| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/05/1984 | CA1168656A1 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivatives, a process for the preparation thereof, and radiation-sensitive compositions containing these derivatives |
| 06/05/1984 | CA1168508A1 Colour reproduction process |
| 06/05/1984 | CA1168502A1 Compressible photopolymer printing plate including a layer of open or closed cell foam |
| 06/05/1984 | CA1168500A1 Developer solution including propylene glycol monoether and monoethylene glycol ester |
| 05/30/1984 | EP0109838A2 Light and heat-sensitive recording material |
| 05/30/1984 | EP0109796A2 Developer for light-sensitive lithographic printing plate precursor |
| 05/30/1984 | EP0109773A2 Dispersed imaging systems with tetra(hydrocarbyl) borate salts |
| 05/30/1984 | EP0109718A1 Displacement device, particularly for the photolithographic treatment of a substrate |
| 05/30/1984 | EP0109634A1 Exposure device |
| 05/30/1984 | EP0109630A2 Process for the manufacture of printing plates |
| 05/30/1984 | EP0109617A1 Positive type, radiation-sensitive organic polymer materials |
| 05/30/1984 | EP0020782B1 Light-sensitive polyamide resin composition |
| 05/29/1984 | US4451613 Ethylenically-unsaturated dextrin oligomers |
| 05/29/1984 | US4451553 Halogen finishing of flexographic printing plates containing butadiene/acrylonitrile copolymers |
| 05/29/1984 | US4451552 Impervious thin film covering the image surface; antisticking agents |
| 05/29/1984 | US4451551 Radiation-sensitive poly(amic acid) polymer composition |
| 05/29/1984 | US4451550 Vesicular film and composition with phenoxy resin matrix |
| 05/29/1984 | US4451412 Process for producing diffracting phase structures |
| 05/29/1984 | US4451349 Electrode treatment for plasma patterning of polymers |
| 05/29/1984 | US4451145 Apparatus and process for making lithographic printing plate with reinforced image |
| 05/29/1984 | CA1168141A1 Lamination of photosensitive layer using a liquid interface |
| 05/29/1984 | CA1168140A1 Lamination of photosensitive layer using a liquid interface |
| 05/29/1984 | CA1168139A1 Precleaning substrate and lamination of photosensitive layer using a liquid interface |
| 05/24/1984 | WO1984001967A1 Permanent color photographic picture |
| 05/23/1984 | EP0109360A1 Metallic conductive (2-fluoro-5,6,11,12-tetraselenotetracene)2-bromide, process for the preparation thereof and the use thereof |
| 05/23/1984 | EP0109293A1 Process for toning image-wise modified surfaces |
| 05/23/1984 | EP0109291A1 Photopolymerizable composition |
| 05/23/1984 | EP0109193A2 X-ray lithographic system |
| 05/23/1984 | EP0109062A1 Photosensitive compositions containing an O-quinonediazide compound |
| 05/23/1984 | EP0032153B1 Plating resist with improved resistance to extraneous plating |
| 05/22/1984 | US4450360 Alkylaryliodonium salts and method for making |
| 05/22/1984 | US4450358 Optical lithographic system |
| 05/22/1984 | US4450279 Dialkylthioxanthones |
| 05/22/1984 | US4450227 And bleachable dye |
| 05/22/1984 | US4450226 High-speed and uniform dispensing of a photopolymerizable resin onto a radiation-transparent surface |
| 05/22/1984 | US4449814 Exposure device |
| 05/22/1984 | US4449287 Method of providing a narrow groove or slot in a substrate region, in particular a semiconductor substrate region |
| 05/22/1984 | CA1167746A1 Masking portions of a substrate |
| 05/16/1984 | EP0108258A1 A master disk for optical disk manufacture, and a method and the system for manufacturing the same |
| 05/16/1984 | EP0108189A2 A method for etching polyimides |
| 05/16/1984 | EP0108160A1 Method to adjust and monitor a light spot |
| 05/16/1984 | EP0108130A1 Composition and method for forming amorphous chalcogenide films from solution |
| 05/16/1984 | EP0011648B1 Process for reducing the contact time between a photosensitive printing plate and an original |
| 05/15/1984 | US4448876 Electron beam sensitive resist |
| 05/15/1984 | US4448875 Electron beam sensitive mixture resist |
| 05/15/1984 | US4448873 Negative working diazo contact film |
| 05/15/1984 | US4448827 Optically readable information disc comprising an envelope of cross-linked synthetic resin |
| 05/15/1984 | US4448522 Device for supporting and aligning photographic masters |
| 05/15/1984 | US4448518 Photosensitive material holder for an upright printing machine |
| 05/15/1984 | US4448516 Developer roll |
| 05/09/1984 | EP0108037A2 Propiophenone derivatives as photoinitiators in the photopolymerization |
| 05/09/1984 | EP0107792A1 Photopolymerizable compositions |
