Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/1985
10/08/1985CA1194723A1 Imaging system
10/08/1985CA1194722A1 Color image-forming process
10/02/1985EP0156683A1 Apparatus for optical micro-lithography with a local alignment system
10/02/1985EP0156535A2 Spectrally-sensitized imaging system
10/02/1985EP0156534A1 Screen printing compositions
10/02/1985EP0156369A2 Toners treated with polymeric quaternary ammonium salts and slip agent and process
10/02/1985EP0035028B1 Single sheet color proofing diazo oxide system
10/01/1985US4544846 Variable axis immersion lens electron beam projection system
10/01/1985US4544729 Photo and radiation-sensitive organopolymeric material
10/01/1985US4544627 Negative image forming process in o-quinone diazide layer utilizing laser beam
10/01/1985US4544626 Photoprinting process and apparatus for exposing photopolymers
10/01/1985US4544625 Photosensitive resin composition and photosensitive element
10/01/1985US4544624 Photosensitive resin composition
10/01/1985US4544623 Photosensitive coating composition and the use thereof for protective purposes
10/01/1985US4544622 Negative-acting photoresist imaging system
10/01/1985US4544621 Photocrosslinkable water-soluble polymers, containing maleimidyl and quaternary ammonium groups process for their preparation and use thereof
10/01/1985US4544619 Photoresist layer, protective intermediate layer, and support layer
10/01/1985US4544416 Passivation of silicon oxide during photoresist burnoff
10/01/1985US4544311 Mask alignment apparatus
10/01/1985US4544259 Side printing apparatus
10/01/1985CA1194615A1 Bilevel ultraviolet resist system for patterning substrates of high reflectivity
09/1985
09/25/1985EP0155652A2 Photopolymerizable mixture and recording material produced from it
09/25/1985EP0155620A2 Burning-in and gumming for lithographic plates, and process for the preparation of a lithograhic plate
09/25/1985EP0155304A1 System and method for projecting multiple images directly onto printing plates
09/24/1985US4543319 Coating, halocarbons, dopes, negatives, photoresists, exposure, development
09/24/1985US4543318 Photoresists for circuit boards and printing plates
09/24/1985US4543315 Storage-stable photosensitive composition and article with adduct of diazo resin and amorphous sulfopolyester
09/24/1985US4542968 Device for treating photo printing plates
09/24/1985CA1194250A1 Photopolymerisable resins
09/24/1985CA1193896A1 Method of replenishing a developer for photosensitive plate
09/18/1985EP0155231A2 Image-producing process
09/18/1985EP0155138A2 A reticle used in semiconductor device fabrication and a method for inspecting a reticle pattern thereon
09/18/1985EP0155051A1 Optical glass fibre with a polymer coating and process for making it
09/18/1985EP0155000A2 Method of manufacturing optical memory element
09/18/1985EP0154994A2 Improved surface tack-free photosensitive resin composition and a method using same
09/18/1985EP0154981A2 Process for producing light-sensitive lithographic plate requiring no dampening solution
09/18/1985EP0154980A1 Negative working light-sensitive lithographic plate requiring no dampening solution and plate making process
09/18/1985EP0154979A2 Single development step, dual layer photoresist photolithographic process
09/18/1985EP0154932A2 Multilayer photoresist process
09/18/1985EP0154675A2 A process for reactive ion etching a polymer film
09/18/1985EP0032936B1 Pressure-sensitive adhesive susceptible to ultraviolet light-induced detackification
09/17/1985US4542397 Self aligning small scale integrated circuit semiconductor chips to form large area arrays
09/17/1985US4542392 Method and apparatus for setting and monitoring an exposure spot for printing
09/17/1985US4542090 Electron beam sensitive resist
09/17/1985US4542088 Photopolymerizable compositions and image-forming materials using said compositions
09/17/1985US4542085 Negative working diazo light-sensitive composition with oxonol dye and lithographic printing plate using the same
09/17/1985US4541715 Apparatus for detecting contaminants on the reticle of exposure system
09/17/1985US4541714 Method of handling workpieces and masks in a duplication process
09/17/1985US4541712 Laser pattern generating system
09/17/1985CA1193785A1 Acylphosphine sulfides, their preparation and a process for the preparation of a photopolymerizable composition
09/12/1985WO1985004028A1 Screen printing compositions
