| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 11/29/2001 | US20010045590 Nonvolatile semiconductor memory device and process for producing the same |
| 11/29/2001 | US20010045589 Semiconductor device with memory and logic cells |
| 11/29/2001 | US20010045587 Semiconductor memory device and fabrication method thereof |
| 11/29/2001 | US20010045586 Method and device for improved salicide resistance on polysilicon gates |
| 11/29/2001 | US20010045585 Non-volatile semiconductor memory device and method of manufacturing the same |
| 11/29/2001 | US20010045583 Semiconductor memory device capable of performing stable operation for noise while preventing increase in chip area |
| 11/29/2001 | US20010045580 Image sensor with a photodiode array |
| 11/29/2001 | US20010045578 Semiconductor device |
| 11/29/2001 | US20010045572 Semiconductor interated circuit and method of manufacturing the same |
| 11/29/2001 | US20010045571 Cell architecture with local interconnect and method for making same |
| 11/29/2001 | US20010045569 Potential detector and semiconductor integrated circuit |
| 11/29/2001 | US20010045566 Semiconductor device and manufacturing method thereof |
| 11/29/2001 | US20010045563 Method for producing insulated gate thin film semiconductor device |
| 11/29/2001 | US20010045561 Nitride based semiconductor light emitting element |
| 11/29/2001 | US20010045559 Semiconductor device and method of fabricating the same |
| 11/29/2001 | US20010045558 Semiconductor device and a method of manufacturing the same |
| 11/29/2001 | US20010045557 Semiconductor device and method of manufacturing the same |
| 11/29/2001 | US20010045528 Electrostatic deflector for electron beam exposure apparatus |
| 11/29/2001 | US20010045527 Electron-beam cured polymer mask for DRIE micro-machining |
| 11/29/2001 | US20010045526 Stage device for an exposure apparatus and semiconductor device manufacturing method wich uses said stage device |
| 11/29/2001 | US20010045524 Process for precise arrangement of micro-bodies |
| 11/29/2001 | US20010045511 Method for sample separation and lift-out |
| 11/29/2001 | US20010045443 Controlled attenuation capillary |
| 11/29/2001 | US20010045419 Laser system and method for single pass micromachining of multilayer workpieces |
| 11/29/2001 | US20010045417 Implementation of laser technology |
| 11/29/2001 | US20010045360 Electroplating method using combination of vibrational flow in plating bath and plating current of pulse |
| 11/29/2001 | US20010045354 Method of etching high aspect ratio openings in silicon |
| 11/29/2001 | US20010045269 Cooling disk unit for use in a wafer chucking device |
| 11/29/2001 | US20010045234 Water tank, cooling tower including the same and method of manufacturing semiconductor device |
| 11/29/2001 | US20010045224 Substrate processing apparatus and substrate processing method |
| 11/29/2001 | US20010045223 Semiconductor wafer cleaning apparatus and method of using the same |
| 11/29/2001 | US20010045174 Container for conveying flat objects |
| 11/29/2001 | US20010045012 Angled flying lead wire bonding process |
| 11/29/2001 | US20010044999 Method for sealing and/or joining an end of a ceramic filter |
| 11/29/2001 | US20010044979 Apparatus for processing a wafer |
| 11/29/2001 | EP1144523A3 Preparations containing fine-particulate inorganic oxides |
| 11/29/2001 | DE10125750A1 Halbleiterschaltungsanordnung und Verfahren zu deren Herstellung A semiconductor circuit arrangement, and processes for their preparation |
| 11/29/2001 | DE10119411A1 Self-aligning double gate MOSFET with separate gates has channel region, first gate above channel region, second gate below channel region; gates are electrically mutually isolated |
| 11/29/2001 | DE10119047A1 Temperature measurement in semiconductor device manufacture, involves determining radiant light intensity and correction factors corresponding to various optical losses, which are then substituted in specific formula |
| 11/29/2001 | DE10110697A1 Vorrichtung und Verfahren zum Züchten von Halbleitereinkristallen An apparatus and method for growing semiconductor single crystals |
| 11/29/2001 | DE10025833A1 Halbleiterschichtsystem und Verfahren zur Herstellung von einem Halbleiterschichtsystem mit erhöhter Resistenz gegen thermische Prozessierung Semiconductor layer system and method for the production of a semiconductor layer system with an increased resistance to thermal processing |
| 11/29/2001 | DE10025550A1 Plasma etching process used in the production of Fe-RAMs comprises applying a polyimide mask before the structure is etched |
| 11/29/2001 | DE10025346A1 Amorphous and/or polycrystalline growth for a composite semiconductor based comprises growing a first composite semiconductor layer in the gas phase on a substrate |
| 11/29/2001 | DE10025289A1 Inductances have windings that windings that are not wound but produced e.g. by diffusion or implantation then divided, mounted around ferromagnetic circuit and recombined |
| 11/29/2001 | DE10024883A1 Plasmaätzanlage Plasma etching |
| 11/29/2001 | DE10024876A1 Vertikaler Transistor Vertical transistor |
| 11/29/2001 | DE10024874A1 Polierflüssigkeit und Verfahren zur Strukturierung von Metallen und Metalloxiden Polishing liquid and method for patterning of metals and metal oxides |
| 11/29/2001 | DE10024858A1 Holder for wafer has ring element and at least one holding ring for insertion into ring element, whereby wafer can be positioned inside ring element by holding ring |
| 11/29/2001 | DE10024857A1 Production of a partially single crystalline silicon carbide layer in a silicon wafer comprises preparing a silicon wafer, implanting carbon ions into the wafer by ion implantation, and subjecting the wafer to a thermal radiation source |
