Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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12/11/2001 | US6329279 Method of fabricating metal interconnect structure having outer air spacer |
12/11/2001 | US6329278 Multiple row wire bonding with ball bonds of outer bond pads bonded on the leads |
12/11/2001 | US6329277 Method of forming cobalt silicide |
12/11/2001 | US6329276 Method of forming self-aligned silicide in semiconductor device |
12/11/2001 | US6329275 Target formed by sputtering and a second element of carbon, oxygen, nitrogen and hydrogen |
12/11/2001 | US6329274 Method of producing semiconductor device |
12/11/2001 | US6329273 Solid-source doping for source/drain to eliminate implant damage |
12/11/2001 | US6329272 Method and apparatus for iteratively, selectively tuning the impedance of integrated semiconductor devices using a focussed heating source |
12/11/2001 | US6329271 Self-aligned channel implantation |
12/11/2001 | US6329270 Laser annealed microcrystalline film and method for same |
12/11/2001 | US6329269 Semiconductor device manufacturing with amorphous film cyrstallization using wet oxygen |
12/11/2001 | US6329268 Semiconductor cleaning method |
12/11/2001 | US6329267 Isolation region forming methods |
12/11/2001 | US6329266 Methods of forming isolation trenches including damaging a trench isolation mask |
12/11/2001 | US6329265 Method of making a semiconductor device using processing from both sides of a workpiece |
12/11/2001 | US6329264 Method for forming a ragged polysilcon crown-shaped capacitor for a memory cell |
12/11/2001 | US6329263 Method of forming a container capacitor structure |
12/11/2001 | US6329262 Method for producing semiconductor integrated circuit |
12/11/2001 | US6329261 Method for forming a shallow trench isolation structure |
12/11/2001 | US6329259 Collector-up RF power transistor |
12/11/2001 | US6329258 Semiconductor device and method of manufacturing the same |
12/11/2001 | US6329257 Method for laterally peaked source doping profiles for better erase control in flash memory devices |
12/11/2001 | US6329256 Self-aligned damascene gate formation with low gate resistance |
12/11/2001 | US6329255 Method of making self-aligned bit-lines |
12/11/2001 | US6329254 Memory cell of the EEPROM type having its threshold adjusted by implantation, and fabrication method |
12/11/2001 | US6329253 Thick oxide MOS device used in ESD protection circuit |
12/11/2001 | US6329252 Method of forming self-aligned contacts |
12/11/2001 | US6329251 Microelectronic fabrication method employing self-aligned selectively deposited silicon layer |
12/11/2001 | US6329250 Method of manufacturing semiconductor memory device |
12/11/2001 | US6329249 Method for fabricating a semiconductor device having different gate oxide layers |
12/11/2001 | US6329248 Method for making split gate flash memory cells with high coupling efficiency |
12/11/2001 | US6329247 Nonvolatile semiconductor memory device and manufacturing method thereof |
12/11/2001 | US6329246 Method for fabricating flash memory |
12/11/2001 | US6329245 Flash memory array structure with reduced bit-line pitch |
12/11/2001 | US6329244 Method of manufacturing dynamic random access memory cell |
12/11/2001 | US6329243 Method to form crown capacitor for high density DRAM |
12/11/2001 | US6329242 Method of fabricating a semiconductor memory device having a tree-type capacitor |
12/11/2001 | US6329241 Methods for producing capacitor-node contact plugs of dynamic random-access memory |
12/11/2001 | US6329240 Non-volatile memory cell and methods of fabricating and operating same |
12/11/2001 | US6329239 Dram cell formed on an insulating layer having a vertical channel and a manufacturing method thereof |
12/11/2001 | US6329238 Method of fabricating a memory device having a long data retention time with the increase in leakage current suppressed |
12/11/2001 | US6329237 Method of manufacturing a capacitor in a semiconductor device using a high dielectric tantalum oxide or barium strontium titanate material that is treated in an ozone plasma |
12/11/2001 | US6329236 Method for fabricating resistive load static random access memory device |
12/11/2001 | US6329235 Method of performing a pocket implantation on a MOS transistor of a memory cell of a DRAM |
12/11/2001 | US6329234 Copper process compatible CMOS metal-insulator-metal capacitor structure and its process flow |
12/11/2001 | US6329233 Method of manufacturing photodiode CMOS image sensor |
12/11/2001 | US6329232 Method of manufacturing a semiconductor device |
12/11/2001 | US6329231 Distributed constant circuit with active element |
12/11/2001 | US6329230 High-speed compound semiconductor device having an improved gate structure |
12/11/2001 | US6329229 Method for processing semiconductor device, apparatus for processing a semiconductor and apparatus for processing semiconductor device |
12/11/2001 | US6329228 Semiconductor device and method of fabricating the same |
12/11/2001 | US6329227 Method of patterning organic polymer film and method for fabricating semiconductor device |
12/11/2001 | US6329226 Method for fabricating a thin-film transistor |
12/11/2001 | US6329225 Tight pitch gate devices with enlarged contact areas for deep source and drain terminals and method |
