| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/12/2015 | US20150041310 Sputtering apparatus and method |
| 02/12/2015 | US20150041309 Method and device for production of acetylene using plasma technology |
| 02/12/2015 | US20150041062 Plasma processing chamber with removable body |
| 02/12/2015 | US20150041061 Recursive pumping for symmetrical gas exhaust to control critical dimension uniformity in plasma reactors |
| 02/12/2015 | US20150040829 Multizone hollow cathode discharge system with coaxial and azimuthal symmetry and with consistent central trigger |
| 02/12/2015 | DE112012002764B4 Ladungsteilchenstrahlvorrichtung Charged particle |
| 02/12/2015 | DE102014111372A1 Iridium-spitze, gasfeld-ionenquelle, einrichtung eines fokussierten ionenstrahls, elektronenquelle, elektronenmikroskop, einrichtung zur analyse unter anwendung eines elektronenstrahls, ionen-elektronen- mehrfachstrahl-einrichtung, abtastsondenmikroskop und masken- reparatureinrichtung Iridium-top, gas field-ion source, a focused ion beam device, electron source, electron microscope, device for analysis under an electron beam, ion-electron multiple-jet device, scanning probe and mask-repair facility |
| 02/12/2015 | DE102013108667A1 Magnetfelderzeugungsvorrichtung für eine Magnetronröhre, Magnetron und Verfahren zum Austausch einer alten Magnetronröhre eines Magnetrons gegen eine neue Magnetronröhre Magnetic field generating apparatus for a magnetron, magnetron and method for replacing an old magnetron of a magnetron with a new magnetron |
| 02/12/2015 | DE102013108603A1 Strahlungsquelle, Vorrichtung und Verfahren zur schnellen Wärmebehandlung von Beschichtungen Radiation source device and method for rapid heat treatment of coatings |
| 02/12/2015 | DE102011085789B4 Vertikale Durchlaufbeschichtungsanlage zur kontinuierlichen Vakuumbeschichtung von Substraten Vertical continuous coating plant for continuous vacuum coating of substrates |
| 02/12/2015 | DE102010052341B4 Schutzvorrichtung an Rohrtargets Guard on the tube target |
| 02/12/2015 | DE102010043114B4 Magnetroneinrichtung mit Rohrtarget With magnetron tube target |
| 02/11/2015 | EP2835817A1 Method and data analysis system for semi-automated particle analysis using a charged particle beam |
| 02/11/2015 | EP2834832A2 Integrated optical and charged particle inspection apparatus |
| 02/11/2015 | EP2834208A1 Method and device for production of acetylene using plasma technology |
| 02/11/2015 | CN204155901U 质量分析器 Mass analyzer |
| 02/11/2015 | CN104350584A 基板处理装置及基板处理方法 Substrate processing apparatus and substrate processing method |
| 02/11/2015 | CN104350575A 带电粒子装置 Charged particle device |
| 02/11/2015 | CN104350173A 用于涂布基板的方法及涂布机 Method for coating a substrate and coater |
| 02/11/2015 | CN104347459A 一种盖板、承载装置及等离子体加工设备 One kind of cover, carrying device and a plasma processing apparatus |
| 02/11/2015 | CN104347341A 用于蚀刻的快速气体切换 Fast gas switching for etching |
| 02/11/2015 | CN104347340A 蚀刻速率模拟及其在室内和室对室匹配中的用途 Etch rate simulate their use in indoor and outdoor rooms matching pair of |
| 02/11/2015 | CN104347339A 用于感应耦合等离子体腔室中射频窗的加热器 For inductively coupled radio-frequency plasma chamber window heater |
| 02/11/2015 | CN104347338A 等离子体处理装置的冷却液处理系统及方法 Plasma processing system and method of cooling fluid processing device |
| 02/11/2015 | CN104347337A 刻蚀机和利用刻蚀机刻蚀晶片的方法 Etching machine and use wafer etcher etching method |
| 02/11/2015 | CN104347336A 电感耦合线圈及等离子体加工设备 Coil and inductively coupled plasma processing equipment |
| 02/11/2015 | CN104347335A 铱针尖、及使用铱针尖的离子源、电子源、显微镜和装置 Iridium tip, and the tip of the use of iridium ion source, the electron source, a microscope and means |
| 02/11/2015 | CN102939403B 涂层源及其生产方法 Coating sources and production methods |
