Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143) |
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03/09/1999 | US5880514 Protection circuit for semiconductor device |
03/09/1999 | US5880513 Asymmetric snubber resistor |
03/09/1999 | US5880512 Programmable interconnect structures and programmable integrated circuits |
03/09/1999 | US5880511 Low-voltage punch-through transient suppressor employing a dual-base structure |
03/09/1999 | US5880509 Semiconductor pressure sensor and its manufacturing method |
03/09/1999 | US5880508 MOSFET with a high permitivity gate dielectric |
03/09/1999 | US5880507 Semiconductor device with improved pn junction breakdown voltage |
03/09/1999 | US5880505 Solid solution with high heat resistance and low sheet resistance |
03/09/1999 | US5880502 Low and high voltage CMOS devices and process for fabricating same |
03/09/1999 | US5880501 Semiconductor integrated circuit and manufacturing method of the same |
03/09/1999 | US5880500 Semiconductor device and process and apparatus of fabricating the same |
03/09/1999 | US5880499 Memory cell of a nonvolatile semiconductor device |
03/09/1999 | US5880498 Flash read only memory |
03/09/1999 | US5880484 Lateral resonant tunneling transistor having two non-symmetric quantum dots |
03/09/1999 | US5880483 Active layer comprising groups 3-5 materials; field effect transistors |
03/09/1999 | US5880371 Pressure transducer apparatus and method for making |
03/09/1999 | US5880040 Gate dielectric based on oxynitride grown in N2 O and annealed in NO |
03/09/1999 | US5880038 Forming a resist mask on an upper portion of an aluminum gate electrode, anodizing to form an oxide on unmasked regions; forming silicon oxide film, hydrofluoric acid etching to form contact holes to semiconductor and wire simultaneously |
03/09/1999 | US5880022 Self-aligned contact window |
03/09/1999 | US5880015 Method of producing stepped wall interconnects and gates |
03/09/1999 | US5880008 Selectively etching a portion of the semiconductor substrate with the first silicon nitride film and sidewall spacer used as a mask; forming thin field oxide in a self-aligned manner relative to polysilicon layer; floating gate memory devices |
03/09/1999 | US5880001 Method for forming epitaxial pinched resistor having reduced conductive cross sectional area |
03/09/1999 | US5880000 Method for fabricating an NPN transistor of minimum surface |
03/09/1999 | US5879999 Method of manufacturing an insulated gate semiconductor device having a spacer extension |
03/09/1999 | US5879998 Adaptively controlled, self-aligned, short channel device and method for manufacturing same |
03/09/1999 | US5879997 Method for forming self aligned polysilicon contact |
03/09/1999 | US5879996 Implanting germanium (ge) layer under existing gate oxide and growing the silicide in a low temperature furnace; efficient manufacture of complementary metal oxide semiconductor (cmos) with stable gate oxide over a silicon-ge transistor channel |
03/09/1999 | US5879995 High-voltage transistor and manufacturing method therefor |
03/09/1999 | US5879994 Self-aligned method of fabricating terrace gate DMOS transistor |
03/09/1999 | US5879993 Nitride spacer technology for flash EPROM |
03/09/1999 | US5879992 Method of fabricating step poly to improve program speed in split gate flash |
03/09/1999 | US5879990 Semiconductor device having an embedded non-volatile memory and method of manufacturing such a semicondutor device |
03/09/1999 | US5879989 Method for fabricating nonvolatile memory device using disposable layer |
03/09/1999 | US5879983 Semiconductor device and method for manufacturing the same |
03/09/1999 | US5879982 Methods of forming integrated circuit memory devices having improved electrical interconnects therein |
03/09/1999 | US5879979 Method of manufacturing a semiconductor device containing CMOS elements |
03/09/1999 | US5879978 Semiconductor device and method of fabricating the same |
03/09/1999 | US5879977 Deposition of metal catalyst promotes crystallization of amorphous silicon film |
03/09/1999 | US5879976 Thin film transistor and method for producing the same |
03/09/1999 | US5879974 Using a metal which promotes crystallization of silicon and an amorphous silicon film |
03/09/1999 | US5879973 Method for fabricating thin-film transistor |
03/09/1999 | US5879970 Process of growing polycrystalline silicon-germanium alloy having large silicon content |
03/09/1999 | US5879969 Anodic oxidation of electrode pattern by feeding an electric field through wiring on substrate |
03/09/1999 | US5879968 Process for manufacture of a P-channel MOS gated device with base implant through the contact window |
03/09/1999 | US5879967 Methods forming power semiconductor devices having latch-up inhibiting regions |
03/09/1999 | US5879960 Manufacturing method of thin film diode for liquid crystal display device |
03/09/1999 | US5879958 Method of producing an electro-optical device |
03/09/1999 | US5879957 Method for manufacturing a capacitor |
