Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2001
11/15/2001US20010041455 Method of manufacturing semiconductor device
11/15/2001US20010041453 Process for patterning conductive line without after-corrosion
11/15/2001US20010041450 Forming resist mask on silicon oxide film on silicon nitride film having step portion on semiconductor substrate in such way as to have opening above step portion and etching film through opening by plasma etching with fluorohydrocarbon gas
11/15/2001US20010041449 Method and apparatus for plasma etching
11/15/2001US20010041447 Method and system for copper interconnect formation
11/15/2001US20010041446 Precision polishing apparatus for polishing semiconductor substrate
11/15/2001US20010041444 Tin contact barc for tungsten polished contacts
11/15/2001US20010041442 Fabrication process of semiconductor device with titanium film.
11/15/2001US20010041441 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organic precursor compounds
11/15/2001US20010041440 Semiconductor device and method for manufacturing semiconductor devices
11/15/2001US20010041439 Low temperature reflow method for filling high aspect ratio contacts
11/15/2001US20010041438 Semiconductor device and method of manufacturing the same
11/15/2001US20010041437 Method of locating conductive spheres utilizing screen and hopper of solder balls
11/15/2001US20010041436 Techniques for triple and quadruple damascene fabrication
11/15/2001US20010041435 Formation of micro rough poly surface for low sheet resistance salicided sub-quarter micron poly lines
11/15/2001US20010041434 Method of manufacturing non-volatile semiconductor memory device storing charge in gate insulating layer therein
11/15/2001US20010041433 Method for doping spherical semiconductors
11/15/2001US20010041432 Ultra-shallow semiconductor junction formation
11/15/2001US20010041431 Semiconductor device with transparent link area for silicide applications and fabrication thereof
11/15/2001US20010041427 Etching underlying gallium nitride layer on sapphire substrate to selectively expose sapphire substrate and define post and trench in underlying gallium nitride layer, and laterally growing sidewall of post into trench
11/15/2001US20010041426 System for providing a continuous motion sequential lateral solidification
11/15/2001US20010041425 Semiconductor wafer and method for manufacturing semiconductor devices
11/15/2001US20010041424 Semiconductor device and a method of manufacturing the same
11/15/2001US20010041423 Method for transferring porous layer, method for making semiconductor devices, and method for making solar battery
11/15/2001US20010041422 Method of forming a device separation region
11/15/2001US20010041421 Prevents a hump phenomenon and an inverse narrow width effect of transistors by rounding the top edges of a trench and increasing the amount of oxidation at the top edges of a trench
11/15/2001US20010041420 Forming trench within substrate, forming first layer comprising silanol to partially fill trench, converting silanol to a compound comprising silicon oxide or organosilicon compound
11/15/2001US20010041419 Method for fabrication semiconductor device having trench isolation structure
11/15/2001US20010041417 Aligning method, exposure apparatus using this aligning method, and semiconductor device manufacturing method utilizing this exposure apparatus
11/15/2001US20010041416 Method of fabricating semiconductor device
11/15/2001US20010041415 Methods of forming capacitors
11/15/2001US20010041413 Method of manufacturing electronic component having capacitor element and resistor element, method of manufacturing semiconductor device, and semiconductor device
11/15/2001US20010041412 Method of manufacturing a semiconductor device
11/15/2001US20010041411 Semiconductor device having improved parasitic capacitance and mechanical strength
11/15/2001US20010041410 Method for production and formation of semiconductor light emitting diodes
11/15/2001US20010041409 Method for forming a spacer for semiconductor manufacture
11/15/2001US20010041407 Trench-gate semiconductor devices
11/15/2001US20010041406 Method of producing electrodes of a micromechanical or microelectronic device
11/15/2001US20010041405 Semiconductor memory device and method of manufacturing the same
11/15/2001US20010041404 Semiconductor memory device and method of fabricating the same
11/15/2001US20010041403 Methods of forming materials comprising tungsten and nitrogen
11/15/2001US20010041402 Method for manufacturing semiconductor memory and method for manufacturing capacitor
11/15/2001US20010041401 Open pattern inductor
11/15/2001US20010041400 Angle implant process for cellular deep trench sidewall doping
11/15/2001US20010041398 Partially removable spacer with salicide formation
