H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2001
10/25/2001	US20010033032 Manufacturing method for semiconductor device, mounting method of semiconductor device, semiconductor device, and inspecting method of semiconductor device
10/25/2001	US20010033031 Semiconductor device and production process thereof
10/25/2001	US20010033030 Three dimensional structure integrated circuits
10/25/2001	US20010033029 Methods for fabricating semiconductor devices having protected plug contacts and upper interconnections and semiconductor devices formed thereby
10/25/2001	US20010033028 Semiconductor devices and methods for manufacturing the same
10/25/2001	US20010033027 Graded layer for use in semiconductor circuits and method for making same
10/25/2001	US20010033026 Low dielectric constant film material, film and semiconductor device using such material
10/25/2001	US20010033025 Semiconductor device and method and apparatus for fabricating the same
10/25/2001	US20010033023 Semiconductor device and method of manufacturing the same
10/25/2001	US20010033018 Semiconductor device, its manufacturing method and electrodeposition frame
10/25/2001	US20010033016 Semiconductor device and method of manufacturing the same
10/25/2001	US20010033012 Anti tamper encapsulation for an integrated circuit
10/25/2001	US20010033011 Semiconductor package having a die pad with downward-extended tabs
10/25/2001	US20010033010 Semiconductor device tester and method of testing semiconductor device
10/25/2001	US20010033007 Solid state image sensor and method for fabricating the same
10/25/2001	US20010033006 MOS transistor in a single-transistor memory cell having a locally thickened gate oxide
10/25/2001	US20010033005 Semiconductor device and method of fabricating the same
10/25/2001	US20010033003 Semiconductor device having a protective circuit
10/25/2001	US20010033002 Control of buried oxide quality in low dose SIMOX
10/25/2001	US20010033001 Semiconductor integrated circuit device
10/25/2001	US20010033000 Field effect transistor structure with self-aligned raised source/drain extensions
10/25/2001	US20010032999 GaN-based compound semiconductor device
10/25/2001	US20010032998 Super-junction semiconductor device and method of manufacturing the same
10/25/2001	US20010032996 Nonvolatile semiconductor memory device
10/25/2001	US20010032995 Lanthanum oxide-based gate dielectrics for integrated circuit field effect transistors and methods of fabricating same
10/25/2001	US20010032994 Method of fabricating a wide-based box- structured capacitor containing hemi-spherical grains
10/25/2001	US20010032993 Semiconductor devices and methods for manufacturing the same
10/25/2001	US20010032992 Microelectronic structure, method for fabricating it and its use in a memory cell
10/25/2001	US20010032991 Semiconductor memory having a memory cell array
10/25/2001	US20010032990 Semiconductor device for load drive circuit
10/25/2001	US20010032989 Dram cell formed on an insulating layer having a vertical channel and a manufacturing method thereof
10/25/2001	US20010032986 Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic device
10/25/2001	US20010032981 Contact structures of wirings and methods for manufacturing the same, and thin film transistor array panels including the same and methods for manufacturing the same
10/25/2001	US20010032980 Semiconductor device having a thin film field-effect transistor, liquid crystal display device, and production method thereof
10/25/2001	US20010032978 Semiconductor device
10/25/2001	US20010032977 Optical function device with photonic band gap and/or filtering characteristics
10/25/2001	US20010032937 System and method for uniformity enhancement during ion implantation
10/25/2001	US20010032936 Ion beam processing position correction method
10/25/2001	US20010032829 Hydroxylammonium salt
10/25/2001	US20010032800 Method of manufacturing semiconductor device and tray used in the method
10/25/2001	US20010032787 Multilayer metal plating
10/25/2001	US20010032783 Vault shaped target and magnetron having both distributed and localized magnets
10/25/2001	US20010032708 Electrode plate for plasma etching equipment for forming uniformly-etched surface
10/25/2001	US20010032707 Dry etching system for patterning target layer at high reproducibility and method of dry etching used therein
10/25/2001	US20010032705 Local etching apparatus and local etching method
10/25/2001	US20010032704 Vacuum loadlock ultra violet bake for plasma etch
10/25/2001	US20010032666 Integrated capacitor-like battery and associated method
10/25/2001	US20010032660 By the action of centrifugal force generated during rotation of the housing
10/25/2001	US20010032591 Magnetic barrier for plasma in chamber exhaust
10/25/2001	US20010032590 Magnetic barrier for plasma in chamber exhaust
10/25/2001	US20010032589 Film forming apparatus and method of forming a crystalline silicon film
10/25/2001	US20010032581 Epitaxial silicon wafer with intrinsic gettering and a method for the preparation thereof
10/25/2001	US20010032543 Abatement of semiconductor processing gases
10/25/2001	US20010032533 Cutting apparatus equipped with a blade aligning means
10/25/2001	US20010032396 Substrate processing method and substrate processing apparatus
10/25/2001	DE10102141A1 Integrierter Halbleiter-Schaltkreis mit einer verminderten Zeitdifferenz und Layout-Verfahren bei der Konstruktion eines integrierten Halbleiter-Schaltkreises Integrated semiconductor circuit with a reduced time difference, and layout method in the construction of a semiconductor integrated circuit
10/25/2001	DE10062237A1 Semiconductor device manufacture, employs SOI substrate with total insulation film separating elements of NMOS and PMOS devices
10/25/2001	DE10054636A1 Semi conductor has structure suppresses a rise in the transmission resistance
10/25/2001	DE10031019A1 Method and device for transporting wafers in connection their production and/or processing uses gas-operated flow-through nozzles to create gas cushions and/or gas jets for moving and/or positioning wafers.
