| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 01/31/2002 | WO2001047009A3 Method and apparatus for detecting the endpoint of a photoresist stripping process |
| 01/31/2002 | WO2001047003A3 Methods and apparatus for forming submicron patterns on films |
| 01/31/2002 | WO2001043198A3 Source/drain-on-insulator (s/doi) field effect transistor using silicon nitride and silicon oxide and method of fabrication |
| 01/31/2002 | WO2001041544B1 Deposition of gate stacks including silicon germanium layers |
| 01/31/2002 | WO2001033630A3 Methods and compositions for detection and treatment of breast cancer, based on breast cancer-associated polypeptides |
| 01/31/2002 | WO2001020656A3 Dmos transistor having a trench gate electrode and method of making the same |
| 01/31/2002 | WO2000074117A9 Rapid heating and cooling of workpiece chucks |
| 01/31/2002 | WO2000074114A9 Disk cascade scrubber |
| 01/31/2002 | WO2000019481A9 Low contamination high density plasma processing chamber and methods for processing a semiconductor substrate |
| 01/31/2002 | WO2000008691A9 Zinc oxide films containing p-type dopant and process for preparing same |
| 01/31/2002 | WO1999066545A9 Process for removing oxide using hydrogen fluoride vapor |
| 01/31/2002 | US20020013930 Method and system for producing semiconductor devices |
| 01/31/2002 | US20020013913 Placement and routing method for clock distribution circuit, clock distribution circuit manufacturing method, semiconductor device manufacturing method, clock distribution circuit and semiconductor device |
| 01/31/2002 | US20020013908 Remote diagnostic system for facilities and remote diagnostic method |
| 01/31/2002 | US20020013688 Back annotation apparatus for carrying out a simulation based on the extraction result in regard to parasitic elements |
| 01/31/2002 | US20020013682 Method and system for improving a transistor model |
| 01/31/2002 | US20020013665 Method and system for calculating kill ratio, degree of contribution to yield by defect specie, and yield of final products, and computer program for implementing calculation of kill ratio |
| 01/31/2002 | US20020013637 Method and apparatus for monitoring and/or end point detecting a process |
| 01/31/2002 | US20020013632 Production system for manufacturing semiconductor devices by lot |
| 01/31/2002 | US20020013487 Using organometallic compound; vapor deposition |
| 01/31/2002 | US20020013448 Novel monomers, polymers, methods of synthesis thereof and photoresist compositions |
| 01/31/2002 | US20020013443 Polybenzoxazole and crosslinking agent |
| 01/31/2002 | US20020013420 Polyepoxides; electronic packages |
| 01/31/2002 | US20020013240 Composition and method for removing resist and etching residues using hydroxylammonium carboxylates |
| 01/31/2002 | US20020013239 Polymer remover |
| 01/31/2002 | US20020013238 A semiconductor wafer cleaning formulation, including organic amine, water, 1,3-dicarbonyl compound chelating agent, nitrogen containing carboxylic acid or an imine, and 2-98% wt polar organic solvent; used in removing the inorganic residue |
| 01/31/2002 | US20020013120 Method and apparatus for optical monitoring in chemical mechanical polishing |
| 01/31/2002 | US20020013114 Semiconductor device and method of manufacturing the same |
| 01/31/2002 | US20020013071 Final testing of IC die in wafer form |
| 01/31/2002 | US20020013069 Reticle chuck in exposure apparatus and semiconductor device manufacturing method using the same |
| 01/31/2002 | US20020013068 Vapor deposition using diluent gas |
| 01/31/2002 | US20020013067 Semiconductor device manufacturing method |
| 01/31/2002 | US20020013066 Semiconductor device and semiconductor device manufacturing method |
| 01/31/2002 | US20020013065 Wafer processing apparatus and method, wafer convey robot, semiconductor substrate fabrication method, and semiconductor fabrication apparatus |
| 01/31/2002 | US20020013063 Wet treatment, dry treatment |
| 01/31/2002 | US20020013062 Etching silicon oxide doped with fluorine with hydrogen fluoride; forming hollow structures in semiconductor |
| 01/31/2002 | US20020013061 Thinning and dicing of semiconductor wafers using dry etch, and obtaining semiconductor chips with rounded bottom edges and corners |
| 01/31/2002 | US20020013060 Semiconductor device and method of manufacturing the same |
| 01/31/2002 | US20020013059 Pattern formation material and pattern formation method |
| 01/31/2002 | US20020013057 Method of embedding contact hole by damascene method |
| 01/31/2002 | US20020013055 Method of manufacturing semiconductor device |
| 01/31/2002 | US20020013052 Methods for preparing ruthenium metal films |
| 01/31/2002 | US20020013051 CVD of tantalum and tantalum nitride films from tantalum halide precursors |
| 01/31/2002 | US20020013050 Chemistry for chemical vapor deposition of titanium containing films |
| 01/31/2002 | US20020013049 Process for forming a conducting structure layer that can reduce metal etching residue |
| 01/31/2002 | US20020013047 Semiconductor processing methods of forming contact openings, methods of forming electrical connections and interconnections, and integrated circuitry |
