Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
---|
04/16/1986 | EP0177962A2 Photosensitive composition |
04/16/1986 | EP0177905A2 Process for the development and stripping of photoresist layers with quaternary ammonium compounds |
04/16/1986 | EP0177890A2 Process for the treatment of printing plates with liquids |
04/16/1986 | EP0177873A1 Facility for pressing and lifting rollers |
04/15/1986 | US4583077 Deflection system in an electron beam exposure device |
04/15/1986 | US4582862 Ketone with morpholino and s-phenyl groups as photoinitiator in pigmented coating |
04/15/1986 | US4582778 Multi-function photopolymer for efficiently producing high resolution images on printed wiring boards, and the like |
04/15/1986 | US4582777 Compressible printing plate |
04/15/1986 | US4582422 Apparatus for forming relief plates from liquid photo-sensitive resin |
04/15/1986 | EP0161258A4 Data handling system for a pattern generator. |
04/15/1986 | CA1203323A1 Method of providing a narrow groove or slot in a substrate region, in particular a semiconductor substrate region |
04/15/1986 | CA1203108A1 Photosensitive material employing encapsulated radiation sensitive composition and process for improving sensitivity by sequestering oxygen |
04/15/1986 | CA1203107A1 Photosensitive elastomeric polymer composition for flexographic printing plates, processable in semi- aqueous basic solution or solvent |
04/15/1986 | CA1203106A1 Method of forming images from liquid masses |
04/10/1986 | WO1986002177A1 Post-treatment of cured, radiation sensitive polymerizable resins |
04/09/1986 | EP0177453A2 Image-producing process |
04/09/1986 | EP0177314A2 Projected image relief printing plates |
04/09/1986 | EP0177302A2 Compressable printing plate |
04/09/1986 | EP0176871A2 Photoresist preparation process |
04/09/1986 | EP0176555A1 Multilayer hybrid integrated circuit. |
04/08/1986 | US4581401 Copolymer of metal methacrylate, allyl methacrylate and an organosulfur compound |
04/08/1986 | US4581389 Method for photopolymerization of vinyl compounds and photopolymerizable materials used in said process using 1-aryl-2,5 dialkypyrrole as reducing agent |
04/08/1986 | US4581321 Exposing diazide and hexamethylol melamine ether mixture; developing with aqueous alkaline solution |
04/08/1986 | US4581320 Heatless and pressureless foil transfer method |
04/08/1986 | US4581318 Photoresists for photo-and electron beam lithography |
04/08/1986 | US4581316 Method of forming resist patterns in negative photoresist layer using false pattern |
04/08/1986 | US4581315 Photoresistive compositions |
04/08/1986 | US4581313 Photosensitive composition with polymer having diazonium salt in side chain |
04/08/1986 | US4581106 Modified method of making a stencil plate |
04/08/1986 | US4580900 Auto focus alignment and measurement system and method |
04/08/1986 | CA1203040A1 Radiation-sensitive compositions of polymers containing a p-metal carbonyl complex of conjugated polyolefin |
04/02/1986 | EP0176356A2 Photosensitive polymer compositions, electrophoretic deposition processes using same, and the use of same in forming films on substrates |
04/02/1986 | EP0176348A2 Tanning development in low silver photoimaging |
04/01/1986 | US4579811 Process for developing exposed diazo negative-working reproduction layers using aqueous developer having salt of aromatic carboxylic acid with adjacent group substituent |
04/01/1986 | US4579810 Process for preparing surprint proof on a pearlescent support |
04/01/1986 | US4579809 Positive image formation |
04/01/1986 | US4579806 Positive-working photosensitive recording materials |
03/27/1986 | WO1986001914A1 Photolithography process using positive photoresist containing unbleachable light absorbing agent |
03/26/1986 | EP0175460A1 Manufacture of diffraction gratings |
03/26/1986 | EP0175456A2 Phototreating apparatus |
03/26/1986 | EP0175244A2 Light-sensitive registration material and process for its production |
03/26/1986 | EP0174954A1 Method for making integrated circuit devices using a layer of indium arsenide as an antireflective coating |
03/25/1986 | US4578615 Vacuum fluorescent printing device employing a fly's-eye light coupling method |
03/25/1986 | US4578590 Continuous alignment target pattern and signal processing |
03/25/1986 | US4578587 Error-corrected corpuscular beam lithography |
03/25/1986 | US4578344 Improving resolution by applying arylinitrone in polymer binder expose to pattern light, and development into mask of uniform thickness |
03/25/1986 | US4578342 Presensitized diazo lithographic plate with anodized and silicated aluminum plate surface and subbing layer of polymer with sulfonic acid group |
