Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2002
11/19/2002US6482746 Computer readable medium for controlling a method of cleaning a process chamber
11/19/2002US6482745 Etching methods for anisotropic platinum profile
11/19/2002US6482743 Method of forming a semiconductor device using CMP to polish a metal film
11/19/2002US6482742 Fluid pressure imprint lithography
11/19/2002US6482741 Copper wiring structure comprising a copper material buried in a hollow of an insulating film and a carbon layer between the hollow and the copper material in semiconductor device and method fabricating the same
11/19/2002US6482740 Method of growing electrical conductors by reducing metal oxide film with organic compound containing -OH, -CHO, or -COOH
11/19/2002US6482739 Method for decreasing the resistivity of the gate and the leaky junction of the source/drain
11/19/2002US6482738 Method of locally forming metal silicide layers
11/19/2002US6482737 Fabrication method of implanting silicon-ions into the silicon substrate
11/19/2002US6482736 Methods for forming and integrated circuit structures containing enhanced-surface-area conductive layers
11/19/2002US6482734 Diffusion barrier layer for semiconductor device and fabrication method thereof
11/19/2002US6482733 Protective layers prior to alternating layer deposition
11/19/2002US6482732 Method and apparatus for polishing semiconductor wafer
11/19/2002US6482731 Semiconductor processing methods of forming devices on a substrate, forming device arrays on a substrate, forming conductive lines on a substrate, and forming capacitor arrays on a substrate, and integrated circuitry
11/19/2002US6482730 Method for manufacturing a semiconductor device
11/19/2002US6482728 Method for fabricating floating gate
11/19/2002US6482727 Method of producing a semiconductor integrated circuit device and the semiconductor integrated circuit device
11/19/2002US6482726 Control trimming of hard mask for sub-100 nanometer transistor gate
11/19/2002US6482725 Gate formation method for reduced poly-depletion and boron penetration
11/19/2002US6482724 Integrated circuit asymmetric transistors
11/19/2002US6482723 Method for forming self-aligned floating gates
11/19/2002US6482722 Process of crystallizing semiconductor thin film and laser irradiation system
11/19/2002US6482721 Method of manufacturing a polysilicon active layer in a thin film transistor
11/19/2002US6482720 Method for manufacturing compound semiconductor device
11/19/2002US6482719 Semiconductor field region implant methodology
11/19/2002US6482718 Method of manufacturing semiconductor device
11/19/2002US6482717 Method of manufacturing a semiconductor device including forming well comprising EPI in trench
11/19/2002US6482716 Uniform recess depth of recessed resist layers in trench structure
11/19/2002US6482715 Method of forming shallow trench isolation layer in semiconductor device
11/19/2002US6482714 Semiconductor device and method of manufacturing the same
11/19/2002US6482712 Method for fabricating a bipolar semiconductor device
11/19/2002US6482711 InPSb/InAs BJT device and method of making
11/19/2002US6482710 Bipolar transistor and manufacting method thereof
11/19/2002US6482709 Manufacturing process of a MOS transistor
11/19/2002US6482708 Nonvolatile memory device and method for manufacturing the same
11/19/2002US6482707 Method of improving static refresh
11/19/2002US6482706 Method to scale down device dimension using spacer to confine buried drain implant
11/19/2002US6482705 Method of fabricating a semiconductor device having a MOSFET with an amorphous SiGe gate electrode and an elevated crystalline SiGe source/drain structure and a device thereby formed
11/19/2002US6482704 Method of manufacturing silicon carbide semiconductor device having oxide film formed thereon with low on-resistances
11/19/2002US6482703 Method for fabricating an electrostatic discharge device in a dual gate oxide process
11/19/2002US6482702 Method of forming and recognizing an identification mark for read-only memory
11/19/2002US6482701 Integrated gate bipolar transistor and method of manufacturing the same
11/19/2002US6482700 Split gate field effect transistor (FET) device with enhanced electrode registration and method for fabrication thereof
11/19/2002US6482699 Method for forming self-aligned contacts and local interconnects using decoupled local interconnect process
11/19/2002US6482698 Method of manufacturing an electrically programmable, non-volatile memory and high-performance logic circuitry in the same semiconductor chip
11/19/2002US6482697 Method of forming a highly integrated non-volatile semiconductor memory device
11/19/2002US6482696 Method of forming storage nodes in a DRAM
11/19/2002US6482695 Method for fabricating semiconductor device including stacked capacitors
11/19/2002US6482694 Semiconductor device structure including a tantalum pentoxide layer sandwiched between silicon nitride layers
