| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 05/13/2009 | CN101431009A Shower plate and substrate processing apparatus |
| 05/13/2009 | CN101431003A Exhaustion ring and plasma processing device |
| 05/13/2009 | CN100487871C Etching method |
| 05/13/2009 | CN100487858C Array type electron beam etching device and etching method |
| 05/12/2009 | US7532322 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 05/12/2009 | US7531103 Mask forming method, mask forming functional layer, dry etching method, and method of manufacturing an information recording medium |
| 05/07/2009 | US20090114851 Fib milling of copper over organic dielectrics |
| 05/06/2009 | CN101425450A Gas supply device, substrate processing apparatus and substrate processing method |
| 05/06/2009 | CN101423945A Method for preparing light metal super-hydrophobic surface |
| 04/29/2009 | CN101419907A High temperature cathode for plasma etching |
| 04/29/2009 | CN101419904A Plasma confinement device and plasma treatment device |
| 04/29/2009 | CN101419400A Dry method etching method by chrome metal mask |
| 04/29/2009 | CN101417578A Surface decoration method for stainless steel |
| 04/29/2009 | CN100483617C Base plate processing device and base plate processing method |
| 04/23/2009 | US20090104781 Plasma processing apparatus, ring member and plasma processing method |
| 04/22/2009 | CN101414537A Tunable multi-zone gas injection system |
| 04/22/2009 | CN101413111A Film forming device and use method thereof |
| 04/21/2009 | CA2430511C Method of removing ceramic coatings |
| 04/16/2009 | WO2006011954A3 Diagnostic plasma measurement device having patterned sensors and features |
| 04/15/2009 | CN201220964Y Auxiliary tooling for etching silicon chip |
| 04/08/2009 | CN201217686Y Ionic beam emission source capable of emitting singular ion energy |
| 04/08/2009 | CN100477104C Plasma treatment apparatus |
| 04/08/2009 | CN100477103C Atmospheric transfer chamber and after-processing transfer method of processed object |
| 04/08/2009 | CN100477078C Substrate processing apparatus and substrate processing method |
| 04/07/2009 | US7513063 Substrate processing apparatus |
| 04/01/2009 | CN201215800Y Upper electrode for semiconductor etching device |
| 04/01/2009 | CN101399166A Etching substrates mounted with gas wall |
| 04/01/2009 | CN100474506C Substrate processing apparatus and lid supporting apparatus for the same |
| 03/31/2009 | US7510667 Plasma processing method and apparatus |
| 03/26/2009 | US20090081512 Micromachined electrolyte sheet, fuel cell devices utilizing such, and micromachining method for making fuel cell devices |
| 03/26/2009 | DE102008040160A1 Treating optical elements by plasma, which is ignited to exist on surface of optical element to be treated and is present in cavity, for microlithography system, comprises forming a side from the cavity through the surface to be treated |
| 03/24/2009 | US7506610 Plasma processing apparatus and method |
| 03/12/2009 | WO2009032095A1 Method and apparatus for diagnosing status of parts in real time in plasma processing equipment |
| 03/11/2009 | CN101383314A Substrate table substrate processing apparatus and temperature control method |
| 03/11/2009 | CN101383272A Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection |
| 03/11/2009 | CN101383266A Reaction cavity |
| 03/11/2009 | CN100468619C Temperature control device of etching equipment and its method for controlling wafer temperature |
| 03/11/2009 | CN100468615C Plasma processing apparatus and methods for removing extraneous material from selected areas on a substrate |
| 03/11/2009 | CN100468613C Method and apparatus for removing material from a substrate surface |
| 03/04/2009 | CN101378031A Substrate carrier plateform and substrate processing device |
| 03/04/2009 | CN101378003A Alternate gas delivery and evacuation system for plasma processing apparatuses |
| 03/04/2009 | CN101376980A Process for improving strip steel wetting property |
| 03/04/2009 | CN100466217C Stage, substrate processing apparatus and the control method thereof |
| 02/25/2009 | EP1187187B1 Plasma processing apparatus |
| 02/25/2009 | CN101373731A Electrostatic chuck apparatus and temperature control method thereof |
| 02/25/2009 | CN101373707A Processing device |
| 02/25/2009 | CN101373703A Cap-opening mechanism and semiconductor processing device and cap-opening control method thereof |