| 02/11/2015 | CN102891060B 热阴极离子源系统 Hot cathode ion source system |
| 02/11/2015 | CN102751155B 束流传输系统及其传输方法 Beam transport system and transmission method |
| 02/11/2015 | CN102646569B 等离子体处理装置 Plasma processing apparatus |
| 02/10/2015 | US8954184 Tool performance by linking spectroscopic information with tool operational parameters and material measurement information |
| 02/10/2015 | US8953894 Pattern matching method and image processing device |
| 02/10/2015 | US8952765 System and methods of bimodal automatic power and frequency tuning of RF generators |
| 02/10/2015 | US8952605 Metal hexaboride cold field emitter, method of fabricating same, and electron gun |
| 02/10/2015 | US8952365 Light-emitting panel, manufacturing method of light-emitting panel, and film forming system |
| 02/10/2015 | US8952342 Support and positioning structure, semiconductor equipment system and method for positioning |
| 02/10/2015 | US8952339 Chromatic aberration corrector and method of controlling same |
| 02/10/2015 | US8952330 System and method for electromagnetic interference shielding for critical dimension-scanning electron microscope |
| 02/10/2015 | US8952328 Charged particle detector system comprising a conversion electrode |
| 02/10/2015 | US8951913 Method for removing native oxide and associated residue from a substrate |
| 02/10/2015 | US8951894 Plasma treatment apparatus, method for forming film, and method for manufacturing thin film transistor |
| 02/10/2015 | US8951857 Method for implanting ions in semiconductor device |
| 02/10/2015 | US8951429 Tungsten oxide processing |
| 02/10/2015 | US8951385 Plasma processing apparatus and plasma processing method |
| 02/10/2015 | US8951384 Electron beam plasma source with segmented beam dump for uniform plasma generation |
| 02/10/2015 | US8950356 Barrier-film forming apparatus, barrier-film forming method, and barrier-film coated container |
| 02/05/2015 | WO2015017730A1 Aperture scanning fourier ptychographic imaging |
| 02/05/2015 | WO2015017635A1 Improved lifetime ion source |
| 02/05/2015 | WO2015017612A1 Intermittent mass spectrometer inlet |
| 02/05/2015 | WO2015016618A1 Manipulator keeping analysis location of rotating specimen constant |
| 02/05/2015 | WO2015016040A1 Scanning electron microscope |
| 02/05/2015 | WO2015016039A1 Ion milling device and processing method using the ion milling device |
| 02/05/2015 | WO2015015985A1 Charged particle beam device and aberration measurement method in charged particle beam device |
| 02/05/2015 | WO2015015957A1 Charged particle beam apparatus |
| 02/05/2015 | WO2015015853A1 Charged particle beam device, and charged particle beam device operation display method |
| 02/05/2015 | US20150037983 Optical heat source with restricted wavelengths for process heating |
| 02/05/2015 | US20150037731 Drawing apparatus and article manufacturing method |
| 02/05/2015 | US20150037601 Method of manufacturing a component |
| 02/05/2015 | US20150037597 Three-dimensional copper nanostructure and fabrication method thereof |
| 02/05/2015 | US20150037511 Alternate materials and mixtures to minimize phosphorus buildup in implant applications |
| 02/05/2015 | US20150037260 Chemical reaction by combination of gas-phase and wet-chemical methods |
| 02/05/2015 | US20150034842 Driving apparatus, charged particle beam irradiation apparatus, method of manufacturing device |
| 02/05/2015 | US20150034836 Electron beam equipment |
| 02/05/2015 | US20150034835 Charged particle beam apparatus |
| 02/05/2015 | US20150034824 Scanning electron microscope |
| 02/05/2015 | US20150034822 Position sensitive stem detector |
| 02/05/2015 | US20150034592 Method for etching deep, high-aspect ratio features into glass, fused silica, and quartz materials |
