Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769)
08/2010
08/19/2010WO2010092297A1 Method for the ion beam treatment of a metal layer deposited on a substrate
08/18/2010CN101276738B Plama processing apparatus
08/18/2010CN101162689B Focus ring and plasma processing apparatus
08/12/2010DE202010004773U1 Dichtungselement mit Postionierungsmerkmal für eine festgeklemmte monolithische Gasverteilungselektrode Sealing element with Postionierungsmerkmal for a clamped monolithic gas distribution electrode
08/12/2010CA2751736A1 Plasma source with integral blade and method for removing materials from substrates
08/12/2010CA2751709A1 Plasma source and method for removing materials from substrates utilizing pressure waves
08/11/2010CN101483980B Combined surface processing method for firm-flexible combined circuit board
08/11/2010CN101276777B Substrate mounting stage and substrate processing apparatus
08/11/2010CN101241846B Techniques for improving etch rate uniformity
08/10/2010US7771607 Plasma processing apparatus and plasma processing method
08/10/2010US7771561 Apparatus and method for surface treatment to substrate
08/04/2010CN101796618A Method and apparatus for diagnosing status of parts in real time in plasma processing equipment
07/2010
07/28/2010CN101499407B Gas dispensing device and semiconductor process plant employing the same
07/28/2010CN101335192B Substrate processing apparatus and shower head
07/28/2010CN101236891B Plasma processing device
07/28/2010CN101170052B Apparatus for controlling plasma etching process
07/27/2010US7763545 Semiconductor device manufacturing method
07/22/2010WO2010082340A1 Base material etching mechanism, vacuum process device and base material etching method
07/21/2010CN101226871B Method for desorption of silicon slice
07/07/2010CN101770973A Plasma process equipment and static chuck device
07/07/2010CN101770933A Plasma process equipment and gas distribution device thereof
07/07/2010CN101768743A Method for etching germanium antimony tellurium alloy materials
07/07/2010CN101768733A Gas distribution device and plasma processing device
06/2010
06/30/2010CN101764044A Method for pretreating technical cavity of plasma device
06/30/2010CN101298673B Preparation of insulated heat conducting metal substrate
06/29/2010US7744769 etching gas COMPRISING HYPOFLUORITE WHICH DISSOCIATES MORE EASILY THAN, FOR EXAMPLE, EACH OF CF4, C2F6, C4F8, AND NF3
06/24/2010US20100155223 Electromagnet array in a sputter reactor
06/24/2010DE19852256B4 Verfahren zum Ätzen von Platin A method for etching platinum
06/23/2010CN101752214A Semiconductor processing cavity part and production method thereof, as well as semiconductor processing equipment
06/23/2010CN101207062B Method for manufacturing substrate carrying table
06/16/2010CN101740448A Plasma processing equipment and substrate support plate thereof
06/16/2010CN101736326A Capacitively coupled plasma processing reactor
06/16/2010CN101145508B Plasma processing device and method
06/16/2010CN101080331B Gear surface treatment procedure
06/15/2010US7737382 Device for processing welding wire
06/10/2010US20100140224 Plasma Processing Apparatus And Plasma Processing Method
06/09/2010CN101730375A Inductively coupled plasma processing device and plasma processing method
06/09/2010CN101724843A Plasma precleaning method
06/09/2010CN101399166B Etching substrates mounted with gas wall
06/09/2010CN101359580B Substrate processing apparatus having a sensing unit
06/09/2010CN101153396B Plasma etching method
06/02/2010CN1626718B Method for making sliding part and said sliding part, and sewing machine
06/02/2010CN101719480A Static cartridge and plasma device
06/02/2010CN101339895B Gas distribution device and plasma processing apparatus applying the same
06/02/2010CN101325150B Flexible manifold for integrated gas system gas panels
06/02/2010CN101320679B Plasma processing system
06/02/2010CN101315880B Gas distribution device and plasma processing apparatus adopting the same
06/02/2010CN101303997B Plasma processing apparatus, focus ring, and susceptor
06/02/2010CN101246836B Substrate carrying platform and process method for its surface
06/02/2010CN101179010B Process chamber having gate slit opening and closing apparatus
06/02/2010CN101162685B Apparatus and method of semiconductor plasma process
06/02/2010CN101060074B Method for etching wafer in plasma etching cell
06/01/2010US7727412 Dry etching method
05/2010
05/19/2010CN101285189B Process for decreasing deposit at reaction chamber in metal etching process
