H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2002
11/19/2002	US6481723 Lift pin impact management
11/19/2002	US6481720 Stern tube sealing apparatus
11/19/2002	US6481616 Bump bonding device and bump bonding method
11/19/2002	US6481614 Apparatus for mounting semiconductor chips on a substrate
11/19/2002	US6481558 Integrated load port-conveyor transfer system
11/19/2002	US6481447 Fluid delivery ring and methods for making and implementing the same
11/19/2002	US6481446 Method of cleaning a polishing pad conditioner and apparatus for performing the same
11/19/2002	US6481309 Transfer arm
11/19/2002	US6481187 Position sensing system and method for an inspection handling system
11/19/2002	US6481119 Apparatus for removing organic antireflection coating
11/19/2002	CA2409373A1 Ceramic joined body substrate holding structure and substrate processing apparatus
11/19/2002	CA2266330C Internet television apparatus
11/19/2002	CA2252875C Semiconductor device and fabrication method thereof
11/19/2002	CA2238857C Ferroelectric material, method of manufacturing the same, semiconductor memory, and method of manufacturing the same
11/17/2002	CA2380209A1 Organic semiconductor devices with short channels
11/14/2002	WO2002091812A1 Method and component system for providing a substrate with electronic components
11/14/2002	WO2002091809A2 Method and device for generating an activated gas curtain for surface treatment
11/14/2002	WO2002091496A2 Reversible field-programmable electric interconnects
11/14/2002	WO2002091494A1 Switch element having memeory effect
11/14/2002	WO2002091488A2 Semiconductor device including an optically-active material
11/14/2002	WO2002091483A2 Improved photovoltaic device
11/14/2002	WO2002091477A1 Barrier structures for integration of high k oxides with cu and ai electrodes
11/14/2002	WO2002091476A1 Floating gate memory device using composite molecular material
11/14/2002	WO2002091473A1 Ferroelectric composite material, method of making same and memory utilizing same
11/14/2002	WO2002091472A2 Transistor and integrated circuit
11/14/2002	WO2002091471A2 Integrated circuit
11/14/2002	WO2002091468A1 Method for thin film lift-off processes using lateral extended etching masks and device
11/14/2002	WO2002091463A1 Semiconductor process and integrated circuit
11/14/2002	WO2002091462A1 Dual damascene using removable via studs
11/14/2002	WO2002091461A2 Ionized pvd with sequential deposition and etching
11/14/2002	WO2002091460A2 Method of manufacturing an interconnection in an electoronic device
11/14/2002	WO2002091459A1 A method and apparatus for bleeding off accumulated charge from an electrostatic clamp
11/14/2002	WO2002091458A1 Method of producing electrostatic chucks and method of producing ceramic heaters
11/14/2002	WO2002091457A1 Ceramic plate for semiconductor producing/inspecting apparatus
11/14/2002	WO2002091456A1 Method for the industrial production of a slot for anchoring a plastic moulding resin
11/14/2002	WO2002091455A1 Thin film transistor self-aligned to a light-shield layer
11/14/2002	WO2002091454A1 Method of manufacturing a thin film transistor
11/14/2002	WO2002091452A2 Methods of forming a nitridated surface on a metallic layer and products produced thereby
11/14/2002	WO2002091451A2 Methods of forming gap fill and layers formed thereby
11/14/2002	WO2002091450A2 Ordered two-phase dielectric film, and semiconductor device containing the same
11/14/2002	WO2002091449A2 Etching a substrate in a process zone
11/14/2002	WO2002091448A1 Gaseous phase growing device
11/14/2002	WO2002091447A1 System and method for heat treating semiconductor
11/14/2002	WO2002091446A1 Vacuum treatment method and vacuum treatment device
11/14/2002	WO2002091445A1 Coating agent, plasma-resistant component having coating film formed by the coating agent, plasma processing device provided with the plasma-resistant component
11/14/2002	WO2002091442A1 Monocrystallaline material layer on a compliant substrate
11/14/2002	WO2002091441A2 Semiconductor device and method of making same
11/14/2002	WO2002091438A1 Method of removing debris from cleaning pads in work piece cleaning equipment
11/14/2002	WO2002091437A2 Tisin barrier formation with treatment in n2/h2 plasma and in silane
11/14/2002	WO2002091436A1 Apparatus for the measurement or machining of an object, provided with a displacement stage with wedge-shaped guides
11/14/2002	WO2002091435A2 Device for wet cleaning disc-shaped substrates
