| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/24/1984 | CA1171555A1 Apparatus for projecting a series of images onto dies of a semiconductor wafer |
| 07/19/1984 | WO1984002781A1 Method and apparatus for exposing photosensitive material |
| 07/18/1984 | EP0113521A2 Light-sensitive lithographic printing plate precursor |
| 07/18/1984 | EP0113409A2 Method and composition for applying coatings on printed circuit boards, and process for making said composition |
| 07/17/1984 | US4460675 Calendering a composition of binder, monomer, and photoinitiator between supports |
| 07/17/1984 | US4460674 Gallic acid derivatives and napohthoquinones |
| 07/17/1984 | US4460436 Deposition of polymer films by means of ion beams |
| 07/17/1984 | US4460427 Process for the preparation of flexible circuits |
| 07/17/1984 | US4460272 Printing machines used in photolithography, repro work, screen printing, and bromography |
| 07/17/1984 | US4459937 High rate resist polymerization apparatus |
| 07/17/1984 | CA1170890A1 Apparatus and method for developing high resolution images using a means reciprocating perpendicular to the image surface |
| 07/17/1984 | CA1170888A1 Light-sensitive copying material including an ester of ether surfactant obtained by reacting a fluorinated carboxylic acid or alkanol with polyalkylene gylcol |
| 07/17/1984 | CA1170887A1 Aqueous developable photopolymerizable elements |
| 07/11/1984 | EP0113314A1 Compositions photocurable in the presence of sensitizers |
| 07/11/1984 | EP0113313A1 Compositions photocurable in the presence of sensitizers, and their use |
| 07/11/1984 | EP0113034A2 A method for producing a resist image involving the use of polystyrene-tetrathiafulvalene polymer as a deep-ultraviolet printing mask |
| 07/11/1984 | EP0113033A2 Process for forming resist masks |
| 07/10/1984 | US4459416 Water soluble thioxantone photoinitiators |
| 07/10/1984 | US4459414 Photoinitiators |
| 07/10/1984 | US4459349 Photosensitive resin composition |
| 07/10/1984 | US4459348 Multi-layer elements suitable for the production of printing plates and relief plates |
| 07/10/1984 | US4458994 High resolution optical lithography method and apparatus having excimer laser light source and stimulated Raman shifting |
| 07/10/1984 | US4458980 Optical reproducing head |
| 07/10/1984 | CA1170788A1 Positioning system |
| 07/04/1984 | EP0112653A2 Dry planographic plate |
| 07/04/1984 | EP0112486A2 Transport and squeegee device |
| 07/04/1984 | EP0112399A1 Interferential measuring method for surfaces |
| 07/03/1984 | US4458302 Reflection type optical focusing apparatus |
| 07/03/1984 | US4458063 2-Methyl-1,3-propylene glycol mono- or di-alkylene oxide ether |
| 07/03/1984 | US4458008 Photolithography |
| 07/03/1984 | US4458007 Printing plates, photoresists |
| 07/03/1984 | US4458006 Photopolymerizable mixture and photopolymerizable copying material prepared therewith |
| 07/03/1984 | US4458005 Lithographic printing plates |
| 07/03/1984 | US4458003 Photosensitive materials for use in making dry transfers |
| 07/03/1984 | US4458000 Light-sensitive mixture and light-sensitive copying material prepared therefrom wherein image produced therein is visible under yellow safety light |
| 07/03/1984 | US4457999 Positive photoresists |
| 07/03/1984 | US4457664 Wafer alignment station |
| 07/03/1984 | US4457259 Apparatus for spraying a liquid on a spinning surface |
| 07/03/1984 | CA1170012A1 Sleeve for a printing cylinder |
| 06/27/1984 | EP0112217A1 Pattern generator for integrated circuits and process using this generator |
| 06/27/1984 | EP0111799A1 Process for the development of polymeric high temperature-resistant relief structures obtained by the cross-radiation cross-linking of prepolymers |
| 06/27/1984 | EP0111707A2 Methods of forming exposure patterns |
| 06/27/1984 | EP0111655A1 Processes for producing positive self-developed photo resist patterns |
| 06/27/1984 | EP0111648A1 Alignment and focusing system for a scanning mask aligner |
| 06/26/1984 | US4456680 Process for preparing a mask for sandblasting |
| 06/26/1984 | US4456679 Production of relief images or resist images by a positive-working method |
| 06/26/1984 | US4456678 High resolution lithographic resist of negative working cationic vinyl polymer |
| 06/26/1984 | US4456677 Composite resist structures for submicron processing in electron/ion lithography |
| 06/26/1984 | US4456675 Dry process for forming metal patterns wherein metal is deposited on a depolymerizable polymer and selectively removed |
| 06/26/1984 | US4456371 Optical projection printing threshold leveling arrangement |
