Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
04/2000
04/13/2000DE19942885A1 Semiconductor device has an electrode or wiring layer of a thick aluminum layer below a nickel layer to prevent an aluminum-nickel intermetallic compound from reaching the underlying substrate
04/13/2000DE19845658A1 Solarzelle mit Bypassdiode Solar cell with bypass diode
04/13/2000DE19845537A1 Sensor und Verfahren zu seiner Herstellung Sensor and method for its preparation
04/12/2000EP0993049A1 Vertical field-effect transistor having an annular trench gate and method of making the same
04/12/2000EP0993048A2 Nitride semiconductor device and its manufacturing method
04/12/2000EP0993047A1 Semiconductor device with elements of integrated circuits of III-V group and means to prevent the pollution by hydrogen
04/12/2000EP0993038A1 TFT matrix panel
04/12/2000EP0993036A1 Method of manufacturing an integrated semiconductor device comprising a floating gate field-effect transistor and a logic-field effect transistor, and corresponding device
04/12/2000EP0993033A1 Gate insulating structure for power devices, and related manufacturing process
04/12/2000EP0993032A2 Apparatus having integrated circuits made of TFT devices, and methods of manufacture thereof
04/12/2000EP0992778A2 Sensor and fabrication method thereof
04/12/2000EP0992070A1 Semiconductor component and method for producing the same
04/12/2000EP0992069A1 Semiconductor current limiter
04/12/2000EP0992067A1 Power converter and the use thereof
04/12/2000EP0992063A1 A titanium nitride diffusion barrier for use in non-silicon technologies and metallization method
04/12/2000EP0991975A1 Wire electrode structure and liquid crystal display employing the structure
04/12/2000EP0738396B1 A device for measuring force components in monocristalline material, a method for manufacturing such a device and a use of such a device
04/12/2000CN1250223A Semi-conductor chip with mesa structure finished by sawing method
04/12/2000CN1051403C Capacitor having a metal-oxide dielectric
04/11/2000US6049494 Semiconductor memory device
04/11/2000US6049482 Non-volatile semiconductor memory device
04/11/2000US6049477 Ferroelectric memory device in which the channel region has the same conductivity type as the diffusion region
04/11/2000US6049465 Signal carrying means including a carrier substrate and wire bonds for carrying signals between the cache and logic circuitry of a microprocessor
04/11/2000US6049200 Voltage regulator capable of lowering voltage applied across phase compensating capacitor
04/11/2000US6049133 Semiconductor fabrication employing concurrent diffusion barrier and salicide formation
04/11/2000US6049131 Device formed by selective deposition of refractory metal of less than 300 Angstroms of thickness
04/11/2000US6049124 Semiconductor package
04/11/2000US6049119 Protection circuit for a semiconductor device
04/11/2000US6049115 Scanning probe microscope, and semiconductor distortion sensor for use therein
04/11/2000US6049114 Semiconductor device having a metal containing layer overlying a gate dielectric
04/11/2000US6049110 Body driven SOI-MOS field effect transistor
04/11/2000US6049109 Silicon on Insulator semiconductor device with increased withstand voltage
04/11/2000US6049108 Trench-gated MOSFET with bidirectional voltage clamping
04/11/2000US6049107 Sub-quarter-micron MOSFET and method of its manufacturing
04/11/2000US6049106 Large grain single crystal vertical thin film polysilicon MOSFETs
04/11/2000US6049104 MOSFET device to reduce gate-width without increasing JFET resistance
04/11/2000US6049099 Cadmium sulfide layers for indium phosphide-based heterojunction bipolar transistors
04/11/2000US6049098 Bipolar transistor having an emitter region formed of silicon carbide
04/11/2000US6049097 Reliable HEMT with small parasitic resistance
04/11/2000US6049096 Protection component for telephone line interface
04/11/2000US6049095 Semiconductor device
04/11/2000US6049092 Semiconductor device and method for manufacturing the same
04/11/2000US6049091 High electron mobility transistor
04/11/2000US6048795 Process of fabricating a semiconductor device having nitrogen-containing silicon layer and refractory metal layer
04/11/2000US6048791 Semiconductor device with electrode formed of conductive layer consisting of polysilicon layer and metal-silicide layer and its manufacturing method
04/11/2000US6048784 Transistor having an improved salicided gate and method of construction
04/11/2000US6048783 Method of forming an electrode on a substrate of a semiconductor device
04/11/2000US6048780 Semiconductor device and manufacturing method for the same
04/11/2000US6048778 Gettering regions and methods of forming gettering regions within a semiconductor wafer
04/11/2000US6048776 Semiconductor device and a method of fabricating the same
04/11/2000US6048773 Methods of forming bipolar junction transistors having preferred base electrode extensions and transistors formed thereby
04/11/2000US6048772 Method for fabricating a lateral RF MOS device with an non-diffusion source-backside connection
