Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2002
01/17/2002US20020007018 Hydroxyl-containing polymer, amino cross-linking agent, thermal acid generator; for use as undercoat layer in deep UV lithography
01/17/2002US20020006999 Aromatic blocks with branches of aliphatic polyether chains that have lower thermal decomposition temperature for formation of porous organic films that allow lowering of dielectric constant as insulation materials in electronics
01/17/2002US20020006876 For disk shapes
01/17/2002US20020006772 Polishing apparatus
01/17/2002US20020006769 Method of fabricating a semiconductor device
01/17/2002US20020006768 Polishing method using an abrading plate
01/17/2002US20020006767 Ion exchange pad or brush and method of regenerating the same
01/17/2002US20020006766 Process for cleaning ceramic articles
01/17/2002US20020006740 Real-time in-line testing of semiconductor wafers
01/17/2002US20020006739 Vapor deposition of titanium nbitride and tantalum oxide
01/17/2002US20020006737 Method and system for coating and developing
01/17/2002US20020006736 Methods of forming transistors associated with semiconductor substrates
01/17/2002US20020006734 Manufacturing method of semiconductor integrated circuit device
01/17/2002US20020006733 Ferroelectric film on silicon substrate
01/17/2002US20020006732 Semiconductor device and method for manufacturing the same
01/17/2002US20020006730 Fine pattern formation method and semiconductor device or liquid crystal device manufacturing method employing this method
01/17/2002US20020006729 Low thermal budget solution for PMD application using sacvd layer
01/17/2002US20020006728 Slurry for CMP, method of forming thereof and method of manufacturing semiconductor device including a CMP process
01/17/2002US20020006727 Method of forming a metal wiring in a semiconductor device
01/17/2002US20020006725 Copper metallurgy in integrated circuits
01/17/2002US20020006724 Composite friction elements for brakes and clutches; uniform array of predominately glass strands of reinforcing fibers, in a matrix of phenolic resin material
01/17/2002US20020006723 Integrated circuit trenched features and method of producing same
01/17/2002US20020006722 Refractory metal roughness reduction using high temperature anneal in hydrides or organo-silane ambients
01/17/2002US20020006721 Semiconductor Device With Sidewall Spacers Having Minimized Area Contacts
01/17/2002US20020006720 Forming barrier layer; then aluminum, germanium, copper alloy
01/17/2002US20020006719 Thermal processing of metal alloys for an improved CMP process in integrated circuit fabricatin
01/17/2002US20020006718 Compliant semiconductor chip package with fan-out leads and method of making same
01/17/2002US20020006717 Method for manufacturing a semiconductor device
01/17/2002US20020006716 Method for forming polycide gate electrode of metal oxide semiconductor field effect transistor
01/17/2002US20020006715 Method for forming an extended metal gate using a damascene process
01/17/2002US20020006713 Optical article, exposure apparatus or optical system using it, and process for producing it
01/17/2002US20020006712 Semiconductor device and method of fabricating same
01/17/2002US20020006711 Method of manufacturing a semiconductor device
01/17/2002US20020006710 Semiconductor laser device
01/17/2002US20020006709 Process for producing semiconductor device
01/17/2002US20020006708 Forming sacrificial metal layer; replacement
01/17/2002US20020006707 Angled implant to improve high current operation of bipolar transistors
01/17/2002US20020006706 Semiconductor device and method of manufacturing seciconductor device
01/17/2002US20020006705 Forming impurity zones
01/17/2002US20020006704 Process for forming gate oxide layer
01/17/2002US20020006703 Field-effect transistor configuration with a trench-shaped gate electrode and an additional highly doped layer in the body region
01/17/2002US20020006702 Method and composite for decreasing charge leakage
01/17/2002US20020006701 Method of manufacturing semiconductor device having a thin insulating film
01/17/2002US20020006700 Method of fabricating semiconductor device equipped with capacitor portion
01/17/2002US20020006699 Circuit and method for a folded bit line memory cell with vertical transistor and trench capacitor
01/17/2002US20020006697 Method for forming a storage electrode on a semiconductor device
01/17/2002US20020006696 Protective structures for bond wires, methods for forming same, and test apparatus including such structures
01/17/2002US20020006694 Method of manufacturing photodiodes
01/17/2002US20020006693 Semiconductor device and the manufacturing method thereof
01/17/2002US20020006691 Patterning a dielectric; forming silicide
01/17/2002US20020006689 Thin film semiconductor device and method for producing the same
