Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2001
12/11/2001US6329279 Method of fabricating metal interconnect structure having outer air spacer
12/11/2001US6329278 Multiple row wire bonding with ball bonds of outer bond pads bonded on the leads
12/11/2001US6329277 Method of forming cobalt silicide
12/11/2001US6329276 Method of forming self-aligned silicide in semiconductor device
12/11/2001US6329275 Target formed by sputtering and a second element of carbon, oxygen, nitrogen and hydrogen
12/11/2001US6329274 Method of producing semiconductor device
12/11/2001US6329273 Solid-source doping for source/drain to eliminate implant damage
12/11/2001US6329272 Method and apparatus for iteratively, selectively tuning the impedance of integrated semiconductor devices using a focussed heating source
12/11/2001US6329271 Self-aligned channel implantation
12/11/2001US6329270 Laser annealed microcrystalline film and method for same
12/11/2001US6329269 Semiconductor device manufacturing with amorphous film cyrstallization using wet oxygen
12/11/2001US6329268 Semiconductor cleaning method
12/11/2001US6329267 Isolation region forming methods
12/11/2001US6329266 Methods of forming isolation trenches including damaging a trench isolation mask
12/11/2001US6329265 Method of making a semiconductor device using processing from both sides of a workpiece
12/11/2001US6329264 Method for forming a ragged polysilcon crown-shaped capacitor for a memory cell
12/11/2001US6329263 Method of forming a container capacitor structure
12/11/2001US6329262 Method for producing semiconductor integrated circuit
12/11/2001US6329261 Method for forming a shallow trench isolation structure
12/11/2001US6329259 Collector-up RF power transistor
12/11/2001US6329258 Semiconductor device and method of manufacturing the same
12/11/2001US6329257 Method for laterally peaked source doping profiles for better erase control in flash memory devices
12/11/2001US6329256 Self-aligned damascene gate formation with low gate resistance
12/11/2001US6329255 Method of making self-aligned bit-lines
12/11/2001US6329254 Memory cell of the EEPROM type having its threshold adjusted by implantation, and fabrication method
12/11/2001US6329253 Thick oxide MOS device used in ESD protection circuit
12/11/2001US6329252 Method of forming self-aligned contacts
12/11/2001US6329251 Microelectronic fabrication method employing self-aligned selectively deposited silicon layer
12/11/2001US6329250 Method of manufacturing semiconductor memory device
12/11/2001US6329249 Method for fabricating a semiconductor device having different gate oxide layers
12/11/2001US6329248 Method for making split gate flash memory cells with high coupling efficiency
12/11/2001US6329247 Nonvolatile semiconductor memory device and manufacturing method thereof
12/11/2001US6329246 Method for fabricating flash memory
12/11/2001US6329245 Flash memory array structure with reduced bit-line pitch
12/11/2001US6329244 Method of manufacturing dynamic random access memory cell
12/11/2001US6329243 Method to form crown capacitor for high density DRAM
12/11/2001US6329242 Method of fabricating a semiconductor memory device having a tree-type capacitor
12/11/2001US6329241 Methods for producing capacitor-node contact plugs of dynamic random-access memory
12/11/2001US6329240 Non-volatile memory cell and methods of fabricating and operating same
12/11/2001US6329239 Dram cell formed on an insulating layer having a vertical channel and a manufacturing method thereof
12/11/2001US6329238 Method of fabricating a memory device having a long data retention time with the increase in leakage current suppressed
12/11/2001US6329237 Method of manufacturing a capacitor in a semiconductor device using a high dielectric tantalum oxide or barium strontium titanate material that is treated in an ozone plasma
12/11/2001US6329236 Method for fabricating resistive load static random access memory device
12/11/2001US6329235 Method of performing a pocket implantation on a MOS transistor of a memory cell of a DRAM
12/11/2001US6329234 Copper process compatible CMOS metal-insulator-metal capacitor structure and its process flow
12/11/2001US6329233 Method of manufacturing photodiode CMOS image sensor
12/11/2001US6329232 Method of manufacturing a semiconductor device
12/11/2001US6329231 Distributed constant circuit with active element
12/11/2001US6329230 High-speed compound semiconductor device having an improved gate structure
12/11/2001US6329229 Method for processing semiconductor device, apparatus for processing a semiconductor and apparatus for processing semiconductor device
12/11/2001US6329228 Semiconductor device and method of fabricating the same
12/11/2001US6329227 Method of patterning organic polymer film and method for fabricating semiconductor device
12/11/2001US6329226 Method for fabricating a thin-film transistor
12/11/2001US6329225 Tight pitch gate devices with enlarged contact areas for deep source and drain terminals and method
12/11/2001US6329224 Encapsulation of microelectronic assemblies
