Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
01/1985
01/01/1985US4491313 Suction device for holding plates
12/1984
12/27/1984EP0129108A1 Wafer transferring chuck assembly
12/27/1984EP0129106A1 High contrast photoresist developer
12/27/1984EP0128949A1 Coated media for optical recording and associated coating techniques
12/27/1984EP0128948A1 Coated media for optical recording, associated acrylic coatings and related application methods
12/27/1984CA1179881A Photopolymerisation process using a compound containing both acryloyl and bicyclo [2.2.1] hept-2-ene groups
12/25/1984US4490457 Cold/dry substrate treatment technique which improves photolithographic limits of resolution and exposure tolerance
12/25/1984US4490440 High technology jewelry and fabrication of same
12/25/1984US4490410 Method of affixing a decorative pattern to a stock or a molded component
12/25/1984US4490217 Coating photoresist on matrix, then film pattern, development and plating
12/25/1984US4489502 Spin drier for silicon wafers and the like
12/25/1984US4489501 Spin drier for silicon wafers and the like
12/19/1984EP0128433A2 Electro-magnetic alignment apparatus
12/19/1984EP0128322A1 Sensitization of glyoxylate photoinitiators
12/19/1984EP0128321A1 Amine promotion of glyoxylate photoinitiators
12/19/1984EP0128320A1 Amine promotion of benzoin ether photoinitiators
12/19/1984EP0128242A2 Method for polymer film patterning in a plasma etching apparatus.
12/18/1984US4489154 Process for preparing a surprint proof
12/18/1984US4489153 Process for preparing a positive overlay
12/18/1984US4489146 Reverse process for making chromium masks using silicon dioxide dry etch mask
12/18/1984US4488806 Shot arranging method in a divisional printing apparatus
12/18/1984US4488781 Method for manufacturing an electrochromic display device and device produced thereby
12/12/1984EP0128014A2 Photopolymerizable composition, products made therefrom and processes for preparing such products
12/12/1984EP0127919A2 Electron lithography mask manufacture
12/12/1984EP0127893A2 Light-sensitive composition for use with lithographic printing plates
12/12/1984EP0127861A2 X-ray lithography
12/12/1984EP0127765A1 Sensitization of glyoxylate photoinitiators
12/12/1984EP0127764A1 Sensitization of glyoxylate photoinitiators
12/12/1984EP0127762A1 Constrained N-alkylamino aryl ketones as sensitizers for photopolymer compositions
12/11/1984US4487942 6,7-Dihydro-5H-benzocycloheptene-8,9-dicarboxylic acid anhydrides
12/11/1984US4487827 Positives, containing diazo compound, treatment with electromagnetic radiation
12/11/1984US4487823 Light-sensitive copying material and process for the manufacture thereof utilizing non-ionic fluorinated ester surfactant
12/11/1984US4487652 Semiconductor with insulating layer
12/11/1984CA1179180A1 Lithographic printing plate with photosensitive layer containing an emulsion polymer having perfluoroalkyl groups
12/05/1984EP0127574A2 Light cross-linkable composition
12/05/1984EP0127477A2 Improvements in or relating to radiation sensitive compositions
12/05/1984EP0127415A2 A resist for vacuum ultraviolet lithography
12/05/1984EP0127171A1 Developing liquid for photoresist
12/05/1984EP0127097A2 Liquid chemical dispensing apparatus
12/05/1984EP0127045A2 Apparatus for producing a light source of required shape
12/05/1984EP0126875A1 Light-sensitive polycondensation product with diazonium groups, process for the preparation thereof and light-sensitive registration material which contains this polycondensation product
12/05/1984EP0126786A1 Process for pattern transfer onto a light-sensitive layer
12/04/1984US4486596 Printing plates and photoresists
12/04/1984US4486529 Dialo printing plate made from laser
12/04/1984US4486526 Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated phenol-blocked isocyanate polyurethane materials
12/04/1984US4486518 Duplicating film mask with radiation absorbing benzophenone in processed positive-working radiation sensitive layer on transparent substrate
12/04/1984US4486094 Original holder for a printing plate processing apparatus
12/04/1984CA1178839A1 Long run electrophotographic-imaged lithographic printing plate with a resinous urethane layer and a pigmented inorganic photoconductive layer
11/1984
11/28/1984EP0126712A1 Curable composition and use thereof
11/28/1984EP0126652A1 Electron beam sensitive mixture resist
