Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2001
02/01/2001WO2001008212A1 Device for opening/closing semiconductor container and method for producing semiconductor device
02/01/2001WO2001008211A1 Untreated body transfer device and semiconductor manufacturing device with the untreated body transfer device
02/01/2001WO2001008210A1 Wafer storing method and storing container therefor and wafer transferring method for transferring wafer to the storing container
02/01/2001WO2001008209A1 Multiple stage cleaning for plasma etching chambers
02/01/2001WO2001008208A1 Semiconductor device, method for forming silicon oxide film, and apparatus for forming silicon oxide film
02/01/2001WO2001008207A1 Method and apparatus for anisotropic etching
02/01/2001WO2001008206A1 Processor and temperature control method therefor
02/01/2001WO2001008203A1 Method for removing redepositions on a wafer and wafer which is devoid of redepositions
02/01/2001WO2001008202A1 Low stress wafer mounting assembly and method
02/01/2001WO2001008201A1 Method and device for transporting a semiconductor wafer through a treatment container
02/01/2001WO2001008200A1 Device for treating substrates
02/01/2001WO2001008199A1 Substrate and workpiece support for receiving a substrate
02/01/2001WO2001008176A1 Method of manufacturing a magnetic tunnel junction device
02/01/2001WO2001008163A1 Extreme ultraviolet soft x-ray projection lithographic method system and lithography elements
02/01/2001WO2001008159A2 Method of forming memory capacitor contact openings
02/01/2001WO2001007968A1 Mask for high resolution optical lithography
02/01/2001WO2001007967A1 Extreme ultraviolet soft x-ray projection lithographic method and mask devices
02/01/2001WO2001007926A1 Method of manufacturing a magnetic tunnel junction device
02/01/2001WO2001007858A1 Heat exchanger
02/01/2001WO2001007691A1 Apparatus for growing epitaxial layers on wafers
02/01/2001WO2001007687A1 Plating method and device, and plating system
02/01/2001WO2001007678A1 Plasma activated cvd method and device for producing a microcristalline si:h layer
02/01/2001WO2001007677A1 Method and apparatus for manufacturing semiconductor device
02/01/2001WO2001007346A1 Arrangement and method for manually moving a container for storing objects
02/01/2001WO2001007339A1 Protective system for integrated circuit (ic) wafers
02/01/2001WO2001007208A1 Cmp polishing head with three chambers and method for using the same
02/01/2001WO2001007207A1 Membrane probing system
02/01/2001WO2001007177A1 Process and apparatus for treating a workpiece such as a semiconductor wafer
02/01/2001WO2000075983B1 A method for dicing wafers with laser scribing
02/01/2001WO2000072090A3 A method for error reduction in lithography
02/01/2001WO2000058713A3 Device for rapidly measuring angle-dependent diffraction effects on finely structured surfaces
02/01/2001WO2000055690A3 A compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography
02/01/2001WO2000051012A3 Integrated circuit interconnect system
02/01/2001DE4423186C2 Verfahren zum Betreiben einer automatischen Testeinrichtung sowie automatische Testeinrichtung A method for operating an automatic test equipment as well as automatic test equipment
02/01/2001DE19960244C1 Arrangement for trimming reference voltages in semiconducting chips enables rapid and cost-effective reference voltage trimming
02/01/2001DE19943760C1 DRAM cell arrangement comprises a substrate with a recess containing a storage node of a capacitor
02/01/2001DE19935852A1 Production of an integrated circuit semiconductor component comprises producing gate paths in the regions of a substrate, forming source/drain regions in one region and distance pieces
02/01/2001DE19935446A1 Ätzlösung, Flußsäure enthaltend Etching solution of hydrofluoric acid containing
02/01/2001DE19935404A1 Beleuchtungssystem mit mehreren Lichtquellen A lighting system comprising a plurality of light sources
02/01/2001DE19934301A1 Verfahren und Vorrichtung zum Transportieren eines Halbleiterwafers durch einen Behandlungsbehälter Method and device for transporting a semiconductor wafer by a treatment vessel
02/01/2001DE19933959A1 Verfahren zur Herstellung zweier unterschiedlich dotierter benachbarter Gebiete in einem integrierten Halbleiter Process for the preparation of two differently doped adjacent regions in a semiconductor integrated
02/01/2001DE19933842A1 Vorrichtung und Verfahren zum Ätzen eines Substrates mittels eines induktiv gekoppelten Plasmas Apparatus and method for etching a substrate by means of an inductively coupled plasma
02/01/2001DE19933841A1 Vorrichtung und Verfahren zum Ätzen eines Substrates mittels eines induktiv gekoppelten Plasmas Apparatus and method for etching a substrate by means of an inductively coupled plasma
02/01/2001DE19930748A1 Stages making EEPROM memory cell with trenched condenser, fill trench, form insulating collar, remove filling, construct condenser plates and insulation, and connect tunneling layer with optional DRAM region definition
02/01/2001DE19929233C1 Speicherzellenanordnung mit auf einer Grabenseitenwand angeordnetem Floating-Gate und Herstellungsverfahren Memory cell arrangement with arranged on a grave side wall floating gate and manufacturing processes
02/01/2001DE19926106C1 Halbleiterspeicherbauelement mit Speicherzellen, Logikbereichen und Füllstrukturen A semiconductor memory device having memory cells, logic regions and dummy
