| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 01/24/2002 | WO2002006568A2 Slicing of single-crystal films using ion implantation |
| 01/24/2002 | WO2002006560A1 Graded material and method for synthesis thereof and method for processing thereof |
| 01/24/2002 | WO2002006555A2 Sputtering target |
| 01/24/2002 | WO2002006423A1 Liquid crystal polymers for flexible circuits |
| 01/24/2002 | WO2002006413A1 Low haze adhesive sheet |
| 01/24/2002 | WO2002006402A1 Absorbing compounds for spin-on glass anti-reflective coatings for photolithography |
| 01/24/2002 | WO2002006057A1 Method for providing a recess pattern in a foil |
| 01/24/2002 | WO2001082333A3 Homogeneous gate oxide thickness for vertical transistor structures |
| 01/24/2002 | WO2001077406A3 A method of determining the end point of a plasma cleaning operation |
| 01/24/2002 | WO2001066819A3 Methods for preparing ruthenium metal films |
| 01/24/2002 | WO2001061747A3 Method for eliminating stress induced dislocation in cmos devices |
| 01/24/2002 | WO2001046993A3 Reduction of plasma charge-induced damage in microfabricated devices |
| 01/24/2002 | WO2001043197A3 Source/drain-on-insulator (s/doi) field effect transistors and method of fabrication |
| 01/24/2002 | WO2001042767A3 Detecting a process endpoint from a change in reflectivity |
| 01/24/2002 | WO2001041959A3 Monitoring system for dicing saws |
| 01/24/2002 | WO2001038939A3 Method for determining misalignment between a reticle and a wafer |
| 01/24/2002 | WO2001037325A3 A method of forming wires on an integrated circuit chip |
| 01/24/2002 | WO2001037322A3 System and method for product yield prediction using a logic characterization vehicle |
| 01/24/2002 | WO2001035041A3 Method for rapid thermal processing of substrates |
| 01/24/2002 | WO2001033300A3 High precision orientation alignment and gap control stages for imprint lithography processes |
| 01/24/2002 | WO2001031682A8 Method and apparatus for low voltage plasma doping using dual pulses |
| 01/24/2002 | WO2001029879A3 Systems and methods for photoresist strip and residue treatment in integrated circuit manufacturing |
| 01/24/2002 | WO2001026133A8 High transmission, low energy beamline apparatus for ion implanter |
| 01/24/2002 | WO2000033365A8 Fabrication of gallium nitride layers by lateral growth |
| 01/24/2002 | US20020010906 Circuit pattern design method,exposure method, charged-particle beam exposure system |
| 01/24/2002 | US20020010905 Circuit pattern design method, circuit pattern design system, and recording medium |
| 01/24/2002 | US20020010902 Field programmable gate array (FPGA) bit stream cormat |
| 01/24/2002 | US20020010900 Delay analysis method and design assist apparatus of semiconductor circuit |
| 01/24/2002 | US20020010692 Layout method arranging nodes corresponding to lsi elements having a connecting relationship |
| 01/24/2002 | US20020010565 Method to support the setup of input parameters |
| 01/24/2002 | US20020010559 Semiconductor device having a mode of functional test |
| 01/24/2002 | US20020010306 Tubular molded product using nylon 12 |
| 01/24/2002 | US20020010281 Curable electron donor compounds |
| 01/24/2002 | US20020009955 Oxidizing polishing slurries for low dielectric constant materials |
| 01/24/2002 | US20020009954 Polishing apparatus |
| 01/24/2002 | US20020009953 Control of CMP removal rate uniformity by selective heating of pad area |
| 01/24/2002 | US20020009904 Probe card |
| 01/24/2002 | US20020009902 Substrate processing method, substrate processing apparatus and substrate carrying method |
| 01/24/2002 | US20020009901 Charged-particle beam exposure apparatus and device manufacturing method |
| 01/24/2002 | US20020009900 Growth of ultrathin nitride on Si (100) by rapid thermal N2 treatment |
| 01/24/2002 | US20020009899 Forming silica barrier; process control |
| 01/24/2002 | US20020009898 Method for fabricating semiconductor integrated circuit device |
| 01/24/2002 | US20020009897 Flowable germanium doped silicate glass for use as a spacer oxide |
| 01/24/2002 | US20020009896 Chemical vapor deposition using organometallic precursors |
| 01/24/2002 | US20020009895 Melting, solidificating silicon |
| 01/24/2002 | US20020009893 Method of forming a conductor in a fluoride silicate glass (FSG) layer |
| 01/24/2002 | US20020009892 Plasma preclean with argon, helium, and hydrogen gases |
| 01/24/2002 | US20020009891 Method for the etchback of a conductive material |
| 01/24/2002 | US20020009890 Manufacturing method of active matrix substrate |
| 01/24/2002 | US20020009889 Semiconductor manufacturing process and semiconductor device |
| 01/24/2002 | US20020009888 Method of producing a semiconductor device |
| 01/24/2002 | US20020009886 Method and apparatus for controlling chemical interactions during planarization of microelectronic substrates |
