| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/02/1986 | EP0166682A2 Process for obtaining positive images |
| 01/02/1986 | EP0166307A2 Process for forming a lift-off glass mask on a substrate |
| 01/02/1986 | EP0166004A1 Proximity effect correction method for E-beam lithography |
| 12/31/1985 | US4562142 Printed circuits |
| 12/31/1985 | US4562141 High resolution photographic film |
| 12/31/1985 | US4562137 Rupturing capsules upon exposure to actinic radiation |
| 12/31/1985 | US4562091 Use of plasma polymerized orgaosilicon films in fabrication of lift-off masks |
| 12/31/1985 | US4561931 Applying polyvinyl alcohol and sensitizer, drying exposing, and developing |
| 12/31/1985 | US4561773 Projection exposure apparatus |
| 12/31/1985 | US4561688 Method of and apparatus for adsorbingly fixing a body |
| 12/27/1985 | EP0165591A2 Method for direct plate making |
| 12/27/1985 | EP0165561A2 Device for the treatment of flat plates |
| 12/27/1985 | EP0165273A1 Plant for the treatment of objects by means of a liquid |
| 12/27/1985 | EP0084544B1 Photo-crosslinkable telomers and production method thereof |
| 12/24/1985 | US4560641 Method for forming fine multilayer resist patterns |
| 12/24/1985 | US4560640 Glycidol methacrylate and methacryloyloxybenzalacetophenones; for integrated circuits |
| 12/24/1985 | US4560639 Two-sided supporting body sheet, transparency image, release surface structure |
| 12/24/1985 | US4560637 Containing a phenol and hydrazine compound with an ethylenically unsaturated compound capable of addition polymerization |
| 12/24/1985 | US4560636 Novolaks and naphthoquinone diazides; rough surface |
| 12/24/1985 | US4560249 Method of forming diffraction gratings and optical branching filter elements produced thereby |
| 12/24/1985 | US4559896 Coating apparatus |
| 12/24/1985 | US4559717 Flexure hinge |
| 12/24/1985 | CA1198426A1 Photocurable coloured compositions |
| 12/24/1985 | CA1198308A1 Deposition process |
| 12/24/1985 | CA1198307A1 Photosensitive coating compositions and the use thereof for protective purposes |
| 12/19/1985 | WO1985005721A1 Method of manufacturing stamper |
| 12/18/1985 | EP0165055A2 Method and apparatus for exposing photoresist by using an electron beam and controlling its voltage and charge |
| 12/18/1985 | EP0165031A2 Presensitized color-proofing sheet |
| 12/18/1985 | EP0165030A2 Pre-press proofing system incorporating antihalation layer |
| 12/18/1985 | EP0164931A2 Photosensitive materials and imaging processes using such materials |
| 12/18/1985 | EP0164750A2 Antireflective coatings for use in the manufacture of semiconductor devices, methods and solutions for making such coatings, and the method for using such coatings to absorb light in ultraviolet photolithography processes |
| 12/18/1985 | EP0164675A2 Lift-off process |
| 12/18/1985 | EP0164620A2 Positively acting light-sensitive coating solution |
| 12/18/1985 | EP0164598A2 Photosensitive resin composition and process for forming photo-resist pattern using the same |
| 12/17/1985 | US4559484 Stop-position controlling device for electric windshield wiper |
| 12/17/1985 | US4559389 High resolution and dry etching resistance |
| 12/17/1985 | US4559371 For printing inks and paints |
| 12/17/1985 | US4559295 Flotation of released material and removal by skimming |
| 12/17/1985 | US4559294 Manufacturing of relief printing plates made of photo-sensitive polymeric material |
| 12/17/1985 | US4559292 Photosensitive transfer material having a support of defined roughness |
| 12/11/1985 | EP0164314A2 Sulfoxonium salts |
| 12/11/1985 | EP0164270A2 Photo-polymerizable compositon and printing plate prepared therefrom |
| 12/11/1985 | EP0164248A2 Photosensitive coating compositions, thermally stable coatings prepared from them, and the use of such coatings in forming thermally stable polymer images |
| 12/11/1985 | EP0164165A1 Apparatus for imaging a mask pattern on a substrate |
| 12/11/1985 | EP0164149A1 Screen material for printing material and a manufacturing method |
| 12/11/1985 | EP0164128A2 Process for making lithographic printing plates, and printing plates made by the process |
| 12/11/1985 | EP0164100A2 Polymeric pyridinium ylide and products from same |
| 12/11/1985 | EP0164083A2 Positively acting light-sensitive coating solution |
| 12/11/1985 | EP0164059A2 Polymers having perfluoroalkyl groups, reproducing layers containing them, and their use in non-aqueous offset printing |
| 12/11/1985 | EP0164022A2 Method of forming corrosion resistant film on the surface of substrate composed of copper or copper alloy |
| 12/10/1985 | US4558117 Organic solvent-soluble photosensitive polyimide resin |
| 12/10/1985 | US4557997 Binders of amide-and carboxylic-containing acrylic copolymers; alkaline aqueous |
