| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 08/19/2010 | WO2010092297A1 Method for the ion beam treatment of a metal layer deposited on a substrate |
| 08/18/2010 | CN101276738B Plama processing apparatus |
| 08/18/2010 | CN101162689B Focus ring and plasma processing apparatus |
| 08/12/2010 | DE202010004773U1 Dichtungselement mit Postionierungsmerkmal für eine festgeklemmte monolithische Gasverteilungselektrode Sealing element with Postionierungsmerkmal for a clamped monolithic gas distribution electrode |
| 08/12/2010 | CA2751736A1 Plasma source with integral blade and method for removing materials from substrates |
| 08/12/2010 | CA2751709A1 Plasma source and method for removing materials from substrates utilizing pressure waves |
| 08/11/2010 | CN101483980B Combined surface processing method for firm-flexible combined circuit board |
| 08/11/2010 | CN101276777B Substrate mounting stage and substrate processing apparatus |
| 08/11/2010 | CN101241846B Techniques for improving etch rate uniformity |
| 08/10/2010 | US7771607 Plasma processing apparatus and plasma processing method |
| 08/10/2010 | US7771561 Apparatus and method for surface treatment to substrate |
| 08/04/2010 | CN101796618A Method and apparatus for diagnosing status of parts in real time in plasma processing equipment |
| 07/28/2010 | CN101499407B Gas dispensing device and semiconductor process plant employing the same |
| 07/28/2010 | CN101335192B Substrate processing apparatus and shower head |
| 07/28/2010 | CN101236891B Plasma processing device |
| 07/28/2010 | CN101170052B Apparatus for controlling plasma etching process |
| 07/27/2010 | US7763545 Semiconductor device manufacturing method |
| 07/22/2010 | WO2010082340A1 Base material etching mechanism, vacuum process device and base material etching method |
| 07/21/2010 | CN101226871B Method for desorption of silicon slice |
| 07/07/2010 | CN101770973A Plasma process equipment and static chuck device |
| 07/07/2010 | CN101770933A Plasma process equipment and gas distribution device thereof |
| 07/07/2010 | CN101768743A Method for etching germanium antimony tellurium alloy materials |
| 07/07/2010 | CN101768733A Gas distribution device and plasma processing device |
| 06/30/2010 | CN101764044A Method for pretreating technical cavity of plasma device |
| 06/30/2010 | CN101298673B Preparation of insulated heat conducting metal substrate |
| 06/29/2010 | US7744769 etching gas COMPRISING HYPOFLUORITE WHICH DISSOCIATES MORE EASILY THAN, FOR EXAMPLE, EACH OF CF4, C2F6, C4F8, AND NF3 |
| 06/24/2010 | US20100155223 Electromagnet array in a sputter reactor |
| 06/24/2010 | DE19852256B4 Verfahren zum Ätzen von Platin A method for etching platinum |
| 06/23/2010 | CN101752214A Semiconductor processing cavity part and production method thereof, as well as semiconductor processing equipment |
| 06/23/2010 | CN101207062B Method for manufacturing substrate carrying table |
| 06/16/2010 | CN101740448A Plasma processing equipment and substrate support plate thereof |
| 06/16/2010 | CN101736326A Capacitively coupled plasma processing reactor |
| 06/16/2010 | CN101145508B Plasma processing device and method |
| 06/16/2010 | CN101080331B Gear surface treatment procedure |
| 06/15/2010 | US7737382 Device for processing welding wire |
| 06/10/2010 | US20100140224 Plasma Processing Apparatus And Plasma Processing Method |
| 06/09/2010 | CN101730375A Inductively coupled plasma processing device and plasma processing method |
| 06/09/2010 | CN101724843A Plasma precleaning method |
| 06/09/2010 | CN101399166B Etching substrates mounted with gas wall |
| 06/09/2010 | CN101359580B Substrate processing apparatus having a sensing unit |
| 06/09/2010 | CN101153396B Plasma etching method |
| 06/02/2010 | CN1626718B Method for making sliding part and said sliding part, and sewing machine |
| 06/02/2010 | CN101719480A Static cartridge and plasma device |
| 06/02/2010 | CN101339895B Gas distribution device and plasma processing apparatus applying the same |
| 06/02/2010 | CN101325150B Flexible manifold for integrated gas system gas panels |
| 06/02/2010 | CN101320679B Plasma processing system |
| 06/02/2010 | CN101315880B Gas distribution device and plasma processing apparatus adopting the same |
| 06/02/2010 | CN101303997B Plasma processing apparatus, focus ring, and susceptor |
| 06/02/2010 | CN101246836B Substrate carrying platform and process method for its surface |
| 06/02/2010 | CN101179010B Process chamber having gate slit opening and closing apparatus |
| 06/02/2010 | CN101162685B Apparatus and method of semiconductor plasma process |
| 06/02/2010 | CN101060074B Method for etching wafer in plasma etching cell |
| 06/01/2010 | US7727412 Dry etching method |
| 05/19/2010 | CN101285189B Process for decreasing deposit at reaction chamber in metal etching process |
