Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2002
02/07/2002US20020014669 Field-effect-controlled transistor and method for fabricating the transistor
02/07/2002US20020014668 Semiconductor device
02/07/2002US20020014667 Method of horizontally growing carbon nanotubes and field effect transistor using the carbon nanotubes grown by the method
02/07/2002US20020014666 Semiconductor device formed on (111) surface of a si crystal and fabrication process thereof
02/07/2002US20020014664 Multi-function semiconductor structure and method
02/07/2002US20020014663 Semiconductor device and manufacturing process thereof
02/07/2002US20020014662 Fabrication method for semiconductor integrated circuit devices and semiconductor integrated circuit device
02/07/2002US20020014661 Method of manufacturing semiconductor devices by dividing wafer into chips and such semiconductor devices
02/07/2002US20020014660 Highly conductive composite polysilicon gate for cmos integrated circuits
02/07/2002US20020014659 Semiconductor device and method of fabricating the same
02/07/2002US20020014658 High voltage power mosfet having low on-resistance
02/07/2002US20020014657 Semiconductor device with a thin gate stack having a plurality of insulating layers
02/07/2002US20020014656 Semiconductor memory
02/07/2002US20020014654 Method and structure for an oxide layer overlying an oxidation-resistant layer
02/07/2002US20020014653 Autoaligned etching process for realizing word lines in memory devices integrated semiconductor substrates
02/07/2002US20020014652 Method and apparatus for a semiconductor device with adjustable threshold voltage
02/07/2002US20020014650 High frequency transistor device
02/07/2002US20020014649 Memory cell, method of controlling same and method of manufacturing same
02/07/2002US20020014648 Semiconductor device and method of manufacturing the same
02/07/2002US20020014647 Trench capacitor with isolation collar and corresponding method of production
02/07/2002US20020014646 Integrated circuit capacitor
02/07/2002US20020014645 Semiconductor memory device and method for operation thereof
02/07/2002US20020014644 Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material
02/07/2002US20020014643 Circuit-incorporating photosensitve device
02/07/2002US20020014642 Independently programmable memory segments within a PMOS electrically erasable programmable read only memory array achieved by N-well separation and method therefor
02/07/2002US20020014641 Semiconductor integrated circuit device and having deposited layer for gate insulation
02/07/2002US20020014639 Semiconductor device having heat protection circuits
02/07/2002US20020014638 Semiconductor integrated circuit
02/07/2002US20020014637 Semiconductor integrated circuit device
02/07/2002US20020014634 Semiconductor device and method of manufacturing the same
02/07/2002US20020014633 High frequency field effect transistor with carrier extraction to reduce intrinsic conduction
02/07/2002US20020014631 Semiconductor light emitting device
02/07/2002US20020014630 Light emitting element, method of manufacturing the same, and semiconductor device having light emitting element
02/07/2002US20020014629 Group III nitride compound semiconductor device and method for producing the same
02/07/2002US20020014628 Display device
02/07/2002US20020014626 Substrate of semiconductor device and fabrication method thereof as well as semiconductor device and fabrication method thereof
02/07/2002US20020014625 Semiconductor device and method of manufacturing the same
02/07/2002US20020014624 Semiconductor device
02/07/2002US20020014623 Method for producing insulated gate thin film semiconductor device
02/07/2002US20020014621 Method of manufactruing structure with pores and structure with pores
02/07/2002US20020014615 For electrically connecting a liquid crystal display (LCD) to a circuit board
02/07/2002US20020014600 Scanning exposure method
02/07/2002US20020014598 Plasma focus light source with active and buffer gas control
02/07/2002US20020014587 Method and system for ion beam containment in an ion beam guide
02/07/2002US20020014577 Circuit for machine-vision system
02/07/2002US20020014533 Automated object dimensioning system employing contour tracing, vertice detection, and forner point detection and reduction methods on 2-d range data maps
02/07/2002US20020014519 Method of applying bonding paste
02/07/2002US20020014515 Method of self-correcting bond placement errors of integrated circuit bonders
02/07/2002US20020014512 Wire bonding apparatus
02/07/2002US20020014483 Batch type heat treatment system, method for controlling same, and heat treatment method
02/07/2002US20020014471 Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor
02/07/2002US20020014465 Carrier tape
02/07/2002US20020014448 Grinding slurry recycling apparatus
02/07/2002US20020014435 Shock resistant variable load tolerant wafer shipper
02/07/2002US20020014407 For reducing the surface roughness (smoothing) and improving the thickness uniformity of, top silicon film of silicon-on-insulator wafer or similar thin-film electronic or photonic workpiecies
02/07/2002US20020014390 Wafer carrying system and carrying method thereof
02/07/2002US20020014350 Methods of making connections to a microelectronic unit
02/07/2002US20020014346 Mounting structure of semiconductor package
