Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2002
01/23/2002CN1078388C Surface mounting type light emitting diode
01/23/2002CN1078387C Semiconductor device and its manufacture
01/23/2002CN1078386C Method of manufacturing semiconductor device
01/23/2002CN1078385C Improved method of die attach
01/23/2002CN1078384C Method of fabricating semiconductor device
01/23/2002CN1078382C High O-factor integrated inductor
01/23/2002CN1078359C Management device of photoresists stripping liquid
01/23/2002CN1078357C Waterborne photoresists having associate thickeners
01/23/2002CN1078108C Apparatus for application of lacquer or film on board or icrcular plate
01/22/2002US6341365 Method for automating the placement of a repeater device in an optimal location, considering pre-defined blockages, in high frequency very large scale integration/ultra large scale integration (VLSI/ULSI) electronic designs
01/22/2002US6341364 Computer assisted method of partitioning an electrical circuit
01/22/2002US6341363 Delay computation apparatus, delay computation method, and storage medium for determining a path of a logic circuit with maximum or minimum delay times
01/22/2002US6341241 Defect analysis method and process control method
01/22/2002US6341090 Method for repairing semiconductor integrated circuit device
01/22/2002US6341088 Dynamic random access memory in switch MOSFETs between sense amplifiers and bit lines
01/22/2002US6341087 Semiconductor device
01/22/2002US6341082 Ferroelectric memory capable of suppressing deterioration of dummy cells and drive method therefor
01/22/2002US6341081 Circuit for driving nonvolatile ferroelectric memory
01/22/2002US6341042 Laser radiating apparatus and methods for manufacturing a polycrystalline semiconductor film and a liquid crystal display device
01/22/2002US6341011 Exposure method
01/22/2002US6341009 Laser delivery system and method for photolithographic mask repair
01/22/2002US6341007 Exposure apparatus and method
01/22/2002US6340894 Semiconductor testing apparatus including substrate with contact members and conductive polymer interconnect
01/22/2002US6340846 Making semiconductor packages with stacked dies and reinforced wire bonds
01/22/2002US6340844 Semiconductor device having improved contact hole structure, and method of manufacturing the same
01/22/2002US6340843 Plasma CVD dielectric film and process for forming the same
01/22/2002US6340840 Lead frame and production method thereof, and semiconductor device and fabrication method thereof
01/22/2002US6340838 Apparatus and method for containing semiconductor chips to identify known good dies
01/22/2002US6340837 Semiconductor device and method of fabricating the same
01/22/2002US6340835 Method of making a resistor, method of making a diode, and SRAM circuitry and other integrated circuitry
01/22/2002US6340834 Method of making a resistor, method of making a diode, and SRAM circuitry and other integrated circuitry
01/22/2002US6340833 Integrated circuit polysilicon resistor having a silicide extension to achieve 100 % metal shielding from hydrogen intrusion
01/22/2002US6340832 MIM capacitor having reduced capacitance error and phase rotation
01/22/2002US6340830 Semiconductor device and method for forming the same
01/22/2002US6340829 Semiconductor device and method for manufacturing the same
01/22/2002US6340828 Process for manufacturing nonvolatile memory cells with dimensional control of the floating gate regions
01/22/2002US6340827 Diffusion barrier for use with high dielectric constant materials and electronic devices incorporating same
01/22/2002US6340825 Method of designing semiconductor integrated circuit device and semiconductor integrated circuit device
01/22/2002US6340823 Semiconductor wafer having a multi-test circuit, and method for manufacturing a semiconductor device including multi-test process
01/22/2002US6340822 Article comprising vertically nano-interconnected circuit devices and method for making the same
01/22/2002US6340812 Two-dimensional image detector with electrodes on counter substrate
01/22/2002US6340806 Energy-efficient method and system for processing target material using an amplified, wavelength-shifted pulse train
01/22/2002US6340769 Structures with iridium reagents and heterocyclic lewis bases
01/22/2002US6340644 Method for applying a protecting lacquer on a wafer
01/22/2002US6340643 Treatment solution supply method
01/22/2002US6340642 Cleaning surface to remove oxide; drying the surface by blowing a non-oxidizing gas thereon; directly applying layer of lacquer onto surface at temperature below 100.degree. c.; drying layer of lacquer; forming conductive structure
01/22/2002US6340641 Substrate flattening method and film-coated substrate made thereby
01/22/2002US6340640 Etching a silicon substrate with an aqueous etching solution of mixed acid to form projections and recesses in a surface of the silicon substrate, etching solution including hydrofluoric acid, nitric acid and an adjusting agent
