Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/1999
09/10/1999WO1999045436A1 Improved pattern generator for avoiding stitching errors
09/10/1999WO1999045435A1 Pattern generator with improved precision
09/10/1999WO1999045340A1 Measuring a diffracting structure, broadband, polarized, ellipsometric, and an underlying structure
09/10/1999WO1999045170A1 Substrate plating device
09/10/1999WO1999045167A1 Method of depositing silicon with high step coverage
09/10/1999WO1999045165A1 Method of forming phosphosilicate glass having a high wet-etch rate
09/10/1999WO1999045164A1 Method of coating and annealing large area glass substrates
09/10/1999WO1999045070A1 High-melting polyamide composition for electronic applications
09/10/1999WO1999044937A1 Material with reduced optical absorption
09/10/1999WO1999044782A1 Method and contact point for producing an electrical connection
09/10/1999WO1999044752A2 Circuit and method for specifying performance parameters in integrated circuits
09/10/1999WO1999035673B1 Two-wafer loadlock wafer processing apparatus and loading and unloading method therefor
09/10/1999WO1999027150A9 Sputtering target
09/10/1999WO1999022396A3 Enhanced macroparticle filter and cathode arc source
09/09/1999DE19908456A1 Power consumption estimation method for large scale integrated circuit e.g. for LSI chip design
09/09/1999DE19847631A1 Quality management system for semiconductor device
09/09/1999DE19845315A1 Semiconductor device e.g. power semiconductor with trench MOS gate
09/09/1999DE19842441A1 Semiconductor device especially a chip size package for mounting on a printed circuit board
09/09/1999DE19839079A1 Semiconductor device insulating layer structure especially a gate insulation structure for a dual-gate MOSFET
09/09/1999DE19821726C1 Integrated CMOS circuit for high frequency applications, e.g. as a symmetrical mixer input stage or an impedance transformer
09/09/1999DE19809556A1 Transverse feed device for vertical through-flow oven e.g. for semiconductor manufacture
09/09/1999DE19808516A1 Unterfüllmaterial für Flip-Chip-bestückte Leiterplatten, damit ausgerüstete Leiterplatte sowie Verfahren zur Füllgradüberprüfung von damit unterfüllten Chips Underfill material for flip-chip assembled printed circuit boards, printed circuit board equipped therewith, and methods for Füllgradüberprüfung of so underfilled chips
09/09/1999DE19808246A1 Verfahren zur Herstellung eines mikroelektronischen Halbleiterbauelements A process for producing a microelectronic semiconductor component,
09/09/1999DE19601862C2 Vorrichtung und Verfahren zur Entdeckung von fehlerhaften Logikteilschaltungen mittels eines anomalen Ruheversorgungsstroms Apparatus and method for detection of faulty logic subcircuits by an abnormal resting supply current
09/08/1999EP0940923A2 Mixed-signal circuitry and integrated circuit devices
09/08/1999EP0940920A2 Current limiting receiver with impedance/load matching for a powered down receiver chip
09/08/1999EP0940856A1 Ferroelectric memory element and method of producing the same
09/08/1999EP0940855A2 III-V semiconductor heterojunction field effect transistor
09/08/1999EP0940853A2 DRAM trench capacitor cell and method of fabricating the same
09/08/1999EP0940852A2 Electrostatic discharge protection for integrated circuit semiconductor device
09/08/1999EP0940851A1 Integrated circuit security system and method with implanted interconnections
09/08/1999EP0940849A1 A low-loss conductive pattern on a substrate and a method for fabrication thereof
09/08/1999EP0940847A2 SOI substrate bonding under clean room conditions
09/08/1999EP0940846A1 Method for stripping ion implanted photoresist layer
09/08/1999EP0940845A2 Susceptor for semiconductor manufacturing equipment and process for producing the same
09/08/1999EP0940844A2 Integrated circuit fabrication
09/08/1999EP0940843A2 Apparatus for heat-treating substrate and method for separating the substrate from the apparatus
09/08/1999EP0940839A2 Etching or coating devices
09/08/1999EP0940838A2 In situ removal of contaminants from the interior surfaces of an ion beam implanter
09/08/1999EP0940828A2 Method for producing foil electrodes
09/08/1999EP0940826A2 Inductor for use with electronic oscillators
09/08/1999EP0940724A2 Developer for photosensitive polyimide precursor, and method of using it for patterning
09/08/1999EP0940723A2 Sample table for pattern exposure machine
09/08/1999EP0940722A2 Illumination system and REMA (reticle masking) objective with lens shift and method of use therefor
09/08/1999EP0940721A2 Reticle library apparatus and method
09/08/1999EP0940719A2 Photoresist film and method for forming a pattern thereof
09/08/1999EP0940710A2 Display device and fabrication method thereof