11/28/1984EP0126541A1 Photopolymerization initiator and method of photopolymerization by use of said initiator
11/28/1984EP0126473A2 Chemical container
11/28/1984EP0126266A2 Low striation positive resist composition
11/28/1984EP0126241A2 Brown stain suppressing phenol free and chlorinated hydrocarbon free photoresist stripper
11/28/1984EP0126214A2 Process for making a lithographic mask
11/28/1984EP0126192A1 Coating composition and the use thereof
11/27/1984US4485339 Electro-magnetic alignment device
11/27/1984US4485249 2-Acylated dihydro-1,3-dioxepins, process for the production thereof and use thereof as photo-initiators
11/27/1984US4485167 Unsaturated monomer, binder, photoinitiator and nitrogen containing compound
11/27/1984US4485166 Crosslinkable blend of unsaturated compound, binder, activator, and epoxide
11/27/1984US4485123 Process for producing textured coatings
11/27/1984US4484978 Etching method
11/27/1984CA1178607A1 Radiation curable telomers and preparation thereof
11/27/1984CA1178479A1 Photopolymerisation process employing compounds containing acryloyl groups and maleimide groups
11/27/1984CA1178478A1 Photopolymerisation process employing compounds containing acryloyl groups and anthryl groups
11/27/1984CA1178476A1 Flexographic printing plates containing blended adhesives
11/27/1984CA1178474A1 Syndiotactic polybutadiene composition including cis 1,4, polyisoprene for photosensitive printing plate
11/27/1984CA1178473A1 Photosensitive lithographic plate with sulfonate containing photosensitive polyester
11/21/1984EP0126029A2 Image-forming process
11/21/1984EP0125875A2 Improvements in or relating to perester compounds
11/21/1984EP0125862A2 Photopolymerizable laminate
11/21/1984EP0125587A1 Desentsitized forms of explosive organic diazo and azido compounds for radiation-sensitive compositions
11/20/1984US4484351 Non-glass chemical container
11/20/1984US4484334 Optical beam concentrator
11/20/1984US4483917 Photoresist stripper composition and method of use
11/20/1984US4483913 Planographic printing plate
11/20/1984US4483912 Imaging system with microcapsules containing photohardenable or photosoftenable composition
11/20/1984US4483884 Process for producing textured coatings
11/20/1984US4483758 Esterification of an epoxyalkylated tetrakis(hydroxyphenyl) alkane resin with ethylenic unsaturated acid
11/20/1984US4483434 Apparatus for conveying semiconductor substrates
11/20/1984CA1178120A1 Device for transporting printing plates
11/20/1984CA1178102A1 Imageable film including an intermediate layer containing metal and metal oxide or sulfide and a photoresist layer
11/14/1984EP0125206A1 Liquid blend of photoinitiators
11/14/1984EP0125140A2 Improvements in or relating to radiation sensitive plates
11/14/1984EP0125102A2 Photosensitive systems showing visible indication of exposure
11/14/1984EP0125086A2 Imageable vapor-deposited colorant layers
11/14/1984EP0124899A2 Sensitizing bath for chalcogenide resists
11/13/1984US4482842 Curved tube type ultra high pressure mercury arc discharge lamp device
11/13/1984US4482625 Process for preparing a color proofing sheet
11/13/1984US4482624 Photosensitive material employing encapsulated radiation sensitive composition and process for improving sensitivity by sequestering oxygen
11/13/1984US4482424 Method for monitoring etching of resists by monitoring the flouresence of the unetched material
11/13/1984CA1177686A1 Photosensitive relief image-forming materials including an indicator which shifts on exposure and at a higher ph to a higher actinic opacity state
11/13/1984CA1177685A1 Photosensitive recording materials for the production of abrasion-resistant and scratch-resistant gravure printing plates, and the production of gravure printing plates using these recording materials
11/13/1984CA1177684A1 Post-exposure treatment of a relief printing plate with a solution of persulfate salt and carboxylic acid
11/07/1984EP0124297A2 Alkaline solution for developing positive photoresists
11/07/1984EP0124292A2 Water based photopolymerisable compositions and their use
11/07/1984EP0124274A2 Electron beam sensitive mixture resist
11/07/1984EP0124265A2 Process for forming pattern with negative resist
11/07/1984EP0124064A1 Electroforming of flat articles with a conical structure and without rotation symmetry
11/07/1984EP0123982A2 Continuous alignment target pattern and signal processing