| 02/05/2015 | US20150034483 Fe-Co-BASED ALLOY SPUTTERING TARGET MATERIAL, AND METHOD OF PRODUCING SAME |
| 02/05/2015 | US20150034482 Copper alloy sputtering target and manufacturing method of copper alloy sputtering target |
| 02/05/2015 | US20150034481 Fastening member and vacuum device |
| 02/05/2015 | US20150034477 Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefrom |
| 02/05/2015 | US20150034476 Deposition of thick magnetizable films for magnetic devices |
| 02/05/2015 | US20150033546 Driving apparatus, charged particle beam irradiation apparatus, and method of manufacturing device |
| 02/05/2015 | DE112013002551T5 Vorrichtung zur Erzeugung eines Strahls geladener Teilchen, mit einem Strahl geladener Teilchen arbeitende Vorrichtung, Vorrichtung zur Erzeugung einer Hochspannung und mit einem hohen Potential arbeitende Vorrichtung Apparatus for generating a beam of charged particles, working with a charged particle beam apparatus, means for generating a high voltage and operating with a high potential device |
| 02/05/2015 | DE102013215252A1 Vorrichtung und Verfahren zur Behandlung von Prozessgasen in einem Plasma angeregt durch elektromagnetische Wellen hoher Frequenz Device and method for the treatment of process gases in a plasma excited by electromagnetic waves of high frequency |
| 02/05/2015 | DE102013111650B3 Vorrichtung zum Erzeugen beschleunigter Elektronen An apparatus for generating accelerated electrons |
| 02/04/2015 | EP2833390A1 Use of electrostatic objective lens in an electron microscope |
| 02/04/2015 | EP2831708A1 Transparent body for use in a touch panel and its manufacturing method and apparatus |
| 02/04/2015 | EP2830813A1 Method for determining beam parameters of a charge carrier beam, measuring device, and charge carrier beam device |
| 02/04/2015 | CN204144218U 清理工具 Cleanup Tools |
| 02/04/2015 | CN104335321A 样品保持件以及观察用样品固定方法 The sample holder and sample observation method of fixing |
| 02/04/2015 | CN104335320A 压板夹持表面监控 Platen clamping surface monitoring |
| 02/04/2015 | CN104335319A 双端电极机械手 Double-ended electrode manipulator |
| 02/04/2015 | CN104332427A 具有等离子体能力的半导体反应室 A semiconductor plasma reaction chamber capacity |
| 02/04/2015 | CN104332396A 一种将异型中电流离子注入机导入量产的方法 A method of current implanters shaped into mass production method |
| 02/04/2015 | CN104332380A 用于干法刻蚀设备的电极及其制备方法、干法刻蚀设备 Electrode and its preparation method for dry etching equipment, dry etching equipment |
| 02/04/2015 | CN104332379A 等离子体放电装置 The plasma discharge device |
| 02/04/2015 | CN104332378A 等离子体处理装置及其温度测试装置 The plasma processing apparatus and temperature testing equipment |
| 02/04/2015 | CN104332377A 一种离子注入机束流与剂量测控装置及剂量控制方法 An ion implanter beam dose and dose monitoring device and control method |
| 02/04/2015 | CN102820196B 可加磁场的透射电子显微镜样品杆 Additive field TEM sample rod |
| 02/04/2015 | CN102683250B 晶体硅太阳能电池镀膜设备 Crystalline silicon solar cell coating equipment |
| 02/04/2015 | CN102592935B 等离子体处理设备 The plasma processing apparatus |
| 02/04/2015 | CN102522303B 一种多分区气体输送装置 A multi-partition gas delivery device |
| 02/03/2015 | US8947520 Electron microscope |
| 02/03/2015 | US8946659 Particle beam transport apparatus and method of transporting a particle beam with small beam spot size |
| 02/03/2015 | US8946652 Sample positioning apparatus, sample stage, and charged particle beam apparatus |
| 02/03/2015 | US8946650 Particle beam device and method for analyzing and/or treating an object |
| 02/03/2015 | US8946649 Charged particle beam device having an energy filter |
| 02/03/2015 | US8946631 Testing apparatus using charged particles and device manufacturing method using the testing apparatus |