| 11/29/2001 | DE10024709A1 Lamp for thermal treatment of substrates has at least two filaments, each with at least one winding section extending along longitudinal lamp axis and arranged adjacent to other filament |
| 11/29/2001 | DE10024699A1 Plasmaätzanlage Plasma etching |
| 11/29/2001 | DE10024111A1 Verfahren zur Herstellung eines Bauelements aus übereinander gestapelten miteinander verlöteten Platten A method for producing a component of stacked plates soldered together |
| 11/29/2001 | DE10023539A1 Verfahren zum Herstellen eines Bauteils A method for manufacturing a component |
| 11/29/2001 | DE10023012A1 Silicon wafer used in the production of electronic components has crystal-originated particles in its surface which change in morphology in such a way that there is no destructive influence on the gate oxide material |
| 11/29/2001 | DE10023002A1 Verfahren zur beidseitigen Politur von Halbleiterscheiben und Läuferscheiben zur Durchführung des Verfahrens Method for two-sided polishing of semiconductor wafers and rotor disks for performing the method |
| 11/29/2001 | DE10022384A1 Production of a power diode used in a semiconductor component comprises carrying out the steps of forming the carbon-hydrogen layer and etching the carbon-hydrogen layer in the same apparatus |
| 11/29/2001 | DE10007642A1 Separating substrate with defined preferred break points involves applying separating blade to preferred break points with substrate held on rubber mat by suction |
| 11/29/2001 | DE10004387A1 CMOS compatible lateral DMOS transistor has drift space region depleted of free charge carriers if drain voltage lower than gate isolator breakdown voltage |
| 11/29/2001 | CA2408959A1 Method for making an extreme ultraviolet microlithography transmission modulator and resulting modulator |
| 11/28/2001 | EP1158629A2 Laser oscillation apparatus |
| 11/28/2001 | EP1158584A2 Semiconductor device having semiconductor resistance element and fabrication method thereof |
| 11/28/2001 | EP1158582A1 Pin diode with insulated gate and manufacturing method thereof |
| 11/28/2001 | EP1158581A1 Method for manufacturing soi wafer, and soi wafer |
| 11/28/2001 | EP1158580A2 Method of crystallizing a silicon layer |
| 11/28/2001 | EP1158579A1 Wire bonding capillary for forming bump electrodes |
| 11/28/2001 | EP1158578A1 Bump electrode on an integrated circuit and manufacturing method thereof |
| 11/28/2001 | EP1158577A2 Method for forming an insulating film with low dielectric constant |
| 11/28/2001 | EP1158576A2 Method for etching a compound metal oxide film and processing apparatus |
| 11/28/2001 | EP1158575A2 Method for fabricating a semiconductor device including a step of etching an organic film to form a pattern |
| 11/28/2001 | EP1158574A1 Ultraviolet radiation producing apparatus |
| 11/28/2001 | EP1158573A1 Method and apparatus for forming interconnection |
| 11/28/2001 | EP1158572A1 Implantation method for forming an integrated circuit with two sorts of MOSFETs on a substrate |
| 11/28/2001 | EP1158571A2 Carrier shape measurement device |
| 11/28/2001 | EP1158570A1 Vertical interconnect process for silicon segments |
| 11/28/2001 | EP1158569A2 Heater sealed with carbon wire heating element |
| 11/28/2001 | EP1158568A2 Plasma assisted semiconductor substrate processing chamber |
| 11/28/2001 | EP1158565A2 Toroidal plasma source for plasma processing |
| 11/28/2001 | EP1158538A2 Method for reading electrical fuses and antifuses |
| 11/28/2001 | EP1158529A1 Memory-logic semiconductor device |
| 11/28/2001 | EP1158528A1 Semiconductor device with memory and logic cells |
| 11/28/2001 | EP1158524A1 Semiconductor memory device having a boosted voltage generating circuit |
| 11/28/2001 | EP1158363A1 Positive resist composition and onium salts of saccharin derivatives |
| 11/28/2001 | EP1158361A1 Photomask, method for manufacturing the same, projection aligner using the photomask, and projection exposing method |
| 11/28/2001 | EP1158340A2 High-frequency circuit and its module for communication devices |
| 11/28/2001 | EP1158317A1 Echelle grating and use of an echelle grating |
| 11/28/2001 | EP1158302A2 Method and apparatus for probing a conductor of an array of closely-spaced conductors |
| 11/28/2001 | EP1158291A1 Ellipsometric metrology method and apparatus for samples contained in a chamber or the like |
| 11/28/2001 | EP1158257A1 Method and device for drying substrate |
| 11/28/2001 | EP1158073A1 Plating method, wiring forming method and devices therefor |
| 11/28/2001 | EP1158071A2 Method for depositing a layer on a surface of a substrate |
| 11/28/2001 | EP1158008A2 Curable hybrid electron donor compounds containing vinyl ether |
| 11/28/2001 | EP1157783A2 Polishing method and polishing apparatus |
| 11/28/2001 | EP1157782A2 Polishing apparatus |
| 11/28/2001 | EP1157598A1 Method and apparatus for deposition of diamond-like carbon coatings from a hall-current ion source |
| 11/28/2001 | EP1157597A1 Method of generating euv radiation, method of manufacturing a device by means of said radiation, euv radiation source unit, and lithographic projection apparatus provided with such a radiation source unit |
| 11/28/2001 | EP1157596A1 Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
| 11/28/2001 | EP1157595A1 Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
| 11/28/2001 | EP1157467A1 Electronic component with reduced inductive coupling |
| 11/28/2001 | EP1157460A1 Surface wave device connected to a base with conductive adhesive |
| 11/28/2001 | EP1157454A1 Power supply with flux-controlled transformer |