| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 01/29/2002 | US6342430 Trench isolation for micromechanical devices |
| 01/29/2002 | US6342429 Method of fabricating an indium field implant for punchthrough protection in semiconductor devices |
| 01/29/2002 | US6342428 Method for a consistent shallow trench etch profile |
| 01/29/2002 | US6342425 Capacitor for semiconductor memory device and fabrication method thereof |
| 01/29/2002 | US6342424 High-Q spiral inductor structure and methods of manufacturing the structure |
| 01/29/2002 | US6342423 MOS-type transistor processing utilizing UV-nitride removable spacer and HF etch |
| 01/29/2002 | US6342422 Method for forming MOSFET with an elevated source/drain |
| 01/29/2002 | US6342421 Semiconductor device and manufacturing method thereof |
| 01/29/2002 | US6342420 Hexagonally symmetric integrated circuit cell |
| 01/29/2002 | US6342419 DRAM capacitor and a method of fabricating the same |
| 01/29/2002 | US6342418 Semiconductor device and manufacturing method thereof |
| 01/29/2002 | US6342417 Depositing layer comprising tungsten and nitrogen over substrate and in separate step from depositing, exposing layer comprising tungsten and nitrogen to a nitrogen-containing plasma |
| 01/29/2002 | US6342416 Method of manufacturing a semiconductor memory device |
| 01/29/2002 | US6342415 Method and system for providing reduced-sized contacts in a semiconductor device |
| 01/29/2002 | US6342414 Damascene NiSi metal gate high-k transistor |
| 01/29/2002 | US6342413 Method of manufacturing semiconductor device |
| 01/29/2002 | US6342412 Having a dram (dynamic random access memory), having a capacity as high as 16 mbits; improve the alpha-ray soft error withstand voltage; misfet |
| 01/29/2002 | US6342411 Electronic component and method for manufacture |
| 01/29/2002 | US6342410 Fabrication of a field effect transistor with three sided gate structure on semiconductor on insulator |
| 01/29/2002 | US6342409 Polysilicon thin film transistor and method of manufacturing the same |
| 01/29/2002 | US6342408 Method of manufacturing semiconductor memory device |
| 01/29/2002 | US6342406 Flip chip on glass image sensor package fabrication method |
| 01/29/2002 | US6342404 Group III nitride compound semiconductor device and method for producing |
| 01/29/2002 | US6342403 Electrical detection of V-groove width |
| 01/29/2002 | US6342400 Dye penetrant test for semiconductor package assembly solder joints |
| 01/29/2002 | US6342399 Testing integrated circuits |
| 01/29/2002 | US6342337 Ferroelectric memory cell fabrication method |
| 01/29/2002 | US6342334 Chemically amplified resist compositions |
| 01/29/2002 | US6342333 Photosensitive resin composition, patterning method, and electronic components |
| 01/29/2002 | US6342313 Oxide films and process for preparing same |
| 01/29/2002 | US6342277 Sequential chemical vapor deposition |
| 01/29/2002 | US6342166 Method of detecting end point of polishing of wafer and apparatus for detecting end point of polishing |
| 01/29/2002 | US6342165 Plasm etching dielectric with trifluoromethane and difluoromethane; carbon monoxide-free |
| 01/29/2002 | US6342139 Sputtering system |
| 01/29/2002 | US6342137 Lift and rotate assembly for use in a workpiece processing station and a method of attaching the same |
| 01/29/2002 | US6342134 Method for producing piezoelectric films with rotating magnetron sputtering system |
| 01/29/2002 | US6342133 Integrated circuits; hollow cathode magnetron |
| 01/29/2002 | US6342131 Method of depositing a multilayer thin film by means of magnetron sputtering which controls the magnetic field |
| 01/29/2002 | US6342114 Nickel/vanadium sputtering target with ultra-low alpha emission |
| 01/29/2002 | US6342104 Method of cleaning objects to be processed |
| 01/29/2002 | US6341998 Integrated circuit (IC) plating deposition system and method |
| 01/29/2002 | US6341935 Wafer boat having improved wafer holding capability |
| 01/29/2002 | US6341903 Substrate processing apparatus |
| 01/29/2002 | US6341740 Cutting-and-transferring system and pellet transferring apparatus |
| 01/29/2002 | US6341703 Wafer cassette having dividers of different length or color |
| 01/29/2002 | US6341695 Containment device for retaining semiconductor wafers |
| 01/29/2002 | US6341574 Plasma processing systems |
| 01/29/2002 | US6341549 Trimming apparatus having punches with air flow routes for removal of gate scraps |
| 01/29/2002 | US6341418 Method for direct chip attach by solder bumps and an underfill layer |
| 01/29/2002 | CA2301283C A ferroelectric data processing device |
