Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2001
12/06/2001US20010049186 Method for establishing ultra-thin gate insulator using anneal in ammonia
12/06/2001US20010049185 Semiconductor memory device and fabrication method thereof
12/06/2001US20010049184 A second metal electrode forms a Schottky contact with said semiconductor film; the thickness and material of said second metal electrode enables a Schottky barrier height to decrease when hydrogen gas is contacted
12/06/2001US20010049183 Method for forming MIS transistors with a metal gate and high-k dielectric using a replacement gate process and devices obtained thereof
12/06/2001US20010049182 Manufacturing method of semiconductor substrate
12/06/2001US20010049181 Plasma treatment for cooper oxide reduction
12/06/2001US20010049179 Semiconductor wafer, method for processing the same and method for manufacturing semiconductor device
12/06/2001US20010049178 A first etching the substrate with a first etching gas, e.g., tetrafluoromethane, to form a base trench having rounded-off or tapered upper edges; dielectric layer filled in the trench region so an upper edge is not exposed
12/06/2001US20010049177 Method for manufacturing semiconductor devices
12/06/2001US20010049176 Method of forming low-resistivity connections in non-volatile memories
12/06/2001US20010049175 Method of fabricating a resistor and a capacitor electrode in an integrated circuit
12/06/2001US20010049174 Method and system for configuring integrated systems on a chip
12/06/2001US20010049173 Methods of forming field effect transistors and related field effect transistor constructions
12/06/2001US20010049172 Laterally diffused metal oxide semiconductor device and a method of manufacture therefor
12/06/2001US20010049171 High-cmos device having high-density resistance elements
12/06/2001US20010049170 Single poly non-volatile memory structure and its fabricating method
12/06/2001US20010049169 Semiconductor memory and its manufacturing method
12/06/2001US20010049168 Manufacture of a semiconductor device with retrograded wells
12/06/2001US20010049167 Method of manufacturing a trench mosfet using selective growth epitaxy
12/06/2001US20010049166 Method of manufacturing an electrically programmable, non-volatile memory and high-performance logic circuitry in the same semiconductor chip
12/06/2001US20010049165 MOS transistors having dual gates and self-aligned interconnect contact windows
12/06/2001US20010049164 One-time UV-programmable non-volatile semiconductor memory and method of programming such a semiconductor memory
12/06/2001US20010049163 Semiconductor device and method for producing it
12/06/2001US20010049162 Semiconductor wafer diaphragm
12/06/2001US20010049161 Apparatus processing a gate portion in a semiconductor manufacturing apparatus, which remove a gate correspondence portion from a semiconductor package connected to a lead frame, and a resin burr deposited on a lead portion associated with the semiconductor package
12/06/2001US20010049160 Semiconductor chip removing and conveying method and device
12/06/2001US20010049159 Substrate strip for use in packaging semiconductor chips and method for making the substrate strip
12/06/2001US20010049158 Methods of making microelectronic assemblies using compressed resilient layer
12/06/2001US20010049156 Increasing the interface area between the package body and die pad and the connection pads to prolong the path and time for moisture diffusion into the package by etching concave profiles in the connective pads to give a larger thickness
12/06/2001US20010049155 Semiconductor device using substrate having cubic structure and method of manufacturing the same
12/06/2001US20010049153 Method for manufacturing organic electroluminescence display device
12/06/2001US20010049151 Method for manufacturing semiconductor device capable of improving manufacturing yield
12/06/2001US20010049150 Using plasma generated from an reactive ion etching gas containing a first gas of a compound including carbon, hydrogen and nitrogen, e.g., methylamine, and a second gas including a nitrogen component, e.g., nitrogen or ammonia
12/06/2001US20010049131 Using baths to which are added a biogenic catalyst (in particular, an enzyme) which selectively acts (etching) upon a preselectable thin layer; less expensive and environmentally friendly; thermally controlled; photoresists
12/06/2001US20010049080 Heat treatment system and method
12/06/2001US20010049073 Amplification; photolithography patterning
12/06/2001US20010049070 Heating coating solution
12/06/2001US20010049064 Radiation transparent substrate; sheild pattern
12/06/2001US20010049062 Photomask, fabrication method of photomask, and fabrication method of semiconductor integrated circuit
12/06/2001US20010049029 Process control
12/06/2001US20010048981 High speed plasma vapor deposition; exhaustion ventilation gas
12/06/2001US20010048980 High density plasma enhanced chemical vapor deposition method