09/12/1985WO1985004026A1 Method for making integrated circuit devices using a layer of indium arsenide as an antireflective coating
09/11/1985EP0154512A2 Tapered di-block copolymer photopolymerizable composition
09/11/1985EP0154237A2 Photopolymer for use as a solder mask
09/11/1985EP0154201A1 Process for the aftertreatment of aluminium oxide layers with aqueous solutions containing alkali-metal silicate, and their use in the production of supports for off-set printing plates
09/11/1985EP0154200A1 Process for a two-step hydrophilizing aftertreatment of aluminium oxide layers with aqueous solutions, and their use in the production of supports for off-set printing plates
09/11/1985EP0154198A2 A method and an apparatus for applying an emulsion onto a screen-printing plate
09/10/1985US4540650 Photoresists suitable for forming relief structures of highly heat-resistant polymers
09/10/1985US4540649 Water developable photopolymerizable composition and printing plate element containing same
09/10/1985US4540278 Optical focusing system
09/10/1985US4540251 Thermo-mechanical overlay signature tuning for Perkin-Elmer mask aligner
09/10/1985US4540240 Optical objective adjusting apparatus
09/10/1985CA1193275A1 Light-sensitive compounds, light-sensitive mixture, and light-sensitive copying material prepared therefrom
09/10/1985CA1193177A1 Photoresist stripper composition and method of use
09/04/1985EP0153904A2 Process for the preparation of a protection layer or a relief pattern
09/04/1985EP0153864A2 A method of electron beam exposure
09/04/1985EP0153682A2 Radiation-sensitive composition with acid cleavable compounds
09/04/1985EP0153648A2 X-ray source and X-ray lithography method
09/03/1985US4539695 X-Ray lithography system
09/03/1985US4539647 Method of and apparatus for identifying presensitized offset printing plates
09/03/1985US4539479 Automatic apparatus and method for exposing, registering, and handling double-sided printed circuit boards
09/03/1985US4539288 Sharp images
09/03/1985US4539287 Thermoplastic resin binder
09/03/1985US4539286 Flexible, fast processing, photopolymerizable composition
09/03/1985US4539285 Photosensitive negative diazo composition with two acrylic polymers for photolithography
09/03/1985US4539250 Resist material and process for forming fine resist pattern
09/03/1985US4539070 Exposure of photo resist
09/03/1985US4539061 Chemisorption, activation, molecular orientatin, bonding
08/1985
08/28/1985EP0153133A2 Assembling multilayers of polymerizable surfactant on a surface of a solid material
08/28/1985EP0152889A2 Photosensitive recording material
08/28/1985EP0152819A1 Light-sensitive mixture with diazoresins and light-sensitive registration material prepared therefrom
08/28/1985EP0152653A2 Process for the preparation of photoresist layers with rough surface on printing plates
08/28/1985EP0152475A1 Photopolymerizable compositions.
08/27/1985US4538105 Overlay test wafer
08/27/1985US4537977 Sensitizers for photocrosslinkable polymers or initiators for photopolymerization
08/27/1985US4537855 Photopolymerizable high molecular weight compound having polyfuctional ethylenically unsaturated side chain or end groups
08/27/1985US4537854 Photoresist compositions and method
08/27/1985US4537851 Process of forming powder pattern using positive diazonium salt photoresist
08/27/1985US4537811 Electron beam irradiating process for rendering rough or topographically irregular surface substrates smooth; and coated substrates produced thereby
08/27/1985US4537501 Apparatus for the attitude control of plate-form body
08/27/1985US4537498 Focal plane adjusted photomask and methods of projecting images onto photosensitized workpiece surfaces
08/27/1985US4537496 Method of replenishing a developer for photosensitive plate
08/27/1985US4536909 Apparatus for treating flexible printing plates produced by photochemical methods
08/27/1985CA1192673A1 X-ray lithographic system
08/27/1985CA1192662A1 Erasable recording medium comprising a dimer acid polyamide resin
08/27/1985CA1192429A1 Multi-layer element having a photo sensitive layer including 2-hydroxy-alkyl (meth) acrylate and polyvinyl alcohol
08/21/1985EP0152377A2 Curable compositions and their use
08/21/1985EP0152294A1 Adaptive X-ray lithography mask
08/21/1985EP0152227A2 The fabrication of microstructures over large areas using physical replication
08/21/1985EP0152164A2 Provision of a sub-half-micron-size recess in a semiconductor substrate
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