| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/02/1986 | US4609615 Process for forming pattern with negative resist using quinone diazide compound |
| 09/02/1986 | US4609614 Two-step curing |
| 09/02/1986 | US4609612 Photopolymerizable composition and process with liquid mixture of photoinitiators and ethylenically unsaturated compound |
| 09/02/1986 | US4609606 Polyesters comprising recurring photoconductive and photocrosslinkable units and elements thereof |
| 09/02/1986 | US4609285 Wafer support plate for photolithographic apparatus |
| 09/02/1986 | US4609259 Process for producing micro Fresnel lens |
| 09/02/1986 | CA1210734A1 Process for producing textured coatings |
| 09/02/1986 | CA1210622A1 Development of light-sensitive quinone diazide compositions |
| 08/27/1986 | EP0192377A2 Non-photosensitive transfer resist |
| 08/27/1986 | EP0192302A1 Method of manufacturing a semiconductor device, in which a photolacquer mask is formed by means of a two-layer lacquer system |
| 08/27/1986 | EP0192167A1 Use of thio-substitued ketones as photoinitiators |
| 08/27/1986 | EP0192078A2 Process for preparing negative relief images |
| 08/27/1986 | EP0191866A1 Photosensitive resin printing material for letterset printing |
| 08/27/1986 | EP0191774A1 Fabrication of devices involving lithographic procedures. |
| 08/26/1986 | US4608400 Novel (meth)acrylate and resin composition comprising the same |
| 08/26/1986 | US4608333 Radiation sensitive polymer composition |
| 08/26/1986 | US4608332 Electron lithography mask manufacture |
| 08/26/1986 | US4608331 Photosensitive plates with diazonium composition layer and polyurethane photopolymer with unsaturation in side chain overlayer |
| 08/26/1986 | US4608330 Method for producing microcapsules and photosensitive microcapsules produced thereby |
| 08/26/1986 | US4608281 Improvements in sensitivity of a positive polymer resist having a glass transition temperature through control of a molecular weight distribution and prebaked temperature |
| 08/26/1986 | US4608131 Aqueous electrolyte containing phosphoric acid and aluminum orthoposphate |
| 08/26/1986 | CA1210547A1 Photopolymerisable materials for use in producing stencils for screen printing |
| 08/20/1986 | EP0191400A2 Light-sensitive composition and registration material prepared thereof |
| 08/20/1986 | CN85107347A Method of high contrast positive photoresist developing |
| 08/19/1986 | USRE32228 Applying sheet of photopolymerizable elastomer to screen, heat treatment and curing |
| 08/19/1986 | US4606999 Development of positive photoresists using cyclic quaternary ammonium hydroxides |
| 08/19/1986 | US4606997 Maintaining quality of light during high power level consumption |
| 08/19/1986 | US4606996 Method of reducing treatment of silver halide photographic light-sensitive material for photochemical process |
| 08/19/1986 | US4606995 Process for developing light-sensitive o-quinonediazide lithographic plates with developing solution having cobalt or nickel compound |
| 08/19/1986 | US4606994 Crystallization |
| 08/19/1986 | US4606993 Saponified polyvinyl acetate, acrylic monomer, acrylic copolymer |
| 08/19/1986 | US4606985 Hardened gelatin |
| 08/19/1986 | US4606949 Coating method |
| 08/19/1986 | US4606931 Lift-off masking method |
| 08/19/1986 | CA1210161A1 Electron beam peripheral patterning of integrated circuits |
| 08/14/1986 | WO1986004695A1 Device fabrication method using spin-on glass resins and devices formed thereby |
| 08/13/1986 | EP0190831A2 Photocationically curable thiol-ene compositions |
| 08/13/1986 | EP0190799A1 Method of manufacturing a device: |
| 08/13/1986 | EP0190227A1 Product and process for producing an image on a substrate. |
| 08/13/1986 | CN85100875A Photosensitive lithographic plate with preapplied positive pattern |
| 08/12/1986 | US4605301 Exposure method of semiconductor wafer by mercury-vapor lamp |
| 08/12/1986 | CA1209741A1 Photopolymerisable compositions containing diaryliodosyl salts |
| 08/12/1986 | CA1209723A1 Method for lithographically fabricating devices |
| 08/12/1986 | CA1209579A1 THIOXANTHONES SUBSTITUTED BY .alpha.-AMINOALKYL GROUPS |
| 08/06/1986 | EP0189752A2 Process for stripping photoresist and stripping rests from semiconductor surfaces |
| 08/05/1986 | USH102 Oxygen quenching after exposure to crosslinking radiation |
| 08/05/1986 | US4604345 Exposure method |
| 08/05/1986 | US4604344 Polyepoxides, cyanoacrylates, polyurethanes, phenolic resins |
| 08/05/1986 | US4604343 Water developable photosensitive resinous composition |