02/07/2002US20020014311 Substrate processing apparatus and method
02/07/2002US20020014310 Method and apparatus for endpointing a chemical-mechanical planarization process
02/07/2002US20020014308 Plasma etching apparatus
02/07/2002US20020014289 Physical vapor deposition targets
02/07/2002US20020014275 Automatic refill system for ultra pure or contamination sensitive chemicals
02/07/2002US20020014263 Method of manufacturing a non-single-crystal thin film solar cell
02/07/2002US20020014257 Applying gas in supercritical state to substrate; soak and agitation steps are applied to the wafer, including a rapid decompression of the chamber after a soak period at higher supercritical pressure to loosen debris and cleaning
02/07/2002US20020014207 Vaporizing reactant liquids for chemical vapor deposition film processing
02/07/2002US20020014205 Chemical vapor deposition method for depositing silicide and apparatus for performing the same
02/07/2002US20020014204 Heater block having catalyst spray means
02/07/2002US20020014203 View port of a chemical vapor deposition device for manufacturing semiconductor devices
02/07/2002US20020014160 Chemical Filter
02/07/2002US20020014084 Substrate-processing apparatus
02/07/2002DE19826382C2 Verfahren zum anisotropen Ätzen von Silicium A method for anisotropic etching of silicon
02/07/2002DE10136197A1 Determination of a test object thickness, such as a lithium tantalum or diamond crystal with double refracting properties using optical refractive and polarizing equipment
02/07/2002DE10135557A1 Semiconductive device used in complementary metal oxide semiconductor transistor, sequentially comprises substrate, conductive silicon film, silicide film, barrier film, and metal film
02/07/2002DE10133719A1 Organic anti-reflective polymer, for fabricating ultrafine patterns of semiconductor devices, has specific composition
02/07/2002DE10133716A1 Organic anti-reflective polymer, for fabricating ultrafine patterns and 4G DRAM semiconductor devices as it eliminates standing waves caused by optical properties of lower layers on the wafer and by thickness changes of the photoresist
02/07/2002DE10125368A1 Bauelement mit differentiellem negativem Widerstand und Verfahren zu dessen Herstellung Component having a differential negative-resistance and process for its preparation
02/07/2002DE10114832A1 Postsiliziumverfahren zum Einstellen der Anstieg-/Abfallzeiten von Zeitsignalflanken Post silicon method for adjusting the attack- / fall times of the time signal edges
02/07/2002DE10106423A1 Semiconductor structure for dynamic threshold metal oxide semiconductor field effect transistor for notebook computers partly overlaps contact body with isolation film
02/07/2002DE10056296C1 MOS vertical transistor for LV applications has polycrystalline drain electrode in window of insulation layer on one side of semiconductor body and gate electrode within insulation layer on its opposite side
02/07/2002DE10046296A1 Elektronisches Chipbauteil mit einer integrierten Schaltung und Verfahren zur Herstellung An electronic chip component with an integrated circuit and methods for making
02/07/2002DE10035439A1 Gate transistor, used in DRAM storage cell for PCs, comprises gate arranged on substrate, source arranged next to first edge of gate, and drain arranged next to second edge of gate
02/07/2002DE10035430A1 Verfahren und Vorrichtung zur thermischen Behandlung einer Fotolackschicht auf einem Schaltungssubstrat, insbesondere Halbleiterwafer Method and apparatus for thermal treatment of a photoresist layer on a circuit substrate, in particular semiconductor wafers
02/07/2002DE10035344A1 Shadow mask for local processing of substrate has micromechanical structure opening facilitating local processing
02/07/2002DE10034868A1 MRAM-Speicherzelle MRAM memory cell
02/07/2002DE10034020A1 Metallisierungsanordnung für Halbleiterstruktur und entsprechendes Herstellungsverfahren Metallisierungsanordnung for semiconductor structure and corresponding manufacturing method
02/07/2002DE10034004A1 Non-volatile semiconductor storage cell, used in e.g. EPROMs, has active region with sharp edge on surface of tunnel layer in tunnel window region
02/07/2002DE10016996C1 Testanordnung zur Funktionsprüfung eines Halbleiterchips Test set for testing the function of a semiconductor chip
02/07/2002CA2416655A1 Hierarchical design and test method and system, program product embodying the method and integrated circuit produced thereby
02/07/2002CA2414602A1 Silicatein-mediated synthesis of amorphous silicates and siloxanes and their uses
02/06/2002EP1178611A2 Current source cell arrangement, method of selecting current cell and current addition type digital-to-analog converter
02/06/2002EP1178543A1 Semiconductor light emitting device
02/06/2002EP1178540A1 Nonvolatile memory cell with high programming efficiency
02/06/2002EP1178539A2 Schottky field-effect transistor
02/06/2002EP1178538A2 Heterojunction bipolar transistor with reduced thermal resistance
02/06/2002EP1178533A1 Non-volatile semiconductor memory device and manufacturing method thereof
02/06/2002EP1178532A2 NMOS and PMOS with strained channel layer
02/06/2002EP1178531A1 Input protecting circuit in use with a CMOS semiconductor device
02/06/2002EP1178530A2 Three-dimensional processor using transferred thin film circuits
02/06/2002EP1178529A2 Semiconductor device with a light blocking layer