Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/1998
12/08/1998US5847381 Photoelectric conversion apparatus having a light-shielding shunt line and a light-shielding dummy line
12/08/1998US5847326 Low-temperature fired ceramic circuit substrate with improved Ag-Au connection reliability
12/08/1998US5847218 Sulfonium salts and chemically amplified positive resist compositions
12/08/1998US5846921 Semiconductor substrate cleaning solutions, methods of forming the same, and methods using the same
12/08/1998US5846888 Method for in-situ incorporation of desirable impurities into high pressure oxides
12/08/1998US5846887 Method for removing defects by ion implantation using medium temperature oxide layer
12/08/1998US5846886 Metal film etching method
12/08/1998US5846885 Plasma treatment method
12/08/1998US5846884 Methods for metal etching with reduced sidewall build up during integrated circuit manufacturing
12/08/1998US5846883 Method for multi-zone high-density inductively-coupled plasma generation
12/08/1998US5846882 Endpoint detector for a chemical mechanical polishing system
12/08/1998US5846881 Low cost DRAM metallization
12/08/1998US5846880 Process for removing titanium nitride layer in an integrated circuit
12/08/1998US5846879 Contact structure for vertical chip connections
12/08/1998US5846878 Method of manufacturing a wiring layer in a semiconductor device
12/08/1998US5846877 Method for fabricating an Al-Ge alloy wiring of semiconductor device
12/08/1998US5846876 Integrated circuit which uses a damascene process for producing staggered interconnect lines
12/08/1998US5846875 Method of producing a semiconductor device
12/08/1998US5846873 Method of creating ultra-small nibble structures during mosfet fabrication
12/08/1998US5846871 Integrated circuit fabrication
12/08/1998US5846870 Method of measuring a semiconductor device and a method of making a semiconductor device
12/08/1998US5846869 Method of manufacturing semiconductor integrated circuit device
12/08/1998US5846868 Method for forming a walled-emitter transistor
12/08/1998US5846867 Method of producing Si-Ge base heterojunction bipolar device
12/08/1998US5846865 Method of fabricating flat-cell mask read-only memory (ROM) devices
12/08/1998US5846864 Method of fabricating a high density mask ROM with recess channels
12/08/1998US5846863 Method for manufacturing a semiconductor ROM device
12/08/1998US5846862 Semiconductor device having a vertical active region and method of manufacture thereof
12/08/1998US5846861 Method of manufacturing non-volatile semiconductor memory having erasing gate
12/08/1998US5846860 Method of making buried contact in DRAM technology
12/08/1998US5846859 Method for manufacturing a semiconductor memory device having capacitive storage
12/08/1998US5846858 SOI-BiCMOS method
12/08/1998US5846857 CMOS processing employing removable sidewall spacers for independently optimized N- and P-channel transistor performance
12/08/1998US5846855 Thin-film transistor and method for fabricating same and liquid crystal display device
12/08/1998US5846853 Process for bonding circuit substrates using conductive particles and back side exposure
12/08/1998US5846851 Method of applying adhesive to lead of lead frame and method of making semiconductor device using the same
12/08/1998US5846849 Microstructure and single mask, single-crystal process for fabrication thereof
12/08/1998US5846847 Method of manufacturing a ferroelectric device
12/08/1998US5846844 Method for producing group III nitride compound semiconductor substrates using ZnO release layers
12/08/1998US5846695 Removing agent composition for a photoresist and process for producing a semiconductor integrated circuit
12/08/1998US5846692 Pattern formation method
12/08/1998US5846690 Radiation-sensitive composition containing plasticizer
12/08/1998US5846689 Positive-working radiation-sensitive mixture and production of relief structures
12/08/1998US5846686 Agent for forming a fine pattern of ferroelectric film, and method of forming a fine pattern of ferroelectric film
12/08/1998US5846678 Exposure apparatus and device manufacturing method
12/08/1998US5846676 Mask structure and exposure method and apparatus using the same
12/08/1998US5846612 Process for forming high-quality deposited film utilizing plasma CVD
12/08/1998US5846609 Masking methods for semiconductor materials