| 06/26/1984 | CA1169980A1 Interferometrically controlled stage with precisely orthogonal axes of motion |
| 06/26/1984 | CA1169889A2 Shock and vibration isolation system |
| 06/21/1984 | WO1984002308A1 Improvements in or relating to electro-sensitive materials |
| 06/21/1984 | WO1984002289A1 Coated media for optical recording and associated coating techniques |
| 06/21/1984 | WO1984002288A1 Coated media for optical recording, associated acrylic coatings and related application methods |
| 06/20/1984 | EP0111371A2 A method of forming a printing sleeve |
| 06/20/1984 | EP0111274A2 Photosensitive composition, photoprinting material prepared therewith and process for producing a printing plate with that material |
| 06/20/1984 | EP0111273A2 Light-sensitive composition, photoprinting material prepared using that composition and processes for producing a printing plate with this material |
| 06/20/1984 | EP0111128A2 UV patterning of resist materials |
| 06/19/1984 | US4455563 System and film gate for accurately imaging information on a film by a charged particle beam |
| 06/19/1984 | US4455501 Precision rotation mechanism |
| 06/19/1984 | US4455485 Laser beam scanning system |
| 06/19/1984 | US4455365 Silver halide photographic material for photomechanical process and reduction processing method thereof |
| 06/19/1984 | US4455364 Process for forming metallic image, composite material for the same |
| 06/19/1984 | CA1169347A1 Integrated laminating process |
| 06/13/1984 | EP0110832A1 Xanthene-9-ones and thioxanthene-9-ones |
| 06/13/1984 | EP0110831A1 Thioxanthones substituted by alpha-aminoalkyl groups |
| 06/13/1984 | EP0110576A2 Ionizing radiation-sensitive material and its use for preparing a pattern |
| 06/13/1984 | EP0110558A2 Method and apparatus for use in developing resist film |
| 06/13/1984 | EP0110515A1 Improvements in contrast and sensitivity of a positive polymer resist having a glass transition temperature |
| 06/13/1984 | EP0110417A2 Presensitized lithographic plate |
| 06/13/1984 | EP0110414A2 X-ray lithographic apparatus |
| 06/13/1984 | EP0110393A2 Process for surface improvement of surprint proof with transparentized particulate material |
| 06/13/1984 | EP0110256A1 Pressing and lifting device |
| 06/13/1984 | EP0110214A1 Photosensitive composition |
| 06/13/1984 | EP0110165A2 A method of enhancing the contrast of images and materials therefor |
| 06/13/1984 | EP0110145A2 Single exposure positive contact litho film |
| 06/13/1984 | EP0110042A2 Electron beam lithograph proximity correction method |
| 06/12/1984 | US4454222 Process for forming resist patterns using mixed ketone developers |
| 06/12/1984 | US4454221 Anisotropic wet etching of chalcogenide glass resists |
| 06/12/1984 | US4454220 Electrical device containing a radiation-sensitive polyimide precursor composition derived from a diaryl fluoro compound |
| 06/12/1984 | US4454219 Photosensitive resin composition comprised of a polymer obtained from an aliphatic amino group-containing monomer as a comonomer |
| 06/12/1984 | US4454218 N-Alkylindolylidene and N-alkylbenzo-thiazolylidene alkanones as sensitizers for photopolymer compositions |
| 06/12/1984 | US4454217 Opaque image formation in toned photopolymer layers using leaching solution |
| 06/12/1984 | US4454216 Diffusion transfer, thione compound |
| 06/12/1984 | US4454200 Methods for conducting electron beam lithography |
| 06/12/1984 | US4454179 Dry transfer article |
| 06/12/1984 | US4454167 Process for generating conductive patterns |
| 06/12/1984 | CA1169071A1 4-halogeno-5-(halogenomethyl-phenyl)-oxazole derivatives, a process for the preparation thereof, and radiation-sensitive compositions containing these derivatives |
| 06/12/1984 | CA1168915A1 Self-trimming photosensitive layer including a discontinuous minor phase of dispersed nonfibrous solid particles |
| 06/05/1984 | US4453262 X-Ray lithography apparatus and method of use |
| 06/05/1984 | US4453106 Compression base lamp |
| 06/05/1984 | US4452881 Method of adjusting the edge angle in polysilicon |
| 06/05/1984 | US4452880 Development of o-quinonediazide with potassium silicate |
| 06/05/1984 | US4452879 Preparation of ozone resistant printing plates |
| 06/05/1984 | US4452877 Coating an aluminum layer |
| 06/05/1984 | US4452665 Polymeric halocarbons as plasma etch barriers |
| 06/05/1984 | US4451971 Lift-off wafer processing |
| 06/05/1984 | CA1168792A1 Mixture which is polymerizable by radiation, and radiation-sensitive copying material prepared therewith |
| 06/05/1984 | CA1168657A1 Light-sensitive mixture comprising o- naphthoquinonediazides and light-sensitive copying material prepared therefrom |