| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/14/1985 | US4517282 Printed circuit board manufacture, polyamines, isobutylmethyl carbinol, air |
| 05/14/1985 | US4517281 Unsaturated monomer, polymer binder developers |
| 05/14/1985 | US4517279 Photosensitive elastomeric polymer composition for flexographic printing plates - processable in semi-aqueous basic solution or solvent systems |
| 05/14/1985 | US4517278 Flexographic printing plates and process for making the same |
| 05/14/1985 | US4517277 Photosensitive recording material suitable for the production of printing plates and relief plates, and the production of these plates using this recording material |
| 05/14/1985 | US4517276 Metal-containing organic photoresists |
| 05/14/1985 | US4517275 Light-sensitive mixture based on O-naphthoquinone-diazides, and light-sensitive copying material prepared therefrom |
| 05/14/1985 | US4517267 Images, gelatrin, ultrasonic vibration |
| 05/14/1985 | US4517266 Vinlycarbazole polymer, thioflavine dye, alpha-dicarbonyl compound |
| 05/14/1985 | US4517106 Soluble surfactant additives for ammonium fluoride/hydrofluoric acid oxide etchant solutions |
| 05/14/1985 | US4516852 Method and apparatus for measuring intensity variation in a light source |
| 05/14/1985 | US4516833 Production of high performance optical spatial filters |
| 05/14/1985 | US4516832 Apparatus for transformation of a collimated beam into a source of _required shape and numerical aperture |
| 05/14/1985 | CA1187211A1 Lift-off shadow mask |
| 05/14/1985 | CA1187202A1 End point detection method |
| 05/09/1985 | WO1985002030A1 GRAFT POLYMERIZED SiO2 LITHOGRAPHIC MASKS |
| 05/09/1985 | WO1985001947A1 Photocurable (meth)acrylate and cationic monomers or prepolymers |
| 05/09/1985 | WO1985001906A1 Data handling system for a pattern generator |
| 05/08/1985 | EP0140730A1 Soft X-ray source utilising a microch annel plasma created by photoionization of a gas |
| 05/08/1985 | EP0140376A2 Thermally stable positive resist |
| 05/08/1985 | EP0140353A2 Photopolymerisable registration material for the preparation of printing forms and process for the production of printing forms with this materials |
| 05/08/1985 | EP0140319A2 Polynorbornene Negative Photoresist |
| 05/08/1985 | EP0140273A2 Positive photoresist compositions having deep UV response, photosensitive elements and thermally stable photochemically imaged systems containing same |
| 05/08/1985 | EP0140175A2 Method for manufacturing a Fresnel phase reversal plate lens |
| 05/07/1985 | US4516254 X-Ray lithographic apparatus |
| 05/07/1985 | US4516253 Lithography system |
| 05/07/1985 | US4516030 Scanning electron beam exposure system |
| 05/07/1985 | US4515887 Photopatternable dielectric compositions, method for making and use |
| 05/07/1985 | US4515886 Photoresists, semiconductors |
| 05/07/1985 | US4515877 Image-recording materials and image-recording carried out using these to produce an optical mask |
| 05/07/1985 | CA1186810A1 Apparatus for projecting a series of images onto dies of a semiconductor wafer |
| 05/07/1985 | CA1186570A1 Method for forming video discs |
| 05/02/1985 | EP0139479A1 Emulsion useful in preparing radiation sensitive microcapsules, preparations of microcapsules and processes for forming the same, and imaging sheets |
| 05/02/1985 | EP0139234A2 Resin composition |
| 05/02/1985 | EP0139211A2 Suction nozzle |
| 04/30/1985 | US4514858 Lithography system |
| 04/30/1985 | US4514857 X-Ray lithographic system |
| 04/30/1985 | US4514436 Methods of highlighting pinholes in a surface layer of an article |
| 04/30/1985 | US4514345 Method of making a foraminous member |
| 04/30/1985 | US4514082 Pattern generator for integrated circuits and process of generating patterns by means of said generator |
| 04/30/1985 | CA1186439A1 Light-sensitive mixture comprising a naphthoquinonediazidesulfonic acid ester and process for preparing said ester |
| 04/30/1985 | CA1186432A1 Radiation polymerizable mixture containing a (meth) acrylate ester of polyhydroxy with two or more urethane groups |
| 04/30/1985 | CA1186431A1 Photopolymerizable mixture including an aromatic compound having terminal (meth) acrylate groups |
| 04/30/1985 | CA1186171A1 Photopolymerizable recording material including a polyurethane binder free of quaternary in atoms material |
| 04/24/1985 | EP0138768A2 Light-sensitive condensate, process for the preparation thereof, coated material and use |
| 04/24/1985 | EP0138754A2 Photocurable compositions |
| 04/24/1985 | EP0138639A2 Inspection method for mask pattern used in semiconductor device fabrication |
| 04/24/1985 | EP0138602A2 Method of fabricating a photomask pattern |
| 04/24/1985 | EP0138459A1 Liquid crystal display device having color filter |