05/19/2010CN101217114B A method for semiconductor silicon etching technique migration
05/19/2010CN101207034B Chamber top cover and reaction chamber containing said top cover
05/19/2010CN101207001B Exhaust device and reaction chamber containing the same
05/19/2010CN101206999B Inner lining and reaction chamber containing the same
05/12/2010EP2184381A1 Dry etching method for magnetic material
05/12/2010EP2184380A1 Dry etching method for magnetic material
05/12/2010EP1143496B1 Plasma etching method
05/12/2010CN1909193B Plasma etching apparatus
05/12/2010CN1896315B Ion beam etching method and ion beam etching apparatus
05/12/2010CN1891861B Process kit design for reducing particle generation
05/12/2010CN101165868B Wafer processing chamber liner and wafer processing chamber comprising same
05/12/2010CN101148765B Silicon chip etching method
05/06/2010WO2010050337A1 Etching process and thin film device
05/05/2010CN1967773B Etching method of ditch road device
04/2010
04/28/2010CN1479175B Method for etching surface material with induced chemical reaction by focused electron beam on surface
04/21/2010CN201439539U Reaction cavity vacuum valve and protection device thereof
04/21/2010CN101308773B System for manufacturing flat display
04/15/2010DE102008042777A1 Selektiver Lötstop Selective Solderstop
04/08/2010DE102005017632B4 Verfahren zur Modifikation der Oberfläche einer Probe mittels eines gepulsten Ionenstrahls oder mittels eines ionenstrahlgenerierten Teilchenstrahls mit homogen oder gaußförmig verteilter Stromdichte A method of modifying the surface of a sample by means of a pulsed ion beam or ion beam generated by a particle beam with homogeneously distributed, or Gaussian current density
04/07/2010CN101140860B Apparatus for treating plasma
03/2010
03/31/2010CN101685791A Substrate supporting device and method for discharging static electricity by using same
03/30/2010US7686926 A tantalum nitride/Ta barrier is first sputter deposited with high target power and wafer bias, argon etching is performed with even higher wafer bias. a flash step is applied with reduced target power and wafer bias; different magnetic field distributions
03/25/2010DE19646700B4 Vakuumbehandlungskammer, Vakuum-Zerstäubungsverfahren und Magnetronanordnung Vacuum processing chamber, vacuum magnetron sputtering and
03/24/2010CN101681829A Etching method and etching apparatus
03/24/2010CN101680826A Method for quantitative analysis of tin or tin alloy plating layer
03/24/2010CN100595895C Silicon groove forming method and device
03/24/2010CN100595885C Plasma processing apparatus
03/17/2010CN100594587C 干蚀刻方法 The dry etching method
03/11/2010US20100060109 Nanotubes, nanorods and nanowires having piezoelectric and/or pyroelectric properties and devices manufactured therefrom
03/04/2010US20100053624 Biosensor
03/04/2010DE10296978B4 Elektrodenteil für eine Plasmabehandlungsvorrichtung, Plasmabehandlungsvorrichtung und Plasmabehandlungsverfahren Electrode member for a plasma processing apparatus, plasma processing apparatus and plasma processing method
03/03/2010EP2158995A1 Micro-arc alloy cleaning method and device
02/2010
02/25/2010US20100043974 Plasma processing method and apparatus
02/23/2010US7666718 Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method
02/18/2010US20100041238 Tunable multi-zone gas injection system
02/18/2010DE102008038910A1 Verfahren und Vorrichtung zur Herstellung eines strukturierten Gegenstands sowie strukturierter Gegenstand Method and apparatus for producing a patterned article, and structured object
02/04/2010DE102008033977A1 Method for surface coating of a base material with layer materials, comprises providing the base material with a protective material, wearing out upper most part of the protective layer and providing the protective layer with a cover layer
02/03/2010EP2149899A1 Etching method and etching apparatus
02/03/2010CN100587116C Rare earth metal member and making method
02/02/2010US7655152 Etching
01/2010
01/27/2010CN100585828C Substrate carrying platform, substrate processing device and temperature control method
01/27/2010CN100585795C Chamber isolation valve RF grounding
01/20/2010CN100582299C Method and processing system for controlling a chamber cleaning process
01/14/2010WO2010003321A1 A gas injection device and a semiconductor processing apparatus including the gas injection device
01/13/2010CN201383492Y Microwave excitation small-sized plasma etching device
01/13/2010CN101624701A Dry etching method for magnetic material
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