| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 01/13/2010 | CN100580891C Wafer bevel polymer removal |
| 01/13/2010 | CN100580870C Heat-conducting gas supply mechanism, supply method and substrate processing device and method |
| 01/13/2010 | CN100580135C Method for cleaning reaction chamber |
| 01/07/2010 | US20100003768 System and method for processing substrates with detachable mask |
| 01/06/2010 | CN100578732C Vacuum processing apparatus |
| 01/06/2010 | CN100577854C Method (variant) for cleaning shade in display production and apparatus for implementing the method |
| 12/31/2009 | DE19756774B4 Mikrowellenplasmaquelle Microwave plasma source |
| 12/30/2009 | CN100576438C Plasma confinement baffle and flow equalizer for enhanced magnetic control of plasma radial distribution |
| 12/23/2009 | WO2009155028A1 Method and system for supplying a cleaning gas into a process chamber |
| 12/23/2009 | CN101609792A Microwave plasma processing apparatus and method of supplying microwaves using the apparatus |
| 12/23/2009 | CN101609790A Processing device |
| 12/23/2009 | CN100573829C Silicon slice etching equipment |
| 12/23/2009 | CN100573817C Pressure reduction vessel and pressure reduction processing apparatus |
| 12/23/2009 | CN100573816C Reaction cavity lining and reaction cavity including the same |
| 12/23/2009 | CN100573814C An exception monitoring device and method for controlled components in a micro-electronic engraving system |
| 12/23/2009 | CN100573813C Apparatus for fabricating semiconductor device, control method, and method of fabricating semiconductor device |
| 12/23/2009 | CN100571886C Gas refiller |
| 12/22/2009 | US7635865 Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method |
| 12/17/2009 | US20090309145 Method and system for patterning of magnetic thin flims using gaseous transformation |
| 12/16/2009 | CN101604630A Plasma etching method and plasma etching apparatus |
| 12/16/2009 | CN100570818C Plasma processing apparatus |
| 12/09/2009 | CN101599426A Method for manufacturing capacitor of semiconductor device |
| 12/09/2009 | CN100569043C Radiofrequency system control method and its radiofrequency matching box |
| 12/09/2009 | CN100567561C Process for preparing nitrogen doped micropore titanium dioxide photocatalysis layer of visual light on base of titanium and titanium alloy |
| 12/09/2009 | CN100566847C Air-intake nozzle |
| 12/02/2009 | CN101592777A Method for manufacturing full spectrum wide-angle condenser based on nanometer structure |
| 11/26/2009 | US20090289035 Plasma Processing Apparatus And Plasma Processing Method |
| 11/25/2009 | CN101587821A Electrode plate |
| 11/25/2009 | CN101587156A Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 11/25/2009 | CN100562974C Etching reaction system |
| 11/19/2009 | US20090285998 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
| 11/18/2009 | CN100561679C Plasma etching apparatus and method |
| 11/17/2009 | US7618753 Photoresists; etching; semiconductor integrated circuit, charge-coupled device, color fiter, liquid crystal display device, magnetic head |
| 11/11/2009 | CN101577216A Plasma reactor |
| 11/10/2009 | USRE40951 Via alcohol and photomask; tunneling magnetoresistive device; magnetic random access memory |
| 11/04/2009 | CN201341268Y Nozzle electrode |
| 11/03/2009 | US7611911 Method and system for patterning of magnetic thin films using gaseous transformation to transform a magnetic portion to a non-magnetic portion |
| 10/28/2009 | EP0748260B2 Ion beam process for deposition of highly abrasion-resistant coatings |
| 10/22/2009 | US20090260977 Method for manufacturing workpieces with ion-etched surface |
| 10/21/2009 | CN101562126A Vacuum container and plasma processing apparatus |
| 10/21/2009 | CN101562122A Dry etching method and silicon wafer etching method |
| 10/21/2009 | CN100552912C Thimble for silicon chip up-down in etching equipment |
| 10/20/2009 | US7604709 Plasma processing apparatus |
| 10/15/2009 | US20090255805 Removing Method of Hard Coating Film |
| 10/14/2009 | CN101556913A Plasma processing container and plasma processing device |
| 10/14/2009 | CN101556904A Gas distributor and semiconductor processing equipment applying same |
| 10/14/2009 | CN100551200C Plasma processing apparatus |
| 10/14/2009 | CN100550283C Apparatus for manufacturing flat-panel display |
| 10/13/2009 | US7601619 Method and apparatus for plasma processing |
| 10/13/2009 | US7601469 Plasma etching chamber and method for manufacturing photomask using the same |
| 10/13/2009 | US7601241 Plasma processing apparatus and plasma processing method |
| 10/07/2009 | CN101552182A Marginal ring mechanism used in semiconductor manufacture technology |