| 08/05/1986 | US4604342 Photopolymerizable mixture and recording material produced from it |
| 08/05/1986 | US4604340 Tacky and tonable with actinic radiation |
| 08/05/1986 | US4604329 High technology decorative materials and fabrication of same |
| 08/05/1986 | US4604305 Coating substrate with resist to trap solvent and baking to remove solvent |
| 08/05/1986 | US4603974 Reticle used in semiconductor device fabrication and a method for inspecting a reticle pattern thereon |
| 08/05/1986 | US4603968 Device for exchanging masks |
| 08/05/1986 | US4603473 Method of fabricating integrated semiconductor circuit |
| 08/05/1986 | CA1209143A1 Photocrosslinkable water-soluble polymers, process for their preparation and use thereof |
| 08/05/1986 | CA1209018A1 Method and apparatus for ultrasonic etching of printing plates |
| 07/31/1986 | WO1986004303A1 Graphic design article |
| 07/30/1986 | EP0189374A2 Liquid mixtures of 2-(hydroxy-3-branched alkyl-5-methylphenyl)-2H-benzotriazole, process for their preparation and stabilized compositions containing them |
| 07/30/1986 | EP0189271A2 Photosensitive composition |
| 07/30/1986 | EP0188752A2 Curable resin, photosensitive registration material based on this curable resin and process for the preparation of a lithographic impression plate by means of this photosensitive registration material |
| 07/30/1986 | EP0188568A1 Method of developing radiation sensitive negative resists. |
| 07/30/1986 | EP0188432A1 Conveyorized microwave heating system |
| 07/30/1986 | CN85100457A Preparation for rare earthe cis-polyisopentadiene negative original photoresister |
| 07/29/1986 | US4603195 Organosilicon compound and use thereof in photolithography |
| 07/29/1986 | US4603101 Photoresist compositions containing t-substituted organomethyl vinylaryl ether materials |
| 07/29/1986 | US4603100 Lithographic printing-transition metal chelates as oxidizer |
| 07/29/1986 | US4603058 Post-treatment of cured, radiation sensitive, polymerizable resins to eliminate surface tack |
| 07/29/1986 | US4602866 Exposure device for platemaking apparatus |
| 07/29/1986 | CA1208846A1 Dual uv/thermally curable acrylate compositions with pinacol |
| 07/29/1986 | CA1208811A1 Prelamination, imagewise exposure of photohardenable layer in process for sensitizing, registering and exposing circuit boards |
| 07/29/1986 | CA1208473A1 Water developable printing plate |
| 07/23/1986 | EP0188380A2 Protective coating for phototools |
| 07/23/1986 | EP0188232A2 Radiation curable liquid resin composition |
| 07/23/1986 | EP0188230A2 Photolithographic stripping method |
| 07/23/1986 | EP0188228A2 Colour-proof foil for the overlay process |
| 07/23/1986 | EP0188205A2 Photoresist compositions with enhanced sensitivity using polyamide esters |
| 07/23/1986 | EP0188148A1 Photolythographic process for thick film paste deposited on a substrate |
| 07/23/1986 | EP0187870A1 Pattern formation |
| 07/22/1986 | US4602097 Water soluble photoinitiator benzophenone and thioxanthenone ethoxy-ether derivatives |
| 07/22/1986 | US4602076 Unsaturated monomer, ketone, peroxide |
| 07/22/1986 | US4601972 Hybrid integrated circuits, acrylate |
| 07/22/1986 | US4601971 Tunnel cathode mask for electron lithography and method for manufacturing and operating it |
| 07/22/1986 | US4601970 Dry photosensitive film containing crosslinked beads |
| 07/22/1986 | US4601969 High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution |
| 07/22/1986 | US4601928 Pressurized and heated, fused layer of termoplastic elastomer sheet and knitted fabric |
| 07/22/1986 | US4601913 Plasma oxidation |
| 07/22/1986 | US4601560 Focus adjustment in an alignment and exposure apparatus |
| 07/22/1986 | CA1208062A1 Processing of radiation sensitive devices |
| 07/17/1986 | WO1986004158A1 Establishing and/or evaluating alignment by means of alignment marks |
| 07/16/1986 | EP0187517A2 High-temperature resistant, selectively developable resist |
| 07/16/1986 | EP0187421A2 Method of manufacturing a semiconductor device |
| 07/16/1986 | EP0187303A2 Storage stable aryl nitrone compositions |
| 07/16/1986 | EP0187295A2 Photolithographic method |
| 07/16/1986 | CN85107650A Amorphous silicon as an anti-reflective coating for metal layer lithography |
| 07/15/1986 | US4600973 Light source device |
| 07/15/1986 | US4600686 Method of forming a resist mask resistant to plasma etching |
| 07/15/1986 | US4600685 Patterning process using ladder-type organosiloxane resin and process for production of electronic devices utilizing said patterning process |
| 07/15/1986 | US4600684 Process for forming a negative resist using high energy beam |