12/11/2001 | US6329224 Encapsulation of microelectronic assemblies |
12/11/2001 | US6329222 Interconnect for packaging semiconductor dice and fabricating BGA packages |
12/11/2001 | US6329220 Packages for semiconductor die |
12/11/2001 | US6329218 Method for forming a CMOS sensor with high S/N |
12/11/2001 | US6329215 Gallium indium aluminum nitrides for semiconductors and metal dopes for p or n junctions |
12/11/2001 | US6329143 Providing a substrate having surface bearing multiple copies of a protective group removable on exposure to an electric field or electric current; applying electric field or current to substrate; exposing to protected monomer, repeating |
12/11/2001 | US6329124 Method to produce high density memory cells and small spaces by using nitride spacer |
12/11/2001 | US6329118 Method for patterning dual damascene interconnects using a sacrificial light absorbing material |
12/11/2001 | US6329117 Photoresist patterns, integrated circuits, acrylic ester copolymer with chromophore, |
12/11/2001 | US6329112 Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lens |
12/11/2001 | US6329110 Photosensitive polymer composition, method for forming relief patterns, and electronic parts |
12/11/2001 | US6329109 Photolithography,smaller, more accurate contacts, |
12/11/2001 | US6329106 To remove a bridge formed on a quartz substrate, implanting ga ions using focused ion beam then using blue laser |
12/11/2001 | US6329105 Pattern formation method and apparatus using atomic beam holography technology |
12/11/2001 | US6329088 Silicon carbide epitaxial layers grown on substrates offcut towards <1{overscore (1)}00> |
12/11/2001 | US6329063 Method for producing high quality heteroepitaxial growth using stress engineering and innovative substrates |
12/11/2001 | US6329062 Nanocrystals, low dielectric constant, porous binder |
12/11/2001 | US6329050 Adhesive for electronic parts and adhesive tape for electronic parts |
12/11/2001 | US6329017 Mesoporous silica film from a solution containing a surfactant and methods of making same |
12/11/2001 | US6328914 Thick-film paste with insoluble additive |
12/11/2001 | US6328905 Residue removal by CO2 water rinse in conjunction with post metal etch plasma strip |
12/11/2001 | US6328902 Probe tip configuration and a method of fabrication thereof |
12/11/2001 | US6328876 Providing blank of etchable semiconductor material having a first side and a second side, connecting blank to a current source, illuminating with light, immersing holding element and blank in etching solution until only first side is wetted |
12/11/2001 | US6328872 Method and apparatus for plating and polishing a semiconductor substrate |
12/11/2001 | US6328871 Depositing a barrier layer comprising tantalum over the surface; annealing the barrier layer to form high conductance barrier layer; depositing a seed layer over the barrier layer |
12/11/2001 | US6328865 Method for forming a thin film of a composite metal compound and apparatus for carrying out the method |
12/11/2001 | US6328864 Vacuum processing apparatus |
12/11/2001 | US6328858 For semiconductor processing apparatus |
12/11/2001 | US6328848 Apparatus for high-resolution in-situ plasma etching of inorganic and metal films |
12/11/2001 | US6328846 Device for an etch treatment of a disk-like object |
12/11/2001 | US6328845 Plasma-processing method and an apparatus for carrying out the same |
12/11/2001 | US6328844 Heat-active adhesive for a connecting circuit which is used for electrically connecting circuit electrodes facing each other in pressing direction |
12/11/2001 | US6328841 Providing silicon wafer withfully cured polyimide layer; causing water to react withpolyimide layer; causing surface of second silicon wafer to react with chlorine; treating with hydroxlyzed triethoxysilylpropanamine; connecting |
12/11/2001 | US6328815 Multiple chamber vacuum processing system configuration for improving the stability of mark shielding process |
12/11/2001 | US6328814 Apparatus for cleaning and drying substrates |
12/11/2001 | US6328809 Providing system containing a vessel and object having surface; immersing object in process fluid in vessel; performing quick dump to discharge process fluid from vessel; introducing drying vapor into vessel for flowing fluid off |
12/11/2001 | US6328806 Device for treating a band-shaped substrate with a gas |
12/11/2001 | US6328804 Chemical vapor deposition of metals on a spherical shaped semiconductor substrate |
12/11/2001 | US6328802 Method and apparatus for determining temperature of a semiconductor wafer during fabrication thereof |
12/11/2001 | US6328794 Method of controlling stress in a film |
12/11/2001 | US6328768 Can minimize number of wet units and investment cost for equipment in wet process areas and reduce the distance and time required for transferring wafers |
12/11/2001 | US6328642 Integrated pad and belt for chemical mechanical polishing |
12/11/2001 | US6328640 Wafer preparation apparatus including rotatable wafer preparation assemblies |
12/11/2001 | US6328637 Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization |
12/11/2001 | US6328634 Finishing semiconductor wafer; provide pad, scruc semicomponent wafer with pad, evaluate surace of semiconductor |
12/11/2001 | US6328629 Method and apparatus for polishing workpiece |