| 01/24/2002 | US20020009885 Method of growing surface aluminum nitride on aluminum films with low energy barrier |
| 01/24/2002 | US20020009884 Method of forming a metal wiring in a semiconductor device |
| 01/24/2002 | US20020009883 Method and apparatus for forming interconnect |
| 01/24/2002 | US20020009882 Method of manufacturing a contact plug in a semiconductor device |
| 01/24/2002 | US20020009881 Conductor member formation and pattern formation methods |
| 01/24/2002 | US20020009880 Diffusion barriers in semiconductors |
| 01/24/2002 | US20020009879 Expanded implantation of contact holes |
| 01/24/2002 | US20020009878 Method for manufacturing a multilayer interconnection structure |
| 01/24/2002 | US20020009877 Method for forming via holes by using retardation layers to reduce overetching |
| 01/24/2002 | US20020009876 Method for manufacturing a conductor structure for an integrated circuit |
| 01/24/2002 | US20020009875 Method of producing semiconductor device and system for producing the same |
| 01/24/2002 | US20020009874 Buried conductors |
| 01/24/2002 | US20020009873 Semiconductor device and method of manufacturing the same |
| 01/24/2002 | US20020009872 Fabrication process of a semiconductor device including a CVD process of a metal film |
| 01/24/2002 | US20020009871 Forming titanium layer, refractory metal layer and silicon layer; heating; multilayer stacks connectors |
| 01/24/2002 | US20020009870 Semiconductor device having a nonpeeling electrode pad portion |
| 01/24/2002 | US20020009869 Reflow of low melt solder tip C4's |
| 01/24/2002 | US20020009868 Method of growing a thin film in gaseous phase and apparatus for growing a thin film in gaseous phase for use in said method |
| 01/24/2002 | US20020009867 Method of fabricating semiconductor device |
| 01/24/2002 | US20020009866 Method for forming gate electrode for a semiconductor device |
| 01/24/2002 | US20020009865 Lithography and etching process |
| 01/24/2002 | US20020009864 Methods, complexes, and system for forming metal-containing films |
| 01/24/2002 | US20020009863 Method of etching a wafer layer using multiple layers of the same photoresistant material and structure formed thereby |
| 01/24/2002 | US20020009862 Method of treating a semiconductor wafer thermally and semiconductor wafer fabricated by the same |
| 01/24/2002 | US20020009861 Oxidation, heating, annealing |
| 01/24/2002 | US20020009860 Methods for manufacturing resistors using a sacrificial layer |
| 01/24/2002 | US20020009859 Method for making SOI MOSFET |
| 01/24/2002 | US20020009857 Method of fabricating semiconductor device |
| 01/24/2002 | US20020009856 Method of fabricating a semiconductor device with self- aligned silicide areas formed using a supplemental silicon overlayer |
| 01/24/2002 | US20020009855 Forming silicon nitride over silica dielectric |
| 01/24/2002 | US20020009854 Trench MOSFET with double-diffused body profile |
| 01/24/2002 | US20020009853 Method of manufacturing a flash memory device |
| 01/24/2002 | US20020009852 Method of manufacturing semiconductor device |
| 01/24/2002 | US20020009851 Method for manufacturing semiconductor integrated circuit device having floating gate and deposited film |
| 01/24/2002 | US20020009850 Multi-layer polysilicon plug and method for making the same |
| 01/24/2002 | US20020009849 Semiconductor processing methods of forming devices on a substrate, forming device arrays on a substrate, forming conductive lines on a substrate, and forming capacitor arrays on a substrate, and integrated circuitry |
| 01/24/2002 | US20020009848 Methods of forming dielectric layers and methods of forming capacitors |
| 01/24/2002 | US20020009847 Semiconductor device, and manufacturing method of the same |
| 01/24/2002 | US20020009846 Semiconductor device and method of manufacturing the same |
| 01/24/2002 | US20020009845 Simplified method of patterning field dielectric regions in a semiconductor device |
| 01/24/2002 | US20020009843 Method for repairing pattern by laser and laser-based pattern repair apparatus |
| 01/24/2002 | US20020009842 High-voltage device and method for manufacturing high-voltage device |
| 01/24/2002 | US20020009841 Fabrication process of semiconductor devices |
| 01/24/2002 | US20020009840 High density giant magnetoresistive memory cell |
| 01/24/2002 | US20020009839 Laser processing method |
| 01/24/2002 | US20020009838 Thin-film transistor and method of making same |
| 01/24/2002 | US20020009837 Forming a semiconductor film comprising silicon over a substrate comprising a glass; crystallizing film by heat treatment; patterning; doping n-type impurities; masking doping p-type impurities; thermal annealing |
| 01/24/2002 | US20020009836 Fabrication method and fabrication apparatus for thin film transistor |