09/08/1999EP0940483A2 Anodizing method and apparatus and semiconductor substrate manufacturing method
09/08/1999EP0940420A1 Nylon 12, nylon 12 composition, method for producing nylon 12 and tubular molded product using nylon 12
09/08/1999EP0940222A2 Method and apparatus for chemical mechanical planarization (CMP) of a semiconductor wafer
09/08/1999EP0940219A2 A wafer processing machine and a processing method thereby
09/08/1999EP0939974A2 Manufacture of a semiconductor device with a mos transistor having an ldd structure
09/08/1999EP0939973A1 Process for manufacturing micromechanical functional elements
09/08/1999EP0939972A1 Plasma etch reactor and method
09/08/1999EP0939957A2 Programmable metallization cell structure and method of making same
09/08/1999EP0815565A4 Method and apparatus for micromachining using hard x-rays
09/08/1999EP0777760B1 Transport system for thin film sputtering system
09/08/1999EP0761017B1 Semiconductor device of the type sealed in glass having a silver-copper bonding layer between slugs and connection conductors
09/08/1999CN1228199A Formation of source/drain from doped glass
09/08/1999CN1228198A Process for producing semiconductor bodies with MOVPE-layer sequence
09/08/1999CN1228197A Method and device for washing electronic parts member or like
09/08/1999CN1228196A Plasma etch reactor and method
09/08/1999CN1228172A Liquid antireflective coating for photoresist compositions
09/08/1999CN1227973A 半导体器件 Semiconductor devices
09/08/1999CN1227972A Non-volatile semiconductor memory device and data erase method of non-volatile semiconductor memory device
09/08/1999CN1227971A Semiconductor device with silicide layers and fabrication method thereof
09/08/1999CN1227970A Memory cell structure and fabrication method
09/08/1999CN1227969A Method of fabricating semiconductor device
09/08/1999CN1227968A Susceptor for semiconductor manufacturing equipment and process for producing the same
09/08/1999CN1227967A Semiconductor device and method for making the same
09/08/1999CN1227966A Apparatus for manufacturing semiconductor device, and method of manufacturing capacitor of semiconductor device thereby
09/08/1999CN1227965A Method of manufacturing semiconductor device having shallow junction
09/08/1999CN1227964A SOI substrate and method and system for manufacturing the same
09/08/1999CN1227963A Defect induced buried oxide for throughput SOI
09/08/1999CN1227961A Focussed ion beam apparatus and control method for same
09/08/1999CN1227923A Circuit board for testing semiconductor device
09/08/1999CN1227881A Magnetic filter for ion source
09/07/1999USRE36290 Manufacture of high precision electronic components with ultra-high purity liquids
09/07/1999US5950181 Apparatus and method for detecting and assessing a spatially discrete dot pattern
09/07/1999US5950109 Methods of depositing films on semiconductor wafers using partial deposition and reloading techniques
09/07/1999US5950108 Method of fabricating a conductive plug
09/07/1999US5950107 In-situ pre-ILD deposition treatment to improve ILD to metal adhesion
09/07/1999US5950106 Method of patterning a metal substrate using spin-on glass as a hard mask
09/07/1999US5950105 Completely buried contact holes and methods of forming same
09/07/1999US5950104 Contact process using Y-contact etching
09/07/1999US5950102 Method for fabricating air-insulated multilevel metal interconnections for integrated circuits
09/07/1999US5950101 Method for manufacturing a semiconductor device involving forming two silicon oxide layers by CVD and forming HMDS between the silicon oxide layers
09/07/1999US5950100 Method of manufacturing semiconductor device and apparatus for the same
09/07/1999US5950099 Method of forming an interconnect
09/07/1999US5950098 Manufacturing method of a semiconductor device with a silicide layer
09/07/1999US5950097 Advanced isolation scheme for deep submicron technology
09/07/1999US5950096 Process for improving device yield in integrated circuit fabrication
09/07/1999US5950095 Semiconductor memory cell fabrication method
09/07/1999US5950094 Method for fabricating fully dielectric isolated silicon (FDIS)
09/07/1999US5950093 Method for aligning shallow trench isolation
09/07/1999US5950092 Use of a plasma source to form a layer during the formation of a semiconductor device
09/07/1999US5950091 Method of making a polysilicon gate conductor of an integrated circuit formed as a sidewall spacer on a sacrificial material
09/07/1999US5950090 Method for fabricating a metal-oxide semiconductor transistor
09/07/1999US5950089 Method of making read-only memory device having a silicon-on-insulator structure
09/07/1999US5950088 Semiconductor memory device and method of manufacturing the same