| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/26/1986 | EP0172583A2 Method of x-ray lithography |
| 02/26/1986 | EP0172525A2 Process for reducing side lighting during the exposure of reproduction layers |
| 02/26/1986 | EP0172330A1 Photocurable composition |
| 02/25/1986 | US4572956 Electron beam pattern transfer system having an autofocusing mechanism |
| 02/25/1986 | US4572890 Process for the production of images |
| 02/25/1986 | US4572889 Lithographic printing plate and process for production thereof |
| 02/25/1986 | US4572888 Photopolymerizable composition with adhesion improving additive |
| 02/25/1986 | US4572887 Radiation-polymerizable mixture with crosslinkable binder |
| 02/25/1986 | US4572886 Optical method for integrated circuit bar identification |
| 02/25/1986 | US4572659 Illuminating apparatus |
| 02/19/1986 | EP0171748A2 Negative-toning imaging system with re-imaging capability using 4-(2'-nitrophenyl)-1,4-Dihydropyridine compounds |
| 02/19/1986 | EP0171654A1 Novel (meth)acrylate and resin composition comprising the same |
| 02/19/1986 | EP0171630A2 System for producing high resolution circuit lines on a printed circuit board |
| 02/19/1986 | EP0171600A1 Carbazole photoinitiators for the photopolymerization of unsaturated compounds |
| 02/18/1986 | US4571377 Polymerization effected only by applying a plurality of energy wavelengths |
| 02/18/1986 | US4571375 Ring-opened polynorbornene negative photoresist with bisazide |
| 02/18/1986 | US4571374 Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive |
| 02/18/1986 | US4571073 Apparatus for the exposure of photosensitive plates on two sides |
| 02/18/1986 | CA1200713A1 Photopolymerizable mixtures and photocurable elements produced therefrom |
| 02/13/1986 | WO1986001065A1 Conveyorized microwave heating system |
| 02/13/1986 | WO1986001010A1 Product and process for producing an image on a substrate |
| 02/13/1986 | WO1986001009A1 Pattern formation |
| 02/12/1986 | EP0171195A1 Method for detecting endpoint of development |
| 02/12/1986 | EP0171111A2 Process to superpose two positive photoresist layers |
| 02/12/1986 | EP0171069A2 Method and apparatus for production of three-dimensional objects by stereolithography |
| 02/12/1986 | EP0171068A2 Method of forming ultrafine patterns |
| 02/11/1986 | US4570059 Automatic lens focus with respect to the surface of a workpiece |
| 02/11/1986 | US4569953 Photoactivated polymerization of vinyl monomers by polysilanes |
| 02/11/1986 | US4569901 Poly(N-benzyl acrylamide) polymer containing negative photoresist compositions |
| 02/11/1986 | US4569897 Imidized acrylic polymers and crosslinking azide photosensitizer in a solvent |
| 02/11/1986 | CA1200559A1 Acrylphosphine oxides and their use |
| 02/11/1986 | CA1200411A1 Developer for photosensitive coatings |
| 02/05/1986 | EP0170078A1 Support for lithograhic printing plates made from an aluminium alloy, and printing plate of this material |
| 02/05/1986 | EP0170041A2 Water-developable, bi-layer or mono-layer, negative-working, lithographic plate |
| 02/05/1986 | EP0170013A2 Lithographic apparatus performance measurement |
| 02/04/1986 | US4569068 X-Ray Lithography apparatus |
| 02/04/1986 | US4568734 Methacrylate copolymers containing oxygen-containing heterocyclic ring |
| 02/04/1986 | US4568632 Patterning of polyimide films with far ultraviolet light |
| 02/04/1986 | US4568631 Process for delineating photoresist lines at pattern edges only using image reversal composition with diazoquinone |
| 02/04/1986 | US4568629 Dry planographic plate with silicon rubber layer and organic polymer overlayer |
| 02/04/1986 | US4568628 Water developable diazo printing plate composition with quaternary nitrogen stabilizer |
| 02/04/1986 | US4568627 Film for chromatic proofreading |
| 02/04/1986 | US4568411 Metal/semiconductor deposition |
| 02/04/1986 | US4568409 Laser ablation, etching |
| 01/30/1986 | WO1986000725A1 Method of developing radiation sensitive negative resists |
| 01/29/1986 | EP0169485A2 Method and apparatus for inducing photochemical reaction |
| 01/29/1986 | EP0169294A2 A resin printing plate and preparation thereof |
| 01/29/1986 | EP0169238A1 Inspection system utilizing dark-field illumination |
| 01/28/1986 | US4567132 Multi-level resist image reversal lithography process |
| 01/28/1986 | US4567131 Lithographic printing plates |
| 01/28/1986 | US4567128 Cover sheet in a photosensitive element |