| 04/24/1985 | EP0138187A2 Photopolymerizable composition |
| 04/24/1985 | EP0137947A1 Spin dryer |
| 04/24/1985 | EP0137923A1 Electroconductive film system for aircraft windows |
| 04/23/1985 | US4513077 Electron beam or X-ray reactive image-formable resinous composition |
| 04/23/1985 | US4513076 Electron beam sensitive resist |
| 04/23/1985 | US4512848 Procedure for fabrication of microstructures over large areas using physical replication |
| 04/23/1985 | US4512657 Exposure control system |
| 04/23/1985 | US4512642 Automatic focusing apparatus in optical drawing machine |
| 04/23/1985 | CA1185982A1 Carboxyl-containing compositions and their polymerisation |
| 04/23/1985 | CA1185823A1 Dry transfer article including a graphic pattern of ink in a radiation sensitive adhesive layer |
| 04/17/1985 | EP0137679A1 Diacetylenes having liquid crystal phases |
| 04/17/1985 | EP0137655A2 Radiation-sensitive polymer composition |
| 04/17/1985 | EP0137452A1 Light-sensitive compounds containing trichloromethyl groups, process for their preparation and light-sensitive mixture containing these compounds |
| 04/17/1985 | EP0137366A2 Method for manufacturing a shadow mask |
| 04/17/1985 | EP0137331A2 Preparation of ozone resistant printing plates |
| 04/17/1985 | EP0137228A2 Photopolymerizable composition |
| 04/16/1985 | US4511757 Circuit board fabrication leading to increased capacity |
| 04/16/1985 | US4511646 Ethylenically-unsaturated dextrin composition for preparing a durable hydrophilic photopolymer |
| 04/16/1985 | US4511645 Photosensitive plate for lithographic printing plate |
| 04/16/1985 | US4511641 Metal film imaging structure |
| 04/16/1985 | US4511640 Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer |
| 04/16/1985 | US4511038 Container for masks and pellicles |
| 04/16/1985 | CA1185739A1 Photocurable compositions including a cationically polymerizable material, a dialkyl phenacyl sulfonium salt photoinitiator and a sensitizer |
| 04/16/1985 | CA1185648A1 System and film gate for accurately imaging information on a film by a charged particle beam |
| 04/10/1985 | EP0136903A2 Storage-stable photosensitive composition and article |
| 04/10/1985 | EP0136679A2 Photopolymerizable epoxy resin composition |
| 04/10/1985 | EP0136672A2 Method and apparatus for X-ray exposure |
| 04/10/1985 | EP0136534A2 Method of forming a large surface area integrated circuit |
| 04/10/1985 | EP0136452A2 Process for producing light hardened layers with a particular hardness |
| 04/10/1985 | EP0136421A2 Microlithographic process |
| 04/09/1985 | US4510593 Information disk of grooved, metal-coated crosslinked polymeric layer |
| 04/09/1985 | US4510230 Photopolymerizable compositions and elements containing acid to reduce scum and stain formation |
| 04/09/1985 | US4510228 Improved printing endurance |
| 04/09/1985 | US4510227 Light-sensitive aqueous developable copying material and product by coating process thereof utilizing polysiloxane and alkylene oxide copolymer as coating aid |
| 04/09/1985 | US4510226 Salt of aromatic diazonium compounds |
| 04/09/1985 | US4510176 Removal of coating from periphery of a semiconductor wafer |
| 04/09/1985 | US4509852 Apparatus for the photolithographic manufacture of integrated circuit elements |
| 04/09/1985 | US4509455 Apparatus for applying emulsion onto screen printing plate |
| 04/09/1985 | CA1185389A1 Radiation-polymerizable mixture including crosslinkable compound with terminal unsaturation and thermally crosslinkable compound |
| 04/09/1985 | CA1185387A1 Radiation-polymerizable mixture including a compound having terminal unsaturated groups and a compound having two epoxy groups |
| 04/09/1985 | CA1185310A1 Compression fitted tubular metal base for quartz lamp envelope |
| 04/03/1985 | EP0136186A2 Photocurable resin composition |
| 04/03/1985 | EP0136130A2 Method of making articles using gas functionalized plasma developed layer |
| 04/03/1985 | EP0136110A2 Positive photosensitive compositions useful as photoresists |
| 04/03/1985 | EP0135925A2 Photo-settable, light-shielding coating composition |
| 04/03/1985 | EP0135900A2 Aqueous developable negative resist compositions |
| 04/03/1985 | EP0135887A2 Photocurable composition |
| 04/03/1985 | EP0135863A2 Carbonylmethyleneheterocycles containing trihalogenmethyl-groups, process for their preparation and light-sensitive mixtures containing them |
| 04/03/1985 | EP0135682A2 Method and apparatus for applying emulsion onto screen printing plate |
| 04/03/1985 | EP0135616A2 Mixed photosensitive condensate and photosensitive registration material prepared therefrom |
| 04/03/1985 | EP0135573A1 Method for obtaining and observing color and relief images |