11/19/2002US6482693 Methods of forming diodes
11/19/2002US6482692 Method of manufacturing a semiconductor device, having first and second semiconductor regions with field shield isolation structures and a field oxide film covering a junction between semiconductor regions
11/19/2002US6482691 Seismic imaging using omni-azimuth seismic energy sources and directional sensing
11/19/2002US6482690 Method for fabricating semiconductor device
11/19/2002US6482689 Stacked local interconnect structure and method of fabricating same
11/19/2002US6482688 Utilizing amorphorization of polycrystalline structures to achieve T-shaped MOSFET gate
11/19/2002US6482687 Laser processing method
11/19/2002US6482686 Method for manufacturing a semiconductor device
11/19/2002US6482685 Method for fabricating a low temperature polysilicon thin film transistor incorporating multi-layer channel passivation step
11/19/2002US6482684 Method of manufacturing a TFT with Ge seeded amorphous Si layer
11/19/2002US6482682 Manufacturing method for improving reliability of polysilicon thin film transistors
11/19/2002US6482681 Hydrogen implant for buffer zone of punch-through non epi IGBT
11/19/2002US6482680 Flip-chip on lead frame
11/19/2002US6482678 Wafer preparation systems and methods for preparing wafers
11/19/2002US6482677 Chip component assembly manufacturing method
11/19/2002US6482676 Method of mounting semiconductor chip part on substrate
11/19/2002US6482675 Substrate strip for use in packaging semiconductor chips and method for making the substrate strip
11/19/2002US6482673 Semiconductor device, method of making the same, circuit board, flexible substrate, and method of making substrate
11/19/2002US6482672 Using a critical composition grading technique to deposit InGaAs epitaxial layers on InP substrates
11/19/2002US6482671 Integrated optoelectronic device with an avalanche photodetector and method of making the same using commercial CMOS processes
11/19/2002US6482670 Semiconductor manufacturing unit and semiconductor manufacturing method
11/19/2002US6482669 Colors only process to reduce package yield loss
11/19/2002US6482667 Solid state image sensor device and method of fabricating the same
11/19/2002US6482666 Semiconductor device, its manufacturing method and substrate for manufacturing a semiconductor device
11/19/2002US6482662 Semiconductor device fabricating method
11/19/2002US6482660 Effective channel length control using ion implant feed forward
11/19/2002US6482659 Post-epitaxial thermal oxidation for reducing microsteps on polished semiconductor wafers
11/19/2002US6482658 Nonvolatile ferroelectric memory having shunt lines
11/19/2002US6482657 Methods of manufacturing tunnel magnetoresistive element, thin-film magnetic head and memory element
11/19/2002US6482656 Method of electrochemical formation of high Tc superconducting damascene interconnect for integrated circuit
11/19/2002US6482567 Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
11/19/2002US6482566 Hydroxycarborane photoresists and process for using same in bilayer thin film imaging lithography
11/19/2002US6482555 For making a mask for optically transferring a lithographic pattern corresponding to an integrated circuit from the mask onto semiconductor substrate, using an optical exposure tool
11/19/2002US6482554 Method for manufacturing a semiconductor device, photolithography mask and method for manufacturing the same
11/19/2002US6482538 Microelectronic piezoelectric structure and method of forming the same
11/19/2002US6482520 Thermal management system
11/19/2002US6482477 Method for pretreating dielectric layers to enhance the adhesion of CVD metal layers thereto
11/19/2002US6482331 Method for preventing contamination in a plasma process chamber
11/19/2002US6482307 Applying potentials
11/19/2002US6482300 Cup shaped plating apparatus with a disc shaped stirring device having an opening in the center thereof
11/19/2002US6482289 Nonconductive laminate for coupling substrates and method therefor
11/19/2002US6482269 Process for the removal of copper and other metallic impurities from silicon
11/19/2002US6482262 Deposition of transition metal carbides
11/19/2002US6482260 Silicon single crystal wafer and a method for producing it
11/19/2002US6482075 Process for planarizing an isolation structure in a substrate
11/19/2002US6482013 Microelectronic spring contact element and electronic component having a plurality of spring contact elements
11/19/2002US6481956 Method of transferring substrates with two different substrate holding end effectors
11/19/2002US6481955 Vacuum treatment equipment
11/19/2002US6481951 Multiple sided robot blade for semiconductor processing equipment
11/19/2002US6481945 Method and device for transferring wafers
11/19/2002US6481886 Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing system