Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2002
11/21/2002DE10121778A1 Improving a doping profile during gas phase doping comprises preparing a semiconductor substrate, introducing silicon nitride and/or decomposition products of silicon nitride
11/21/2002DE10062212C1 Process for doping silicon carbide semiconductor substrates comprises making the region to be doped amorphous by implanting doping atoms, enriching with doping atoms, and recrystallizing by curing
11/21/2002CA2447058A1 Group-iii nitride based high electron mobility transistor (hemt) with barrier/spacer layer
11/21/2002CA2443512A1 High-resistivity silicon carbide substrate for semiconductor devices with high breakdown voltage
11/20/2002EP1259103A1 Multilayer printed wiring board and method for producing multilayer printed wiring board
11/20/2002EP1258990A2 Method and system for wafer-level tuning of bulk acoustic wave resonators and filters
11/20/2002EP1258975A1 Control circuit for high voltage generator
11/20/2002EP1258929A2 Semiconductor LED flip-chip having low refractive index underfill
11/20/2002EP1258928A1 Light emitting diode and semiconductor laser
11/20/2002EP1258924A2 Method for manufacturing of devices on an SOI wafer
11/20/2002EP1258923A2 Semiconductor memory device and manufacturing method for the same
11/20/2002EP1258920A2 Method of manufacturing buried regions
11/20/2002EP1258919A2 Method of manufacturing a silicon wafer
11/20/2002EP1258918A1 Electrostatic chuck member and method of producing the same
11/20/2002EP1258917A1 Method and device for preventing oxidation on substrate surface
11/20/2002EP1258916A1 Thickness measuring apparatus, thickness measuring method, and wet etching apparatus and wet etching method utilizing them
11/20/2002EP1258915A1 Method of detecting defects on a semiconductor device in a processing tool and an arrangement therefore
11/20/2002EP1258913A2 Method for producing a semiconductor device
11/20/2002EP1258912A2 A single RIE process for MIMCAP top and bottom plates
11/20/2002EP1258911A2 Method of using titanium doped aluminium oxide for passivation of ferroelectric materials and devices including the same
11/20/2002EP1258910A2 Wafer alignment device
11/20/2002EP1258909A2 Method and device for the heat treatment of substrates
11/20/2002EP1258908A2 Automated spray cleaning apparatus for semiconductor wafers
11/20/2002EP1258888A2 Multi-port memory cell with refresh port
11/20/2002EP1258887A2 Memory architecture with refresh and sense amplifiers
11/20/2002EP1258834A1 Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer
11/20/2002EP1258830A2 Method for adjusting a resonating circuit of a passive transponder
11/20/2002EP1258796A2 Copy protection method and system for a field-programmable gate array
11/20/2002EP1258781A2 Interferometer system
11/20/2002EP1258780A2 Optical imaging system with polarising means and crystalline quartz plate therefor
11/20/2002EP1258670A2 Gas containment system
11/20/2002EP1258634A1 Vacuum pump
11/20/2002EP1258544A1 Compound crystal and method of manufacturing same
11/20/2002EP1258317A1 A carrier head with flexible membrane for a chemical mechanical polishing system
11/20/2002EP1258060A1 Fast wavelength correction technique for a laser
11/20/2002EP1258040A1 Vertical conduction flip-chip device with bump contacts on single surface
11/20/2002EP1258039A1 Communicating device
11/20/2002EP1258038A1 Semiconductor devices
11/20/2002EP1258037A1 Abrasives for chemical mechanical polishing
11/20/2002EP1258036A1 Method for producing a ferroelectric layer
11/20/2002EP1258035A1 Process for wafer level treatment to reduce stiction and passivate micromachined surfaces and compounds used therefor
11/20/2002EP1258034A1 A METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE OF SiC
11/20/2002EP1258033A1 Tungsten gate electrode method and device
11/20/2002EP1258032A1 Method for producing defined polycrystalline silicon areas in an amorphous silicon layer
11/20/2002EP1258031A1 Semiconductor structure
11/20/2002EP1258030A1 A process for forming a semiconductor structure
11/20/2002EP1258029A1 Method for treating a diamond surface and corresponding diamond surface
11/20/2002EP1258028A2 Wafer processing system
11/20/2002EP1258027A2 Semiconductor structure
11/20/2002EP1257924A1 Process monitoring system for lithography lasers
11/20/2002EP1257882A2 Device for detecting wave fronts
