Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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02/19/1985 | CA1182915A1 Optically readable information disk |
02/14/1985 | WO1985000671A1 Method for making permanent colored images and apparatus therefor |
02/14/1985 | WO1985000670A1 Thermal development of photosensitive materials employing microencapsulated radiation sensitive compositions |
02/13/1985 | EP0132959A2 Photopolymerizable composition including catalyst comprising diketone plus 4-(N,N-dimethylamino) benzoic acid or ester thereof |
02/13/1985 | EP0132869A1 Alpha-halogenated aromatic compounds as photoinitiators |
02/13/1985 | EP0132868A1 Alpha-halogenated aromatic compounds as photoinitiators |
02/13/1985 | EP0132867A1 Alpha-halogenated aromatic compounds as photoinitiators |
02/13/1985 | EP0132866A1 Alpha-halogenated aromatic compounds as photoinitiators |
02/13/1985 | EP0132865A1 Alpha-halogenated aromatic compounds as photoinitiators |
02/13/1985 | EP0132710A1 Light-sensitive recording material for the production of relief or resist patterns |
02/13/1985 | EP0132585A2 Lift-off process and composition therefor |
02/12/1985 | US4499217 Thermo-setting resinous liquid compositions |
02/12/1985 | US4499177 Method of manufacturing a semiconductor device |
02/12/1985 | US4499176 Coating of aqueous solution of unsaturated monomer, photoinitator, tertiary amine promoter, colloid and miscible solvent; contrast |
02/12/1985 | US4499175 Unsaturated prepolymer dispersed in aqueous solution of colloid |
02/12/1985 | US4499173 Increased photosensitivity, alkaline solubility and shelf life; phhotoresists; offset printing |
02/12/1985 | US4499171 Positive type photosensitive resin composition with at least two o-quinone diazides |
02/12/1985 | US4499170 Lithographic plates and photoresists having stabilized photosensitive diazo resin with theophylline derivative |
02/12/1985 | US4499163 Blend of polyurethane di(meth)acrylate, linear polymer, and sensitzer |
02/12/1985 | US4498964 Photoinitiators for high-speed curing of printing inks, paints, photoresists and films |
02/12/1985 | US4498762 Projection type exposure apparatus |
02/12/1985 | US4498742 Illumination optical arrangement |
02/06/1985 | EP0035574B1 Photo-polymerizable light-sensitive resin composition and light-sensitive sheet material |
02/05/1985 | US4498010 Virtual addressing for E-beam lithography |
02/05/1985 | US4498009 Optical lithographic system having a dynamic coherent optical system |
02/05/1985 | US4497891 Dry-developed, negative working electron resist system |
02/05/1985 | US4497890 Process for improving adhesion of resist to gold |
02/05/1985 | US4497889 Release compound in negative acting photopolymerizable element |
02/05/1985 | US4497888 Aluminum supports |
02/05/1985 | US4497884 Method for the production of a self-supporting mask |
02/05/1985 | US4497686 Fine-line die and method of making same |
02/05/1985 | US4497081 Apparatus for treating printing plates |
02/05/1985 | CA1181977A1 Image transfer film unit with surface layer having an array of open-ended capillaries over the imaging layer |
01/30/1985 | EP0132379A2 Planographic printing plate |
01/30/1985 | EP0132354A2 Developing composition for light-sensitive quinone B diazide |
01/29/1985 | US4497015 Light illumination device |
01/29/1985 | US4497013 Illuminating apparatus |
01/29/1985 | US4496647 Treatment of image-forming laminated plate |
01/29/1985 | US4496646 Photosensitive imaging material |
01/29/1985 | US4496241 Process and device for relatively aligning the image and object surfaces in optical copying systems |
01/29/1985 | US4496239 Projection exposure apparatus |
01/29/1985 | US4496222 For producing a reduced image on a surface |
01/29/1985 | US4496216 Method and apparatus for exposing photosensitive material |
01/29/1985 | CA1181759A1 Polyacetylenic lipids, radiation-sensitive compositions, photographic elements and processes relating to same |
01/29/1985 | CA1181757A1 Sulfoxonium salts and their use as polymerisation catalysts |
01/29/1985 | CA1181627A2 Radiation-sensitive composition containing an azide compound and an iodine compound |
01/23/1985 | EP0132221A1 Polyimide, process for its preparation and its use |
01/23/1985 | EP0131992A1 Photosensitive polyamic acid derivative, method of manufacturing polyimide pattern on a substrate, and semiconductor device comprising a polyimide pattern obtained by using the said method |
01/23/1985 | EP0131824A2 Photopolymerizable composition |
01/23/1985 | EP0131780A1 Light-sensitive composition and reproduction material prepared thereof |
