| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 08/21/1985 | EP0152114A2 Method for making a dry planographic printing plate |
| 08/21/1985 | EP0152080A2 Light spreading device |
| 08/20/1985 | US4536884 Plasma pinch X-ray apparatus |
| 08/20/1985 | US4536468 Method of forming resist pattern |
| 08/20/1985 | US4536465 Containing carboxy, oxy, aromatic compound and aldehyde or ketone with a novolak resin |
| 08/20/1985 | US4536464 Photosensitive composition with o-quinonediazide compound and condensate of dihydric phenol and aldehyde or ketone |
| 08/20/1985 | US4536463 Imaging system |
| 08/20/1985 | US4536450 Nonlinear optical materials and processes employing diacetylenes |
| 08/20/1985 | US4536421 Only one kind of thotoresist film; developed only once |
| 08/20/1985 | US4536265 Siloxane polyphotoinitiators of the substituted acetophenone type |
| 08/20/1985 | US4536195 Electroconductive pattern bonded with abrasive grains, immersion in electrolytic bath, stacking and hot pressure molding |
| 08/20/1985 | US4535694 Looped, elongate letterpieces printing plate for use on rotary presses, and method of preparation |
| 08/20/1985 | CA1192204A1 Light-crosslinkable polysiloxanes |
| 08/20/1985 | CA1192119A1 Stripping compositions and methods of stripping resists |
| 08/14/1985 | EP0151408A2 A method of forming a patterned resist mask for etching via holes in an insulating layer |
| 08/14/1985 | EP0151372A2 Image production |
| 08/14/1985 | EP0151191A1 Photosensitive material for the production of orginals |
| 08/14/1985 | EP0151178A1 Method for making permanent colored images and apparatus therefor |
| 08/13/1985 | US4535278 Two-dimensional precise positioning device for use in a semiconductor manufacturing apparatus |
| 08/13/1985 | US4535234 Light exposure apparatus with cooling means |
| 08/13/1985 | US4535054 Irradiation to give negative pattern image, development by dissoluing unexposed polymer with solvent and rinsing |
| 08/13/1985 | US4535053 Multilayer photoresist process utilizing cinnamic acid derivatives as absorbant dyes |
| 08/13/1985 | US4535052 Constrained n-alkylamino aryl ketones as sensitizers for photopolymer compositions |
| 08/13/1985 | US4535050 Peeling development of photosensitive materials employing microencapsulated radiation sensitive compositions |
| 08/13/1985 | US4535041 Photopolymerization of ethylenic unsatd monomer and zirconium compound; humidity resistance |
| 08/13/1985 | US4534839 Camphorquinone sensitizer and alkyl-and aryl barb turic acid reducing agents |
| 08/13/1985 | US4534838 Siloxane polyphotoinitiators of the substituted acetophenone type |
| 08/13/1985 | CA1191728A1 Imaging system utilizing a fresnel lens |
| 08/07/1985 | EP0150952A2 Photopolymerizable composition |
| 08/07/1985 | EP0150623A2 Photosensitive stencil materials |
| 08/07/1985 | EP0150315A2 Tailoring of novolak/diazoquinone positive resists by acylation |
| 08/06/1985 | US4534047 Mask ring assembly for X-ray lithography |
| 08/06/1985 | US4534015 Information holding device |
| 08/06/1985 | US4533624 Applying pghotoresist to substrates; masking, plasma etching accur |
| 08/06/1985 | US4533623 Silver halide photographic light-sensitive materials for plate making and method of reduction treatment for them |
| 08/06/1985 | US4533620 Light sensitive co-condensates |
| 08/06/1985 | US4533619 Heat resistance |
| 08/06/1985 | US4533615 Abrasion development |
| 08/06/1985 | US4533610 Method of manufacture of a color television tube having low screen reflectance for ambient light |
| 08/01/1985 | WO1985003353A1 Inspection system utilizing dark-field illumination |
| 07/31/1985 | EP0150129A2 Method and apparatus for lithographic rotate and repeat processing |
| 07/31/1985 | EP0150089A1 Charged-particle optical systems |
| 07/30/1985 | US4532427 Method and apparatus for performing deep UV photolithography |
| 07/30/1985 | US4532332 N-(hydroxypolyoxaalkylene)phthalimides and succinimides and acrylate esters thereof |
| 07/30/1985 | US4532200 Photosensitive imaging material employing encapsulated radiation sensitive composition having improved toe speed |
| 07/30/1985 | US4532005 Device lithography using multi-level resist systems |
| 07/30/1985 | US4532002 Multilayer planarizing structure for lift-off technique |
| 07/30/1985 | CA1191109A1 Electrode treatment for plasma patterning of polymers |
