| Patents for C23F 4 - Processes for removing metallic material from surfaces, not provided for in group or (4,769) |
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| 05/08/2012 | US8173478 Method of manufacturing metal wiring and method of manufacturing semiconductor device |
| 05/08/2012 | US8173032 Measurement of etching |
| 05/02/2012 | EP1664924B1 Method for high-resolution etching of thin layers with electron beams |
| 05/02/2012 | CN102437001A Vacuum processing apparatus, vacuum processing method, and micro-machining apparatus |
| 05/02/2012 | CN101935883B Ultrahigh vacuum ion source wafer cleaning system |
| 04/26/2012 | US20120097526 Rotary magnetron |
| 04/25/2012 | CN101419904B 等离子体约束装置及等离子体处理装置 The plasma processing apparatus and plasma confinement apparatus |
| 04/25/2012 | CN101302610B 具有覆盖钇铝层的部件的处理腔 A cover member having a layer of yttrium aluminum processing chamber |
| 04/25/2012 | CN101276775B 载置台的表面处理方法 The surface treatment method of the stage |
| 04/18/2012 | CN202193849U 电浆反应装置及其承载盘 Plasma reactor and carrier plate |
| 04/11/2012 | CN101685791B 基片支承装置及其静电释放方法 Substrate support apparatus and method for electrostatic discharge |
| 03/29/2012 | WO2012039944A1 Method for removing mercury contamination from solid surfaces |
| 03/29/2012 | CA2807837A1 Method for removing mercury contamination from solid surfaces |
| 03/28/2012 | CN101872713B Electrostatic chuck device, plasma processing device and method for manufacturing electrostatic chuck device |
| 03/07/2012 | CN102368469A Cover for forevacuum cavity of novel ICP (Inductively Coupled Plasma) etcher |
| 02/22/2012 | CN102362006A Method for the ion beam treatment of a metal layer deposited on a substrate |
| 02/15/2012 | CN102352512A Method for preparing high-adhesion diamond coating with pulse laser |
| 02/01/2012 | CN101383272B 等离子体反应器室中的具有晶片边缘气体注射的阴极衬套 Plasma reactor chamber having a cathode liner of the wafer edge gas injection |
| 02/01/2012 | CN101369527B 真空加工器 Vacuum processing unit |
| 01/25/2012 | CN102332385A Mesh plate structure for ion neutralization |
| 01/25/2012 | CN101924011B Etching device and method |
| 01/04/2012 | CN101419907B High temperature cathode for plasma etching |
| 12/28/2011 | CN102299068A 基板处理方法 Substrate processing method |
| 12/22/2011 | WO2011060444A3 Gas delivery for beam processing systems |
| 12/21/2011 | EP2396457A2 Plasma source with integral blade and method for removing materials from substrates |
| 12/21/2011 | EP2396456A2 Plasma source and method for removing materials from substrates utilizing pressure waves |
| 12/21/2011 | EP2396447A1 Method for the ion beam treatment of a metal layer deposited on a substrate |
| 12/21/2011 | CN101894737B 腔室环境的控制方法 The control method of the chamber environment |
| 12/21/2011 | CN101572219B 一种腔室状态监控系统、方法以及半导体处理设备 One kind of chamber condition monitoring systems, methods, and semiconductor processing equipment |
| 12/14/2011 | EP1484788B1 High-frequency power supply structure and plasma cvd device using the same |
| 12/14/2011 | CN202072761U 一种适用于等离子体处理机台的气体混合装置以及等离子体处理机台 One for plasma processor sets plasma gas mixing device and processor sets |
| 12/14/2011 | CN1806310B 局部除去玻璃板涂层的方法及装置 Method and apparatus for removing a partial coating of the glass sheet |
| 12/14/2011 | CN102280341A 稳定等离子体处理的方法和设备 Stabilization method and apparatus for plasma treatment |
| 12/14/2011 | CN101417578B 一种不锈钢表面装饰方法 A surface decoration method for stainless steel |
| 12/07/2011 | EP1639619B1 Method and device for removing layers in some areas of glass plates |
| 12/07/2011 | EP1390964B1 Dipole ion source |
| 12/07/2011 | EP1388159B1 Magnetic mirror plasma source |
| 12/07/2011 | CN101042991B 等离子体处理装置 Plasma processing apparatus |
| 11/30/2011 | CN102260849A 团簇束产生装置以及方法、基板处理装置以及方法 Cluster beam generating apparatus and method, substrate processing apparatus and method |
| 11/16/2011 | CN102245812A Base material etching mechanism, vacuum process device and base material etching method |
| 11/16/2011 | CN101359583B Plasma processing apparatus of batch type |
| 11/09/2011 | CN101414537B Tunable multi-zone gas injection system |
| 11/02/2011 | CN102230179A Method for preparing metal nano stripes |
| 11/02/2011 | CN101355009B Etching device |
| 11/01/2011 | US8048327 Plasma processing apparatus and control method thereof |
| 10/25/2011 | US8043971 Plasma processing apparatus, ring member and plasma processing method |
| 10/12/2011 | CN1840740B Plasma processing device |
| 10/12/2011 | CN101465284B Substrate processing appratus |