10/25/2001	DE10029835C1 Integrated circuit with test facility has test switch closed by applied test signal to allow test voltage to be applied to irreversible programmable switches
10/25/2001	DE10027103A1 Verfahren zur Überführung einer Rücklaufscheibe in eine Halbleiterscheibe A process for converting a return disc in a semiconductor wafer
10/25/2001	DE10019822A1 Process for structuring thin layers used for corrosion protection layers comprises applying a thin film as sol to substrate, hardening, removing hardened film, and converting into the required solid body state by introducing energy
10/25/2001	DE10019712A1 Production of periodic structures is achieved by material deposition at antinodes of standing surface waves on substrate
10/25/2001	DE10019562A1 Vorrichtung zum Verbinden von Gehäusen oder Fassungen für optische Elemente A device for connecting casings or holders for optical elements
10/25/2001	DE10019433A1 Manufacture of multi media cards has sequence of operations to mount components on circuit board layer followed by encapsulation
10/25/2001	DE10019090A1 Grabenkondensator sowie dazugehöriges Herstellungsverfahren Grave belonging to capacitor and manufacturing method
10/25/2001	DE10018371A1 Semiconductor substrate manufacturing method e.g. for multiple-epitaxy device
10/25/2001	DE10015193A1 Hochintegrierte System-on-Chip-Systeme mit nichtflüchtigen Speichereinheiten Highly integrated system-on-chip systems with non-volatile memory units
10/25/2001	DE10004315A1 Burn-in test board handler for integrated circuits, mounts IC on burn in test board which is short tested by burn in board checker before burn in test
10/25/2001	CA2406307A1 Method for measuring diffusion of photogenerated catalyst in chemically amplified resists
10/25/2001	CA2406214A1 Deposited thin films and their use in separation and sarcrificial layer applications
10/25/2001	CA2406111A1 Probe card device and probe for use therein
10/24/2001	EP1148559A2 High speed semiconductor photodetector and method of fabricating the same
10/24/2001	EP1148557A2 Stacked capacitor and method of fabricating the stacked capacitor
10/24/2001	EP1148556A2 Split-gate flash memory element arrangement and method of erasing the same
10/24/2001	EP1148554A2 Heterojunction bipolar transistor and manufacturing method therefor
10/24/2001	EP1148552A2 Vertical transistor DRAM cell with stacked storage capacitor and associated method cell
10/24/2001	EP1148551A2 Device comprising micromagnetic components for power applications and process for forming device
10/24/2001	EP1148549A2 Integrated circuit with integrated HF filter
10/24/2001	EP1148548A2 Method of forming lead-free bump interconnections
10/24/2001	EP1148546A1 Method for alignment of structures on a semiconductor substrate
10/24/2001	EP1148545A2 Dynamic random access memory
10/24/2001	EP1148544A1 Method for thinning a substrate
10/24/2001	EP1148543A2 Semiconductor device and process of manufacturing the same
10/24/2001	EP1148542A2 Process for the fabrication of an interconnection level in a semiconductor chip having an antifuse
10/24/2001	EP1148541A1 Method and apparatus for conditioning an electrostatic chuck
10/24/2001	EP1148540A2 Method and device for attaching a semiconductor chip to a chip carrier
10/24/2001	EP1148539A2 Method of depositing low K films using an oxidizing plasma
10/24/2001	EP1148538A1 Cmp abrasive, liquid additive for cmp abrasive and method for polishing substrate
10/24/2001	EP1148537A2 Method for forming an integrated barrier/plug for a stacked capacitor
10/24/2001	EP1148536A2 Support device for a wafer shipping container
10/24/2001	EP1148535A2 Dry etching method and apparatus, and fabrication method for semiconductor device
10/24/2001	EP1148533A2 Method and apparatus for cleaning parts of a deposition system or etching wafers
10/24/2001	EP1148513A1 Operation method for ferroelectric memory
10/24/2001	EP1148511A2 MRAM memory
10/24/2001	EP1148510A2 Integrated semiconductor memory, especially semiconductor memory device and operating method thereof
10/24/2001	EP1148440A1 Semiconductor device and production method thereof
10/24/2001	EP1148402A1 Semiconductor manufacturing apparatus and method for controlling the operating condition parameter
10/24/2001	EP1148390A2 Mark independent alignment sensor
10/24/2001	EP1148388A1 Pattern formation material and pattern formation method

1 ... 5234 5235 5236 5237 5238 5239 5240 5241 5242 5243 5244 5245 5246 5247 5248 5249 5250 5251 5252 5253 5254 ... 6590