Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2001
11/06/2001US6313648 Method for quantitating impurity concentration in a semiconductor device
11/06/2001US6313622 Power source voltage controller
11/06/2001US6313596 Detection system for substrate clamp
11/06/2001US6313583 Plasma processing apparatus and method
11/06/2001US6313567 Lithography chuck having piezoelectric elements, and method
11/06/2001US6313540 Electrode structure of semiconductor element
11/06/2001US6313539 Semiconductor memory device and production method of the same
11/06/2001US6313538 Semiconductor device with partial passivation layer
11/06/2001US6313537 Semiconductor device having multi-layered pad and a manufacturing method thereof
11/06/2001US6313536 Semicoductor device having a multilayered interconnection structure
11/06/2001US6313535 Wiring layer of a semiconductor integrated circuit
11/06/2001US6313534 Ohmic electrode, method and multi-layered structure for making same
11/06/2001US6313533 Function element, substrate for mounting function element thereon, and method of connecting them to each other
11/06/2001US6313531 Coaxial integrated circuitry interconnect lines, and integrated circuitry
11/06/2001US6313529 Bump bonding and sealing a semiconductor device with solder
11/06/2001US6313528 Compliant multichip package
11/06/2001US6313526 Semiconductor apparatus, Including thin film belt-like insulating tape
11/06/2001US6313525 Hollow package and method for fabricating the same and solid-state image apparatus provided therewith
11/06/2001US6313523 IC die power connection using canted coil spring
11/06/2001US6313522 Semiconductor structure having stacked semiconductor devices
11/06/2001US6313521 Semiconductor device and method of manufacturing the same
11/06/2001US6313520 Resin-sealed power semiconductor device including substrate with all electronic components for control circuit mounted thereon
11/06/2001US6313518 Porous silicon oxycarbide integrated circuit insulator
11/06/2001US6313517 With connecting layer of homopolymerized benzocyclobutene
11/06/2001US6313516 Method for making high-sheet-resistance polysilicon resistors for integrated circuits
11/06/2001US6313515 Reference voltage supply circuit
11/06/2001US6313513 AC switch device used for switching AC circuit and AC switch circuit having the AC switch device
11/06/2001US6313512 Low source inductance compact FET topology for power amplifiers
11/06/2001US6313511 Semiconductor device
11/06/2001US6313510 Integrated circuits including metal silicide contacts extending between a gate electrode and a source/drain region
11/06/2001US6313508 Semiconductor device of high-voltage CMOS structure and method of fabricating same
11/06/2001US6313507 SOI semiconductor device capable of preventing floating body effect
11/06/2001US6313505 Method for forming shallow source/drain extension for MOS transistor
11/06/2001US6313504 Vertical MOS semiconductor device
11/06/2001US6313502 Semiconductor device comprising a non-volatile memory which is erasable by means of UV irradiation
11/06/2001US6313500 Split gate memory cell
11/06/2001US6313498 Flash memory cell with thin floating gate with rounded side wall, and fabrication process
11/06/2001US6313497 Semiconductor device and method for manufacturing the same
11/06/2001US6313496 Capacitor and method of forming a capacitor
11/06/2001US6313495 Stack capacitor with improved plug conductivity
11/06/2001US6313494 Semiconductor device having a selectively-grown contact pad
11/06/2001US6313492 Integrated circuit chip produced by using frequency doubling hybrid photoresist
11/06/2001US6313491 Semiconductor memory having cell including transistor and ferroelectric capacitor
11/06/2001US6313490 Base current reversal SRAM memory cell and method
11/06/2001US6313489 Lateral thin-film silicon-on-insulator (SOI) device having a lateral drift region with a retrograde doping profile, and method of making such a device
11/06/2001US6313488 Bipolar transistor having a low doped drift layer of crystalline SiC
11/06/2001US6313469 Substrate handling apparatus and ion implantation apparatus
11/06/2001US6313466 Method for determining nitrogen concentration in a film of nitrided oxide material
11/06/2001US6313443 Apparatus for processing material at controlled temperatures
11/06/2001US6313441 Control system and method for providing variable ramp rate operation of a thermal cycling system
11/06/2001US6313430 Plasma processing apparatus and plasma processing method
11/06/2001US6313411 Wafer level contact sheet and method of assembly
11/06/2001US6313402 Stress relief bend useful in an integrated circuit redistribution patch