01/17/2002US20020006686 Die to die connection method and assemblies and packages including dice so connected
01/17/2002US20020006685 Method of manufacturing an electronic power component, and an electronic power component obtained thereby
01/17/2002US20020006681 Method of producing electrooptical device and method of producing driving substrate for driving electrooptical device
01/17/2002US20020006680 Hot plate and method of manufacturing semiconductor device
01/17/2002US20020006678 Susceptor and manufacturing method thereof
01/17/2002US20020006677 Detection of contaminants on semiconductor wafers
01/17/2002US20020006675 Semiconductor manufacturing apparatus and method of manufacturing semiconductor devices
01/17/2002US20020006674 Hydrogen-free contact etch for ferroelectric capacitor formation
01/17/2002US20020006585 Overcoating with photoresist patterns
01/17/2002US20020006583 Solution includes a photosensitive material and a plurality of masking particles within the photosenstive material; screen printing the solution over a substrate
01/17/2002US20020006582 Chemical amplification type positive resist compositions and sulfonium salts
01/17/2002US20020006578 Positive resist composition
01/17/2002US20020006577 Apparatus and method for coating treatment
01/17/2002US20020006574 Positive resist composition
01/17/2002US20020006563 Calculating exposure dose at specified regions of the sensitive substrate to determine expected proximity effects at the specified regions; mathematical equations; making microelectronics
01/17/2002US20020006562 Plate pattern forming method and its inspecting method
01/17/2002US20020006560 Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby
01/17/2002US20020006557 Masking particles within photosensitive material
01/17/2002US20020006556 Low thermal distortion extreme-UV lithography reticle
01/17/2002US20020006555 Resist film patterns are partly formed over substrate in addition to metal patterns to shorten time required to change or correct mask pattern
01/17/2002US20020006553 Reducing line width difference due to pattern density without applying a load; lithographic process for multiplexing exposure
01/17/2002US20020006526 Aluminum silicon carbide and copper clad material and manufacturing process
01/17/2002US20020006525 Chemical vapor deposition of titanium
01/17/2002US20020006497 Disk; for the detection of aberrations in semiconductors
01/17/2002US20020006478 Separating a plasma generating region from a deposition region wherein oxygen atoms are formed within plasma while silicon atoms are supplied at controlled rate to depostion region; vapor deposition; semiconductors
01/17/2002US20020006477 Exhaust processing method, plasma processing method and plasma processing apparatus
01/17/2002US20020006476 Apparatus and method for forming a deposited film by means of plasma CVD
01/17/2002US20020006474 Solvent prewet and method and apparatus to dispense the solvent prewet
01/17/2002US20020006473 Solvent prewet and method and apparatus to dispense the solvent prewet
01/17/2002US20020006468 Method for forming a copper film on a substrate
01/17/2002US20020006324 Apparatus and method for automatically transferring wafers between wafer holders in a liquid environment
01/17/2002US20020006323 Semiconductor processing system and transfer apparatus for the same
01/17/2002US20020006322 Pod door opener
01/17/2002US20020006219 Digital feature separation
01/17/2002US20020006180 X-ray projection exposure apparatus and a device manufacturing method
01/17/2002US20020006068 Method and configuration for compensating for parasitic current losses
01/17/2002US20020006061 Integrated memory having memory cells with a magnetoresistive storage property
01/17/2002US20020006056 Selective device coupling
01/17/2002US20020006055 Selective device coupling
01/17/2002US20020006054 Semiconductor integrated circuit and nonvolatile memory element
01/17/2002US20020006050 Memory architecture with refresh and sense amplifiers
01/17/2002US20020006024 Electronic device
01/17/2002US20020005957 Method and apparatus for monitoring a chemical mechanical planarization process applied to metal-based patterned objects
01/17/2002US20020005952 Measurement of crystal face orientation
01/17/2002US20020005951 Semiconductor impurity concentration testing apparatus and semiconductor impurity concentration testing method
01/17/2002US20020005947 Optical inspection method and apparatus utilizing a variable angle design
01/17/2002US20020005945 Surface inspecting apparatus and method
01/17/2002US20020005943 Method for inspection of an analyzed surface and surface scanning analyzer
01/17/2002US20020005939 Lithographic projection apparatus, supporting assembly and device manufacturing method