Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/1998
12/29/1998US5854159 Alumina sintered bodies and method for producing the same
12/29/1998US5854141 Inorganic seal for encapsulation of an organic layer and method for making the same
12/29/1998US5854140 Method of making an aluminum contact
12/29/1998US5854137 Method for reduction of polycide residues
12/29/1998US5854136 Three-step nitride etching process for better critical dimension and better vertical sidewall profile
12/29/1998US5854135 Optimized dry etching procedure, using an oxygen containing ambient, for small diameter contact holes
12/29/1998US5854134 Passivation layer for a metal film to prevent metal corrosion
12/29/1998US5854133 Method for manufacturing a semiconductor device
12/29/1998US5854132 Method for exposing photoresist
12/29/1998US5854131 Integrated circuit having horizontally and vertically offset interconnect lines
12/29/1998US5854130 Method of forming multilevel interconnects in semiconductor devices
12/29/1998US5854128 Method for reducing capacitive coupling between conductive lines
12/29/1998US5854127 Method of forming a contact landing pad
12/29/1998US5854126 Method for forming metallization in semiconductor devices with a self-planarizing material
12/29/1998US5854125 Dummy fill patterns to improve interconnect planarity
12/29/1998US5854124 Method for opening contacts of different depths in a semiconductor wafer
12/29/1998US5854123 Method for producing semiconductor substrate
12/29/1998US5854122 Epitaxial layer for dissolved wafer micromachining process
12/29/1998US5854121 Semiconductor fabrication employing barrier atoms incorporated at the edges of a trench isolation structure
12/29/1998US5854120 Semiconductor device manufacturing method
12/29/1998US5854119 Robust method of forming a cylinder capacitor for DRAM circuits
12/29/1998US5854117 Method of manufacturing a varicap diode, a varicap diode, a receiver device, and a TV receiver set
12/29/1998US5854116 Semiconductor apparatus
12/29/1998US5854115 Formation of an etch stop layer within a transistor gate conductor to provide for reduction of channel length
12/29/1998US5854114 Data retention of EEPROM cell with shallow trench isolation using thicker liner oxide
12/29/1998US5854113 Method for fabricating power transistor using silicon-on-insulator (SOI) wafer
12/29/1998US5854112 Transistor isolation process
12/29/1998US5854111 ROM device using a schuckly diode
12/29/1998US5854110 Process fabricating semiconductor device having two ion-implantations carried out by using a shared photo-resist mask
12/29/1998US5854109 Silicide process for manufacturing a mask ROM
12/29/1998US5854108 Method and system for providing a double diffuse implant junction in a flash device
12/29/1998US5854107 Method for forming capacitor of semiconductor device
12/29/1998US5854106 Method of forming a data storage capacitor with a wide electrode area for dynamic random access memory
12/29/1998US5854105 Method for making dynamic random access memory cells having double-crown stacked capacitors with center posts
12/29/1998US5854104 Process for fabricating nonvolatile semiconductor memory device having a ferroelectric capacitor
12/29/1998US5854103 Manufacturing method of self-aligned silicide load for static random access memory
12/29/1998US5854102 Vertical diode structures with low series resistance
12/29/1998US5854101 Low mask count CMOS process with inverse-T gate LDD structure
12/29/1998US5854100 Method of forming a new bipolar/CMOS pixel for high resolution imagers
12/29/1998US5854099 DMOS process module applicable to an E2 CMOS core process
12/29/1998US5854097 Method of manufacturing a semiconductor device
12/29/1998US5854096 Process for fabricating semiconductor device
12/29/1998US5854095 Dual source gas methods for forming integrated circuit capacitor electrodes
12/29/1998US5854094 Process for manufacturing metal plane support for multi-layer lead frames
12/29/1998US5854093 Direct attachment of silicon chip to circuit carrier
12/29/1998US5854089 Semiconductor device by selectively controlling growth of an epitaxial layer without a mask
12/29/1998US5854087 Method of manufacturing an optical semiconductor device
12/29/1998US5854086 Method for manufacturing planar field effect transistors and planar high electron mobility transistors
