| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 12/06/2001 | US20010048124 Solid-state image pickup device and a method of producing the same |
| 12/06/2001 | US20010048120 Heterojunction bipolar transistor composed of emitter layer which includes orderly structured layer and disorderly structured layer |
| 12/06/2001 | US20010048119 Semiconductor device and method of manufacturing the same |
| 12/06/2001 | US20010048118 Semiconductor photodetection device and fabrication process thereof |
| 12/06/2001 | US20010048117 Differential negative resistance element and process for fabricating the same |
| 12/06/2001 | US20010048116 Chip scale surface mounted device and process of manufacture |
| 12/06/2001 | US20010048115 Semiconductor device and method of manufacturing the same |
| 12/06/2001 | US20010048109 Electro-optical device, method for fabricating the same, and electronic apparatus |
| 12/06/2001 | US20010048108 Thin-film semiconductor integrated circuit device and picture display device with using thereof and manufacturing method thereof |
| 12/06/2001 | US20010048106 Electronic device and method of driving the same |
| 12/06/2001 | US20010048105 Semiconductor device |
| 12/06/2001 | US20010048104 Semiconductor device and method of manufacturing the same |
| 12/06/2001 | US20010048095 Method for improving thermal stability of fluorinated amorphous carbon low dielectric constant materials |
| 12/06/2001 | US20010048084 Exposure apparatus, device manufacturing method, semiconductor manufacturing plant and method of maintaining exposure apparatus |
| 12/06/2001 | US20010048064 Electronic device and production process of same |
| 12/06/2001 | US20010048017 Continuous mode solder jet apparatus |
| 12/06/2001 | US20010048014 Method of producing a semiconductor device |
| 12/06/2001 | US20010047990 Flash anneal |
| 12/06/2001 | US20010047979 Method and apparatus for increased workpiece throughput |
| 12/06/2001 | US20010047978 Using plates which rotate in opposite directions and are covered with polishing cloth, so that at least 2 mu m of semiconductor material is removed; accuracy |
| 12/06/2001 | US20010047944 Means for holding plurality of wafers and rotating each wafer at constant speed and synchronous within the plurality for electroless plating of bondable metal caps onto bond pads of integrated corcuits having copper metallization |
| 12/06/2001 | US20010047943 Soluble copper salt, electrolyte, one or more brightener compounds that are present in a concentration of at least about 1.5 mg per liter of electroplating composition; increased brightener levels |
| 12/06/2001 | US20010047932 Depositing barrier, wetting layer, vapor depositing conformal metal layer over surface, filling apertures with metals; void-free |
| 12/06/2001 | US20010047880 Double sided flexible circuit for integrated circuit packages and method of manufacture |
| 12/06/2001 | US20010047864 Temperature control apparatus and method with recirculated coolant |
| 12/06/2001 | US20010047849 Apparatus and method for fabricating semiconductor device |
| 12/06/2001 | US20010047821 Apparatus for supplying chemical |
| 12/06/2001 | US20010047817 Wafer cleaning device and tray for use in wafer cleaning device |
| 12/06/2001 | US20010047815 Method for treating substrates |
| 12/06/2001 | US20010047812 Spraying nozzles |
| 12/06/2001 | US20010047810 For semiconductor wafers |
| 12/06/2001 | US20010047764 Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors |
| 12/06/2001 | US20010047762 Processing apparatus |
| 12/06/2001 | US20010047761 Vertical oven with a boat for the uniform treatment of wafers |
| 12/06/2001 | US20010047760 Apparatus and method for multi-zone high-density inductively-coupled plasma generation |
| 12/06/2001 | US20010047759 Plasma CVD apparatus |
| 12/06/2001 | US20010047757 System for processing a workpiece |
