| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
|---|
| 05/12/2011 | DE102009051347A1 Verfahren zur Herstellung von Halbleiterschichten Process for preparing semiconductor layers |
| 05/11/2011 | CN201826017U Ultrahigh vacuum ion source chip cleaning system |
| 05/11/2011 | CN101609790B Processing device |
| 05/05/2011 | WO2011051409A1 Method of plasma etching and plasma chamber cleaning using f2 and cof2 |
| 04/27/2011 | CN102033650A Method for performing laser etching on silver paste indium tin oxide film |
| 04/27/2011 | CN101740448B Plasma processing equipment and substrate support plate thereof |
| 04/27/2011 | CN101373702B Cavity inner lining and reaction cavity |
| 04/21/2011 | WO2011045667A1 System for and method of cleaning of copper wire using plasma, activated or reduced gas atmosphere |
| 04/20/2011 | EP0939972B1 Plasma etch reactor and method of operating it |
| 04/20/2011 | CN1881537B Method for manufacturing active matrix display |
| 04/20/2011 | CN101624701B Dry etching method for magnetic material |
| 04/13/2011 | EP2308629A1 Apparatus for generating a negatively charged ionic reducing gas |
| 04/13/2011 | CN101609792B Microwave plasma processing apparatus and method of supplying microwaves using the apparatus |
| 04/13/2011 | CN101320676B Evacuation method and storage medium |
| 04/12/2011 | US7922925 Method and device for removing layers in some areas of glass plates |
| 04/12/2011 | US7922921 Method for fabricating liquid crystal display panel array |
| 04/12/2011 | US7922862 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
| 04/07/2011 | WO2011040423A1 Processing liquid for suppressing pattern collapse of fine metal structure and method for producing fine metal structure using same |
| 04/06/2011 | CN101527258B Cover part, process gas diffusing and supplying unit, and substrate processing apparatus |
| 03/30/2011 | EP1811335B1 Method for producing a photomask |
| 03/30/2011 | CN101083223B Ring assembly for substrate processing chamber |
| 03/24/2011 | US20110070146 Method of manufacturing graphene, graphene manufactured by the method, conductive film comprising the graphene, transparent electrode comprising the graphene, and radiating or heating device comprising the graphene |
| 03/15/2011 | US7906033 Plasma etching method and apparatus |
| 03/10/2011 | DE4412541B4 Gaseinlassanlage und -verfahren Gas inlet system and method |
| 03/09/2011 | CN101587156B Plasma monitoring method and apparatus |
| 03/03/2011 | WO2011025770A1 Focused ion beam process for selective and clean etching of copper |
| 03/03/2011 | WO2011023798A1 Treatment of parts with metallized finish areas with a differentiated appearance |
| 03/03/2011 | WO2010141257A3 Method and apparatus for etching |
| 03/03/2011 | US20110048931 FIB Process for Selective and Clean Etching of Copper |
| 03/03/2011 | US20110048930 Selective nanotube growth inside vias using an ion beam |
| 03/03/2011 | US20110048929 FIB Process for Selective and Clean Etching of Copper |
| 02/22/2011 | US7892361 In-chamber member, a cleaning method therefor and a plasma processing apparatus |
| 02/10/2011 | US20110030772 Electronic device including graphene-based layer(s), and/or method or making the same |
| 02/09/2011 | CN1838386B Plasma processing device |
| 02/09/2011 | CN101562126B Vacuum container and plasma processing apparatus |
| 02/08/2011 | US7883630 FIB milling of copper over organic dielectrics |
| 02/03/2011 | WO2011013385A1 Plasma treatment apparatus and method for manufacturing magnetic recording medium |
| 02/02/2011 | CN101303998B Plasma processing apparatus, focus ring, and susceptor |
| 02/01/2011 | US7879179 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film |
| 01/27/2011 | WO2010091361A3 Plasma source and method for removing materials from substrates utilizing pressure waves |
| 01/26/2011 | EP1130948B1 Inner-electrode plasma processing apparatus and method of plasma processing |
| 01/26/2011 | CN101064238B Plasma reactor apparatus with independent capacitive and toroidal plasma sources |
| 01/20/2011 | WO2011007527A1 Metal laminated substrate for use as an oxide superconducting wire material, and manufacturing method therefor |
| 01/20/2011 | WO2010091365A3 Plasma source with integral blade and method for removing materials from substrates |
| 01/19/2011 | EP1390558B1 Penning discharge plasma source |
| 01/19/2011 | CN101431009B Shower plate and substrate processing apparatus |
| 01/13/2011 | DE10208043B4 Materialbearbeitungssystem und Materialbearbeitungsverfahren Material processing system and material handling processes |
| 01/12/2011 | EP2272628A2 Processing method for a workpiece |
| 01/12/2011 | CN101441983B Plasma confinement apparatus and semiconductor processing equipment applying the same |
| 01/05/2011 | EP2270259A1 Method of eliminating metallic lithium |
| 01/05/2011 | CN101937832A Dry etching method |