| 01/31/2002 | US20020013046 Multilayer dielectric |
| 01/31/2002 | US20020013045 Multilayer connector |
| 01/31/2002 | US20020013044 HDP liner layer prior to HSQ/SOG deposition to reduce the amount of HSQ/SOG over the metal lead |
| 01/31/2002 | US20020013043 Semiconductor integrated circuit device and manufacturing method of that |
| 01/31/2002 | US20020013042 Defect filter layer |
| 01/31/2002 | US20020013041 Process control; controlling temperature |
| 01/31/2002 | US20020013039 Method of fabrication of semiconductor structures by ion implantation |
| 01/31/2002 | US20020013038 Semiconductor device and production thereof |
| 01/31/2002 | US20020013037 Two-dimensionally arrayed quantum device |
| 01/31/2002 | US20020013036 Methods of forming compound semiconductor layers using spaced trench arrays and semiconductor substrates formed thereby |
| 01/31/2002 | US20020013035 Method of manufacturing a semiconductor device |
| 01/31/2002 | US20020013034 Multilayer; dielectric layer on semiconductor substrate; coils air gap |
| 01/31/2002 | US20020013033 Semiconductor integrated circuit having an integrated resistance region |
| 01/31/2002 | US20020013032 Process to fabricate a novel source-drain extension |
| 01/31/2002 | US20020013031 Method of improving the reliability of gate oxide layer |
| 01/31/2002 | US20020013029 High voltage device having polysilicon region in trench and fabricating method thereof |
| 01/31/2002 | US20020013028 Method of forming flash memory, method of forming flash memory and sram circuitry, and etching methods |
| 01/31/2002 | US20020013027 Semiconductor memory device having a plug contacted to a capacitor electrode and method for fabricating the capacitor |
| 01/31/2002 | US20020013026 Semiconductor device and method for manufacturing the same |
| 01/31/2002 | US20020013025 Method for fabricating bipolar transistors |
| 01/31/2002 | US20020013024 Multilayer damascene structure |
| 01/31/2002 | US20020013022 Method of manufacturing a semiconductor device |
| 01/31/2002 | US20020013021 Composition for wiring, a wiring using the composition, manufacturing method thereof, a display using the wiring and a manufacturing method thereof |
| 01/31/2002 | US20020013020 Thin film transistor array substrate for liquid crystal display and method of fabricating the same |
| 01/31/2002 | US20020013016 Method for fabricating semiconductor device |
| 01/31/2002 | US20020013015 Method of manufacturing a semiconductor device |
| 01/31/2002 | US20020013014 Method and structure for manufacturing improved yield semiconductor packaged devices |
| 01/31/2002 | US20020013012 Semiconductor chip, semiconductor wafer, semiconductor device and method of manufacturing the semiconductor device |
| 01/31/2002 | US20020013011 Methods for making electrooptical device and driving substrate therefor |
| 01/31/2002 | US20020013010 Contactor having conductive particles in a hole as a contact electrode |
| 01/31/2002 | US20020013009 Failure analysis method for chip of ball grid array type semiconductor |
| 01/31/2002 | US20020013008 Method of mounting chips |
| 01/31/2002 | US20020013007 Semiconductor wafer polishing end point detection method and apparatus |
| 01/31/2002 | US20020013006 Semiconductor memory and method of manufacturing the same |
| 01/31/2002 | US20020013005 Inductor for semiconductor device and method of making the same |
| 01/31/2002 | US20020012883 Overcoating polysilicon layer with photoresist and gate electrode |
| 01/31/2002 | US20020012882 Method of manufacturing semiconductor device with improved removal of resist residues |
| 01/31/2002 | US20020012876 Lithography structure |
| 01/31/2002 | US20020012875 Antireflective coating compositions comprising photoacid generators |
| 01/31/2002 | US20020012874 Photoresist composition |
| 01/31/2002 | US20020012873 Photoresist composition containing photo radical generator with photoacid generator |
| 01/31/2002 | US20020012872 Photopolymerization |
| 01/31/2002 | US20020012870 Pattern formation material and pattern formation method |
| 01/31/2002 | US20020012869 Lithography; amplification |
| 01/31/2002 | US20020012867 Forming pattern; exposure to light |
| 01/31/2002 | US20020012865 Mixture of alkali soluble polymer and photosensitizers |
| 01/31/2002 | US20020012860 Method and apparatus for emission lithography using patterned emitter |
| 01/31/2002 | US20020012859 Using both light beam exposure pattern and electron beam pattern |
| 01/31/2002 | US20020012853 Electron beam writing pattern; transfer pattern high resolution |
| 01/31/2002 | US20020012852 Stencil mask for electron beam projection lithography and fabrication method |
| 01/31/2002 | US20020012851 Exposure of a photoresist coated semiconductor to three different intensity of light |
| 01/31/2002 | US20020012809 Smokeless |
| 01/31/2002 | US20020012745 Flash memory and methods of writing and erasing the same as well as a method of forming the same |
| 01/31/2002 | US20020012744 Re-coating MEMS devices using dissolved resins |