| 05/08/1984 | US4447720 Solid-state image pickup element and process for fabricating the same |
| 05/08/1984 | US4447520 Acylphosphine oxides and their use |
| 05/08/1984 | US4447519 Metal foil on insulator, making holes, lamination thin film, then sensitizing |
| 05/08/1984 | US4447512 Method for making a negative working lithographic printing plate |
| 05/08/1984 | US4447510 Process for producing relief copies in light hardenable materials with ultrasonic treatment |
| 05/08/1984 | CA1166885A1 Fabrication based on radiation sensitive resists including a polymer containing chloro- or bromo- alkyl aromatic groups |
| 05/08/1984 | CA1166884A1 Multi-layer elements suitable for the production of printing plates and relief copies including an adhesive layer containing isocyanate hardened resin and oh-free polycarbonate |
| 05/08/1984 | CA1166880A1 Photocrosslinkable layer on printing blocks and a process for producing offset-printing plates |
| 05/08/1984 | CA1166879A1 Lithographic process using a processing layer containing a chalcogenide glass and a surface amount of source-metal containing material |
| 05/02/1984 | EP0107621A2 Composition suitable for obtaining positive images, process for obtaining positive images and images obtained using the same |
| 05/02/1984 | EP0107454A2 Improvements in or relating to the processing of radiation sensitive devices |
| 05/02/1984 | EP0107414A2 Frictionless supporting apparatus |
| 05/02/1984 | EP0107240A1 Method of photolithographically treating a substrate |
| 05/02/1984 | EP0107198A1 Use of 2-hydroxy-2-methyl-(p-chloropropionphenone) as a photoinitiator |
| 05/02/1984 | EP0107065A2 Precurled flexographic printing plate |
| 05/02/1984 | EP0107004A1 Mask for corpuscular lithography, method for its manufacture and of using it |
| 05/01/1984 | US4446549 Alkanedioldiacrylate lacquer information track |
| 05/01/1984 | US4446247 Compositions and process |
| 05/01/1984 | US4446222 Method of preparing printing surface formed of polymeric resin containing polyamide and dicarboxylic acid diester |
| 05/01/1984 | US4446220 Method of making a photosensitive elastomeric composition |
| 05/01/1984 | US4446218 Sulfur and/or amide-containing exposure accelerators for light-sensitive coatings with diazonium compounds |
| 05/01/1984 | US4445776 High resistration photomask machine and computerized numerical control system |
| 05/01/1984 | CA1166635A1 Thioxanthonecarboxylic acids and thioxanthonecarboxylic acid derivatives |
| 05/01/1984 | CA1166507A1 Photoresist developer including an alkali metal hydroxide and a chelating agent for aluminium ion |
| 05/01/1984 | CA1166503A1 Plural imaging component microcellular arrays, processes for their fabrication, and electrographic compositions |
| 04/25/1984 | EP0106641A1 Polymerizable composition for information carrying systems |
| 04/25/1984 | EP0106351A2 Photopolymerizable photosensitive composition |
| 04/25/1984 | EP0106176A1 Photopolymerizable compositions and their use |
| 04/25/1984 | EP0106156A2 Light-sensitive composition |
| 04/25/1984 | EP0105963A1 Polarization transformer |
| 04/25/1984 | EP0009031B1 Desensitizing solution and process for treating a diazo photosensitive printing plate |
| 04/24/1984 | US4444869 Incorporating a photochromic spiropyran compound |
| 04/24/1984 | US4444868 Containing styryl-type nitrogen-heterocycle residue polymer and acid |
| 04/24/1984 | US4444616 Method for exposure of chemically machinable light-sensitive glass |
| 04/24/1984 | US4444607 Method of making a sight model |
| 04/24/1984 | CA1166061A1 Method of forming a negative resist pattern by exposing to crosslink a copolymer containing halomethyl or acrylymethyl substituted styrene units |
| 04/24/1984 | CA1166058A1 Dry nonelectroscopic toners including pigmented resin particles surface coated with a combination of antistatic agent and slip agent |
| 04/24/1984 | CA1166057A1 Method of forming photoresist patterns |
| 04/24/1984 | CA1166050A1 Laser beam scanning system |
| 04/18/1984 | EP0105421A1 Photosensitive stripping material and process for obtaining a photoresist stencil |
| 04/18/1984 | EP0105382A1 Image-forming photo-sensitive material |
| 04/17/1984 | US4443704 Method of electron beam exposure |
| 04/17/1984 | US4443533 Exposure, development, pulsation |
| 04/17/1984 | US4443532 Induced crystallographic modification of aromatic compounds |
| 04/17/1984 | US4443531 Deleting agents for printing plates and method for deletion |
| 04/17/1984 | US4443355 Detergent composition |
| 04/17/1984 | US4443098 Pellicle mounting fixture |
| 04/17/1984 | US4443096 On machine reticle inspection device |