Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/1985
06/26/1985EP0145911A2 Dry process for forming positive tone micro patterns
06/26/1985EP0145902A1 Thermo-mechanical overlay signature tuning for photolithographic mask aligner
06/26/1985EP0145862A2 Metallization of a ceramic substrate
06/25/1985US4525852 Alignment apparatus
06/25/1985US4525523 Negative-working photoresist coating composition
06/25/1985US4525448 Covering with photoresist layer, masking, exposure, forming recess
06/25/1985US4525444 Electrophotographic recording material
06/25/1985US4525392 Method of simultaneously applying multiple layers to web
06/25/1985US4525256 Photopolymerizable composition including catalyst comprising diketone plus 4-(N,N-dimethylamino)benzoic acid or ester thereof
06/25/1985US4525061 Combination of a plate for exposure and frame plates
06/25/1985US4525060 Film exposure apparatus
06/25/1985CA1189650A1 Polyvinylmethylphosphinic acid, process for its manufacture and use
06/25/1985CA1189630A1 Circuit board fabrication leading to increased capacity
06/25/1985CA1189378A1 Electrochemical developing process for reproduction layers
06/25/1985CA1189377A1 Lithographic substrate including an aluminized support, a ceramic layer and an organic photosensitive layer
06/25/1985CA1189376A1 Developer for positive photolithographic articles including sodium silicate and sodium chloride
06/20/1985WO1985002631A1 Plant for the treatment of objects by means of a liquid
06/19/1985EP0145653A2 Photocurable compositions
06/19/1985EP0145648A1 Coating device
06/19/1985EP0145355A2 Positive photoresist systems
06/19/1985EP0145347A2 Dry film resists
06/19/1985EP0145345A2 Solder masks
06/19/1985EP0145272A2 Metal/semiconductor deposition
06/19/1985EP0145263A1 Living polymers and process for their preparation
06/19/1985EP0144950A2 Objective with quadratic surfaces for imaging microzones
06/19/1985EP0144880A2 Positive photoresist composition
06/18/1985US4524306 Extra-high pressure mercury discharge lamp
06/18/1985US4524127 Anisotropic etching
06/18/1985US4524126 Adhesion of a photoresist to a substrate
06/18/1985US4524121 Positive photoresists containing preformed polyglutarimide polymer
06/18/1985CA1189083A1 Cycloalkylsulfonates, polymers and processes relating to same
06/12/1985EP0144148A2 Photocurable compositions containing prepolymers of two curing types
06/11/1985US4523102 Solid-state color-image sensor and process for fabricating the same
06/11/1985US4523098 Electron beam exposure apparatus
06/11/1985US4523000 High resolution, and dry etch resistance, solvent soluble
06/11/1985US4522911 Deep ultra-violet lithographic resists with diazohomotetramic acid compounds
06/11/1985US4522910 Photosensitive graphic arts article
06/11/1985US4522903 Sequential automatic registration and imagewise exposure of a sheet substrate
06/11/1985US4522862 Layer packs comprising a filter
06/11/1985US4522754 Metallically conducting (2-fluoro-5,6,11,12-tetraselenotetracene)2 -bromide
06/11/1985US4522694 With photoinitiators comprising photosensitizers and reducing agents
06/11/1985US4522693 Photopolymerizable composition with acylphosphine sulfide photoinitiator and method
06/11/1985US4522681 Method for tapered dry etching
06/11/1985US4522489 Device for photolithographically treating a thin substrate
06/11/1985CA1188701A1 Water soluble thioxanthone photoinitiators
06/10/1985EP0128949A4 Coated media for optical recording and associated coating techniques.
06/10/1985EP0128948A4 Coated media for optical recording, associated acrylic coatings and related application methods.
06/10/1985EP0120089A4 Automatically adjustable chip design method.
06/06/1985EP0114881A4 Photomagnetic catalysis.