| 05/19/2010 | CN101217114B A method for semiconductor silicon etching technique migration |
| 05/19/2010 | CN101207034B Chamber top cover and reaction chamber containing said top cover |
| 05/19/2010 | CN101207001B Exhaust device and reaction chamber containing the same |
| 05/19/2010 | CN101206999B Inner lining and reaction chamber containing the same |
| 05/12/2010 | EP2184381A1 Dry etching method for magnetic material |
| 05/12/2010 | EP2184380A1 Dry etching method for magnetic material |
| 05/12/2010 | EP1143496B1 Plasma etching method |
| 05/12/2010 | CN1909193B Plasma etching apparatus |
| 05/12/2010 | CN1896315B Ion beam etching method and ion beam etching apparatus |
| 05/12/2010 | CN1891861B Process kit design for reducing particle generation |
| 05/12/2010 | CN101165868B Wafer processing chamber liner and wafer processing chamber comprising same |
| 05/12/2010 | CN101148765B Silicon chip etching method |
| 05/06/2010 | WO2010050337A1 Etching process and thin film device |
| 05/05/2010 | CN1967773B Etching method of ditch road device |
| 04/28/2010 | CN1479175B Method for etching surface material with induced chemical reaction by focused electron beam on surface |
| 04/21/2010 | CN201439539U Reaction cavity vacuum valve and protection device thereof |
| 04/21/2010 | CN101308773B System for manufacturing flat display |
| 04/15/2010 | DE102008042777A1 Selektiver Lötstop Selective Solderstop |
| 04/08/2010 | DE102005017632B4 Verfahren zur Modifikation der Oberfläche einer Probe mittels eines gepulsten Ionenstrahls oder mittels eines ionenstrahlgenerierten Teilchenstrahls mit homogen oder gaußförmig verteilter Stromdichte A method of modifying the surface of a sample by means of a pulsed ion beam or ion beam generated by a particle beam with homogeneously distributed, or Gaussian current density |
| 04/07/2010 | CN101140860B Apparatus for treating plasma |
| 03/31/2010 | CN101685791A Substrate supporting device and method for discharging static electricity by using same |
| 03/30/2010 | US7686926 A tantalum nitride/Ta barrier is first sputter deposited with high target power and wafer bias, argon etching is performed with even higher wafer bias. a flash step is applied with reduced target power and wafer bias; different magnetic field distributions |
| 03/25/2010 | DE19646700B4 Vakuumbehandlungskammer, Vakuum-Zerstäubungsverfahren und Magnetronanordnung Vacuum processing chamber, vacuum magnetron sputtering and |
| 03/24/2010 | CN101681829A Etching method and etching apparatus |
| 03/24/2010 | CN101680826A Method for quantitative analysis of tin or tin alloy plating layer |
| 03/24/2010 | CN100595895C Silicon groove forming method and device |
| 03/24/2010 | CN100595885C Plasma processing apparatus |
| 03/17/2010 | CN100594587C 干蚀刻方法 The dry etching method |
| 03/11/2010 | US20100060109 Nanotubes, nanorods and nanowires having piezoelectric and/or pyroelectric properties and devices manufactured therefrom |
| 03/04/2010 | US20100053624 Biosensor |
| 03/04/2010 | DE10296978B4 Elektrodenteil für eine Plasmabehandlungsvorrichtung, Plasmabehandlungsvorrichtung und Plasmabehandlungsverfahren Electrode member for a plasma processing apparatus, plasma processing apparatus and plasma processing method |
| 03/03/2010 | EP2158995A1 Micro-arc alloy cleaning method and device |
| 02/25/2010 | US20100043974 Plasma processing method and apparatus |
| 02/23/2010 | US7666718 Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method |
| 02/18/2010 | US20100041238 Tunable multi-zone gas injection system |
| 02/18/2010 | DE102008038910A1 Verfahren und Vorrichtung zur Herstellung eines strukturierten Gegenstands sowie strukturierter Gegenstand Method and apparatus for producing a patterned article, and structured object |
| 02/04/2010 | DE102008033977A1 Method for surface coating of a base material with layer materials, comprises providing the base material with a protective material, wearing out upper most part of the protective layer and providing the protective layer with a cover layer |
| 02/03/2010 | EP2149899A1 Etching method and etching apparatus |
| 02/03/2010 | CN100587116C Rare earth metal member and making method |
| 02/02/2010 | US7655152 Etching |
| 01/27/2010 | CN100585828C Substrate carrying platform, substrate processing device and temperature control method |
| 01/27/2010 | CN100585795C Chamber isolation valve RF grounding |
| 01/20/2010 | CN100582299C Method and processing system for controlling a chamber cleaning process |
| 01/14/2010 | WO2010003321A1 A gas injection device and a semiconductor processing apparatus including the gas injection device |
| 01/13/2010 | CN201383492Y Microwave excitation small-sized plasma etching device |
| 01/13/2010 | CN101624701A Dry etching method for magnetic material |