03/25/1986 | US4578341 Acidic photosensitive relief image-forming materials with indicator pigment or dye |
03/25/1986 | US4578340 Free particle abrasion development of imaging sheets employing photosensitive microcapsules |
03/25/1986 | US4578339 Photosensitive imaging system employing oil-containing microcapsules |
03/25/1986 | US4578328 Photopatternable polyimide compositions and method for making |
03/25/1986 | US4578209 Halogenated hydrocarbon solvent, fluorine containing alcohol, and an acid |
03/25/1986 | US4577968 Method and arrangement for optical distance measurement |
03/25/1986 | US4577959 Exposure apparatus |
03/25/1986 | US4577948 Method and apparatus for controlling the processing of radiation sensitive plates with a liquid by monitoring the electrical conductivity of the liquid |
03/25/1986 | US4577945 Pattern transfer device and method |
03/25/1986 | CA1202206A1 Gelatin silver halide photographic elements for tanning development |
03/19/1986 | EP0174877A2 X-ray application system |
03/19/1986 | EP0174634A2 Image forming method |
03/19/1986 | EP0174588A2 Light-sensitive registration material and process for its production |
03/19/1986 | EP0174555A2 High resolution solder mask photopolymers for screen coating over circuit traces |
03/19/1986 | EP0174494A2 Thermostable polymer system, cross-linkable by irradiation, for microelectronic use |
03/18/1986 | US4577111 Apparatus for electron beam lithography |
03/18/1986 | US4576976 Process for the photopolymerization of vinyl compounds and photopolymerizable materials |
03/18/1986 | US4576975 Water soluble Michler's ketone analogs in combined photoinitiator composition and polymerizable composition |
03/18/1986 | US4576903 Developer for positive photoresists |
03/18/1986 | US4576902 O-nitrobenxyl acrylate containing polymer |
03/18/1986 | US4576901 Process for producing negative copies by means of a material based on 1,2-quinone diazides with 4-ester or amide substitution |
03/18/1986 | US4576899 Method for enhancing apparent photospeed of diazonium plates by using thiocyanate to insolubilize diazonium compound after photolysis |
03/18/1986 | US4576898 Process of making photopolymer relief plates using an adhesive layer |
03/18/1986 | US4576897 Process of making a polyamide printing plate having an improved contact with an image-bearing film |
03/18/1986 | US4576894 Tanning development in low silver photoimaging using polymeric couplers |
03/18/1986 | US4576893 Presensitized lithographic printing plate precursor |
03/18/1986 | US4576892 Lithography |
03/18/1986 | US4576891 Photosensitive microcapsules useful in polychromatic imaging having radiation absorber |
03/18/1986 | US4576884 Semiconductor fabrication |
03/18/1986 | US4576832 Self-aligning mask |
03/18/1986 | US4576823 Vacuum sheet |
03/18/1986 | US4576475 Contacting method and apparatus in contact copying |
03/18/1986 | US4576439 Reflective diffractive authenticating device |
03/18/1986 | US4575942 Ultra-precision two-dimensional moving apparatus |
03/18/1986 | CA1202148A1 Photoresist material |
03/18/1986 | CA1202123A1 Method and apparatus for captivating a substrate within a holder |
03/13/1986 | WO1986001616A1 Fabrication of devices involving lithographic procedures |
03/12/1986 | EP0174271A2 Anthraceme derivatives |
03/12/1986 | EP0173881A2 Photolithographic method and combination including barrier layer |
03/12/1986 | EP0173849A2 Laser lithography |
03/12/1986 | EP0173708A1 Screen printing compositions. |
03/11/1986 | US4575636 Deep ultraviolet (DUV) flood exposure system |
03/11/1986 | US4575480 Photoresist composition |
03/11/1986 | US4575399 Antireflective coating on resist film, integrated circuit manufacture |
03/11/1986 | US4575330 Apparatus for production of three-dimensional objects by stereolithography |
03/11/1986 | US4575250 Aligning apparatus and method for mitigating instability caused by interference in alignment signal |
03/11/1986 | US4575229 Photoetch plate hinge |
03/05/1986 | EP0173057A2 Composition polymerisable by irradiation |
03/05/1986 | EP0172949A2 Adapter for the double-sided exposition of chips covered by a light sensitive resin |
03/04/1986 | US4573782 Developing apparatus for forming an image in light-sensitive material using photopolymerizable composition |
03/04/1986 | US4573779 Variable size circular aperture camera |
02/27/1986 | WO1986001313A1 Process for forming a layer of patterned photoresist |
02/27/1986 | WO1986001312A1 Photosensitive resin printing material for letterset printing |