11/15/2001US20010041397 Semiconductor manufacturing method
11/15/2001US20010041396 Method of manufacturing gate insulated field effect transistors
11/15/2001US20010041395 Planar substrate with patterned silicon-on- insulator region and self-aligned trench
11/15/2001US20010041394 Photolithography system and a method for fabricating a thin film transistor array substrate using the same
11/15/2001US20010041393 Process of forming a thick oxide field effect transistor
11/15/2001US20010041392 Semiconductor device and manufacturing method thereof
11/15/2001US20010041391 Polycrystal thin film forming method and forming system
11/15/2001US20010041387 Semiconductor wafer dividing method
11/15/2001US20010041386 Method of manufacturing semiconductor devices and semiconductor devices made according to the method
11/15/2001US20010041385 Plated leadframes with cantilevered leads
11/15/2001US20010041384 Method of producing semiconductor device and configuration thereof, and lead frame used in said method
11/15/2001US20010041383 Center bond flip-chip semiconductor device and method of making it
11/15/2001US20010041382 Resin encapsulated electrode structure of a semiconductor device, mounted semiconductor devices, and semiconductor wafer including multiple electrode structures
11/15/2001US20010041381 Method for manufacturing digital micro-mirror device (DMD) packages
11/15/2001US20010041377 Method of manufacturing semiconductor device
11/15/2001US20010041375 Reduction of plasma charge-induced damage in microfabricated devices
11/15/2001US20010041374 Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices
11/15/2001US20010041373 Thin film ferroelectric capacitors having improved memory retention through the use of essentially smooth bottom electrode structures
11/15/2001US20010041372 Method for fabricating ferroelectric field effect transistor
11/15/2001US20010041341 Bioarray chip reaction apparatus and its manufacture
11/15/2001US20010041311 Scrubbing unit
11/15/2001US20010041310 Semiconductor; masking substrate with photoresist; patterning; exposure; development
11/15/2001US20010041309 Semiconductors
11/15/2001US20010041308 Integrated circuits
11/15/2001US20010041303 Mixture of polymer and acid generators
11/15/2001US20010041302 Copolymer
11/15/2001US20010041257 Ultrafine particle structure and production method thereof
11/15/2001US20010041250 Graded thin films
11/15/2001US20010041229 Film forming method and film forming apparatus
11/15/2001US20010041218 High rate silicon nitride deposition method at low pressures
11/15/2001US20010041129 Articulated robot
11/15/2001US20010041122 Single wafer load lock with internal wafer transport
11/15/2001US20010041121 Single chamber vacuum processing tool
11/15/2001US20010041120 Substrate processing apparatus with vertically stacked load lock and substrate transport robot
11/15/2001US20010041119 Processing system and device manufacturing method using the same
11/15/2001US20010041118 Wafer boat support and method for twin tower wafer boat loader
11/15/2001US20010041076 Parts maintenance managing system
11/15/2001US20010041057 Optical disc, recording apparatus, and computer-readable recording medium
11/15/2001US20010040835 Semiconductor integrated circuit device
11/15/2001US20010040834 Semiconductor integrated circuit device having a hierarchical power source configuration
11/15/2001US20010040831 Dual floating gate programmable read only memory cell structure and method for its fabrication and operation
11/15/2001US20010040829 Semiconductor integrated circuit device capable of performing operational test for contained memory core at operating frequency higher than that of memory tester
11/15/2001US20010040822 Nonvolatile semiconductor memory
11/15/2001US20010040819 Magnetoresistive device and magnetic memory using the same
11/15/2001US20010040817 SRAM having a reduced chip area
11/15/2001US20010040814 Semiconductor memory device
11/15/2001US20010040791 Mounting structure and method of mounting semiconductor device
11/15/2001US20010040778 Limiting magnetoresistive electrical interaction to a preferred portion of a magnetic region in magnetic devices
11/15/2001US20010040722 Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
11/15/2001US20010040674 Projection exposure method and apparatus
11/15/2001US20010040664 Tape carrier package and display device using the same
11/15/2001US20010040663 Thin film transistor array substrate for a liquid crystal display and method for fabricating the same
11/15/2001US20010040649 Manufacturing method of a liquid crystal display
11/15/2001US20010040648 Liquid crystal display device and fabrication method thereof
11/15/2001US20010040646 Liquid crystal display apparatus and production method thereof