Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/1998
12/01/1998US5844771 Capacitor construction
12/01/1998US5844767 Level converting circuit for converting level of an input signal, internal potential generating circuit for generating internal potential, internal potential generating unit generating internal potential highly reliable semiconductor device and method of
12/01/1998US5844727 Illumination design for scanning microlithography systems
12/01/1998US5844683 Position sensor system for substrate holders
12/01/1998US5844666 Positioning device with a vibration-free object table, and lithographic device provided with such a positioning device
12/01/1998US5844664 Positioning device with a force actuator system for compensating center-of-gravity displacements, and lithographic device provided with such a positioning device
12/01/1998US5844662 Resist processing apparatus and a resist processing method
12/01/1998US5844647 Liquid crystal display device
12/01/1998US5844429 Of a semiconductor device
12/01/1998US5844421 Probe control method for leveling probe pins for a probe test sequence
12/01/1998US5844418 Carrier having interchangeable substrate used for testing of semiconductor dies
12/01/1998US5844321 Semiconductor device comprising a chip which is provided with a via opening and is soldered on a support, and method of realizing this device
12/01/1998US5844320 Semiconductor unit with semiconductor device mounted with conductive adhesive
12/01/1998US5844319 Microelectronic assembly with collar surrounding integrated circuit component on a substrate
12/01/1998US5844316 Fixture for handling and attaching conductive spheres to a substrate
12/01/1998US5844315 Low-profile microelectronic package
12/01/1998US5844314 Liquid crystal display
12/01/1998US5844309 Adhesive composition, semiconductor device using the composition and method for producing a semiconductor device using the composition
12/01/1998US5844304 Process for manufacturing semiconductor device and semiconductor wafer
12/01/1998US5844303 Semiconductor device having improved electronic isolation
12/01/1998US5844302 Integrated semiconductor circuit with capacitors of precisely defined capacitance and process for producing the circuit
12/01/1998US5844299 Integrated inductor
12/01/1998US5844297 Antifuse device for use on a field programmable interconnect chip
12/01/1998US5844296 Space saving laser programmable fuse layout
12/01/1998US5844295 Semiconductor device having a fuse and an improved moisture resistance
12/01/1998US5844294 Semiconductor substrate with SOI structure
12/01/1998US5844293 Semiconductor device with improved dielectric breakdown strength
12/01/1998US5844287 Monolithic sensor of fingerprints
12/01/1998US5844285 Body contact structure for semiconductor device
12/01/1998US5844284 Damage free buried contact using salicide technology
12/01/1998US5844281 Semiconductor integrated circuit device with electrostatic protective function
12/01/1998US5844280 Device for protecting a semiconductor circuit
12/01/1998US5844279 Single-electron semiconductor device
12/01/1998US5844278 Semiconductor device having a projecting element region
12/01/1998US5844277 Power MOSFETs and cell topology
12/01/1998US5844276 CMOS integrated circuit and method for implanting NMOS transistor areas prior to implanting PMOS transistor areas to optimize the thermal diffusivity thereof
12/01/1998US5844275 High withstand-voltage lateral MOSFET with a trench and method of producing the same
12/01/1998US5844274 Semiconductor device including an element isolating film having a flat upper surface
12/01/1998US5844273 Vertical semiconductor device and method of manufacturing the same
12/01/1998US5844272 Semiconductor component for high voltage
12/01/1998US5844270 Flash memory device and manufacturing method therefor
12/01/1998US5844269 EEPROM cell having reduced capacitance across the layer of tunnel oxide
12/01/1998US5844268 Nonvolatile semiconductor memory device
12/01/1998US5844266 Buried strap formation in a DRAM trench capacitor
12/01/1998US5844263 Semiconductor integrated device having independent circuit blocks and a power breaking means for selectively supplying power to the circuit blocks
12/01/1998US5844262 Semiconductor device for reducing effects of noise on an internal circuit
12/01/1998US5844260 Compound semiconductor device constructed on a heteroepitaxial substrate
12/01/1998US5844256 Semiconductor device comprising polysilicon interconnection layers separated by insulation films
12/01/1998US5844254 Semiconductor transistor device formed on a semiconductor substrate
