method and apparatus for eliminating migration of etching pattern
11/12/2008CN101303963A Method and apparatus for eliminating migration of etching pattern
11/12/2008CN101302610A Process chamber component having yttrium-aluminum coating
11/12/2008CN101302606A Magnesium alloy surface strengthening method and apparatus
11/12/2008CN100433249C Substrate processing device
11/05/2008EP1988069A1 Method of dry etching, method of microstructure formation, mold and process for producing the same
11/05/2008CN101298676A Manufacturing method of insulation heat-conducting metal substrate
11/05/2008CN101298673A Preparation of insulated heat conducting metal substrate
11/05/2008CN100431097C Top electrode, plasma processing device and method
10/2008
10/30/2008WO2008129605A1 Process for producing magnetic element
10/29/2008CN101295629A Methods to eliminate M-shape etch rate profile in inductively coupled plasma reactor
10/23/2008US20080261074 Structure for Preventing Peeling of Reaction Product, Process for Its Production and Process for the Production of a Semiconductor Device Using the Structure
10/22/2008EP1831429A4 Methods and apparatus for sequentially alternating among plasma processes in order to optimize a substrate
10/22/2008CN101290873A Hollow anode plasma reactor and method
10/15/2008CN101286469A Structure for preventing gap formation and plasma processing apparatus
10/15/2008CN101285189A Process for decreasing deposit at reaction chamber in metal etching process
10/15/2008CN101285167A Ion beam emission source for outputting single ionic energy
10/15/2008CN101285166A Process for increasing binding force and reducing process temperature in filming process of sheet metal strip
10/09/2008WO2008121655A1 Method and apparatus for dc voltage control on rf-powered electrode
10/08/2008CN101281859A Etching reaction system
10/08/2008CN100424849C Electrostatically clamped edge ring for plasma processing
10/08/2008CN100424832C Method and apparatus for plasma etching
10/07/2008CA2432068C Plasma generator
10/02/2008US20080236489 Plasma Processing Apparatus
10/01/2008CN101277576A System for processing thin-film material surface using bi-medium to block electric discharge
10/01/2008CN101276777A Substrate mounting stage and substrate processing apparatus
10/01/2008CN101276775A Surface processing method for mounting stage
10/01/2008CN101276738A Plama processing apparatus
10/01/2008CN100423208C Dielectric etch method with high source and low bombardment plasma providing high etch rates
10/01/2008CN100423188C Fault detection method in chip etching technology
10/01/2008CN100423187C Silicon-chip separating process
10/01/2008CN100421807C Single-admission and double-area adjustable nozzle
09/2008
09/30/2008US7429337 Method for removing at least one area of a layer of a component consisting of metal or a metal compound
09/17/2008CN101266921A Substrate processing method
09/10/2008CN201112360Y Reaction cavity
09/10/2008CN101261952A Substrate carrying bench and substrate treatment device
09/10/2008CN100418189C Vacuum processing apparatus and method of using the same
09/10/2008CN100418187C Plasma processing device, annular element and plasma processing method
09/03/2008CN101256944A Plasma processing apparatus
09/03/2008CN101256940A Gas supply system and integrated unit for semiconductor manufacturing device
09/03/2008CN100416773C Plasma processing method and apparatus
09/03/2008CN100416759C Processing chamber, flat display device production device, plasma treatment method using same
09/03/2008CN100416758C Method for releasing chip static electricity thoroughly in chip etching equipment
09/03/2008CN100416757C Plasma etching device exhaustring ring
09/03/2008CN100416756C Plasma etching apparatus
09/03/2008CN100416744C Chamber configuration for confining plasma
09/02/2008US7419567 Plasma processing apparatus and method
08/2008
08/21/2008WO2008099768A1 Etching apparatus, etching method, and method for production of electronic device
08/21/2008US20080196744 In-chamber member, a cleaning method therefor and a plasma processing apparatus
08/20/2008CN101246836A Substrate carrying platform and process method for its surface
08/20/2008CN101246835A Substrate support assembly
08/20/2008CN101245446A Method for improving homogeneity of large area film coating
08/20/2008CN101244945A Components for substrate processing apparatus and manufacturing method thereof
08/20/2008CN100413035C Plasma etching method
08/20/2008CN100413021C Plasma reaction chamber temperature control system on-line fault detecting device and method
08/13/2008EP1444726A4 Method and apparatus for the etching of photomask substrates using pulsed plasma
08/13/2008CN101241846A Techniques for improving etch rate uniformity
08/13/2008CN101241845A Silicon parts for plasma reaction chamber
08/13/2008CN100411133C Substrate-placing platform, substrate processing device and production method of substrate-placing platform
08/13/2008CN100411096C Temperature control system and substrate processing apparatus
08/13/2008CN100411095C Chamber for vacuum processing device and device having the chamber
08/06/2008CN101236891A Plasma processing device
08/06/2008CN101236888A Vaccuum processing apparatus
07/2008
07/30/2008CN101231966A Wafer retaining device for etching course and method for controlling wafer etching speed
07/30/2008CN101230463A Method for treating wafer
07/24/2008DE202008006477U1 Vorrichtung zur Modifizierung von Substratoberflächen An apparatus for modifying surfaces of substrate
07/24/2008DE102008004883A1 Aluminium-Oberflächenbearbeitungsprozess und Aluminium-Verbundwerkstoffmaterial Aluminum surface treatment process and aluminum composite material
07/23/2008CN101226873A Method for cleaning electrode surface in a polycrystal etching chamber
07/23/2008CN101226872A Method for cleaning silicon material part surface in a polycrystal etching chamber
07/23/2008CN101226871A Method for desorption of silicon slice
07/23/2008CN100405556C Method for controlling key size deviation in chip etching technology
07/23/2008CN100405537C Plasma reaction device
07/23/2008CN100405536C Substrate processing system
07/23/2008CN100405533C Microwave-excited plasma processing apparatus
07/16/2008CN101221905A Silicon slice etching equipment
07/16/2008CN101221904A Silicon slice etching equipment and method for controlling cavity top cover lifting
07/16/2008CN101219417A Gas injection apparatus
07/16/2008CN101219416A Gas refiller
07/16/2008CN100403494C Dry-etching method
07/09/2008CN101217114A A method for semiconductor silicon etching technique migration
07/09/2008CN101217103A A maintenance method of plasma etching device
07/09/2008CN100401852C Method and apparatus for controlling spatial temperature distribution across surface of workpiece support
07/09/2008CN100401481C Plasma processing method and apparatus
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 ... 48