| 10/01/2009 | WO2009100006A3 Method and system for improving surgical blades by the application of gas cluster ion beam technology and improved surgical blades |
| 09/23/2009 | CN101540272A Plasma cleaning method for removing byproduct in chamber and plasma processing system |
| 09/23/2009 | CN100543189C Granule control method for polycrystalline silicon etching process |
| 09/17/2009 | DE102009012878A1 Schauerkopf und Substratbearbeitungsvorrichtung Shower head and substrate processing apparatus |
| 09/16/2009 | CN101533764A Shower head and substrate processing apparatus |
| 09/16/2009 | CN101533763A Method for manufacturing shower plate, shower plate manufactured, and plasma processing apparatus |
| 09/10/2009 | DE4447977B4 Vorrichtung und Verfahren zur Plasmabehandlung von flachen Werkstücken, insbesondere flachen, aktiven Bildschirmen, sowie Verwendung der Vorrichtung Apparatus and method for plasma treatment of flat workpieces, in particular flat active screens, as well as using the apparatus |
| 09/10/2009 | DE102008013166A1 Verfahren zur Herstellung einer interferenzfarbenfreien Schutzschicht A method for producing a protective layer free of interference colors |
| 09/09/2009 | CN101527258A Cover part, process gas diffusing and supplying unit, and substrate processing apparatus |
| 09/08/2009 | US7585386 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
| 09/02/2009 | CN101521143A Lining mechanism for semiconductor processing equipment and manufacturing method thereof |
| 09/01/2009 | US7582220 Photoresists; photomasks; protective coatings |
| 09/01/2009 | US7582182 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 09/01/2009 | US7581550 Method of cleaning reaction chamber using substrate having catalyst layer thereon |
| 08/27/2009 | US20090215201 Method for controlling spatial temperature distribution across a semiconductor wafer |
| 08/26/2009 | CN101515538A Sealing structure for processing reaction chamber by semiconductor |
| 08/26/2009 | CN100533659C Vaccuum processing apparatus |
| 08/19/2009 | CN101509848A Method for producing Transmission electron microscopy sample with surface layer high residual stress example cross section |
| 08/19/2009 | CN100530532C Plasma processing apparatus and plasma processing method |
| 08/19/2009 | CN100528571C Substrate for fluid jet device and method for forming substrate |
| 08/18/2009 | US7575692 Method for etching chromium thin film and method for producing photomask |
| 08/13/2009 | WO2009100006A2 Method and system for improving surgical blades by the application of gas cluster ion beam technology and improved surgical blades |
| 08/12/2009 | EP2087503A1 Device for the pre-treatment of substrates |
| 08/06/2009 | US20090197418 Substrate processing apparatus |
| 08/05/2009 | CN101499407A Gas dispensing device and semiconductor process plant employing the same |
| 08/05/2009 | CN100524641C Plasma processing device |
| 08/05/2009 | CN100523290C Surface treatment method and device |
| 08/04/2009 | US7569411 Metal MEMS devices and methods of making same |
| 07/29/2009 | CN100520382C Plasma monitoring method, plasma monitor and plasma treatment appts. |
| 07/28/2009 | US7565879 Plasma processing apparatus |
| 07/16/2009 | US20090181545 Dry-etching method and apparatus |
| 07/09/2009 | WO2009084445A1 Dry etching method, magnetoresistive element, and method and apparatus for manufacturing the same |
| 07/07/2009 | US7556740 Method for producing a solar cell |
| 07/02/2009 | DE10211332B4 Vorrichtung und Verfahren zur Aktivierung von Gasen im Vakuum sowie Verwendung der Vorrichtung Apparatus and method for activation of gases in the vacuum as well as using the apparatus |
| 06/25/2009 | US20090159197 Method of Forming a Multilayer Test Sensor |
| 06/24/2009 | EP1698215A4 Method of manufacturing an electrical component |
| 06/24/2009 | CN101466873A Etching process |
| 06/24/2009 | CN100503892C Ion source |
| 06/11/2009 | US20090148963 Metal Wiring and Method of Manufacturing the Same, and Metal Wiring Substrate and Method of Manufacturing the Same |
| 05/28/2009 | US20090134121 Plasma processing apparatus and method |
| 05/27/2009 | CN101441983A Plasma confinement apparatus and semiconductor processing equipment applying the same |
| 05/27/2009 | CN100492603C Plasma etching method |
| 05/27/2009 | CN100492591C Plasma processing device |
| 05/27/2009 | CN100492587C Substrate processing apparatus and substrate processing method |
| 05/26/2009 | US7537708 Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface |
| 05/21/2009 | US20090127225 Measurement of etching |
| 05/20/2009 | CN101436536A Method for dry method etching polycrystalline silicon in deep plow groove |
| 05/14/2009 | DE102007054074A1 System zum Bearbeiten eines Objekts System for processing an object |