11/06/2001US6313327 Carboxylic acid derivatives and their synthesis method
11/06/2001US6313233 Can be cured and fabricated without producing no cracks into a cured product such as a semiconductor device having a low dielectric constant, high heat resistance and moisture resistance, superior adhesion to various substrate materials
11/06/2001US6313048 Dilute cleaning composition and method for using same
11/06/2001US6313047 Mixing organic tantalum and oxidizing agent in two different batches, adsorbing onto surface of target substrate first and second layers of tantalum oxide
11/06/2001US6313046 Method of forming materials between conductive electrical components, and insulating materials
11/06/2001US6313044 Methods for forming a spin-on-glass layer
11/06/2001US6313042 Cleaning contact with successive fluorine and hydrogen plasmas
11/06/2001US6313040 Process for the definition of openings in a dielectric layer
11/06/2001US6313039 Chemical mechanical polishing composition and process
11/06/2001US6313038 Method and apparatus for controlling chemical interactions during planarization of microelectronic substrates
11/06/2001US6313037 Semiconductor device and method for manufacturing the same
11/06/2001US6313036 Method for producing semiconductor device
11/06/2001US6313035 Chemical vapor deposition using organometallic precursors
11/06/2001US6313034 Method for forming integrated circuit device structures from semiconductor substrate oxidation mask layers
11/06/2001US6313033 Ionized metal plasma Ta, TaNx, W, and WNx liners for gate electrode applications
11/06/2001US6313032 Method for manufacturing a salicide transistor, semiconductor storage, and semiconductor device
11/06/2001US6313031 Method of fabricating a contract structure having a composite barrier layer between a platinum layer and a polysilicon plug
11/06/2001US6313030 Method of making a conductive layer covering a hole of decreasing diameter in an insulation layer in a semiconductor device
11/06/2001US6313029 Method for forming multi-layer interconnection of a semiconductor device
11/06/2001US6313028 Method of fabricating dual damascene structure
11/06/2001US6313027 Method for low thermal budget metal filling and planarization of contacts vias and trenches
11/06/2001US6313026 Microelectronic contacts and methods for producing same
11/06/2001US6313025 Process for manufacturing an integrated circuit including a dual-damascene structure and an integrated circuit
11/06/2001US6313024 Method for forming a semiconductor device
11/06/2001US6313023 Method of fabricating deflection aperture array for electron beam exposure apparatus, wet etching method and apparatus for fabricating the aperture array, and electron beam exposure apparatus having the aperture array
11/06/2001US6313022 Recessed-container cells and method of forming the same
11/06/2001US6313021 PMOS device having a layered silicon gate for improved silicide integrity and enhanced boron penetration resistance
11/06/2001US6313020 Semiconductor device and method for fabricating the same
11/06/2001US6313019 Y-gate formation using damascene processing
11/06/2001US6313018 Process for fabricating semiconductor device including antireflective etch stop layer
11/06/2001US6313017 Plasma enhanced CVD process for rapidly growing semiconductor films
11/06/2001US6313016 Method for producing epitaxial silicon germanium layers
11/06/2001US6313014 Semiconductor substrate and manufacturing method of semiconductor substrate
11/06/2001US6313013 Method and device for processing semiconductor material
11/06/2001US6313012 Method of fabricating multi-layered structure having single crystalline semiconductor film formed on insulator
11/06/2001US6313011 Method for suppressing narrow width effects in CMOS technology
11/06/2001US6313010 Integrated circuit insulator and method
11/06/2001US6313009 Fabrication method of semiconductor memory device with impurity regions surrounding recess
11/06/2001US6313008 Method to form a balloon shaped STI using a micro machining technique to remove heavily doped silicon
11/06/2001US6313007 Semiconductor device, trench isolation structure and methods of formations
11/06/2001US6313006 Method of field implantation
11/06/2001US6313005 Method of manufacturing semiconductor device
11/06/2001US6313004 Method for manufacturing semiconductor devices
11/06/2001US6313003 Fabrication process for metal-insulator-metal capacitor with low gate resistance
11/06/2001US6313001 Method for semiconductor manufacturing
11/06/2001US6313000 Process for formation of vertically isolated bipolar transistor device
11/06/2001US6312999 Method for forming PLDD structure with minimized lateral dopant diffusion