12/08/1998US5846598 Electroless plating of metallic features on nonmetallic or semiconductor layer without extraneous plating
12/08/1998US5846597 Liquid source formation of thin films using hexamethyl-disilazane
12/08/1998US5846596 Methods of forming field oxide isolation regions having sloped edges
12/08/1998US5846476 Optical curing process for intergrated circuit package assembly
12/08/1998US5846443 Methods and apparatus for etching semiconductor wafers and layers thereof
12/08/1998US5846442 Controlled diffusion partial etching
12/08/1998US5846441 Method for forming a patterned metallic layer in a thin film magnetic head
12/08/1998US5846398 CMP slurry measurement and control technique
12/08/1998US5846387 On-site manufacture of ultra-high-purity hydrochloric acid for semiconductor processing
12/08/1998US5846386 On-site ammonia purification for semiconductor manufacture
12/08/1998US5846375 Area specific temperature control for electrode plates and chucks used in semiconductor processing equipment
12/08/1998US5846374 Gas agitated liquid etcher
12/08/1998US5846366 Method for interconnecting an electronic device using a transferable solder carrying medium
12/08/1998US5846361 Lamination process for producing non-planar substrates
12/08/1998US5846338 Method for dry cleaning clean room containers
12/08/1998US5846335 Method for cleaning workpiece
12/08/1998US5846332 Thermally floating pedestal collar in a chemical vapor deposition chamber
12/08/1998US5846331 Plasma processing apparatus
12/08/1998US5846328 In-line film deposition system
12/08/1998US5846327 Substrate spin treating apparatus
12/08/1998US5846321 Method of producing single crystal thin film
12/08/1998US5846320 Method for forming crystal and crystal article obtained by said method
12/08/1998US5846073 Semiconductor furnace processing vessel base
12/08/1998US5845838 Process for remelting a contact surface metallization
12/08/1998US5845663 Wafer wet processing device
12/08/1998US5845662 Device for treatment of wafer-shaped articles, especially silicon wafers
12/08/1998US5845660 Substrate washing and drying apparatus, substrate washing method, and substrate washing apparatus
12/08/1998US5845630 Process and apparatus for fabricating a semiconductor wafer
12/06/1998CA2239347A1 Thermally stable dielectric coatings
12/06/1998CA2239345A1 Method for producing thick crack-free coatings from hydrogen silsesquioxane resin
12/05/1998CA2232238A1 Method of soldering materials supported on low-melting substrates
12/03/1998WO1998054829A1 Method and apparatus for clamping a substrate
12/03/1998WO1998054760A1 Method for manufacturing electric modules, and the electric module
12/03/1998WO1998054759A1 Process for the removal of copper and other metallic impurities from silicon
12/03/1998WO1998054758A1 Process for the removal of copper from polished boron doped silicon wafers
12/03/1998WO1998054757A1 Method for etching iii-v semiconductor material
12/03/1998WO1998054756A1 Polishing method and semiconductor device manufacturing method using the same
12/03/1998WO1998054755A2 A method of manufacturing an electronic device whereby a conductive layer is provided on an electrically insulating substrate, from which layer a conductor pattern is formed
12/03/1998WO1998054754A1 Device and method for transporting separate substrates
12/03/1998WO1998054749A1 Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages
12/03/1998WO1998054747A1 Device and method for ion beam etching
12/03/1998WO1998054727A2 256 Meg DYNAMIC RANDOM ACCESS MEMORY
12/03/1998WO1998054632A2 Semiconductor wafer processing with defect eradication
12/03/1998WO1998054620A1 Lithography system
12/03/1998WO1998054586A1 Broadband impedance matching probe
12/03/1998WO1998054381A1 Secondary edge reflector for horizontal reactor
12/03/1998WO1998054377A2 Stress tuned tantalum and tantalum nitride films
12/03/1998WO1998054267A1 Heat-resistant adhesives and semiconductor devices produced therewith
12/03/1998WO1998053952A1 Chemical mechanical planarization tool having a linear polishing roller
12/03/1998WO1998053923A1 Method and apparatus for spin-coating chemicals
12/03/1998DE19824514A1 Diode especially p-n, Schottky or combination diode
12/03/1998DE19823729A1 Semiconductor wafer contact pin position determination method
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