| 01/28/1986 | US4567123 Diffusing plate |
| 01/28/1986 | US4566937 Electron beam enhanced surface modification for making highly resolved structures |
| 01/28/1986 | US4566795 Alignment apparatus |
| 01/28/1986 | CA1200037A1 Photopolymerisable materials for use in producing screen printing stencils |
| 01/22/1986 | EP0169049A2 Dye transfer image process |
| 01/22/1986 | EP0168763A2 Method for fabricating a master recording disc |
| 01/22/1986 | EP0168643A2 Device for the inspection of wafers |
| 01/22/1986 | EP0168636A2 Method for making multilayer coating |
| 01/21/1986 | US4566116 Soft X-ray generator |
| 01/21/1986 | US4566016 Dual intensity laser beam picture recording method |
| 01/21/1986 | US4565773 Dry nonelectroscopic toners surface coated with nonionic siloxane-oxyalkylene block copolymer |
| 01/21/1986 | US4565771 Production of gravure printing plates having plastic printing layers |
| 01/21/1986 | US4565769 Polymeric sensitizers for photopolymer composition |
| 01/21/1986 | US4565768 Condensation product of azidoaromatic aldehyde and isophorone; negative photoresists; resolution; semiconductors |
| 01/21/1986 | US4565767 Light-sensitive polymer composition with poly(amic acid), bisazide, and tertiary amine compound |
| 01/21/1986 | US4565756 Dyeing patterned filters protected and separated by barrier layer having photoresistformed apertures |
| 01/21/1986 | US4565443 Printing apparatus |
| 01/21/1986 | CA1199514A1 Transfer imaging system |
| 01/16/1986 | WO1986000427A1 Deep-uv lithography |
| 01/16/1986 | WO1986000425A1 Adhesion promoter and process for plasma oxide surfaces |
| 01/15/1986 | EP0168179A1 Improvements relating to photolithography |
| 01/15/1986 | EP0167963A2 Light-sensitive composition and light sensitive registration material prepared therewith |
| 01/15/1986 | EP0167854A1 Intermediate layer material of three-layer resist system and method of forming resist pattern |
| 01/15/1986 | EP0167779A2 Polymerisable compounds with perfluoroalkyl groups, registration layers containing them and their use in dry lithography |
| 01/15/1986 | EP0167778A1 Derivatives of 1,2-naphthoquinone diazide containing perfluoralkyl groups, and reproduction material containing these compounds |
| 01/15/1986 | EP0167777A2 Copolymers with perfluoroalkyl groups, registration layers containing them and their use in dry lithography |
| 01/14/1986 | US4564583 Method for manufacturing a semiconductor device |
| 01/14/1986 | US4564581 Process of preparing screen stencil using diazo photosensitive compositions with acidic p-H indicator |
| 01/14/1986 | US4564580 Photosensitive resin composition |
| 01/14/1986 | US4564579 Pattern forming material of a siloxane polymer |
| 01/14/1986 | US4564578 Novel thioxanthones substituted by alpha-aminoalkyl groups |
| 01/14/1986 | US4564576 Resist material comprising polymer of allylsilyl compound and pattern forming method using the resist material |
| 01/14/1986 | US4564575 Reduction of solubility |
| 01/14/1986 | US4564572 Color picture tube |
| 01/14/1986 | US4564571 Transfer sheet with color pattern having metallic luster, and method of manufacturing said sheet |
| 01/14/1986 | US4564284 Semiconductor exposure apparatus |
| 01/14/1986 | US4564280 Method and apparatus for developing resist film including a movable nozzle arm |
| 01/14/1986 | US4563820 Aligning system |
| 01/14/1986 | CA1199217A1 Offset printing form and method of making it |
| 01/08/1986 | EP0167489A2 Liquid thioxanthoncarboxilic-acid esters |
| 01/08/1986 | EP0167227A2 Process for the ozone protection of photopolymer-flexoprinting plates by alcohol-soluble polyamides |
| 01/08/1986 | EP0167111A2 Process for obtaining resist patterns |
| 01/08/1986 | EP0167051A1 Thermostable and irradiation-curable polymer system based on bisphenol and epichlorohydrine, and method for its preparation |
| 01/07/1986 | US4563438 Liquid mixture of photoinitiators |
| 01/07/1986 | US4563414 Method of producing a mask to be used for the production of a ceramic filter |
| 01/07/1986 | US4563413 Photopolymer process and composition employing a photooxidizable component capable of forming endoperoxides |
| 01/07/1986 | US4563410 Method for the preparation of a planographic printing plate using NiS containing nuclei |
| 01/07/1986 | US4563241 Method of forming patterns |
| 01/03/1986 | WO1986000151A1 Improvements relating to photolithography |