| 10/06/2011 | US20110241189 Apparatus for and methods of attaching heat slugs to package tops |
| 10/05/2011 | EP2372753A1 Gas Compositions for Cleaning the Interiors of Reactors as Well as for Etching Films of Silicon-Containing Compounds |
| 09/22/2011 | US20110229377 Apparatus for Removal of Surface Oxides via Fluxless Technique Involving Electron Attachment and Remote Ion Generation |
| 09/21/2011 | CN102194634A Focusing ring and substrate carrying system |
| 09/21/2011 | CN102191502A Gas shower structure and substrate processing apparatus |
| 09/21/2011 | CN101376980B Process for improving strip steel wetting property |
| 09/21/2011 | CN101135033B Conductive, plasma-resistant member |
| 09/14/2011 | CN102183509A Plasma monitoring method and plasma monitoring device |
| 09/14/2011 | CN101452821B Plasma treatment apparatus and shield ring thereof |
| 09/09/2011 | WO2011065965A3 An electrostatic chuck with an angled sidewall |
| 09/08/2011 | US20110214813 Plasma processing method and apparatus |
| 09/07/2011 | CN101654774B Method for inhibiting corrosion of metal pad |
| 09/01/2011 | WO2011105282A1 Method for forming conductor traces and method for manufacturing semiconductor substrates |
| 08/31/2011 | CN101261952B Substrate carrying bench and substrate treatment device |
| 08/24/2011 | CN102162099A Gas injection system for etching profile control |
| 08/24/2011 | CN101113514B Substrate processing apparatus |
| 08/17/2011 | CN102157425A Ring assembly for substrate processing chamber |
| 08/17/2011 | CN102154650A Thick aluminum etching method during producing bipolar integrated circuit |
| 08/17/2011 | CN101770933B Plasma process equipment and gas distribution device thereof |
| 08/17/2011 | CN101383266B Reaction cavity |
| 08/17/2011 | CN101369515B Reaction cavity |
| 08/17/2011 | CN101295629B Methods to eliminate M-shape etch rate profile in inductively coupled plasma reactor |
| 08/17/2011 | CN101140859B Etching apparatus and etching method using the same |
| 08/10/2011 | CN101736326B Capacitively coupled plasma processing reactor |
| 08/10/2011 | CN101681829B Etching method and etching apparatus |
| 08/09/2011 | CA2668502C Process for surface treatment of a high-strength steel mechanical part |
| 08/04/2011 | WO2011092909A1 Metal member manufacturing method, and metal member |
| 08/04/2011 | US20110189439 Slide Surface and Surface Processing Method of the Same |
| 08/03/2011 | CN102140640A Slide member and surface processing method of the same |
| 07/28/2011 | DE102010060297A1 Verfahren zum Entfernen von Kontamination von einem Reaktor A method of removing contamination from a reactor |
| 07/27/2011 | CN101373703B Cap-opening mechanism and semiconductor processing device and cap-opening control method thereof |
| 07/20/2011 | CN1958170B Gas supplying unit and substrate processing apparatus |
| 07/20/2011 | CN102129975A Method for forming metal gate by plasma etching process |
| 07/20/2011 | CN101509848B Method for producing Transmission electron microscopy sample with surface layer high residual stress example cross section |
| 07/13/2011 | EP1225621B1 Method of etching |
| 07/13/2011 | CN102122607A Method and apparatus for controlling the spatial temperature distribution |
| 07/13/2011 | CN101615574B Processing device |
| 07/12/2011 | US7977598 Apparatus and method for removal of surface oxides via fluxless technique involving electron attachment and remote ion generation |
| 07/12/2011 | US7976716 Semiconductor device manufacturing method |
| 07/07/2011 | US20110162802 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
| 06/30/2011 | US20110158894 Method and device for cnt length control |
| 06/22/2011 | CN101540273B Shower head and substrate processing apparatus |
| 06/15/2011 | CN102098862A Lower electrode device and plasma processing equipment using same |
| 06/15/2011 | CN101378031B Substrate carrier plateform and substrate processing device |
| 06/09/2011 | US20110132871 Shear sensors and uses thereof |
| 06/03/2011 | WO2011065965A2 An electrostatic chuck with an angled sidewall |
| 06/02/2011 | US20110129617 Plasma system and method of producing a functional coating |
| 05/25/2011 | CN1982083B Production method of planar relief flat based on corrosion |
| 05/18/2011 | CN102067279A Method and system for supplying a cleaning gas into a process chamber |
| 05/18/2011 | CN102061478A Biological corrosion removal method for machined burrs of micro metal parts |
| 05/18/2011 | CN101008072B Apparatus and method to confine plasma and to enhance flow conductance |
| 05/12/2011 | US20110108956 Etching process for semiconductors |