Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/1999
09/07/1999US5950087 Method to make self-aligned source etching available in split-gate flash
09/07/1999US5950086 A semiconductor device
09/07/1999US5950085 Method of manufacturing electrically erasable semiconductor non-volatile memory device
09/07/1999US5950084 Method of manufacturing dual-packed capacitor for DRAM cells
09/07/1999US5950083 Method for fabricating CMOS transistor with self-aligned silicide (salicide) structure
09/07/1999US5950082 For forming an integrated circuit
09/07/1999US5950081 Method of fabricating semiconductor
09/07/1999US5950080 Semiconductor device and method of manufacturing the same
09/07/1999US5950079 Semiconductor processing methods of forming complementary metal oxide semiconductor memory and other circuitry
09/07/1999US5950078 Rapid thermal annealing with absorptive layers for thin film transistors on transparent substrates
09/07/1999US5950077 Semiconductor device and manufacturing method thereof
09/07/1999US5950076 Methods of forming silicon carbide semiconductor devices having buried silicon carbide conduction barrier layers therein
09/07/1999US5950071 Detachment and removal of microscopic surface contaminants using a pulsed detach light
09/07/1999US5950070 Method of forming a chip scale package, and a tool used in forming the chip scale package
09/07/1999US5950069 Quencher clamping operation using an electromagnet
09/07/1999US5950068 Method of fabricating semiconductor devices having a mesa structure for improved surface voltage breakdown characteristics
09/07/1999US5949900 Fine pattern inspection device capable of carrying out inspection without pattern recognition
09/07/1999US5949847 For use in testing a product
09/07/1999US5949844 Exposure apparatus
09/07/1999US5949714 Nonvolatile semiconductor memory device
09/07/1999US5949706 Static random access memory cell having a thin film transistor (TFT) pass gate connection to a bit line
09/07/1999US5949705 DRAM cell, DRAM and method for fabricating the same
09/07/1999US5949704 Stacked read-only memory
09/07/1999US5949701 Memory circuit with a connection layout and a method for testing and a wiring design apparatus
09/07/1999US5949700 Five square vertical dynamic random access memory cell
09/07/1999US5949697 Semiconductor memory device having hierarchical input/output line structure and method for arranging the same
09/07/1999US5949663 Inverter apparatus capable of readily modification of the specification and performance thereof
09/07/1999US5949654 Multi-chip module, an electronic device, and production method thereof
09/07/1999US5949568 Array of thin film actuated mirrors having a levelling member
09/07/1999US5949468 Light quantity measuring system and exposure apparatus using the same
09/07/1999US5949323 Non-uniform width configurable fuse structure
09/07/1999US5949242 Method and apparatus for testing unpackaged semiconductor dice
09/07/1999US5949156 Precision capacitor ladder using differential equal-perimeter pairs
09/07/1999US5949145 Semiconductor device including alignment marks
09/07/1999US5949144 In a bonded wafer
09/07/1999US5949143 Semiconductor interconnect structure with air gap for reducing intralayer capacitance in metal layers in damascene metalization process
09/07/1999US5949142 Chip size package and method of manufacturing the same
09/07/1999US5949141 Laminated film/metal structures
09/07/1999US5949134 For mounting a semiconductor chip
09/07/1999US5949133 Semiconductor interconnect structure for high temperature applications
09/07/1999US5949132 Dambarless leadframe for molded component encapsulation
09/07/1999US5949130 Semiconductor integrated circuit device employing interlayer insulating film with low dielectric constant
09/07/1999US5949129 Wafer comprising optoelectronic circuits and method of verifying this wafer
09/07/1999US5949126 Trench isolation structure employing protective sidewall spacers upon exposed surfaces of the isolation trench
09/07/1999US5949125 Semiconductor device having field isolation with a mesa or mesas
09/07/1999US5949122 Integrated circuit with a device having a predetermined reverse conduction threshold and a thermal compensation device with Vbe multipliers
09/07/1999US5949119 Device equipped with floating rigid microstructure elements
09/07/1999US5949116 MOS device having a source/drain region conforming to a conductive material filled French structure in a substrate
09/07/1999US5949115 Semiconductor device including nickel formed on a crystalline silicon substrate
09/07/1999US5949114 Semiconductor device having increased breakdown voltage and method of fabricating same