| 07/30/1985 | CA1191040A1 Machine reticle inspection device |
| 07/24/1985 | EP0149553A2 Negative photoresist systems |
| 07/24/1985 | EP0149017A2 Piezoelectric X-Y positioner |
| 07/24/1985 | EP0149016A2 A variable size circular aperture camera |
| 07/23/1985 | US4530897 Process for desensitizing diazo lithographic printing forms using desensitizing solution with light absorbing compound |
| 07/23/1985 | US4530896 Multilayer composite transfer material |
| 07/23/1985 | US4530895 mixture of tetraalkylammonium hydroxide and alkali metal silicate |
| 07/23/1985 | US4530747 Photopolymerizable mixture and photopolymerizable copying material prepared therewith |
| 07/23/1985 | US4530746 Oxygen containing ring with vinyl substitution as monomer |
| 07/23/1985 | US4530736 Method for manufacturing Fresnel phase reversal plate lenses |
| 07/23/1985 | US4530635 Wafer transferring chuck assembly |
| 07/23/1985 | US4530587 Exposure apparatus |
| 07/23/1985 | US4530565 Optical transformer using curved strip waveguides to achieve a nearly unchanged F/number |
| 07/23/1985 | US4530306 Coating device for plates |
| 07/23/1985 | CA1190783A1 Photosensitive composition including a water soluble, crosslinkable polymer, a diazo salt photosensitizer and an indicator |
| 07/17/1985 | EP0148787A2 Positive type photosensitive resin composition |
| 07/17/1985 | EP0148784A2 Calibration of electron beam apparatus |
| 07/17/1985 | EP0148549A2 Improved colour reproduction process |
| 07/16/1985 | US4529783 Fluorine containing acrylic monomer |
| 07/16/1985 | US4529685 Pattern of light transmitted through an optical mask |
| 07/16/1985 | US4529682 Containing naphthoquinone diazide sulfonyl compound |
| 07/16/1985 | US4529681 Light- and heat-sensitive recording material |
| 07/16/1985 | US4529618 Method of photolithographically treating a substrate |
| 07/16/1985 | US4529490 Deep section photopolymerization |
| 07/16/1985 | US4529314 Method of measuring misalignment between levels on a substrate |
| 07/16/1985 | US4529299 Interposer element for photomasks in projection printer |
| 07/16/1985 | US4528934 Thin-film coating apparatus |
| 07/10/1985 | EP0147596A2 A positive lithographic resist composition |
| 07/10/1985 | EP0147580A1 Laser pattern generating system |
| 07/09/1985 | US4528262 Process for forming photoresist images |
| 07/09/1985 | US4528261 Prelamination, imagewise exposure of photohardenable layer in process for sensitizing, registering and exposing circuit boards |
| 07/09/1985 | US4528260 Method of fabricating lenticular arrays |
| 07/09/1985 | US4528259 Printed wiring boards with solder mask over bare copper wires having large area thickened circuit pad connections |
| 07/09/1985 | US4527890 Automatic repetitive registration and imagewise exposure of sheet substrates |
| 07/09/1985 | CA1190082A1 Phase-shifting production mask for photolithography |
| 07/09/1985 | CA1190081A1 Transparency, a method for forming it and a photographic mask whose optical densities are correlated with the contour of a surface |
| 07/03/1985 | EP0147169A2 Flexure stage alignment apparatus |
| 07/03/1985 | EP0147127A2 A composition of matter of use as a resist in lithography |
| 07/03/1985 | EP0147074A2 Method of developing a positive photoresist layer, and composition for use therein |
| 07/03/1985 | EP0146834A2 Positive photoresist developer |
| 07/03/1985 | EP0146670A2 Apparatus for projecting a series of images onto dies of a semiconductor wafer |
| 07/02/1985 | US4527070 Method and apparatus for inspecting a pattern |
| 07/02/1985 | US4526859 Metallization of a ceramic substrate |
| 07/02/1985 | US4526858 Method for fabricating superconducting weak-links using electron beam lithography |
| 07/02/1985 | US4526856 Diazoketone photosensitive compound, alkali soluble resin, cyclic ketone solvent, aliphatic alcohol solvent |
| 07/02/1985 | US4526854 Photoresist composition with water soluble bisazide and diazo compound |
| 07/02/1985 | US4525938 Spin drier for semiconductor material |
| 07/02/1985 | CA1189985A1 Method of forming a pattern of metal elements |
| 06/26/1985 | EP0146505A2 Image formation process |
| 06/26/1985 | EP0146501A2 Polymerizable compositions |
| 06/26/1985 | EP0146411A2 Photosolubilisable compositions |
| 06/26/1985 | EP0145973A2 Positive photoresist stripping composition |