12/11/2001US6329222 Interconnect for packaging semiconductor dice and fabricating BGA packages
12/11/2001US6329220 Packages for semiconductor die
12/11/2001US6329218 Method for forming a CMOS sensor with high S/N
12/11/2001US6329215 Gallium indium aluminum nitrides for semiconductors and metal dopes for p or n junctions
12/11/2001US6329143 Providing a substrate having surface bearing multiple copies of a protective group removable on exposure to an electric field or electric current; applying electric field or current to substrate; exposing to protected monomer, repeating
12/11/2001US6329124 Method to produce high density memory cells and small spaces by using nitride spacer
12/11/2001US6329118 Method for patterning dual damascene interconnects using a sacrificial light absorbing material
12/11/2001US6329117 Photoresist patterns, integrated circuits, acrylic ester copolymer with chromophore,
12/11/2001US6329112 Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lens
12/11/2001US6329110 Photosensitive polymer composition, method for forming relief patterns, and electronic parts
12/11/2001US6329109 Photolithography,smaller, more accurate contacts,
12/11/2001US6329106 To remove a bridge formed on a quartz substrate, implanting ga ions using focused ion beam then using blue laser
12/11/2001US6329105 Pattern formation method and apparatus using atomic beam holography technology
12/11/2001US6329088 Silicon carbide epitaxial layers grown on substrates offcut towards <1{overscore (1)}00>
12/11/2001US6329063 Method for producing high quality heteroepitaxial growth using stress engineering and innovative substrates
12/11/2001US6329062 Nanocrystals, low dielectric constant, porous binder
12/11/2001US6329050 Adhesive for electronic parts and adhesive tape for electronic parts
12/11/2001US6329017 Mesoporous silica film from a solution containing a surfactant and methods of making same
12/11/2001US6328914 Thick-film paste with insoluble additive
12/11/2001US6328905 Residue removal by CO2 water rinse in conjunction with post metal etch plasma strip
12/11/2001US6328902 Probe tip configuration and a method of fabrication thereof
12/11/2001US6328876 Providing blank of etchable semiconductor material having a first side and a second side, connecting blank to a current source, illuminating with light, immersing holding element and blank in etching solution until only first side is wetted
12/11/2001US6328872 Method and apparatus for plating and polishing a semiconductor substrate
12/11/2001US6328871 Depositing a barrier layer comprising tantalum over the surface; annealing the barrier layer to form high conductance barrier layer; depositing a seed layer over the barrier layer
12/11/2001US6328865 Method for forming a thin film of a composite metal compound and apparatus for carrying out the method
12/11/2001US6328864 Vacuum processing apparatus
12/11/2001US6328858 For semiconductor processing apparatus
12/11/2001US6328848 Apparatus for high-resolution in-situ plasma etching of inorganic and metal films
12/11/2001US6328846 Device for an etch treatment of a disk-like object
12/11/2001US6328845 Plasma-processing method and an apparatus for carrying out the same
12/11/2001US6328844 Heat-active adhesive for a connecting circuit which is used for electrically connecting circuit electrodes facing each other in pressing direction
12/11/2001US6328841 Providing silicon wafer withfully cured polyimide layer; causing water to react withpolyimide layer; causing surface of second silicon wafer to react with chlorine; treating with hydroxlyzed triethoxysilylpropanamine; connecting
12/11/2001US6328815 Multiple chamber vacuum processing system configuration for improving the stability of mark shielding process
12/11/2001US6328814 Apparatus for cleaning and drying substrates
12/11/2001US6328809 Providing system containing a vessel and object having surface; immersing object in process fluid in vessel; performing quick dump to discharge process fluid from vessel; introducing drying vapor into vessel for flowing fluid off
12/11/2001US6328806 Device for treating a band-shaped substrate with a gas
12/11/2001US6328804 Chemical vapor deposition of metals on a spherical shaped semiconductor substrate
12/11/2001US6328802 Method and apparatus for determining temperature of a semiconductor wafer during fabrication thereof
12/11/2001US6328794 Method of controlling stress in a film
12/11/2001US6328768 Can minimize number of wet units and investment cost for equipment in wet process areas and reduce the distance and time required for transferring wafers
12/11/2001US6328642 Integrated pad and belt for chemical mechanical polishing
12/11/2001US6328640 Wafer preparation apparatus including rotatable wafer preparation assemblies
12/11/2001US6328637 Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization
12/11/2001US6328634 Finishing semiconductor wafer; provide pad, scruc semicomponent wafer with pad, evaluate surace of semiconductor
12/11/2001US6328629 Method and apparatus for polishing workpiece