| 02/25/2009 | CN101373702A Cavity inner lining and reaction cavity |
| 02/24/2009 | US7494596 Measurement of etching |
| 02/19/2009 | DE102005019212B4 Verfahren zum Bearbeiten von kaltgewalzten verzinkten Profilen Method for processing cold rolled galvanized profiles |
| 02/18/2009 | EP2025775A1 Photon induced cleaning of a reaction chamber |
| 02/18/2009 | CN101369527A Vacuum processor |
| 02/18/2009 | CN101369518A Plasma species and uniformity control through pulsed VHF operation |
| 02/18/2009 | CN101369515A Reaction cavity |
| 02/11/2009 | CN201194232Y Plasma body etching machine |
| 02/10/2009 | US7488429 Method of dry etching, method of manufacturing magnetic recording medium, and magnetic recording medium |
| 02/04/2009 | CN101359583A Plasma processing apparatus of batch type |
| 02/04/2009 | CN101359580A Substrate processing apparatus having a sensing unit |
| 02/04/2009 | CN100459059C Plasma processing method and apparatus |
| 02/04/2009 | CN100458167C Method of coating fluorocarbon resin and sliding part and gas compressor using said method |
| 01/29/2009 | US20090025877 Flat panel display manufacturing apparatus |
| 01/28/2009 | CN101356304A Optical metrological scale and laser-based manufacturing method therefor |
| 01/28/2009 | CN101355009A Etching device |
| 01/28/2009 | CN100456445C Etching method and apparatus |
| 01/28/2009 | CN100456434C Semiconductor etching apparatus |
| 01/28/2009 | CN100456433C Focus ring, plasma etching apparatus and plasma etching method |
| 01/27/2009 | US7482279 Method for fabricating semiconductor device using ArF photolithography capable of protecting tapered profile of hard mask |
| 01/27/2009 | US7482274 Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same |
| 01/21/2009 | CN100453702C Plasma processing apparatus and components thereof, and method for detecting life span of the components |
| 01/15/2009 | US20090017259 Dry etching method, fine structure formation method, mold and mold fabrication method |
| 01/14/2009 | CN201181693Y Upper electrode of semiconductor etching equipment |
| 01/14/2009 | CN101345194A Silicon groove forming method and device |
| 01/14/2009 | CN100452290C Plasma processing apparatus |
| 01/14/2009 | CN100451171C Surface treatment for improving metal welding performance and work pieces therefrom |
| 01/13/2009 | US7476951 Selective isotropic etch for titanium-based materials |
| 01/08/2009 | US20090008363 Plasma processing apparatus and a plasma processing method |
| 01/07/2009 | CN101339895A Gas distribution device and plasma processing apparatus applying the same |
| 01/07/2009 | CN101338413A Remote inductively coupled plasma source for cvd chamber cleaning |
| 12/31/2008 | WO2009001744A1 Etching method and etching apparatus |
| 12/31/2008 | EP2007923A1 Etching process |
| 12/31/2008 | CN101335193A Hybrid etch chamber with decoupled plasma controls |
| 12/31/2008 | CN101335192A Substrate processing apparatus and shower head |
| 12/31/2008 | CN101333642A Band steel filming method and system thereof |
| 12/30/2008 | US7470627 Wafer area pressure control for plasma confinement |
| 12/17/2008 | CN101325150A Flexible manifold for integrated gas system gas panels |
| 12/17/2008 | CN100444311C Vacuum processor |
| 12/17/2008 | CN100443637C Method for controlling chip temperature in reaction chamber for semiconductor etching process |
| 12/10/2008 | CN101320680A Anti-arc protection device and its assembling method |
| 12/10/2008 | CN101320679A Plasma processing system |
| 12/10/2008 | CN101320676A Evacuation method and storage medium |
| 12/10/2008 | CN101320675A Plasma processing device, electrode temperature adjusting device and method |
| 12/09/2008 | US7462293 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 12/03/2008 | CN101315889A Silicon film dry etching method |
| 12/03/2008 | CN101315880A Gas distribution device and plasma processing apparatus adopting the same |
| 12/03/2008 | CN101315875A Plasma generator and workpiece processing apparatus using the same |
| 12/03/2008 | CN100440453C Fabrication method of semiconductor device |
| 12/03/2008 | CN100440450C Method and device for flattening surface of solid |
| 12/03/2008 | CN100440427C Plasma processing chamber |
| 12/03/2008 | CN100439562C Process chamber component having electroplated yttrium containing coating |
| 11/27/2008 | WO2008143170A1 Method for quantitative analysis of tin or tin alloy plating layer |