| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 01/16/2001 | US6174788 Partial semiconductor wafer processing with multiple cuts of random sizes |
| 01/16/2001 | US6174787 Silicon corner rounding by ion implantation for shallow trench isolation |
| 01/16/2001 | US6174786 Shallow trench isolation method providing rounded top trench corners |
| 01/16/2001 | US6174785 Method of forming trench isolation region for semiconductor device |
| 01/16/2001 | US6174784 Technique for producing small islands of silicon on insulator |
| 01/16/2001 | US6174783 Semiconductor device having a improved trench structure manufacturing method thereof, and semiconductor device manufacturing apparatus |
| 01/16/2001 | US6174782 Method of fabricating lower electrode of capacitor |
| 01/16/2001 | US6174781 Dual damascene process for capacitance fabrication of DRAM |
| 01/16/2001 | US6174780 Method of preparing integrated circuit devices containing isolated dielectric material |
| 01/16/2001 | US6174779 Method for manufacturing a lateral bipolar transistor |
| 01/16/2001 | US6174778 Method of fabricating metal oxide semiconductor |
| 01/16/2001 | US6174777 Method for fabricating a self aligned contact using a reverse self aligned contact etch |
| 01/16/2001 | US6174776 Method for forming gate contact in complementary metal oxide semiconductor |
| 01/16/2001 | US6174775 Method for making a dual gate structure for CMOS device |
| 01/16/2001 | US6174774 Method of fabricating semiconductor device |
| 01/16/2001 | US6174773 Method of manufacturing vertical trench misfet |
| 01/16/2001 | US6174772 Optimal process flow of fabricating nitride spacer without inter-poly oxide damage in split gate flash |
| 01/16/2001 | US6174771 Split gate flash memory cell with self-aligned process |
| 01/16/2001 | US6174770 Method for forming a crown capacitor having HSG for DRAM memory |
| 01/16/2001 | US6174769 Method for manufacturing stacked capacitor |
| 01/16/2001 | US6174768 Dynamic random access memory cell having an improved fin-structured storage electrode and method of fabricating the same |
| 01/16/2001 | US6174767 Method of fabrication of capacitor and bit-line at same level for 8F2 DRAM cell with minimum bit-line coupling noise |
| 01/16/2001 | US6174766 Semiconductor device and method of manufacturing the semiconductor device |
| 01/16/2001 | US6174765 Method of reducing leakage current in dielectric |
| 01/16/2001 | US6174764 Process for manufacturing integrated circuit SRAM |
| 01/16/2001 | US6174763 Three-dimensional SRAM trench structure and fabrication method therefor |
| 01/16/2001 | US6174762 Salicide device with borderless contact |
| 01/16/2001 | US6174760 Method of improving vertical BJT gain |
| 01/16/2001 | US6174759 Method of manufacturing a semiconductor device |
| 01/16/2001 | US6174758 Semiconductor chip having fieldless array with salicide gates and methods for making same |
| 01/16/2001 | US6174757 Method for producing semiconductor device |
| 01/16/2001 | US6174756 Spacers to block deep junction implants and silicide formation in integrated circuits |
| 01/16/2001 | US6174755 Methods of forming SOI insulator layers and methods of forming transistor devices |
| 01/16/2001 | US6174754 Methods for formation of silicon-on-insulator (SOI) and source/drain-on-insulator(SDOI) transistors |
| 01/16/2001 | US6174753 Mask reduction process with a method of forming a raised fuse and a fuse window with sidewall passivation |
| 01/16/2001 | US6174752 Method and apparatus for epoxy loc die attachment |
| 01/16/2001 | US6174751 Method of manufacturing resin encapsulated semiconductor device |
| 01/16/2001 | US6174745 Method for making a TFT active matrix for a protection system screen |
| 01/16/2001 | US6174744 Method of producing micro contact structure and contact probe using same |
| 01/16/2001 | US6174743 Method of reducing incidence of stress-induced voiding in semiconductor interconnect lines |
| 01/16/2001 | US6174741 Method for quantifying proximity effect by measuring device performance |
| 01/16/2001 | US6174740 Applying mechanical damage onto surface of silicon wafer to form distortions; oxidizing to form thermal oxide film on wafer surface; dissolving thermal oxide film with chemical solution or vapor; determining bulk impurities |
| 01/16/2001 | US6174739 Method of monitoring via and trench profiles during manufacture |
| 01/16/2001 | US6174738 Critical area cost disposition feedback system |
| 01/16/2001 | US6174737 Magnetic random access memory and fabricating method thereof |
| 01/16/2001 | US6174736 Method of fabricating ferromagnetic tunnel junction device |
| 01/16/2001 | US6174735 Method of manufacturing ferroelectric memory device useful for preventing hydrogen line degradation |
| 01/16/2001 | US6174651 Method for depositing atomized materials onto a substrate utilizing light exposure for heating |
| 01/16/2001 | US6174650 Forming resist film in clean room by conducting surface treatment on semiconductor substrate with silane compound; coating semiconductor substrate with chemically amplified resist; exposing and developing |
| 01/16/2001 | US6174647 Providing circuit layer comprising photoresist and via opening; roughening; adsorbing compound having ligand for palladium on photoresist; applying photoresist; catalyzing; metallized exposed palladium compound to form metal pad |
| 01/16/2001 | US6174644 Semiconductor integrated circuits |
| 01/16/2001 | US6174633 Method for correcting photocontiguous effect during manufacture of semiconductor device |
| 01/16/2001 | US6174606 Nitrogen-containing heterocycle such as benzotriazole on the conductive composite to reduce silver(ag) dissolution and ion mobility by forming a water insoluble complex with the ag ion; reduced electrochemical mobility of ag due to moisture |
