Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
02/2000
02/03/2000WO2000005754A1 Semiconductor thin film and thin film device
02/03/2000WO1999065081A3 Semiconductor arrangement with ohmic contact and a method for contacting a semiconductor arrangement
02/03/2000WO1999057750A3 Method of manufacturing a semiconductor device
02/03/2000DE19834491A1 Anordnung und Verfahren zur Herstellung eines Heterobipolartransistors Arrangement and method for manufacturing a heterobipolar
02/02/2000EP0977272A1 Constant current generator
02/02/2000EP0977271A2 Semiconductor IGBT module
02/02/2000EP0977270A2 Resonance phase transistor with antiphase carrier injection
02/02/2000EP0977269A1 Imager having an array of photodiodes
02/02/2000EP0977267A1 Non volatile memory structure and corresponding manufacturing process
02/02/2000EP0977261A1 Pressure contact type semiconductor device and power application device
02/02/2000EP0977257A2 Stacked capacitor DRAM cell and method of producing the same
02/02/2000EP0977250A2 Structure and process for the fabrication of a heterojunction bipolar transistor
02/02/2000EP0977241A2 System, method and apparatus for processing semiconductors
02/02/2000EP0977240A1 System, method and apparatus for processing semiconductors
02/02/2000EP0976159A1 A bipolar transistor structure
02/02/2000EP0976157A2 Emitter-switched thyristor
02/02/2000EP0976149A1 Method for limiting internal diffusion in a semiconductor device with composite si/sige gate
02/02/2000EP0976148A1 Method for nitriding the gate oxide layer of a semiconductor device and resulting device
02/02/2000EP0853819B1 Mos transistor with high output voltage endurance
02/02/2000EP0847624A4 Multiple logic family compatible output driver
02/02/2000EP0763257B1 Method of manufacturing a semiconductor device with a bicmos circuit
02/02/2000CN1243603A Improved active matrix ESD protection and testing scheme
02/02/2000CN1243338A Semiconductor device and mfg. method thereof
02/02/2000CN1243336A Complementary metal oxide semiconductor device and formation method thereof
02/02/2000CN1243334A Surface voltage-resistant layer of semiconductor device for floating voltage end
02/01/2000US6020641 Multilevel interconnection with low contact resistance in a semiconductor device
02/01/2000US6020623 Integrated structure with device having a preset reverse conduction threshold
02/01/2000US6020622 Trench isolation for semiconductor device with lateral projections above substrate
02/01/2000US6020617 Lateral MOS transistor with weakly doped drain extension
02/01/2000US6020615 Semiconductor-on-insulator devices including alternating thin and thick film semiconductor stripes on an insulating layer
02/01/2000US6020613 Field effect transistor array including resistive interconnections
02/01/2000US6020611 Semiconductor component and method of manufacture
02/01/2000US6020610 Semiconductor device and method of manufacturing the same
02/01/2000US6020608 Junction-type field-effect transistor with improved impact-ionization resistance
02/01/2000US6020607 Semiconductor device having junction field effect transistors
02/01/2000US6020606 Structure of a memory cell
02/01/2000US6020605 Quantum box structure and carrier conductivity modulating device
02/01/2000US6020604 Compound semiconductor device
02/01/2000US6020603 Semiconductor device with a beveled and chamfered outer peripheral portion
02/01/2000US6020600 Silicon carbide semiconductor device with trench
02/01/2000US6020598 Liquid crystal display device including crossing gate wiring
02/01/2000US6020260 Annealing polysilicon layer in nitrogen
02/01/2000US6020250 Stacked devices
02/01/2000US6020246 Forming a self-aligned epitaxial base bipolar transistor
02/01/2000US6020245 Method of manufacturing semiconductor device where characteristics can be measured at manufacture
02/01/2000US6020244 Channel dopant implantation with automatic compensation for variations in critical dimension
02/01/2000US6020243 Zirconium and/or hafnium silicon-oxynitride gate dielectric
02/01/2000US6020239 Pillar transistor incorporating a body contact
02/01/2000US6020233 Ferroelectric memory device guaranteeing electrical interconnection between lower capacitor electrode and contact plug and method for fabricating the same
02/01/2000US6020229 Semiconductor device method for manufacturing
02/01/2000US6020227 Fabrication of multiple field-effect transistor structure having local threshold-adjust doping
02/01/2000US6020225 Method of manufacturing array substrate of a liquid crystal display device
02/01/2000US6020224 Method for making thin film transistor
02/01/2000US6020223 Method of manufacturing a thin film transistor with reduced parasitic capacitance and reduced feed-through voltage
02/01/2000US6020222 Silicon oxide insulator (SOI) semiconductor having selectively linked body
02/01/2000US6020214 Method for manufacturing thin film transistor array substrate
02/01/2000US6020213 Method for making ferroelectric semiconductor device
02/01/2000US6020111 Method of manufacturing semiconductor device with patterned lamination of Si film and metal film
02/01/2000US6020050 With a membrane resting on metallic supports.