| 12/06/2001 | US20010047756 Gas distribution system |
| 12/06/2001 | US20010047753 Treatment solution discharge apparatus |
| 12/06/2001 | US20010047752 System for processing a workpiece |
| 12/06/2001 | US20010047751 Method of producing device quality (a1) ingap alloys on lattice-mismatched substrates |
| 12/06/2001 | US20010047750 Apparatus and method for depositing semiconductor film |
| 12/06/2001 | US20010047749 Apparatus and method of growing single crystal of semiconductor |
| 12/06/2001 | US20010047595 Apparatus and method for drying a substrate using hydrophobic and polar organic compounds |
| 12/06/2001 | US20010047590 Method of manufacturing a heat pipe construction |
| 12/06/2001 | EP1145299A3 Manufacture of trench-gate semiconductor devices |
| 12/06/2001 | DE19907276C2 Verfahren zur Herstellung einer Lötverbindung zwischen einem elektrischen Bauelement und einem Trägersubstrat A process for producing a solder connection between an electrical component and a carrier substrate |
| 12/06/2001 | DE10125339A1 Semiconductor device used as a bipolar transistor comprises a silicon substrate, a first silicon film, a silicon-germanium, a second silicon film, a third silicon film, and electrodes |
| 12/06/2001 | DE10125035A1 Halbleiterbauteil Semiconductor device |
| 12/06/2001 | DE10124741A1 Slurry used for the chemical-mechanical polishing of semiconductor components comprises water, grinding grains and a polymer additive having hydrophilic as well as hydrophobic groups |
| 12/06/2001 | DE10119490A1 Substrat-Prozessierverfahren und Substrat-Prozessiervorrichtung Prozessierverfahren substrate and substrate-Prozessiervorrichtung |
| 12/06/2001 | DE10107472A1 Bauelement für die Optoelektronik und Verfahren zu dessen Herstellung Device for optoelectronics and process for its preparation |
| 12/06/2001 | DE10058737A1 Programming flash memory module such as EEPROM by removing electrons caught in insulating layer but not in floating gate electrode of memory cells |
| 12/06/2001 | DE10057412A1 Halbleitergeräteeinkapselungsanordnung und Verfahren zu deren Hertellung Halbleitergeräteeinkapselungsanordnung and methods for their Hertel Lung |
| 12/06/2001 | DE10055280A1 Phasenverschiebungs-Photomaskenrohling, Phasenverschiebungs-Photomaske und Verfahren zur Herstellung von Halbleitervorrichtung Phase shift photomask blank and phase shift photomask process for producing semiconductor device |
| 12/06/2001 | DE10026243A1 Verfahren zum Auslesen von elektrischen Fuses/Antifuses A method for reading out electrical fuses / antifuses |
| 12/06/2001 | DE10026180A1 Apparatus for coating a semiconductor wafer in the production of microelectronics has a gas inlet system for introducing process gases into the process chamber via inlets |
| 12/06/2001 | DE10025871A1 Epitaxierte Halbleiterscheibe und Verfahren zu ihrer Herstellung Epitaxially coated semiconductor wafer, and processes for their preparation |
| 12/06/2001 | DE10025567A1 Production of deep-doped regions of one conductivity type in a semiconductor body with conductivity of the opposite type comprises inserting protons or hydrogen atoms in the direction of the current flow between the electrodes |
| 12/06/2001 | DE10025214A1 Littrow-Gitter sowie Verwendungen eines Littrow-Gitters Littrow grating, as well as uses of a Littrow grating |
| 12/06/2001 | DE10016340C1 Fabrication of deep trench in semiconductor substrate during e.g., fabrication of deep-trench type capacitor utilizes plasma etching composition comprising hydrogen bromide, nitrogen fluoride, chlorine gas, and helium/oxygen gas mixture |
| 12/06/2001 | DE10006378C2 Verfahren zur Herstellung Ohmscher Kontakte auf Siliziumkarbid-Halbleiterbereichen A process for producing ohmic contacts on silicon carbide semiconductor regions |