12/01/1998US5844251 High aspect ratio probes with self-aligned control electrodes
12/01/1998US5844247 Position measuring method
12/01/1998US5844205 Heated substrate support structure
12/01/1998US5844199 Conductor pattern check apparatus for locating and repairing short and open circuits
12/01/1998US5844195 Remote plasma source
12/01/1998US5844168 Multi-layer interconnect sutructure for ball grid arrays
12/01/1998US5844030 Charged ion cleaning devices and cleaning system
12/01/1998US5843860 Ceramic composition for high-frequency dielectrics
12/01/1998US5843850 Method of stripping a nitride layer from a wafer and wet etching apparatus using the same
12/01/1998US5843849 Semiconductor wafer etching process and semiconductor device
12/01/1998US5843848 Method of plasma etching
12/01/1998US5843847 Method for etching dielectric layers with high selectivity and low microloading
12/01/1998US5843846 Etch process to produce rounded top corners for sub-micron silicon trench applications
12/01/1998US5843845 Method for forming sloped contact hole for semiconductor device
12/01/1998US5843844 Probe sheet and method of manufacturing the same
12/01/1998US5843843 Method for forming a wiring layer a semiconductor device
12/01/1998US5843842 Method for manufacturing a semiconductor device having a wiring layer without producing silicon precipitates
12/01/1998US5843841 Fabrication process of a semiconductor integrated circuit device having a local interconnect pattern and a semiconductor integrated circuit device fabricated according to such a fabrication process
12/01/1998US5843840 Semiconductor device having a wiring layer and method for manufacturing same
12/01/1998US5843839 Formation of a metal via using a raised metal plug structure
12/01/1998US5843838 Modified clean recipe to suppress formation of BPSG bubble
12/01/1998US5843837 Method of contact hole burying
12/01/1998US5843836 Tunneling technology for reducing intra-conductive layer capacitance
12/01/1998US5843835 Damage free gate dielectric process during gate electrode plasma etching
12/01/1998US5843834 Self-aligned POCL3 process flow for submicron microelectronics applications using amorphized polysilicon
12/01/1998US5843833 Method for producing semiconductor device
12/01/1998US5843832 Method of formation of thin bonded ultra-thin wafers
12/01/1998US5843831 Process independent alignment system
12/01/1998US5843830 Capacitor, and methods for forming a capacitor
12/01/1998US5843829 Method for fabricating a semiconductor device including a step for forming an amorphous silicon layer followed by a crystallization thereof
12/01/1998US5843828 Method for fabricating a semiconductor device with bipolar transistor
12/01/1998US5843827 Method of reducing dielectric damage from plasma etch charging
12/01/1998US5843826 Deep submicron MOSFET device
12/01/1998US5843825 Fabrication method for semiconductor device having non-uniformly doped channel (NUDC) construction
12/01/1998US5843824 Diode-based semiconductor read-only memory device and method of fabricating the same
12/01/1998US5843823 Method for fabricating a multi-stage ROM structure
12/01/1998US5843822 Double-side corrugated cylindrical capacitor structure of high density DRAMs
12/01/1998US5843821 Fabrication method for a cylindrical capacitor for a semiconductor device
12/01/1998US5843820 Method of fabricating a new dynamic random access memory (DRAM) cell having a buried horizontal trench capacitor
12/01/1998US5843819 Semiconductor memory device with trench capacitor and method for the production thereof
12/01/1998US5843818 Methods of fabricating ferroelectric capacitors
12/01/1998US5843817 Process for integrating stacked capacitor DRAM devices with MOSFET devices used for high performance logic circuits
12/01/1998US5843816 Integrated self-aligned butt contact process flow and structure for six transistor full complementary metal oxide semiconductor static random access memory cell
12/01/1998US5843815 Method for fabricating a MOSFET device, for an SRAM cell, using a self-aligned ion implanted halo region
12/01/1998US5843814 Method of forming BiCMOS circuitry
12/01/1998US5843812 Method of making a PMOSFET in a semiconductor device
12/01/1998US5843811 Method of fabricating a crystalline thin film on an amorphous substrate
12/01/1998US5843810 Film circuit and method of manufacturing the same
12/01/1998US5843808 Structure and method for automated assembly of a tab grid array package
12/01/1998US5843807 Method of manufacturing an ultra-high density warp-resistant memory module
12/01/1998US5843806 Methods for packaging tab-BGA integrated circuits
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