02/01/2000US6020024 Nitrided layer prevents the formation of an oxide at the substrate interface and has a dielectric constant greater than 3.9.
02/01/2000US6019796 Method of manufacturing a thin film transistor with reduced parasitic capacitance and reduced feed-through voltage
01/2000
01/27/2000WO2000004598A2 Semi-conductor element with an emitter area and a stop zone in a pre-mounted position thereto
01/27/2000WO2000004597A2 Asymmetrically blocking power semiconductor component
01/27/2000WO2000004596A2 Power semiconductor component for high blocking voltages
01/27/2000WO2000004587A2 Nitride based transistors on semi-insulating silicon carbide substrates
01/27/2000WO2000004586A1 Rare-earth electrical contacts for semiconductor devices
01/27/2000WO2000004575A2 Collimated sputtering of semiconductor and other films
01/27/2000WO2000004574A1 Improved gate electrode connection structure by in situ chemical vapor deposition of tungsten and tungsten nitride
01/27/2000WO2000004572A1 Method for manufacturing thin film semiconductor device, method for manufacturing display, method for manufacturing thin film transistor, and method for forming semiconductor thin film
01/27/2000CA2334823A1 Nitride based transistors on semi-insulating silicon carbide substrates
01/26/2000EP0975024A2 Semiconductor device with alternating conductivity type layer and method of manufacturing the same
01/26/2000EP0975023A1 Electrostatic discharge protection for salicided devices and method of making same
01/26/2000EP0975022A1 Method for manufacturing electronic devices comprising non-volatile memory cells and LV transistors, with salicided junctions
01/26/2000EP0975013A2 Method of manufacturing an oxide layer on a GaAs-based semiconductor body
01/26/2000EP0974166A1 Nonvolatile semiconductor memory
01/26/2000EP0974165A2 Semiconductor device with a bipolar transistor, and method of manufacturing such a device
01/26/2000EP0974164A2 Thin film transistors and electronic devices comprising such
01/26/2000EP0974160A1 Process of manufacturing a semiconductor device including a buried channel field effect transistor
01/26/2000EP0974159A1 Mos transistor with high doping gradient under the grid
01/26/2000EP0974158A2 Method of manufacturing a semiconductor device
01/26/2000EP0974147A1 Electrically erasable nonvolatile memory
01/26/2000EP0974146A1 Nonvolatile memory
01/26/2000EP0617363B1 Defective cell substitution in EEprom array
01/26/2000CN1242904A Display type image sensor
01/26/2000CN1242874A lateral bipolar field effect mode hydrid transistor and method for mfg. same
01/26/2000CN1242608A Field effect transistor
01/26/2000CN1242607A Non-volatile semiconductor memory device and process for producing the same
01/26/2000CN1048820C Method for making multi-layer amorphous silicon
01/25/2000US6018272 Linearization of resistance
01/25/2000US6018195 MOS gate structure semiconductor device
01/25/2000US6018191 Semiconductor device
01/25/2000US6018185 Semiconductor device with element isolation film
01/25/2000US6018182 Multilayer
01/25/2000US6018181 Thin film transistor and manufacturing method thereof
01/25/2000US6018179 Transistors having a scaled channel length and integrated spacers with enhanced silicidation properties
01/25/2000US6018176 Vertical transistor and memory cell
01/25/2000US6018175 Gapped-plate capacitor
01/25/2000US6018174 Bottle-shaped trench capacitor with epi buried layer
01/25/2000US6018172 Semiconductor memory device including memory cell transistors formed on SOI substrate and having fixed body regions
01/25/2000US6018171 Shallow junction ferroelectric memory cell having a laterally extending p-n junction and method of making the same