09/07/1999US5949113 Static RAM having a stable high-resistance load
09/07/1999US5949112 Integrated circuits with tub-ties
09/07/1999US5949111 Semiconductor device and fabrication process therefor
09/07/1999US5949110 DRAM having peripheral circuitry in which source-drain interconnection contact of a MOS transistor is made small by utilizing a pad layer and manufacturing method thereof
09/07/1999US5949108 Semiconductor device with reduced capacitance
09/07/1999US5949107 Semiconductor device and method of fabricating same
09/07/1999US5949106 FET input/output pad layout
09/07/1999US5949105 Insulated-gate field-effect transistor structure and method
09/07/1999US5949104 Source connection structure for lateral RF MOS devices
09/07/1999US5949103 MOSFET with tunneling insulation and fabrication method thereof
09/07/1999US5949102 Semiconductor device having a gate electrode with only two crystal grains
09/07/1999US5949101 Semiconductor memory device comprising multi-level logic value of the threshold voltage
09/07/1999US5949100 Integrate circuit device including expanded contact holes and related structures
09/07/1999US5949098 Semiconductor integrated circuit having an improved arrangement of power supply lines to reduce noise occurring therein
09/07/1999US5949097 Semiconductor device, method for manufacturing same, communication system and electric circuit system
09/07/1999US5949096 Field effect transistor with stabilized threshold voltage
09/07/1999US5949095 Enhancement type MESFET
09/07/1999US5949092 Ultra-high-density pass gate using dual stacked transistors having a gate structure with planarized upper surface in relation to interlayer insulator
09/07/1999US5949091 Semiconductor device having polysilicon thin-film
09/07/1999US5949090 MOS TEG structure
09/07/1999US5949088 Intermediate SRAM array product and method of conditioning memory elements thereof
09/07/1999US5949079 Method of and an apparatus for electron beam exposure
09/07/1999US5949030 Vias and method for making the same in organic board and chip carriers
09/07/1999US5948986 Monitoring of wafer presence and position in semiconductor processing operations
09/07/1999US5948958 Method and apparatus for verifying the calibration of semiconductor processing equipment
09/07/1999US5948705 Method of forming interconnection line
09/07/1999US5948704 High flow vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support
09/07/1999US5948703 Method of soft-landing gate etching to prevent gate oxide damage
09/07/1999US5948702 Titanium nitride
09/07/1999US5948701 Self-aligned contact (SAC) etching using polymer-building chemistry
09/07/1999US5948700 Method of planarization of an intermetal dielectric layer using chemical mechanical polishing
09/07/1999US5948699 Wafer backing insert for free mount semiconductor polishing apparatus and process
09/07/1999US5948698 Manufacturing method of semiconductor device using chemical mechanical polishing
09/07/1999US5948697 Catalytic acceleration and electrical bias control of CMP processing
09/07/1999US5948690 Pretreatment system for analyzing impurities contained in flat sample
09/07/1999US5948598 Anti-reflective silicon nitride film using in-situ deposition
09/07/1999US5948590 Negative type image recording material
09/07/1999US5948589 Positive-working photoresist composition
09/07/1999US5948587 Positive working photoresist composition
09/07/1999US5948578 The present invention relates to a photoresist for forming a fine pattern used in manufacturing a large scale integrated circuit (lsi) and so on.
09/07/1999US5948574 Mask for manufacturing semiconductor device and method of manufacture thereof
09/07/1999US5948573 Method of designing mask pattern to be formed in mask and method of manufacturing integrated circuit
09/07/1999US5948571 An exposure mask for use in a photoresist imaging system.
09/07/1999US5948570 Process for dry lithographic etching
09/07/1999US5948485 Plasma deposition method and an apparatus therefor
09/07/1999US5948470 A selected block copolymer is coated onto the selected substrate and a component of the block copolymer is modified with ozone and physically removed so that the dense periodic pattern of the block copolymer can be transferred onto the
09/07/1999US5948467 Enhanced CVD copper adhesion by two-step deposition process
09/07/1999US5948300 Process tube with in-situ gas preheating
09/07/1999US5948286 Diffusion bonding of lead interconnections using precise laser-thermosonic energy
09/07/1999US5948283 Method and apparatus for enhancing outcome uniformity of direct-plasma processes