| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 10/16/2001 | US6302585 Two Axis stage with arcuate surface bearings |
| 10/16/2001 | US6302459 Conveyance arm device |
| 10/16/2001 | US6302317 Bump bonding apparatus and method |
| 10/16/2001 | US6302316 Ball arrangement method and arrangement apparatus |
| 10/16/2001 | US6302313 Flip-chip bonding method and apparatus |
| 10/16/2001 | US6302312 Bonding apparatus and method |
| 10/16/2001 | US6302139 Auto-switching gas delivery system utilizing sub-atmospheric pressure gas supply vessels |
| 10/16/2001 | US6302057 Apparatus and method for electrically isolating an electrode in a PECVD process chamber |
| 10/16/2001 | US6301802 Vacuum processing apparatus and operating method therefor |
| 10/16/2001 | US6301801 Vacuum processing apparatus and operating method therefor |
| 10/16/2001 | US6301779 Method for fabricating a heat sink having nested extended surfaces |
| 10/16/2001 | CA2099385C Algaas native oxide |
| 10/16/2001 | CA2080690C Batch assembly of high density hermetic packages for power semiconductor chips |
| 10/14/2001 | CA2343632A1 Die attach adhesives for use in microelectronic devices |
| 10/11/2001 | WO2001076332A1 Circuit board, method of manufacture thereof, integrated circuit and method of manufacture thereof |
| 10/11/2001 | WO2001076326A1 Optical monitoring and control system and method for plasma reactors |
| 10/11/2001 | WO2001076071A2 High voltage cmos signal driver system and method |
| 10/11/2001 | WO2001075983A2 Multilayer capacitor structure having an array of concentric ring-shaped plates for deep sub-micron cmos |
| 10/11/2001 | WO2001075981A1 Thin-film semiconductor device and method for manufacturing the same |
| 10/11/2001 | WO2001075980A1 A high voltage thin film transistor with improved on-state characteristics and method for making same |
| 10/11/2001 | WO2001075979A1 Cmos-compatible lateral dmos transistor and method for producing such a transistor |
| 10/11/2001 | WO2001075978A1 Silicon-carbon layer in emitter for silicon-germanium heterojunction bipolar transistors |
| 10/11/2001 | WO2001075975A1 Contact to a polysilicon layer and method |
| 10/11/2001 | WO2001075974A1 Semiconductor device and method of manufacturing same |
| 10/11/2001 | WO2001075973A2 Combined transistor-capacitor structure in deep sub-micron cmos for power amplifiers |
| 10/11/2001 | WO2001075969A1 Electronic component with flexible contact points and method for the production thereof |
| 10/11/2001 | WO2001075968A2 Method of manufacturing a heterojunction bicmos integrated circuit |
| 10/11/2001 | WO2001075967A1 In situ and ex situ etching process for sti with oxide collar application |
| 10/11/2001 | WO2001075966A1 Method for cutting an object and for further processing the cut material and a carrier for holding the object or the cut material |
| 10/11/2001 | WO2001075965A1 Treating device |
| 10/11/2001 | WO2001075964A1 Semiconductor element comprising a chip and arrangement with a chip |
| 10/11/2001 | WO2001075963A1 Method for producing a heat-conducting connection between two work pieces |
| 10/11/2001 | WO2001075962A1 Housing assembly for an electronic component |
| 10/11/2001 | WO2001075961A1 Chip scale surface mounted device and process of manufacture |
| 10/11/2001 | WO2001075960A2 Method of making a trench gate dmos transistor |
| 10/11/2001 | WO2001075959A1 Transistors having optimized source-drain structures and methods for making the same |
| 10/11/2001 | WO2001075958A2 Method for improving uniformity and reducing etch rate variation of etching polysilicon |
| 10/11/2001 | WO2001075957A1 Method for preparing porous sog film |
| 10/11/2001 | WO2001075956A1 Method of forming a dielectric film |
| 10/11/2001 | WO2001075955A1 Fluorinated solvent compositions containing hydrogen fluoride |
| 10/11/2001 | WO2001075954A1 Method for dicing semiconductor wafer into chips |
| 10/11/2001 | WO2001075953A1 Thin film manufacturing method and manufacturing apparatus, and thin-film transistor and manufacturing method |
| 10/11/2001 | WO2001075952A1 Production method of iii nitride compound semiconductor and iii nitride compound semiconductor element |
| 10/11/2001 | WO2001075945A2 Ferroelectric integrated circuit having hydrogen barrier layer |
| 10/11/2001 | WO2001075944A2 Dry silylation plasma etch process |
| 10/11/2001 | WO2001075942A1 Wafer preparation apparatus |
| 10/11/2001 | WO2001075939A2 Method and apparatus for increased workpiece throughput |
| 10/11/2001 | WO2001075938A2 Leadless semiconductor product packaging apparatus having a window lid and method for packaging |
| 10/11/2001 | WO2001075932A2 An enhanced resist strip in a dielectric etcher using downstream plasma |
| 10/11/2001 | WO2001075891A2 Current conveyor and method for readout of mtj memories |
| 10/11/2001 | WO2001075617A2 Plug and play sensor integration for a process module |
| 10/11/2001 | WO2001075393A1 Thickness measurement using afm for next generation lithography |
| 10/11/2001 | WO2001075196A1 Method and device for making substrates |
| 10/11/2001 | WO2001075189A2 Cleaning of a plasma processing system silicon roof |
| 10/11/2001 | WO2001075188A2 Method of and apparatus for gas injection |
| 10/11/2001 | WO2001074985A1 Fluorinated solvent compositions containing ozone |
| 10/11/2001 | WO2001074962A1 Adhesive composition, method for preparing the same, adhesive film using the same, substrate for carrying semiconductor and semiconductor device |