| 01/16/2001 | US6174596 Process for fabricating dual damascene structure by applying an etch-differentiating technique on a light sensitive organic oxide layer |
| 01/16/2001 | US6174590 Isolation using an antireflective coating |
| 01/16/2001 | US6174583 Aluminum nitride sintered body, metal including member, electrostatic chuck, method of producing aluminum nitride sintered body, and method of producing metal including member |
| 01/16/2001 | US6174564 Used to form metal oxides for use in integrated circuits, by mixing in a c7-10 alkane solvent and reacting a metal alkoxide with a metal carboxylate to form a mixed metal alkoxycarboxylate of given formula |
| 01/16/2001 | US6174563 Forming an integrated circuit which includes a metal film layer for wiring |
| 01/16/2001 | US6174499 A semiconductor etching apparatus comprising a generator for generating a plasma in the reaction chamber to decompose and chemically activate the freon gas, then made into contact with a reactant to form a reaction product |
| 01/16/2001 | US6174454 Slurry formulation for selective CMP of organic spin-on-glass insulating layer with low dielectric constant |
| 01/16/2001 | US6174451 Etching oxide layer over underlying feature having non oxide corner by flowing fluorocarbon selected from trifluoropropyne, hexafluorobutadiene, and pentafluoropropylene, and monofluoromethane and difluoromethane, activating |
| 01/16/2001 | US6174450 Methods and apparatus for controlling ion energy and plasma density in a plasma processing system |
| 01/16/2001 | US6174449 Magnetically patterned etch mask |
| 01/16/2001 | US6174425 Electroplating process makes electrical current density across a semiconductor device substrate surface more uniform during plating to allow for a more uniform or tailored deposition of a conductive material. |
| 01/16/2001 | US6174408 Method and apparatus for dry etching |
| 01/16/2001 | US6174407 Apparatus and method for detecting an endpoint of an etching process by transmitting infrared light signals through a semiconductor wafer |
| 01/16/2001 | US6174377 Processing chamber for atomic layer deposition processes |
| 01/16/2001 | US6174375 Semiconductor device manufacturing system capable of automatic branching and merging of wafers |
| 01/16/2001 | US6174374 Method for annealing a semiconductor |
| 01/16/2001 | US6174373 Non-plasma halogenated gas flow prevent metal residues |
| 01/16/2001 | US6174371 Substrate treating method and apparatus |
| 01/16/2001 | US6174370 Semiconductor wafer chucking device and method for stripping semiconductor wafer |
| 01/16/2001 | US6174366 Processed in two or more different reactors, e.g. reactors for the epitaxial growth of silicon, plasma etching, and/or vacuum metal deposition. the system is kept under constant vacuum. |
| 01/16/2001 | US6174363 Method for producing silicon single crystal |
| 01/16/2001 | US6174222 Process for fabrication of semiconductor device, semiconductor wafer for use in the process and process for the preparation of the wafer |
| 01/16/2001 | US6174221 Polishing chucks, semiconductor wafer polishing chucks, abrading methods, polishing methods, semiconductor wafer polishing methods, and methods of forming polishing chucks |
| 01/16/2001 | US6174011 Method of and apparatus for handling thin and flat workpieces and the like |
| 01/16/2001 | US6173898 Memory card of the contactless type |
| 01/16/2001 | US6173885 Method for forming a ball in wire bonding |
| 01/16/2001 | US6173884 Semiconductor device and equipment for manufacturing the same as well as method of fabricating the same |
| 01/16/2001 | US6173879 Wire bonder |
| 01/16/2001 | US6173750 Method and apparatus for removing die from a wafer and conveying die to a pickup location |
| 01/16/2001 | US6173720 Contacting a substrate with hydrofluoric acid, followed by a deionized water solution containing at least one compound selected from carbonic acid and hydrogen fluoride to provide a hydrogen passivated surface, free of oxygen and carbon |
| 01/16/2001 | US6173674 Plasma reactor with a deposition shield |
| 01/16/2001 | US6173673 Method and apparatus for insulating a high power RF electrode through which plasma discharge gases are injected into a processing chamber |
| 01/16/2001 | US6173632 Single station cutting apparatus for separating semiconductor packages |
| 01/16/2001 | US6173490 Method for forming a panel of packaged integrated circuits |
| 01/16/2001 | US6173468 Apparatus for washing both surfaces of a substrate |
| 01/16/2001 | CA2181993C Method of making a micromechanical silicon-on-glass tuning fork gyroscope |
| 01/16/2001 | CA2156727C High saturation current, low leakage current fermi threshold field effect transistor |
| 01/11/2001 | WO2001003302A1 Capacitor array |
| 01/11/2001 | WO2001003301A1 High voltage protection circuit on standard cmos process |
| 01/11/2001 | WO2001003204A1 Diode comprising a metal semiconductor contact and a method for the production thereof |
| 01/11/2001 | WO2001003203A1 Non-volatile semiconductor memory cell, comprising a separate tunnel window and a method for producing the same |
| 01/11/2001 | WO2001003202A1 Vertical semiconductor device and method for producing the same |
| 01/11/2001 | WO2001003201A1 Lateral thin-film silicon-on-insulator (soi) device having a gate electrode and a field plate electrode |
| 01/11/2001 | WO2001003200A1 Insulation of gate electrodes and production method |
| 01/11/2001 | WO2001003198A1 Memory cell arrangement |
| 01/11/2001 | WO2001003196A1 Ferroelectric transistor |
| 01/11/2001 | WO2001003195A1 Electric semiconductor element with a contact hole |