| 12/10/1985 | US4557996 Method for providing a pattern-wise photoresist layer on a substrate plate and a surface-protected substrate plate therefor |
| 12/10/1985 | US4557995 Applying two patterns on opposite side of the substrate |
| 12/10/1985 | US4557994 Micropattern of terpolymer resistant to rubbing and pressure |
| 12/10/1985 | US4557954 Three-dimensional photograph |
| 12/10/1985 | US4557797 Suppressing reflections from substrate into top resist layer without degrading pattern transfer |
| 12/05/1985 | WO1985005470A1 Bilevel resist |
| 12/05/1985 | EP0134789A4 Bilevel ultraviolet resist system for patterning substrates of high reflectivity. |
| 12/04/1985 | EP0163538A2 Pattern-forming material and its production and use |
| 12/04/1985 | EP0163315A2 Method for laminating a film by applying pressure and heat, and apparatus for carrying out the method |
| 12/04/1985 | EP0163257A1 Photopolymerisable mixture containing 1,3,10-triazaanthracen-4-one as a photoinitiator |
| 12/04/1985 | EP0163255A2 Apparatus for automatically charging a laminating station |
| 12/04/1985 | EP0163202A2 Photoresist stripper and stripping method |
| 12/04/1985 | EP0163199A2 Process and apparatus for determining registration faults of successive structures incorporated in semiconductor substrate |
| 12/04/1985 | EP0163128A2 Process for producing patterns in resist layers |
| 12/04/1985 | EP0163089A2 Process for activating a substrate for electroless deposition of a conductive metal |
| 12/04/1985 | EP0044345B1 Process for making video and similar discs |
| 12/03/1985 | US4556629 Developer composition for positive photoresists using solution with cyclic quaternary ammonium hydroxides |
| 12/03/1985 | US4556627 Two superimposed layers of polymers with diverse characteristics for solder mask coatings |
| 12/03/1985 | US4556626 Aqueous polyvinyl alcohol sensitizer, alcohol, ketone wetting agent |
| 12/03/1985 | US4556619 Negative-type acetalized polyvinyl alcohol resist sensitive to ionizing radiation |
| 12/03/1985 | US4556317 X-Y Stage for a patterned wafer automatic inspection system |
| 12/03/1985 | CA1197408A1 Lithographic substrate and its process of manufacture |
| 12/03/1985 | CA1197406A1 High resolution phototransparency image forming with photopolymers |
| 11/27/1985 | EP0162717A2 Method of forming mask pattern |
| 11/27/1985 | EP0162691A2 Water-developable, negative-working, lithographic printing plate |
| 11/27/1985 | EP0162664A2 Imaging systems, processes for imaging and developer sheets useful therein |
| 11/27/1985 | EP0162633A1 Methods of preparing and applying subbing layers for optical data disks |
| 11/27/1985 | EP0162572A1 Siloxane polyphotoinitiators of the substituted acetophenone type |
| 11/27/1985 | EP0162570A1 A conjugated diene copolymer, a process for producing the copolymer, and a photosensitive composition comprising the copolymer |
| 11/27/1985 | EP0162316A2 Profiling process for resist layers |
| 11/27/1985 | EP0162120A1 Method and device for the inspection of surfaces |
| 11/27/1985 | EP0080479B1 Exposure device |
| 11/26/1985 | US4555650 Two dimensional driving device for use in a positioning device in a semiconductor manufacturing apparatus |
| 11/26/1985 | US4555475 Imagewise photoexposure with laser |
| 11/26/1985 | US4555474 Photopolymerizable composition |
| 11/26/1985 | US4555473 Alkali developable photopolymer crystalline composition |
| 11/26/1985 | US4555471 Image-recording materials and image-recording carried out using these |
| 11/26/1985 | US4555469 Esterification of the sulfonyl halide by a mixture of a phenol and phenolic resin; nonexplosive |
| 11/26/1985 | US4555302 Method and apparatus for ultrasonic etching of printing plates |
| 11/21/1985 | WO1985005194A1 Method of applying poly(methacrylic anhydride) resist to a semiconductor |
| 11/21/1985 | WO1985005193A1 Focal plane adjusted photomask and methods of projecting images onto photosensitized workpiece surfaces |
| 11/21/1985 | WO1985005130A1 Method of applying a protective layer on a surface to be subjected to etching |
| 11/21/1985 | WO1985005119A1 Process for the sensitization of an oxidoreduction photocalatyst, and photocatalyst thus obtained |
| 11/21/1985 | EP0162017A2 Homo and copolymer, process of their crosslinking and their use |
| 11/21/1985 | EP0161870A2 Highly photosensitive aqueous solvent-developable printing assembly |
| 11/21/1985 | EP0161830A1 Siloxane photoinitiators with aryoyl formate groups |
| 11/21/1985 | EP0161660A2 Pattern forming method and composition for pattern formation to be used therefor |
| 11/21/1985 | EP0161592A2 Light-sensitive registration material for the production of lithographic printing plates |