12/29/1998US5854085 Multi-layer tab tape having distinct signal, power and ground planes, semiconductor device assembly employing same, apparatus for and method of assembling same
12/29/1998US5853948 Positive photoresist compositions and multilayer resist materials using the same
12/29/1998US5853947 Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate
12/29/1998US5853925 Lateral diffusion confirming pattern and a method of measuring a lateral diffusion
12/29/1998US5853922 Phase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting mask
12/29/1998US5853921 Methods of fabricating phase shift masks by controlling exposure doses
12/29/1998US5853840 Dummy wafer
12/29/1998US5853812 Method and apparatus for processing substrates
12/29/1998US5853808 Method of using siloxane polymers
12/29/1998US5853804 Gas control technique for limiting surging of gas into a CVD chamber
12/29/1998US5853803 Resist processing method and apparatus
12/29/1998US5853771 Molding die set and mold package
12/29/1998US5853607 CVD processing chamber
12/29/1998US5853604 Method of planarizing an insulating layer in a semiconductor device
12/29/1998US5853603 Manufacturing process of a microelectronic device containing, on a substrate, a plurality of interconnected elements
12/29/1998US5853602 Method of dry etching for patterning refractory metal layer improved in etching rate, anisotropy and selectivity to silicon oxide
12/29/1998US5853533 Wafer slice base peeling system
12/29/1998US5853532 Wafer ring supply and return device
12/29/1998US5853523 Plasma-etching electrode plate
12/29/1998US5853522 Drip chemical delivery apparatus
12/29/1998US5853521 Multi-cathode electron beam plasma etcher
12/29/1998US5853517 Method for coining solder balls on an electrical circuit package
12/29/1998US5853500 Method for fabricating thin films of barium strontium titanate without exposure to oxygen at high temperatures
12/29/1998US5853496 Transfer machine, transfer method, cleaning machine, and cleaning method
12/29/1998US5853491 Method for reducing metal contamination of silicon wafers during semiconductor manufacturing
12/29/1998US5853486 Treatment system and treatment apparatus with multi-stage carrier storage chambers
12/29/1998US5853484 Gas distribution system and method for chemical vapor deposition apparatus
12/29/1998US5853483 Substrate spin treating method and apparatus
12/29/1998US5853480 Apparatus for fabricating a single-crystal semiconductor
12/29/1998US5853479 Apparatus for drawing single crystals by the czochralski method
12/29/1998US5853478 Method for forming crystal and crystal article obtained by said method
12/29/1998US5853471 Composition for anti-reflection coating
12/29/1998US5853317 Polishing pad and polishing apparatus having the same
12/29/1998US5853298 Initiator connector for airbag systems
12/29/1998US5853284 Notched wafer aligning apparatus
12/29/1998US5853214 Aligner for a substrate carrier
12/29/1998US5853176 Vacuum chamber and method of manufacturing the vacuum chamber
12/29/1998US5852871 Method of making raised contacts on electronic components
12/29/1998US5852870 Method of making grid array assembly
12/29/1998CA2143522C Method for manufacturing a grain boundary type josephson junction device
12/29/1998CA2058143C Direct microcircuit decoupling
12/26/1998CA2238158A1 Nozzle-injector for arc plasma deposition apparatus
12/24/1998DE19827454A1 CMOS logic circuit, e.g. inverter or NAND=gate
12/24/1998DE19826735A1 Power supply circuit for integrated circuit with several operating frequency modes
12/24/1998DE19825266A1 Semiconductor device capacitor production
12/24/1998DE19803479A1 Polysilicon thin film transistor
12/24/1998DE19801999A1 Semiconductor device, e.g. IGBT
12/24/1998DE19757889A1 Semiconductor memory device, e.g. DRAM, with test mode
12/24/1998DE19756409A1 Semiconductor component e.g. transistor production process
12/24/1998DE19756185A1 Coupling contact structure for integrated circuit pack
12/24/1998DE19727693A1 Verfahren und Vorrichtung zur Herstellung elektrisch leitfähiger Durchgänge in Halbleiter-Bauelementen Method and device for producing electrically conductive passages in semiconductor devices
12/24/1998DE19726665A1 In situ end point determination during chemical-mechanical polishing
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