11/20/2002EP1257880A2 Resist materials for 157-nm lithography
11/20/2002EP1257879A2 Radiation sensitive copolymers, photoresist compositions thereof and deep uv bilayer systems thereof
11/20/2002EP1257683A1 Method for removing adsorbed molecules from a chamber
11/20/2002EP1257386A1 Polishing pad with a transparent portion
11/20/2002EP1126950B1 Apparatuses and methods for polishing semiconductor wafers
11/20/2002EP1035945A4 Manufacturing a memory disk or semiconductor device using an abrasive polishing system, and polishing pad
11/20/2002EP0901637B1 Method for testing electronic components
11/20/2002CN2521757Y Overlay crystal welding pad allocation on chip for reducing impedance
11/20/2002CN2521754Y Crystal round grinding positioning ring
11/20/2002CN2521753Y Overlay crystal chip conducting scab and redistribution lead wire layer allocation
11/20/2002CN2521752Y Crystal plate reproducing apparatus
11/20/2002CN1381160A Method for producing ceramic substrate
11/20/2002CN1381070A Semiconductor device, method of manufacture thereof, circuit board and electronic device
11/20/2002CN1381069A Module with built-in electronic elements and method of manufacture thereof
11/20/2002CN1381068A Substrate for transfer mask, transfer mask, and method of manufacture thereof
11/20/2002CN1380993A Polymers containing oyxgen and sulfur alicylic units and photoresist compositions comprising same
11/20/2002CN1380980A Device and method for inspection
11/20/2002CN1380979A Probe card and method of producing the same
11/20/2002CN1380730A 反射系数相位检测器 Reflection coefficient phase detector
11/20/2002CN1380727A Group III nitride semiconductor laser device and manufacturing method thereof
11/20/2002CN1380700A Panel display and manufacturing method thereof
11/20/2002CN1380699A Electrically-erasable programmable internal storage device and its production method
11/20/2002CN1380697A Non-volatibility semiconductor memory
11/20/2002CN1380692A Semiconductor device having test elements
11/20/2002CN1380690A Method for making inductance component on chip
11/20/2002CN1380689A Reliability testing device and its testing method
11/20/2002CN1380688A Crystal-covering mounting method of power fieldistor for protection circuit of charging cell
11/20/2002CN1380687A Method for producing semiconductor whose barrier is formed with dielectric layer
11/20/2002CN1380686A Method or elimianting barrier layer pore of semiconductor element
11/20/2002CN1380685A Plasma treatment device and plasma treatment method
11/20/2002CN1380684A Method for forming self-algining metal silicide contactor on semi-conductor wafer
11/20/2002CN1380683A Column-foot type storage note and its contact plug and its production method
11/20/2002CN1380682A Method for manufacturing compound substrate of semiconductor
11/20/2002CN1380681A Method for forming crystaline semiconductor film lamination and colour filter
11/20/2002CN1380658A Method for writing-in action by using source bias to excute non-volatility internal storage unit
11/20/2002CN1380584A Exposure method for forming IC chip image in intermeidate mask using main mask
11/20/2002CN1380578A 液晶显示装置 The liquid crystal display device
11/20/2002CN1380572A Chemical polishing method and device for liquid crystal glass base plate
11/20/2002CN1380541A Method for measuring temp. and monitoring etching rate by using optical method
11/20/2002CN1380449A Process for mixing oxygen into gallium nitride crystal and oxygen-mixed n-type gallium nitride single crystal plate
11/20/2002CN1380238A Arm of scalar robot
11/20/2002CN1094658C Power semiconductor device and method of fabricating the same
11/20/2002CN1094655C Forming polyimide coatings by screen printing method
11/20/2002CN1094654C Insulated gate semiconductor device and method of manufacture
11/20/2002CN1094653C Method for manufacturing high temp. pressure sensor chip
11/20/2002CN1094652C Method of manufacturing semiconductor device with crystallizing semiconductor film
11/19/2002WO2002083596A1 Joined ceramic article, substrate holding structure and apparatus for treating substrate
11/19/2002US6484307 Method for fabricating and checking structures of electronic circuits in a semiconductor substrate
11/19/2002US6484305 Impurity quantity transfer device enabling reduction in pseudo diffusion error generated at integral interpolation of impurity quantities and impurity interpolation method thereof
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