01/23/1985 | EP0131575A1 Aqueous alkaline solution and method for developing positively working reproduction layers. |
01/22/1985 | US4495343 Visible light-sensitive polyester polymer and visible light-sensitive resin composition containing said polymer |
01/22/1985 | US4495271 Terpolymea binders, polyglycol diacrylate or dimethacrylates, initiators, polyurethanes |
01/22/1985 | US4495042 Photo-curable epoxy resin composition |
01/22/1985 | US4495024 Method for deposition of fluid and gaseous media on substrates for their transport |
01/22/1985 | US4495014 Laminating and trimming process |
01/16/1985 | EP0131462A2 Improvements in or relating to lithographic printing plates |
01/16/1985 | EP0131299A2 Controlled roughening of photosensitive composition |
01/16/1985 | EP0131295A2 Process for the stabilisation of photopolymerizable mixtures |
01/16/1985 | EP0131294A2 Water soluble or dispersible photopolymerizable mixture |
01/16/1985 | EP0131238A1 Process for obtaining negative copies using a 1,2-quinone diazide material |
01/16/1985 | EP0131155A2 Electro-magnetic alignment apparatus |
01/15/1985 | US4493886 Composition and method for forming amorphous chalcogenide films from solution |
01/15/1985 | US4493884 Light-sensitive composition |
01/15/1985 | US4493857 Method for applying a coating to a thin board |
01/15/1985 | US4493855 Deposition of organosilicon barrier, heat treatment, deposition photoresist, ion etching, and dissolving first polymer |
01/15/1985 | US4493123 For working elements in a processing unit for exposed printing materials |
01/15/1985 | CA1180931A1 Bilayer photosensitive imaging article including film-forming bimodal styrene-maleic anhydride copolymer in the image layer |
01/09/1985 | EP0130871A1 Process for the production of colour television tubes with a screen having a low ambient light reflection |
01/09/1985 | EP0130828A2 Photosensitive resin composition |
01/09/1985 | EP0130804A2 Photosensitive resin composition |
01/09/1985 | EP0130615A2 Process for making printed-circuit boards, and photolacquer for carrying out this process |
01/09/1985 | EP0130599A2 Photosolubilizable composition |
01/09/1985 | EP0130581A2 Enlargement of photopolymer images in photopolymer mask |
01/09/1985 | EP0130559A2 A method of producing a pattern-engraved article by sandblasting |
01/09/1985 | EP0130488A2 Presensitized lithographic printing plate precursor |
01/09/1985 | EP0130358A1 Electro-magnetic alignment device |
01/09/1985 | EP0130357A1 Electro-magnetic alignment assemblies |
01/09/1985 | EP0130338A2 Resist structure and processes for making and patterning it |
01/09/1985 | EP0130222A1 Cover film for printing plate |
01/09/1985 | EP0130214A1 Method and apparatus for exposing photosensitive material. |
01/09/1985 | EP0027134B1 Method for distributing a uniform coating on a surface |
01/08/1985 | US4492748 Light-sensitive polycondensation product containing diazonium and dialdehyde groups, and light-sensitive recording material prepared therewith |
01/08/1985 | US4492718 Optical recording |
01/08/1985 | US4492356 Precision parallel translation system |
01/08/1985 | CA1180846A1 Elastomeric, ethylenically unsaturated polyurethanes and radiation polymerizable mixtures containing such polyurethanes |
01/08/1985 | CA1180768A1 Raster image processor and method |
01/08/1985 | CA1180588A1 Light-sensitive mixture including a photolytically cleavable organic halogen compound and an azo dyestuff with a nitro group |
01/02/1985 | EP0130088A2 Plasma developable negative resist compositions for electron beam, X-ray and optical lithography |
01/02/1985 | EP0129901A2 Light-sensitive water-developable registration material for producing printing or relief forms, and resists |
01/02/1985 | EP0129834A2 Photo and radiation-sensitive organopolymeric material |
01/02/1985 | EP0129732A1 Wafer transferring chuck assembly |
01/02/1985 | EP0129729A2 Process for the manufacture of letter press forms |
01/02/1985 | EP0129694A1 Deep ultra-violet lithographic resist composition |
01/02/1985 | EP0129681A2 Variable axis immerson lens electron beam projection system |
01/02/1985 | CA1180221A Photolithographic element containing a silver- receptive polyaldehyde-containing receiving layer |
01/01/1985 | US4491629 Polyvinyl pyrrolidone, polyvinyl alcohol |
01/01/1985 | US4491628 Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
01/01/1985 | US4491530 Brown stain suppressing phenol free and chlorinated hydrocarbons free photoresist stripper |
01/01/1985 | US4491492 Methods of and apparatus for applying a sheet to a rigid board |