Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
04/1999
04/27/1999US5897355 Method of manufacturing insulated gate semiconductor device to improve ruggedness
04/27/1999US5897354 Method of forming a non-volatile memory device with ramped tunnel dielectric layer
04/27/1999US5897353 Method of forming dielectric film of semiconductor memory device
04/27/1999US5897349 Method for fabricating a capped gate conductor
04/27/1999US5897347 Semiconductor, semiconductor device, and method for fabricating the same
04/27/1999US5897345 Semiconductor device and process for fabricating the same
04/27/1999US5897344 Method of making a thin film semiconductor device
04/27/1999US5897343 Method of making a power switching trench MOSFET having aligned source regions
04/27/1999US5897328 Thin film transistor, organic electroluminescence display device and manufacturing method of the same
04/27/1999CA2160630C Protein-based semiconductor integrated circuit
04/27/1999CA2139141C Quantum-well type semiconductor laser device having multi-layered quantum-well layer
04/24/1999CA2251438A1 Process for producing thin-film transistors
04/22/1999WO1999019913A1 Memory device having a crested tunnel barrier
04/22/1999WO1999019912A1 Dual-band quantum-well infrared sensing array
04/22/1999WO1999019910A1 Porous silicon oxycarbide integrated circuit insulator
04/22/1999WO1999019902A1 Method of manufacturing a semiconductor device by low temperature cvd
04/22/1999WO1999019900A2 Method of forming an electronic device
04/22/1999WO1999019880A1 Nonvolatile pmos two transistor memory cell and array
04/22/1999WO1999019734A2 Multi-element micro gyro
04/22/1999DE3844958C2 Power semiconductor element on substrate section
04/22/1999DE19827938A1 Integrated semiconductor circuit module with internal circuit
04/22/1999DE19746395A1 Polyhedral p-doped silicon macromolecule used as semiconductor device barrier layer
04/22/1999DE19746138A1 Spin polarisation direction detection method
04/22/1999CA2306384A1 Method of forming an electronic device
04/22/1999CA2305230A1 Memory device having a crested tunnel barrier
04/21/1999EP0910126A2 MOS field effect transistor with an improved lightly doped diffusion region structure and method of forming the same
04/21/1999EP0910120A2 Method of producing a ferroelectric thin film containing bismuth
04/21/1999EP0910119A2 Method for oxidizing a structure during the fabrication of a semiconductor device
04/21/1999EP0909972A2 Method of forming a high resolution liquid crystal display device
04/21/1999EP0909937A1 Semiconductor strain sensor, method of manufacturing the sensor, and scanning probe microscope
04/21/1999EP0909460A1 Hex metal on rectangular cells; metal or metal two is hex
04/21/1999EP0909454A1 Semiconductor cathode and electron tube comprising a semiconductor cathode
04/21/1999EP0731985B1 Improved mesh geometry for mos-gated semiconductor devices
04/21/1999EP0727097B1 Structure and fabrication of bipolar transistors
04/21/1999EP0682811B1 Lateral semiconductor-on-insulator (soi) semiconductor device having a buried diode
04/21/1999CN1214799A Active matrix displays and method of making
04/21/1999CN1214542A Integrated circuit fabrication method and structure
04/21/1999CN1214540A Manufacture of MOS transistor with P+ polysilicon grid
04/21/1999CN1214534A Fabrication method of semiconductor device equipped with silicide layer
04/21/1999CN1043103C Semiconductor device and method for fabricating the same
04/21/1999CN1043097C Method for manufacturing flash eeprom cell
04/20/1999US5896317 Nonvolatile semiconductor memory device having data line dedicated to data loading
04/20/1999US5896315 Nonvolatile memory
04/20/1999US5896314 Asymmetric flash EEPROM with a pocket to focus electron injection and a manufacturing method therefor
04/20/1999US5896172 Method of operating a CCD imager suitable for the implementation of such a method
04/20/1999US5895960 Thin oxide mask level defined resistor
04/20/1999US5895959 Input port electrostatic discharge protection circuit for an intergrated circuit
04/20/1999US5895957 Minimum charge FET fabricated on an ultrathin silicon on sapphire wafer
04/20/1999US5895956 Semiconductor memory device
04/20/1999US5895955 MOS transistor employing a removable, dual layer etch stop to protect implant regions from sidewall spacer overetch
04/20/1999US5895954 Field effect transistor with impurity concentration peak under gate electrode