| 01/05/2011 | CN101935883A Ultrahigh vacuum ion source wafer cleaning system |
| 01/05/2011 | CN101577216B 等离子反应器 Plasma reactor |
| 12/30/2010 | US20100330707 Robust Self-Aligned Process for Sub-65nm Current-Perpendicular Junction Pillars |
| 12/30/2010 | US20100326814 Method for eliminating metallic lithium |
| 12/29/2010 | CN1934913B Plasma generating equipment |
| 12/29/2010 | CN101471395B Reaction chamber structure of solar battery edge-engraving machine |
| 12/22/2010 | CN101924015A Gas input device and semiconductor processing device |
| 12/22/2010 | CN101924014A Air suction device and technological chamber |
| 12/22/2010 | CN101924011A Etching device and method |
| 12/14/2010 | US7850819 Plasma reactor with high productivity |
| 12/14/2010 | US7849814 Plasma generating device |
| 12/09/2010 | WO2010141257A2 Method and apparatus for etching |
| 12/08/2010 | CN101515538B Sealing structure for processing reaction chamber by semiconductor |
| 12/08/2010 | CN101290873B Hollow anode plasma reactor and method |
| 12/08/2010 | CN101197251B Etching apparatus for edges of substrate |
| 12/07/2010 | US7846291 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film |
| 12/01/2010 | CN101556904B Gas distributor and semiconductor processing equipment applying same |
| 12/01/2010 | CN101298676B Manufacturing method of insulation heat-conducting metal substrate |
| 12/01/2010 | CN101124663B Method for processing outer periphery of substrate and apparatus thereof |
| 11/25/2010 | DE4345602B4 Verfahren zum Zünden und Betreiben einer Niederspannungs-Bogenentladung, Vakuumbehandlungsanlage und Kathodenkammer hierfür sowie Verwendung des Verfahrens Method for starting and operating a low-voltage arc discharge, vacuum treatment plant and cathode chamber for this and using the method |
| 11/24/2010 | EP2252726A2 Method and system for improving surgical blades by the application of gas cluster ion beam technology and improved surgical blades |
| 11/24/2010 | CN101894737A Control method of cavity environment |
| 11/24/2010 | CN101355010B Air-intake installation and reaction chamber |
| 11/24/2010 | CN101271859B Plasma processing apparatus and structure therein |
| 11/10/2010 | CN101880863A Multifunctional ion beam sputtering deposition and etching equipment |
| 11/04/2010 | DE102010002593A1 Bildungsverfahren für wasserabweisende Schicht und Injektor mit wasserabweisender Schicht Formation method for water-repellent layer and injector with water-repellent layer |
| 11/03/2010 | CN101552182B Marginal ring mechanism used in semiconductor manufacture technology |
| 11/03/2010 | CN101436536B Method for dry method etching polycrystalline silicon in deep plow groove |
| 10/28/2010 | DE10320805B4 Vorrichtung zur Bearbeitung von zylindrischen, zumindest eine elektrisch leitende Ader aufweisenden Substraten Device for machining cylindrical, at least one electrically conductive wire having substrates |
| 10/27/2010 | CN101872713A Electrostatic chuck device, plasma processing device and method for manufacturing electrostatic chuck device |
| 10/27/2010 | CN101423945B Method for preparing light metal super-hydrophobic surface |
| 10/27/2010 | CN101179005B Exhaust air system, semi-conductor manufacturing installation for manufacturing thin film by the same and method thereof |
| 10/21/2010 | US20100263795 Device for processing welding wire |
| 10/20/2010 | CN1841654B Device and method for controlling temperature of a mounting table, a program therefor, and a processing apparatus including same |
| 10/06/2010 | CN101207003B Inner lining of wafer processing chamber and wafer processing chamber containing said inner lining |
| 10/05/2010 | US7807019 Radial antenna and plasma processing apparatus comprising the same |
| 09/29/2010 | CN101207061B Substrate mounting table and method for manufacturing same, substrate processing apparatus, and fluid supply mechanism |
| 09/22/2010 | CN101459054B Plasma processing apparatus |
| 09/22/2010 | CN101170050B Cleaning method for reaction cavity room, forming method of protection film |
| 09/22/2010 | CN101162688B Plasma processing device and running processing method and method for manufacturing electric device |
| 09/15/2010 | CN101835338A Plasma control method and plasma control apparatus |
| 09/15/2010 | CN101320680B Anti-arc protection device and its assembling method |
| 09/01/2010 | EP2223327A2 Methods and systems for removing a material from a sample |
| 09/01/2010 | CN201567390U High-speed non-plasma silicon etching system |
| 09/01/2010 | CN101562122B Dry etching method and silicon wafer etching method |
| 09/01/2010 | CN101540272B Plasma cleaning method for removing byproduct in chamber and plasma processing system |
| 09/01/2010 | CN101320675B Plasma processing device, electrode temperature adjusting device and method |
| 09/01/2010 | CN101217103B A maintenance method of plasma etching device |
| 08/26/2010 | US20100213170 Etching method and etching apparatus |