01/22/2002US6340639 Plasma process apparatus and plasma process method for substrate
01/22/2002US6340638 Method for forming a passivation layer on copper conductive elements
01/22/2002US6340637 Chemical vapor deposition of titanium from titanium tetrachloride and hydrocarbon reactants
01/22/2002US6340636 Method for forming metal line in semiconductor device
01/22/2002US6340635 Resist pattern, process for the formation of the same, and process for the formation of wiring pattern
01/22/2002US6340634 Method of manufacturing an assembly of conductors and a semiconductor device manufactured by means of such an assembly
01/22/2002US6340633 Method for ramped current density plating of semiconductor vias and trenches
01/22/2002US6340632 Method of manufacturing a semiconductor device
01/22/2002US6340630 Method for making interconnect for low temperature chip attachment
01/22/2002US6340629 Method for forming gate electrodes of semiconductor device using a separated WN layer
01/22/2002US6340628 Providing a semiconductor substrate in chemical vapor deposition chamber; introducing a precursor gas, introducing carbon dioxide containing gas, heating to deposit dielectric layer
01/22/2002US6340627 Method of making a doped silicon diffusion barrier region
01/22/2002US6340626 Method for making a metallic pattern by photolithography
01/22/2002US6340625 Method for simultaneously forming thinner and thicker parts of a dual oxide layer having varying thicknesses
01/22/2002US6340624 Method of forming a circuitry isolation region within a semiconductive wafer
01/22/2002US6340623 Method of fabricating semiconductor device
01/22/2002US6340622 Forming a lower electrode on a semiconductor substrate, depositing an amorphous tantalum oxynitride (taon) thin film over the lower electrode, and subjecting to thermal procedure to form dielectric film, forming upper electrode
01/22/2002US6340621 Thin film capacitor and method of manufacture
01/22/2002US6340620 Method of fabricating a capacitor
01/22/2002US6340619 Capacitor and method of fabricating the same
01/22/2002US6340618 RF power transistor
01/22/2002US6340617 Manufacture of semiconductor device
01/22/2002US6340616 Method for fabricating an integrated electronic circuit and integrated electronic circuit
01/22/2002US6340615 Method of forming a trench capacitor DRAM cell
01/22/2002US6340614 Method of forming a DRAM cell
01/22/2002US6340613 Structural integrity enhancement of dielectric films
01/22/2002US6340612 Method of fabricating body contacted and backgated transistors
01/22/2002US6340611 Nonvolatile semiconductor memory device
01/22/2002US6340610 Thin-film transistor and method of making same
01/22/2002US6340609 Method of forming thin film transistor
01/22/2002US6340608 Method of fabricating copper metal bumps for flip-chip or chip-on-board IC bonding on terminating copper pads
01/22/2002US6340607 Process for mounting semiconductor device and mounting apparatus
01/22/2002US6340606 Semiconductor device and method of manufacturing the same, circuit board, and electronic instrument
01/22/2002US6340603 Plasma emission detection during lateral processing of photoresist mask
01/22/2002US6340602 Method of measuring meso-scale structures on wafers
01/22/2002US6340601 Method for reworking copper metallurgy in semiconductor devices
01/22/2002US6340600 Methods for fabricating large single-grained ferroelectric thin film, for fabricating ferroelectric thin film capacitor using the same, and for fabricating ferroelectric memory device using the same
01/22/2002US6340559 In the manufacture of integrated circuits
01/22/2002US6340557 Depositing anti-reflection coating of organic material for absorbing energy beam on etching target film formed on a semiconductor substrate, a photosensitive film including a sulfonyl compound is deposited; irradiating, removing
01/22/2002US6340553 Positive-working photoresist composition
01/22/2002US6340546 Which, on heating, become heat-resistant polyimide polymers suitable for surface-protecting films, interlayer insulating films
01/22/2002US6340543 Photomask, manufacturing method thereof, and semiconductor device
01/22/2002US6340542 Transferring the selected function-block patterns sequentially to the wafer, thereby forming a desired pattern thereon by photolithography
01/22/2002US6340541 Mask for recycling and fabrication method thereof
01/22/2002US6340535 Method for the heat treatment of a ZnSe crystal substrate, heat treated substrate and light emission device
01/22/2002US6340435 Integrated low K dielectrics and etch stops
01/22/2002US6340434 Method and apparatus for chemical-mechanical polishing
01/22/2002US6340405 Etching apparatus for manufacturing semiconductor devices
01/22/2002US6340395 Salsa clean process
01/22/2002US6340393 Method for synthesizing n-type diamond having low resistance
01/22/2002US6340390 Method for manufacturing silicon single crystal
01/22/2002US6340386 MOCVD of SBT using toluene based solvent system for precursor delivery