04/20/1999US5895953 Ohmic contact to lightly doped islands from a conductive rapid diffusion buried layer
04/20/1999US5895952 Trench MOSFET with multi-resistivity drain to provide low on-resistance
04/20/1999US5895951 MOSFET structure and fabrication process implemented by forming deep and narrow doping regions through doping trenches
04/20/1999US5895950 Semiconductor device having a non-volatile memory and method of manufacturing such a semiconductor device
04/20/1999US5895949 Semiconductor device having inversion inducing gate
04/20/1999US5895948 Semiconductor device and fabrication process thereof
04/20/1999US5895946 MOS random access memory having array of trench type one-capacitor/one-transistor memory cells
04/20/1999US5895944 Charge coupled device image sensor and method of driving the same
04/20/1999US5895941 Etchant that can etch wsi selectively with respect to inalas or ingaas. aqueous solution that contains citric acid, ammonium citrate, and hydrogen peroxide
04/20/1999US5895939 Silicon carbide field effect transistor with increased avalanche withstand capability
04/20/1999US5895938 Semiconductor device using semiconductor BCN compounds
04/20/1999US5895937 Tapered dielectric etch in semiconductor devices
04/20/1999US5895935 Display device having a switch with floating regions in the active layer
04/20/1999US5895934 Negative differential resistance device based on tunneling through microclusters, and method therefor
04/20/1999US5895933 Semiconductor device and method for its preparation
04/20/1999US5895931 Semiconductor device
04/20/1999US5895929 Low subthreshold leakage current HFET
04/20/1999US5895853 Semiconductor acceleration sensor
04/20/1999US5895851 Semiconductor yaw rate sensor with a vibrating movable section with vertical and horizontal displacement detection
04/20/1999US5895766 Method of forming a field effect transistor
04/20/1999US5895460 Apparatus for simulating a biological neuron
04/20/1999US5895274 High-pressure anneal process for integrated circuits
04/20/1999US5895260 Method of fabricating semiconductor devices and the devices
04/20/1999US5895249 Integrated edge structure for high voltage semiconductor devices and related manufacturing process
04/20/1999US5895248 Silicon deposited from a vapor comprising chlorine and silicon at reduced pressure
04/20/1999US5895247 Method of forming a high performance, high voltage non-epi bipolar transistor
04/20/1999US5895246 Method of making semiconductor device with air gap between the gate electrode and substrate during processing
04/20/1999US5895242 Read-only memories and method for manufacturing the same
04/20/1999US5895240 Method of making stepped edge structure of an EEPROM tunneling window
04/20/1999US5895238 Doping technique for MOS devices
04/20/1999US5895237 Narrow isolation oxide process
04/15/1999WO1999018616A1 Nonvolatile semiconductor memory device and method of producing the same
04/15/1999WO1999018615A1 An improved silicon carbide gate turn-off thyristor arrangement
04/15/1999WO1999018608A1 METHOD FOR PRODUCING A MATRIX FROM THIN-FILM TRANSISTORS, INCLUDING WITH a:Si-H AS SEMICONDUCTOR, INTENDED FOR LIQUID CRYSTAL DISPLAYS
04/15/1999WO1999009599A3 Vertical interconnect process for silicon segments with dielectric isolation
04/15/1999DE19744098A1 LCD screen TFT matrix is produced using only three lacquering steps
04/15/1999DE19743496A1 Insulating layer for an active diamond layer of a microelectronic component
04/15/1999DE19743495A1 Insulating layer between an electrode and an active diamond layer of a microelectronic component
04/14/1999EP0908954A2 Semiconductor memory device and manufacturing method thereof
04/14/1999EP0908935A2 Fabrication method of semiconductor device equipped with silicide layer
04/14/1999EP0908934A2 Method of manufacturing a gate electrode
04/14/1999EP0907968A1 Integrated circuit device and method of making the same
04/14/1999EP0907967A2 Soi-transistor circuitry employing soi-transistors and method of manufacture thereof
04/14/1999EP0907881A1 Pressure sensor for mounting on the components side of a printed circuit board
04/14/1999EP0907880A1 Pressure sensor component mounted on the insertion surface of a circuit board
04/14/1999EP0494184B1 Mos device with integral esd protection
04/14/1999CN1214150A Semiconductor device
04/14/1999CN1213863A Nitrided gallium III-V group compound semiconductor device and its mfg.method
04/14/1999CN1213849A Making method of transistor