03/09/1999 | US5879956 Forming insulation film having contact hole, forming electrodes including perovskite structures, etching, forming spacers |
03/09/1999 | US5879447 Semiconductor device and its fabricating method |
03/04/1999 | WO1999010939A2 A method of manufacturing a field-effect transistor substantially consisting of organic materials |
03/04/1999 | WO1999010925A1 Vertical interconnect process for silicon segments with thermally conductive epoxy preform |
03/04/1999 | WO1999010924A1 Reduction of charge loss in nonvolatile memory cells by phosphorous implantation into pecvd nitride/oxynitride films |
03/04/1999 | WO1999010920A1 METHOD FOR THERMAL SELF-HEALING OF AN SiC SEMICONDUCTOR AREA DOPED BY MEANS OF IMPLANTATION AND A SiC BASED SEMICONDUCTOR COMPONENT |
03/04/1999 | WO1999010919A1 Silicon carbide substrate, process for producing the same, and semiconductor element containing silicon carbide substrate |
03/04/1999 | WO1998056020A3 Method for arrangement of a buried capacitor, and a buried capacitor arranged according to said method |
03/04/1999 | DE19832803A1 Gate dielectric for field effect transistor, especially MISFET |
03/04/1999 | DE19819438A1 Semiconductor device production by the salicide technique |
03/04/1999 | DE19757327C1 Single electron device especially a single electron transistor device |
03/04/1999 | DE19747996C1 Ruthenium-doped semi-insulating III-V compound semiconductor epitaxy |
03/04/1999 | DE19739498C1 Cascade MOS thyristor |
03/04/1999 | DE19733350C1 MOSFET production process uses only three photolithography or masking steps |
03/04/1999 | CA2269912A1 Silicon carbide substrate, process for producing the same, and semiconductor element containing silicon carbide substrate |
03/03/1999 | EP0899835A1 Semiconductor Laser Device |
03/03/1999 | EP0899796A2 Light emitting semiconductor device using nanocrystals |
03/03/1999 | EP0899794A2 High frequency diode and method for fabricating it |
03/03/1999 | EP0899793A2 Transistor having localized source and drain extensions and method |
03/03/1999 | EP0899792A2 Transistor with structured sidewalls and method |
03/03/1999 | EP0899791A2 Trench-gated MOSFET with bidirectional voltage clamping |
03/03/1999 | EP0899790A2 DRAM cell array and method of producing the same |
03/03/1999 | EP0899784A2 Semiconductor device and method of fabricating thereof |
03/03/1999 | EP0899783A2 Circuit arrangement with at least four transistors and method of fabrication |
03/03/1999 | EP0899782A2 Method of manufacturing a field effect transistor |
03/03/1999 | EP0898808A1 Three-terminal power mosfet switch for use as synchronous rectifier or voltage clamp |
03/03/1999 | EP0898785A1 Active matrix displays and method of making |
03/03/1999 | CN1209648A Method for mfg. of semiconductor device |
03/03/1999 | CN1209647A Method for mfg. of dual-polar state induction transistor |
03/03/1999 | CN1209646A Mfg. method for semiconductor device |
03/03/1999 | CN1209609A Method for simulating collision ionization phenomenon in semiconductor device |
03/03/1999 | CN1209606A Device analog method |
03/02/1999 | US5877986 Multi-state Flash EEprom system on a card that includes defective cell substitution |
03/02/1999 | US5877980 Nonvolatile memory device having a program-assist plate |
03/02/1999 | US5877977 Nonvolatile memory based on metal-ferroelectric-metal-insulator semiconductor structure |
03/02/1999 | US5877943 Clustering adapter for spherical shaped devices |
03/02/1999 | US5877646 Method for the turn-on regulation of an IGBT and apparatus for carrying out the method |
03/02/1999 | US5877558 Gallium nitride-based III-V group compound semiconductor |
03/02/1999 | US5877540 Epitaxial-base bipolar transistor |
03/02/1999 | US5877539 Bipolar transistor with a reduced collector series resistance |
03/02/1999 | US5877538 Bidirectional trench gated power MOSFET with submerged body bus extending underneath gate trench |
03/02/1999 | US5877535 CMOS semiconductor device having dual-gate electrode construction and method of production of the same |
03/02/1999 | US5877534 Method of forming electrostatic discharge protection device for integrated circuit |
03/02/1999 | US5877532 Semiconductor device and method of manufacturing the same |
03/02/1999 | US5877531 MIS type semiconductor device and method for manufacturing same |
03/02/1999 | US5877530 Formation of gradient doped profile region between channel region and heavily doped source/drain contact region of MOS device in integrated circuit structure using a re-entrant gate electrode and a higher dose drain implantation |
03/02/1999 | US5877529 Mosfet termination design and core cell configuration to increase breakdown voltage and to improve device ruggedness |
03/02/1999 | US5877528 Structure to provide effective channel-stop in termination areas for trenched power transistors |
03/02/1999 | US5877527 Semiconductor device and method of producing the same |
03/02/1999 | US5877526 Semiconductor device having polysilicon thin-film |
03/02/1999 | US5877524 Non-volatile semiconductor memory device |
03/02/1999 | US5877523 Multi-level split- gate flash memory cell |