| 01/29/2002 | CA2205918C Epitaxial growth of silicon carbide and resulting silicon carbide structures |
| 01/29/2002 | CA2137928C A method of treating a semiconductor wafer |
| 01/29/2002 | CA2091332C Semiconductor non-volatile memory with tunnel oxide |
| 01/28/2002 | CA2353683A1 Method for the testing of electronic components taking the drift of the mean into account |
| 01/24/2002 | WO2002007484A2 Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it |
| 01/24/2002 | WO2002007236A1 Displacement detector and processing system |
| 01/24/2002 | WO2002007233A2 Group iii nitride compound semiconductor device |
| 01/24/2002 | WO2002007232A1 Semiconductor light-emitting device and semiconductor light-emitting apparatus |
| 01/24/2002 | WO2002007231A1 Semiconductor light-emitting device and method for manufacturing semiconductor light-emitting device |
| 01/24/2002 | WO2002007223A1 A power mos transistor comprising a plurality of transistor segments with different threshold voltages |
| 01/24/2002 | WO2002007222A2 Receiver comprising a variable capacitance diode |
| 01/24/2002 | WO2002007221A2 Embedded decoupling capacitor |
| 01/24/2002 | WO2002007220A1 Semiconductor device |
| 01/24/2002 | WO2002007219A1 Semiconductor device and its manufacturing method |
| 01/24/2002 | WO2002007216A2 Fabrication of electronic circuit elements |
| 01/24/2002 | WO2002007215A1 Nonvolatile memory device and method for manufacturing the same |
| 01/24/2002 | WO2002007214A1 Low k ild process by removable ild |
| 01/24/2002 | WO2002007213A1 Deliberate void in innerlayer dielectric gapfill to reduce dielectric constant |
| 01/24/2002 | WO2002007212A1 Holding device for treated body |
| 01/24/2002 | WO2002007211A2 Multi-layer registration control for photolithography processes |
| 01/24/2002 | WO2002007210A2 Method and apparatus for modeling thickness profiles and controlling subsequent etch process |
| 01/24/2002 | WO2002007209A1 Electronic chip component comprising an integrated circuit and a method for producing the same |
| 01/24/2002 | WO2002007208A1 Method for making an integrated circuit capable of being surface-mounted and resulting circuit |
| 01/24/2002 | WO2002007207A1 Thin film transistors and their manufacture |
| 01/24/2002 | WO2002007206A1 Method for manufacturing silicon wafer |
| 01/24/2002 | WO2002007205A2 Etching composition and use thereof for cleaning metallization layers |
| 01/24/2002 | WO2002007204A1 Method and apparatus for manufacturing semiconductor device |
| 01/24/2002 | WO2002007203A2 Plasma rie polymer removal |
| 01/24/2002 | WO2002007202A1 Method of manufacturing a semiconductor device by using chemical mechanical polishing |
| 01/24/2002 | WO2002007201A2 Method for etching trenches for the fabrication of semiconductor devices |
| 01/24/2002 | WO2002007200A1 Etching compositions |
| 01/24/2002 | WO2002007199A1 Fluid pressure imprint lithography |
| 01/24/2002 | WO2002007198A2 Deposition of low stress tantalum films |
| 01/24/2002 | WO2002007197A1 Adapter, chamber, and plasma processing device |
| 01/24/2002 | WO2002007196A1 Semiconductor manufacturing/testing ceramic heater |
| 01/24/2002 | WO2002007195A1 Semiconductor manufacturing/testing ceramic heater, production method for the ceramic heater and production system for the ceramic heater |
| 01/24/2002 | WO2002007194A2 Cleaning gas for semiconductor production equipment |
| 01/24/2002 | WO2002007193A1 Method for heating a semiconductor wafer in a process chamber, and process chamber |
| 01/24/2002 | WO2002007191A2 Silica zeolite low-k dielectric thin films |
| 01/24/2002 | WO2002007171A1 Substrate having electrode attached thereto and method for preparation thereof |
| 01/24/2002 | WO2002007167A2 Method for selecting an optimal level of redundancy in the design of memories |
| 01/24/2002 | WO2002007166A2 Mram architectures for increased write selectivity |
| 01/24/2002 | WO2002007132A1 Image display unit and production method for image display unit |
| 01/24/2002 | WO2002006902A2 Method and system of automatic fluid dispensing for imprint lithography processes |
| 01/24/2002 | WO2002006901A2 Photoresist composition for deep uv and process thereof |
| 01/24/2002 | WO2002006899A2 Method for characterizing optical systems using holographic reticles |
| 01/24/2002 | WO2002006898A2 Material and method for making an electroconductive pattern |
| 01/24/2002 | WO2002006897A2 Dry multilayer inorganic alloy thermal resist film for lithographic processing and image creation |
| 01/24/2002 | WO2002006895A1 T-butyl cinnamate polymers and their use in photoresist compositions |
| 01/24/2002 | WO2002006700A1 Vibration isolating device using magnetic levitating device |