| 10/11/2001 | WO2001074958A2 Polishing agent and method for producing planar layers |
| 10/11/2001 | WO2001074957A1 Coating composition for the production of insulating thin films |
| 10/11/2001 | WO2001074798A1 Reworkable composition of oxirane(s) or thiirane(s)-containing resin and curing agent |
| 10/11/2001 | WO2001074708A2 Method for depositing polycrystalline sige suitable for micromachining and devices obtained thereof |
| 10/11/2001 | WO2001074537A1 Method and apparatus for fixed-abrasive substrate manufacturing and wafer polishing in a single process path |
| 10/11/2001 | WO2001074536A2 Carrier head providing uniform upward and downward force on a wafer |
| 10/11/2001 | WO2001074535A1 Fixed abrasive linear polishing belt and system using the same |
| 10/11/2001 | WO2001074534A2 A workpiece carrier with adjustable pressure zones and barriers |
| 10/11/2001 | WO2001074533A2 Methods for performing wafer preparation operations on vertically oriented semiconductor wafers |
| 10/11/2001 | WO2001074532A1 Method of polishing wafers |
| 10/11/2001 | WO2001074529A2 Laser system and method for single pass micromachining of multilayer workpieces |
| 10/11/2001 | WO2001037321A3 Semiconductor devices with selectively doped iii-v nitride layers |
| 10/11/2001 | WO2001037311A3 Method and apparatus for controlling the volume of a plasma |
| 10/11/2001 | WO2001035448A3 Method for making a stack of capacitors, in particular for dynamic ram |
| 10/11/2001 | WO2001022474A3 Method for producing a semiconductor device consisting of silicon-carbide and comprising a schottky contact |
| 10/11/2001 | WO2001003126A3 High density non-volatile memory device |
| 10/11/2001 | WO2000054322A8 Flip chip with integrated flux and underfill |
| 10/11/2001 | US20010029601 Semiconductor device analyzer, method for analyzing/manufacturing semiconductor device, and storage medium storing program for analyzing semiconductor device |
| 10/11/2001 | US20010029600 Storage media being readable by a computer, and a method for designing a semiconductor integrated circuit device |
| 10/11/2001 | US20010029598 Delay time calculating method for use in hierarchical design |
| 10/11/2001 | US20010029597 Semiconductor inspecting system, semiconductor defect anlyzing system, semiconductor design data modifying system, semiconductor inspecting method, semiconductor defect analyzing method, semiconductor design data modifying method, and computer |
| 10/11/2001 | US20010029436 Semiconductor electrical characteristics evaluation apparatus and semiconductor electrical characteristics evaluation method |
| 10/11/2001 | US20010029403 Method and apparatus for determining optimum exposure threshold for a given photolithographic model |
| 10/11/2001 | US20010029283 Electrically insulating thin-film-forming resin composition and method for forming thin film therefrom |
| 10/11/2001 | US20010029156 Method for dressing a polishing pad, polishing apparatus, and method for manufacturing a semiconductor apparatus |
| 10/11/2001 | US20010029154 Method and apparatus for controlling a temperature of a polishing pad used in planarizing substrates |
| 10/11/2001 | US20010029152 Method and apparatus for wireless transfer of chemical-mechanical planarization measurements |
| 10/11/2001 | US20010029150 Polishing apparatus and method |
| 10/11/2001 | US20010029144 Method of manufacturing pixel electrode for reflection type display device |
| 10/11/2001 | US20010029114 Method of forming polymeric layers of silicon oxynitride |
| 10/11/2001 | US20010029113 Semiconductor device, a method of manufacturing the semiconductor device, and an apparatus for manufacturing the semiconductor device |
| 10/11/2001 | US20010029112 Apparatus and method for use in manufacturing a semiconductor device |
| 10/11/2001 | US20010029111 Rotating a solution of precursor compounds or polymers on a semiconductor for first rotation period of time for first rotation speed, rotating the soluton (liquid solution) for second time at lesser speed than first rotation speed |
| 10/11/2001 | US20010029110 Precursors for making low dielectric constant materials with improved thermal stability |
| 10/11/2001 | US20010029109 Nitride surface (formed by silicon compounds and ammonia or other nitriding gases) brought into a chemically active state by etching, hence film forming surface is easily oxidized by hydrogen peroxide, oxygen, ozone, nitric acid etc. |
| 10/11/2001 | US20010029108 Substrate processeing apparatus, substrate processing method and electronic device manufacturing method |
| 10/11/2001 | US20010029107 Resist pattern forming method and semiconductor device manufacturing method |
| 10/11/2001 | US20010029106 In situ and ex situ hardmask process for STI with oxide collar application |
| 10/11/2001 | US20010029105 Semiconductor device and method for manufacturing the same |
| 10/11/2001 | US20010029104 Substrate-cleaning method and substrate-cleaning solution |
| 10/11/2001 | US20010029103 Applying to substrate, a solvent, an organic semiconductor compound selected from, naphthalenedicaroxylic acid imide, alpha-omega-dihexyl-alpha-sexithiophene, alpha, omega-dihexyl alpha-quiqethiophene, bis/3-butoxypropyl-alpha-sexithiophene |
| 10/11/2001 | US20010029102 Drive circuit for plasma display panel |
| 10/11/2001 | US20010029101 Methods for forming ferroelectric capacitors |