11/14/2002	WO2002091434A2 Wide bandgap semiconductor structure
11/14/2002	WO2002091433A2 Method for grinding the back sides of wafers
11/14/2002	WO2002091432A2 Microelectronic structure comprising a hydrogen barrier layer
11/14/2002	WO2002091422A2 Raster shaped beam, electron beam exposure strategy using a two dimensional multiplexel flash field
11/14/2002	WO2002091190A2 Memory with a bit line block and/or a word line block for preventing reverse engineering
11/14/2002	WO2002091083A1 Photoimageable composition
11/14/2002	WO2002091079A1 Photo mask, production method of the same, pattern forming method using the photo mask
11/14/2002	WO2002091057A1 Systems and methods for scanning a beam of light across a specimen
11/14/2002	WO2002091006A1 Method for measuring fuse resistance in a fuse array
11/14/2002	WO2002090922A2 Method and apparatus for nondestructive measurement and mapping of sheet materials
11/14/2002	WO2002090625A1 A method to produce germanium layers
11/14/2002	WO2002090614A1 Method for depositing a coating having a relatively high dielectric constant onto a substrate
11/14/2002	WO2002090423A1 Polysiloxane, process for production thereof and radiation-sensitive resin composition
11/14/2002	WO2002090222A1 Device for gripping and holding an object in a contactless manner
11/14/2002	WO2002090050A1 Wafer polishing method and wafer polishing device
11/14/2002	WO2002090036A1 Method and apparatus for laser ablative modification of dielectric surfaces
11/14/2002	WO2002080233A3 Process and apparatus for removing residues from the microstructure of an object
11/14/2002	WO2002078057A3 A transpinnor-based sample-and-hold circuit and applications
11/14/2002	WO2002077589A3 Method and apparatus for endpoint detection using partial least squares
11/14/2002	WO2002075811A3 Method for fabricating a metal resistor in an ic chip and related structure
11/14/2002	WO2002075790A3 Method and apparatus for transferring heat from a substrate to a chuck
11/14/2002	WO2002075344A3 Semiconductor element comprising a semimagnetic contact
11/14/2002	WO2002073699A3 Nanofabrication
11/14/2002	WO2002073661A3 Extraction method of defect density and size distributions
11/14/2002	WO2002071465A9 Process for the manufacture of large area arrays of discrete components
11/14/2002	WO2002069284A8 Time-detection device and time- detection method by using a semi-conductor element
11/14/2002	WO2002069045A3 Anti-reflective coating material, semiconductor product with an arc layer and methods
11/14/2002	WO2002067291A3 Arrangement of a semi-conductor chip on a substrate
11/14/2002	WO2002059968A3 Integrated circuits protected against reverse engineering using an apparent metal contact line terminating on field oxide and method
11/14/2002	WO2002054505A3 System and method for electrically induced breakdown of nanostructures
11/14/2002	WO2002049076A3 Semiconductor device layout
11/14/2002	WO2002045868A3 Patterned deposition using compressed carbon dioxide
11/14/2002	WO2001057740A3 Calibration software tool and method
11/14/2002	WO2001045134A9 Method and apparatus for producing uniform process rates
11/14/2002	WO2001027991A9 Centrifugal gripper mechanism for dynamic force compensation
11/14/2002	WO2001027972A9 Molecular scale electronic devices
11/14/2002	WO2001023141A9 Polishing pad
11/14/2002	WO2001022717A3 Localizing and isolating an errant process step
11/14/2002	US20020170031 Method for manufacturing a pair of complementary masks
11/14/2002	US20020170027 Method and apparatus for pre-computing placement costs
11/14/2002	US20020170026 Method of designing integrated circuit using hierarchical design technique
11/14/2002	US20020170022 Data analysis apparatus, data analysis method, and computer products
11/14/2002	US20020170010 Power reduction in module-based scan testing
11/14/2002	US20020169266 Polymeric compound and resin composition for photoresist
11/14/2002	US20020169225 Forming a nanoporous aerogel using a supercritical drying process, adding a reinforcing material and volatile compound to form an amalgamated layer; treating to increase strength; films; durability; integrated circuits
11/14/2002	US20020169088 Cleaning solution for semiconductor surfaces following chemical-mechanical polishing
11/14/2002	US20020168929 Cutting blade
11/14/2002	US20020168926 Apparatus and process for recovering abrasive
11/14/2002	US20020168923 Chemical mechanical polishing slurry useful for copper substrates

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