04/11/2000US6048770 Nonvolatile semiconductor memory device and method of manufacturing the same
04/11/2000US6048766 Flash memory device having high permittivity stacked dielectric and fabrication thereof
04/11/2000US6048760 Method of forming a self-aligned refractory metal silicide contact using doped field oxide regions
04/11/2000US6048759 Gate/drain capacitance reduction for double gate-oxide DMOS without degrading avalanche breakdown
04/11/2000US6048756 Method for making a silicon-on-insulator MOS transistor using a selective SiGe epitaxy
04/11/2000US6048740 Lithography for fabrication of ferroelectric memory transistors, dopes of boron
04/11/2000US6048738 Method of making ferroelectric memory cell for VLSI RAM array
04/11/2000US6048737 Forming conductive oxide layer between a metal electrode and a ferroelectric layer, capable of enhancing the fatigue behavior in addition to reducing the leakage current
04/11/2000US6048690 Methods for electronic fluorescent perturbation for analysis and electronic perturbation catalysis for synthesis
04/11/2000US6047604 Pressure sensor component for mounting on the component-mounting surface of a printed circuit board
04/06/2000WO2000019550A1 Magnetic switching of charge separation lifetimes in artificial photosynthetic reaction centers
04/06/2000WO2000019541A1 Electrostatic induction transistor
04/06/2000WO2000019540A1 Bi-directional semiconductor switch, and switch circuit for battery-powered equipment
04/06/2000WO2000019536A1 Electronic switching device with at least two semiconductor components
04/06/2000WO2000019535A1 Semiconductor structure for semiconductor components
04/06/2000WO2000019529A1 Integrated circuit comprising vertical transistors, and a method for the production thereof
04/06/2000WO2000019516A1 Semiconductor device, connection method for semiconductor chip, circuit board and electronic apparatus
04/06/2000WO2000019512A1 Pseudomorphic high electron mobility transistors
04/06/2000WO2000019511A1 Deposition of oxide layer on the gate
04/06/2000WO2000019510A2 Elevated channel mosfet
04/06/2000WO2000019509A2 Method of manufacturing a semiconductor device with a field effect transistor
04/06/2000WO2000019508A1 Silicon carbide deposition method and use as a barrier layer and passivation layer
04/06/2000WO2000019503A1 Method for producing transistors
04/06/2000WO2000019498A1 In situ deposition of low k si carbide barrier layer, etch stop, and anti-reflective coating for damascene applications
04/06/2000DE19946999A1 Ferroelectric memory device manufacture includes forming titanium and platinum layers on an insulation layer covered substrate and thermally treating under an oxygen atmosphere
04/06/2000DE19844531A1 Verfahren zur Herstellung von Transistoren A process for the production of transistors
04/06/2000DE19843959A1 Verfahren zum Herstellen eines Halbleiterbauelements A method of manufacturing a semiconductor device
04/06/2000DE19843893A1 Power semiconductor diode used as a free-wheeling diode has a first layer doped for a first conductivity, a second layer at most weakly doped for a second conductivity, and a third layer doped for an opposite second conductivity
04/06/2000DE19843659A1 Halbleiterbauelement mit strukturiertem Halbleiterkörper A semiconductor device with a structured semiconductor body
04/06/2000DE19843537A1 Semiconductor component with four-layer structure for overvoltage protection has first conductivity base zone and second conductivity region on underside
04/06/2000DE19842475A1 Halbleiterstruktur mit Kontaktierung Semiconductor structure with contacting
04/06/2000CA2345150A1 Magnetic switching of charge separation lifetimes in artificial photosynthetic reaction centers
04/06/2000CA2311967A1 Method of manufacturing a semiconductor device with a field effect transistor
04/05/2000EP0991118A1 Method for realizing a multilevel ROM memory in a dual gate CMOS process and corresponding ROM memory cell
04/05/2000EP0991114A2 Ultra-low sheet resistance metal/poly-SI gate for deep sub-micron CMOS application
04/05/2000EP0991113A2 A process for fabricating a self-aligned T-shaped gate electrode with reduced resistivity
04/05/2000EP0991080A2 Non-volatile semiconductor memory device
04/05/2000EP0991078A2 Quantum random address memory with magnetic readout and/or nano-memory elements
04/05/2000EP0991076A2 Quantum random address memory
04/05/2000EP0990872A1 Angular velocity sensor
04/05/2000EP0990268A1 Latch-up free power mos-bipolar transistor
04/05/2000EP0990266A1 Hyperfrequency transistor with quasi-aligned structure and method for making same
04/05/2000EP0990263A2 A substrate for high frequency integrated circuits
04/05/2000EP0990159A1 Suspension arrangement for semiconductor accelerometer
04/05/2000EP0946988A4 Memory redundancy circuit using single polysilicon floating gate transistors as redundancy elements
04/05/2000CN1249852A Subscriber interface protection circuit
04/05/2000CN1249850A Method for mfg. semiconductor integrated circuit device
04/05/2000CN1249849A Strontium bismuth niobate tantalate ferroelectric thin film