12/06/2001US20010048874 Microelectronic workpiece support and apparatus using the support
12/06/2001US20010048871 Cart for mounting/demounting wafer transfer robot
12/06/2001US20010048867 Method and apparatus for processing semiconductor wafers
12/06/2001US20010048866 Container and loader for substrate
12/06/2001US20010048865 Substrate processing system and substrate processing method
12/06/2001US20010048761 Method of inspecting a semiconductor device and an apparatus thereof
12/06/2001US20010048632 Semiconductor memory integrated circuit
12/06/2001US20010048631 Semiconductor memory device having segment type word line structure
12/06/2001US20010048624 Horizontal type ferroelectric memory and manufacturing method of the same
12/06/2001US20010048622 Method for manufacturing a ferroelectric random access memory device
12/06/2001US20010048617 Semiconductor integrated circuit
12/06/2001US20010048612 Array of flash memory cells and data program and erase methods of the same
12/06/2001US20010048609 Nonvolatile semiconductor memory device having testing capabilities
12/06/2001US20010048514 Projection exposure apparatus and method
12/06/2001US20010048513 Environmental control chamber
12/06/2001US20010048512 Projection exposure apparatus and device manufacturing method including a projection optical system having a pair of diffractive members
12/06/2001US20010048510 Air shower head of photolithography equipment for directing air towards a wafer stage
12/06/2001US20010048499 Liquid crystal displaying apparatus and method for manufacturing array substrate used therefor
12/06/2001US20010048494 Liquid crystal display with light shielding film
12/06/2001US20010048493 Method of imaging using a liquid crystal display device
12/06/2001US20010048491 Color liquid crystal display device and manufacturing method of the same
12/06/2001US20010048490 Liquid crystal display device and method for manufacturing the same
12/06/2001US20010048478 Pattern distortion detecting method and apparatus and recording medium for pattern distortion detection
12/06/2001US20010048340 High performance integrated radio frequency circuit devices
12/06/2001US20010048338 Boosting method and apparatus
12/06/2001US20010048337 Diode element circuit and switch circuit using the same
12/06/2001US20010048333 Buffer circuit block and design method of semiconductor integrated circuit by using the same
12/06/2001US20010048325 Integrated CMOS semiconductor circuit
12/06/2001US20010048319 Semiconductor integrated circuit device
12/06/2001US20010048234 Apparatus and method for solder-sealing an active matrix organic light emitting diode
12/06/2001US20010048166 Flip chip type semiconductor device and method of manufactruing the same
12/06/2001US20010048165 Semiconductor device and fabrication process thereof
12/06/2001US20010048163 Wiring structure of semiconductor device
12/06/2001US20010048162 Semiconductor device having a structure of a multilayer interconnection unit and manufacturing method thereof
12/06/2001US20010048161 Fixed abrasive chemical-mechanical planarization of titanium nitride
12/06/2001US20010048160 Semiconductor device having reinforced coupling between solder balls and substrate
12/06/2001US20010048158 Solder balls and columns with stratified underfills on substrate for flip chip joining
12/06/2001US20010048157 Direct attach chip scale package
12/06/2001US20010048156 Semiconductor device and method of manufacturing the same
12/06/2001US20010048148 Semiconductor device and a method of manufacturing the same
12/06/2001US20010048147 Semiconductor devices passivation film
12/06/2001US20010048146 Method of forming composite silicon oxide layer over a semiconductro device
12/06/2001US20010048145 Photomask including auxiliary mark area, semiconductor device and manufacturing method thereof
12/06/2001US20010048144 Compensation component and process for producing the compensation component
12/06/2001US20010048143 Integrated circuits and microelectronic structures including one or more layers of germanium-containing glass
12/06/2001US20010048142 Semiconductor substrate and method for manufacturing semiconductor device using the same
12/06/2001US20010048140 Photo sensing integrated circuit device and related circuit adjustment
12/06/2001US20010048138 Integrated circuitry
12/06/2001US20010048136 Fabrication of low power CMOS device with high reliability
12/06/2001US20010048135 Buried layer and method
12/06/2001US20010048134 Bipolar junction transistors having trench-based base electrodes
12/06/2001US20010048132 Semiconductor device and manufacturing method of the same
12/06/2001US20010048131 Semiconductor device
12/06/2001US20010048130 Semiconductor device
12/06/2001US20010048129 Semiconductor memory device and method of manufacturing the same
12/06/2001US20010048128 Semiconductor element and semiconductor memory device using the same
12/06/2001US20010048127 Method of manufacturing storage electrode in semiconductor device
12/06/2001US20010048125 Semiconductor device and manufacturing method thereof