| 12/06/2001 | CA2409156A1 Method for depositing a selected thickness of an interlevel dielectric material to achieve optimum global planarity on a semiconductor wafer |
| 12/05/2001 | EP1160882A2 A photonic device, a substrate for fabricating a photonic device, a method for fabricating the photonic device and a method for manufacturing the photonic device-fabricating substrate |
| 12/05/2001 | EP1160880A2 Apparatus and processes for the mass production of photovoltaic modules |
| 12/05/2001 | EP1160879A2 Method of forming silicon-based thin film, silicon-based thin film and photovoltaic element |
| 12/05/2001 | EP1160877A2 Photovoltaic element and method of manufacturing the same |
| 12/05/2001 | EP1160872A2 Trenched semiconductor device |
| 12/05/2001 | EP1160871A2 Charge compensation semiconductor device and method of making the same |
| 12/05/2001 | EP1160870A2 Oriented rhombohedral composition of PbZr1-xTix03 thin films for low voltage operation ferroelectric ram |
| 12/05/2001 | EP1160864A2 Semiconductor device with a corrosion resistant bonding pad and manufacturing method thereof |
| 12/05/2001 | EP1160860A1 Heat sink material and method of manufacturing the heat sink material |
| 12/05/2001 | EP1160858A2 A board for manufacturing a bga and method of manufacturing semiconductor device using thereof |
| 12/05/2001 | EP1160857A2 Epoxy-based adhesive for mounting a semiconductor device on a substrate |
| 12/05/2001 | EP1160856A2 Flip chip type semiconductor device and method of manufacturing the same |
| 12/05/2001 | EP1160855A2 Memory cell with a trench capacitor and method for its manufacture |
| 12/05/2001 | EP1160854A1 Method of electrically contacting the reverse side of a semiconductor substrate during processing |
| 12/05/2001 | EP1160853A2 Method of producing a semiconductor device |
| 12/05/2001 | EP1160852A2 Method of fabricating a trenched semiconductor device |
| 12/05/2001 | EP1160851A2 Method for fabricating a multilayer semiconductor device |
| 12/05/2001 | EP1160850A2 Bipolar transistor and method for manufacturing same |
| 12/05/2001 | EP1160849A2 Method of anisotropic plasma etching using non-chlorofluorocarbon, fluorine-based chemistry |
| 12/05/2001 | EP1160848A2 Composition for silica-based film formation |
| 12/05/2001 | EP1160847A2 Method of forming oxynitride film and system for carrying out the same |
| 12/05/2001 | EP1160846A2 Method of application of electrical biasing to enhance metal deposition |
| 12/05/2001 | EP1160845A2 Method for fabricating a silicon carbide semiconductor device |
| 12/05/2001 | EP1160844A2 Memory cell arrangement |
| 12/05/2001 | EP1160843A1 Planarizing anti-reflective coating layer with improved light absorption |
| 12/05/2001 | EP1160842A2 Integrated radio frequency circuits |
| 12/05/2001 | EP1160841A2 Integrated inductive circuits |
| 12/05/2001 | EP1160840A2 Container for conveying flat objects |
| 12/05/2001 | EP1160839A2 Exposure apparatus, coating/developing apparatus, method of transferring a substrate, method of producing a device, semiconductor production factory, and method of maintaining an exposure apparatus |
| 12/05/2001 | EP1160838A2 Heat treatment system and method |
| 12/05/2001 | EP1160837A2 Substrate processing apparatus and substrate plating apparatus |
| 12/05/2001 | EP1160826A2 Coating, modification and etching of substrate surface with particle beam irradiation |
| 12/05/2001 | EP1160824A2 Illumination system for charged-particle lithography apparatus |
| 12/05/2001 | EP1160629A2 Interferometric measurement of stage position |
| 12/05/2001 | EP1160626A1 Method of detecting aberrations of an optical imaging system |
| 12/05/2001 | EP1160576A2 Contact probe and fabrication method thereof |
| 12/05/2001 | EP1160361A1 Method of manufacturing silicon carbide, silicon carbide, composite material, and semiconductor element |