06/05/1985EP0143597A2 Negative-acting photoresist composition
06/05/1985EP0143437A2 Process for the production of resist images and dry resist film for this process
06/05/1985EP0143380A2 Photoresist composition
06/05/1985EP0143201A2 Photopolymerisable blends with special diaminobenzophenone compounds
06/04/1985US4521503 Highly photosensitive aqueous solvent-developable printing assembly
06/04/1985US4521501 Method for reducing degradation of an optical image in an exposure lighthouse
06/04/1985US4521274 Bilevel resist
06/04/1985US4521268 Apparatus for deposition of fluid and gaseous media on substrates
06/04/1985US4521114 Useful in a semiconductor wafer photoexposure system
06/04/1985US4521092 Developing light sensitive plates including use of ultrasonic waves
06/04/1985US4521087 Optical system with diffuser for transformation of a collimated beam into a self-luminous arc with required curvature and numerical aperture
06/04/1985US4521082 For projecting a pattern from a first body onto a second body
06/04/1985US4520570 Piezoelectric x-y-positioner
06/04/1985CA1188144A1 Development of a light sensitive material containing diazo resin using an alkaline developer including water-softening agent
06/04/1985CA1188138A1 Optical beam concentrator
05/1985
05/29/1985EP0142639A2 Method for forming narrow images on semiconductor substrates
05/28/1985US4520269 Electron beam lithography proximity correction method
05/28/1985US4520097 Polyamide having aminoperhydroazepine units
05/28/1985US4520094 Process for forming powder pattern on light exposed layer having photosensitive diazonium salts
05/28/1985US4520093 Compensating pigments
05/28/1985US4519883 Sensitization of glyoxylate photoinitiators using a terphenyl compound
05/28/1985US4519872 Lithography/ le bubble
05/28/1985US4519865 Lamination
05/28/1985US4519690 Process for developing or peeling alkali-type photosensitive film and apparatus used therein
05/22/1985EP0142463A2 Method of producing prepregs and composite materials reinforced therewith
05/22/1985EP0142386A1 Process for the manufacture of photopolymeric relief printing plates
05/22/1985EP0142384A2 A method for the preparation of photoinitiators
05/22/1985EP0141921A1 Photopolymerisable composition and registration material prepared thereof
05/22/1985EP0141868A1 High resolution phototransparency image forming with photopolymers
05/21/1985US4518848 Apparatus for baking resist on semiconductor wafers
05/21/1985US4518794 Telomers which can be cross-linked by light
05/21/1985US4518678 Photoresist layer dissolved from periphery abnd exposed to light for development
05/21/1985US4518677 Process for making printing plates
05/21/1985US4518676 Photopolymerizable compositions containing diaryliodosyl salts
05/21/1985US4518675 Of poly(fluoroalkyl a-haloacrylate); alkali metal hydroxide or alkoxide or tetraalkylammonium hydroxide in nonaqueous polar dmso
05/21/1985US4518668 Method for preparing a lithographic printing plate
05/21/1985US4518667 Automatic repetitive registration and image wise exposure of sheet substrates
05/21/1985US4518666 Enlargement of photopolymer images in photopolymer mask
05/21/1985US4518473 Photopolymerization, ketone and amide as photoinitiator
05/21/1985US4517752 Splash retarder
05/21/1985CA1187646A1 Photocrosslinkable polymers with thioxanthone and imidyl groupings in side chains and processes for their preparation
05/21/1985CA1187521A1 Device for feeding an transporting printing forms
05/21/1985CA1187387A1 Reagent strip test for antithrombin-iii
05/15/1985EP0141781A2 Light-sensitive coating composition and use thereof
05/15/1985EP0141548A2 Photomask pattern inspection
05/15/1985EP0141400A2 Light-sensitive composition and process for the preparation of relief copies
05/15/1985EP0141389A2 Process for the production of image-wise structured resists, and dry resist therefor
05/15/1985EP0141311A2 Negative working electron beam resist system to be dry-developed
05/15/1985EP0141110A2 Photopolymerisable blends containing tertiary amines as photoactivators
05/15/1985EP0141041A2 X-ray lithographic apparatus
05/15/1985EP0140971A1 Permanent color photographic picture
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