02/01/2001DE10036183A1 Verfahren und Gerät zum Erhitzen eines Wafers und Verfahren und Gerät zum Ausheizen eines Photoresistfilms auf einem Wafer Method and apparatus for heating a wafer, and method and apparatus for baking a photoresist film on a wafer
02/01/2001DE10033013A1 Flüssigkeits-Spritzpresssystem zum Vergießen von integrierten Halbleiterschaltungen Liquid molding system for encapsulating semiconductor integrated circuits
02/01/2001DE10028327A1 Vorrichtung und Verfahren für bildformende Strahlen aus geladenen Teilchen und Bestrahlungsvorrichtung mit Strahlen aus geladenen Teilchen Apparatus and method for image-forming beams of charged particles and radiation device with beams of charged particles
02/01/2001DE10025218A1 Multi-layer connection process transfer-marking structure e.g. for fabrication of semiconductor devices, has transfer marking lined up with transfer point used in preceding step
02/01/2001DE10025217A1 Metal oxide transistor in a silicon-on-insulator construction suppressing effect of suspended body includes barrier layer formed by doping- and semiconductor layers, without application of external voltage
02/01/2001DE10025216A1 Semiconducting device has silicon in isolator substrate, insulating layer, semiconducting layer, transistor with gate electrode, polycrystalline semiconducting region and contact hole
02/01/2001DE10025210A1 Semiconductor device comprises a substrate having a primary surface, and a trench isolation region formed in the primary region of the substrate to divide the surface regions of the substrate into a number of active regions
02/01/2001DE10024735A1 System und Verfahren zum automatischen Verwalten von Halbleiterproduktionsbuchten System and method for automatically managing semiconductor production bays
02/01/2001DE10022665A1 Semiconductor device has current drive circuit which passes current between power-supply node and internal voltage line, based on charging voltage of capacitor
02/01/2001DE10012700A1 Halbleitervorrichtung Semiconductor device
01/2001
01/31/2001EP1073325A2 Testing and transporting semiconductor chips
01/31/2001EP1073124A2 Method for making integrated circuit capacitor including anchored plug
01/31/2001EP1073123A2 High withstand voltage semiconductor device
01/31/2001EP1073122A2 Semiconductor integrated circuit having high-density base cell array
01/31/2001EP1073121A2 Semiconductor memory device and method for manufacturing the same
01/31/2001EP1073120A2 An NROM fabrication method
01/31/2001EP1073118A1 Mixed fuse technologies
01/31/2001EP1073115A2 Process for manufacture of trench DRAM capacitor
01/31/2001EP1073114A2 Integrated circuit capacitor including anchored metal plug
01/31/2001EP1073112A1 Process for the manufacturing of a SOI wafer by oxidation of buried cavities
01/31/2001EP1073111A2 Method and apparatus for forming a solder bump
01/31/2001EP1073110A1 Method of manufacturing unipolar devices
01/31/2001EP1073109A2 Single phase perovskite ferroelectric film on platinum electrode and method for forming same
01/31/2001EP1073108A1 Chemical vapor deposition process for dielectric material
01/31/2001EP1073106A2 Method for reducing oxidation of an interface of a semiconductor device and resulting device
01/31/2001EP1073105A2 Method for wet etching oxides and/or insulators
01/31/2001EP1073104A2 Scratch resistance improvement by filling metal gaps
01/31/2001EP1073103A1 Backside bus vias
01/31/2001EP1073102A2 Liners formed by ionized metal plasma deposition for gate electrode applications
01/31/2001EP1073101A1 Method for manufacturing capacitor elements on a semiconductor substrate
01/31/2001EP1073100A2 Method for making integrated circuit capacitor including anchored plugs
01/31/2001EP1073099A2 Method of making integrated circuit capacitor including tapered plug
01/31/2001EP1073098A1 Low stress wafer mounting assembly and method
01/31/2001EP1073097A2 Dot mark reading apparatus and reading method
01/31/2001EP1073096A1 Semiconductor workpiece processing apparatus and method
01/31/2001EP1073095A2 Method for cleaning photovoltaic module and cleaning apparatus
01/31/2001EP1073071A2 Magnetic multilayer
01/31/2001EP1073062A1 Magnetic random access memory device
01/31/2001EP1073061A1 Magnetic memory
01/31/2001EP1072967A2 Computer integrated manufacturing techniques
01/31/2001EP1072957A2 Illumination system with multiple light sources
01/31/2001EP1072954A2 Lithographic process for device fabrication
01/31/2001EP1072894A2 Capacitive probe for in situ measurement of wafer DC bias voltage
01/31/2001EP1072693A1 Chemical vapor deposition apparatus and method of synthesizing carbon nanotubes using the apparatus
01/31/2001EP1072666A2 Colloidal polishing of fused silica
01/31/2001EP1072665A2 Colloidal silica polishing abrasive
01/31/2001EP1072662A1 Chemical-mechanical abrasive composition and method
01/31/2001EP1072570A1 Silicon carbide and process for its production
01/31/2001EP1072359A2 Semiconductor wafer polishing apparatus
01/31/2001EP1072057A1 Method of manufacturing a vertical metal connection in an integrated circuit
01/31/2001EP1072056A1 Improved endpoint detection for semiconductor processes
01/31/2001EP1072040A1 Non-volatile storage latch
01/31/2001EP1071981A1 Method for producing large-surface membrane masks
01/31/2001EP1071913A1 Compact external torch assembly for semiconductor processing